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Advanced Micro fabrication Equipment Inc Shanghai patents

Recent patent applications related to Advanced Micro fabrication Equipment Inc Shanghai. Advanced Micro fabrication Equipment Inc Shanghai is listed as an Agent/Assignee. Note: Advanced Micro fabrication Equipment Inc Shanghai may have other listings under different names/spellings. We're not affiliated with Advanced Micro fabrication Equipment Inc Shanghai, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Advanced Micro fabrication Equipment Inc Shanghai-related inventors




Date Advanced Micro fabrication Equipment Inc Shanghai patents (updated weekly) - BOOKMARK this page
06/29/17Electrode structure for icp etcher
06/29/17Temperature adjusting a focus ring
06/29/17Multi-zone active-matrix temperature control system and temperature control method, and electrostatic chuck and plasma processing apparatus apply thereof
06/01/17Substrate processing method and apparatus thereof
05/11/17Method for mocvd gas showerhead pretreatment
12/01/16Processing chamber, combination of processing chamber and loadlock, and system for processing substrates
11/03/16Icp source design for plasma uniformity and efficiency enhancement
11/03/16Chemical vapor deposition apparatus and its cleaning method
08/18/16Process component and method to improve mocvd reaction process
06/16/16Device of changing gas flow pattern and a wafer processing method and apparatus
12/24/15Gas shower device, chemical vapor deposition device and method
10/08/15High frequency power supply device and high frequency power supplying method
01/22/15Apparatus and controlling heating of base within chemical vapour deposition chamber
01/22/15Method for measuring temperature of film in reaction chamber
05/01/14Coating for performance enhancement of semiconductor apparatus
05/01/14Coating packaged showerhead performance enhancement for semiconductor apparatus
05/01/14Performance enhancement of coating packaged esc for semiconductor apparatus
05/01/14Coating packaged chamber parts for semiconductor plasma apparatus
05/01/14Icp source design for plasma uniformity and efficiency enhancement
04/17/14Plasma processing method and plasma processing device
03/27/14Method for in situ cleaning of mocvd reaction chamber
03/27/14Method for in situ cleaning of mocvd reaction chamber
03/27/14Method for in situ cleaning of mocvd reaction chamber
11/07/13Method and device for measuring temperature of substrate in vacuum processing apparatus
03/14/13Inductively coupled plasma processing processing substrate with the same
10/11/12Cleaning apparatus and method, and film growth reaction apparatus and method







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