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Advanced Energy Industries Inc patents


Recent patent applications related to Advanced Energy Industries Inc. Advanced Energy Industries Inc is listed as an Agent/Assignee. Note: Advanced Energy Industries Inc may have other listings under different names/spellings. We're not affiliated with Advanced Energy Industries Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Advanced Energy Industries Inc-related inventors


 new patent  Switching amplifier

A rf amplifier is provided that includes a plurality of switch modules connected in a cascade configuration and divided into disjoint sets in accordance with their corresponding distinct peak dc voltages or currents, each switch module including a plurality of switch devices connected in a half-bridge or full-bridge circuit and a dc voltage or current source electrically connected with the half-bridge or full-bridge circuit, and a control circuit configured to determine an output voltage or current of the rf amplifier at the next switching interval, examine the states of the switching devices in the respective switch modules to identify a combination of least-recently-switched switching devices within each set of switch modules that, when switched to an opposite state, will produce the determined output voltage or current, and switch to an opposite state, at the next switching interval, the switching devices in the identified combination.. . ... Advanced Energy Industries Inc

Rate enhanced pulsed dc sputtering system

A sputtering system and method are disclosed. The system includes first power source coupled to a first magnetron and an anode, and the first power source provides a first anode voltage that alternates between positive and negative during each of multiple cycles. ... Advanced Energy Industries Inc

Rate enhanced pulsed dc sputtering system

A sputtering system and method are disclosed. The system includes a first power source that is configured to apply a first voltage at a first electrode that alternates between positive and negative relative to a second electrode during each of multiple cycles. ... Advanced Energy Industries Inc

Noise based frequency tuning and identification of plasma characteristics

This disclosure describes systems, methods, and apparatus for frequency tuning a power source so as to optimize power delivery to a plasma load as well as systems, methods, and apparatus for identifying characteristics and/or changes in characteristics of a plasma load. In particular, a secondary power signal can be applied concurrently with a primary power signal, the secondary power signal having a substantially lower power level, so as to tune for a global optimum of a measure of performance and/or identifying characteristics and/or changes in characteristics of a plasma load. ... Advanced Energy Industries Inc

Application of diode box to reduce crazing in glass coatings

Systems, methods, and apparatus are disclosed for reducing crazing in thin film stacks deposited on large area substrates such as glass, for instance architectural glass. Crazing can occur once a conductor-insulator-conductor series of films have been deposited, thereby effectively forming a capacitor, and where the substrate spans multiple deposition chambers such the coupling between chambers can cause the effective capacitor voltage to breakdown the insulator layer between the two conductor layers. ... Advanced Energy Industries Inc

System, method, and apparatus for controlling ion energy distribution in plasma processing systems

Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.. ... Advanced Energy Industries Inc

System and method for control of high efficiency generator source impedance

Systems and methods for adjusting the source impedance of a generator are disclosed. An exemplary method includes generating a first signal and applying the first signal to a first input of a combiner, generating a second signal and applying the second signal to a second input of said combiner, and combining the first and second signals with the combiner at an output of the combiner to produce power that is delivered to the plasma load. ... Advanced Energy Industries Inc

Apparatus for frequency tuning in a rf generator

A radio-frequency (rf) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem. The frequency-tuning subsystem includes a non-transitory, tangible, machine-readable medium containing instructions to perform a method that includes receiving an impedance trajectory of the plasma load; receiving a reference point in a complex-reflection-coefficient plane, the reference point lying on a reference vector passing through the reference point and the origin; receiving, from the sensor, a measured impedance of the plasma load; determining a measurement angle between a reference vector and a line passing through the reference point and a point in the complex-reflection-coefficient plane corresponding to the measured impedance; scaling the measurement angle by a predetermined constant to produce a frequency step; adding the frequency step to the initial frequency to produce an adjusted frequency; and causing the exciter to generate a signal oscillating at the adjusted frequency.. ... Advanced Energy Industries Inc

Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system

Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.. ... Advanced Energy Industries Inc

Method for balancing consumption of targets in pulsed dual magnetron sputtering (dms) processes

A sputtering system and method are disclosed. The system has at least one dual magnetron pair having a first magnetron and a second magnetron, each magnetron configured to support target material. ... Advanced Energy Industries Inc

Apparatus for controlled overshoot in a rf generator

A radio-frequency (rf) generator is provided that produces a controlled overshoot. One embodiment includes a rf power amplifier and a direct-current (dc) power supply that includes a primary dc power supply, an auxiliary dc power supply, a half-bridge circuit, and a control circuit. ... Advanced Energy Industries Inc

Frequency tuning for pulsed radio frequency plasma processing

This disclosure describes systems, methods, and apparatus for pulsed rf power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial rf frequency for each pulse. ... Advanced Energy Industries Inc

Adjustable non-dissipative voltage boosting snubber network

This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. ... Advanced Energy Industries Inc

Frequency tuning for pulsed radio frequency plasma processing

This disclosure describes systems, methods, and apparatus for pulsed rf power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial rf frequency for each pulse. ... Advanced Energy Industries Inc

01/26/17 / #20170025257

Arc management with voltage reversal and improved recovery

Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. ... Advanced Energy Industries Inc

01/26/17 / #20170022604

Systems and methods for single magnetron sputtering

A system and method for single magnetron sputtering are described. One example includes a system having a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing a thin film material on the substrate. ... Advanced Energy Industries Inc








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