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Advanced Technology Materials Inc
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Advanced Technology Materials Inc_20131212
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Advanced Technology Materials Inc patents

Recent patent applications related to Advanced Technology Materials Inc. Advanced Technology Materials Inc is listed as an Agent/Assignee. Note: Advanced Technology Materials Inc may have other listings under different names/spellings. We're not affiliated with Advanced Technology Materials Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Advanced Technology Materials Inc-related inventors




Date Advanced Technology Materials Inc patents (updated weekly) - BOOKMARK this page
07/27/17Molded fluoropolymer breadseal with compliant material
04/06/17New antioxidants for post-cmp cleaning formulations
03/16/17Method for recycling of obsolete printed circuit boards
11/24/16Post chemical mechanical polishing formulations and use
09/15/16Dip tube assemblies and methods of manufacturing the same
08/18/16Nested blow molded liner and overpack and methods of making same
08/18/16Non-amine post-cmp composition and use
08/11/16Apparatus and pressure dispensing of high viscosity liquid-containing materials
07/14/16Compositions and methods for selectively etching titanium nitride
06/30/16Aqueous formulations for removing metal hard mask and post-etch residue with cu/w compatibility
06/09/16Generally cylindrically-shaped liner for use in pressure dispense systems and methods of manufacturing the same
06/02/16Apparatus and methods for filling and dispensing liquids
06/02/16Photoresist removal
05/26/16Nested blow molded liner and overpack and methods of making same
05/12/16Compositions and methods for selectively etching titanium nitride
05/05/16Compositions and methods for removing ceria particles from a surface
05/05/16Sustainable process for reclaiming precious metals and base metals from e-waste
04/21/16Liquid dispensing systems with gas removal and sensing capabilities
03/31/16Method for recycling of obsolete printed circuit boards
03/17/16Copper cleaning and protection formulations
02/25/16Etching agent for copper or copper alloy
02/11/16Liquid dispensing systems encompassing gas removal
02/04/16Compositions and methods for selectively etching titanium nitride
02/04/16Copper cleaning and protection formulations
02/04/16Compositions and methods for the selective removal of silicon nitride
12/17/15Fluid storage and dispensing systems and processes
12/03/15Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
11/19/15Liner-based shipping and dispensing systems
11/12/15Apparatus and stripping solder metals during the recycling of waste electrical and electronic equipment
11/12/15Folded liner for use with an overpack and methods of manufacturing the same
11/12/15Fluid processing systems and methods
11/12/15Apparatus and stripping solder metals during the recycling of waste electrical and electronic equipment
11/12/15Apparatus and stripping solder metals during the recycling of waste electrical and electronic equipment
11/05/15Dip tube assemblies and methods of manufacturing the same
10/29/15Aqueous cleaner for the removal of post-etch residues
10/22/15Liner-based liquid storage and dispensing systems with empty detection capability
10/08/15Fluid storage and dispensing systems and processes
10/01/15Opto-electronic inspection quality assurance system for fluid dispensing valves
09/24/15Liner-based assembly for removing impurities
09/17/15Cleaning agent for semiconductor provided with metal wiring
06/18/15Composition and process for stripping photoresist from a surface including titanium nitride
06/11/15Formulations for wet etching nipt during silicide fabrication
05/28/15Silicon precursors for low temperature ald of silicon-based thin-films
05/07/15Manufacturing generally cylindrical three-dimensional conformal liners
04/30/15Aqueous clean solution with low copper etch rate for organic residue removal improvement
04/30/15Storage and stabilization of acetylene
03/19/15Methods for the selective removal of ashed spin-on glass
03/19/15Material storage and dispensing packages and methods
02/05/15Alternate materials and mixtures to minimize phosphorus buildup in implant applications
01/29/15Recovery of xe and other high value compounds
01/29/15Gas storage and dispensing system with monolithic carbon adsorbent
01/29/15Compositions and methods for selectively etching titanium nitride
01/29/15Liquid handling system with electronic information storage
01/22/15Polymer-based multilayer gas barrier film
01/15/15Fluid delivery system and method
01/01/15Oxidizing aqueous cleaner for the removal of post-etch residues
12/25/14Liner-based shipping and dispensing systems
11/20/14Ion implantation system and method
10/30/14Sulfolane mixtures as ambient aprotic polar solvents
10/30/14Formulations for the removal of particles generated by cerium-containing solutions
10/16/14Closure/connectors for liner-based shipping and dispensing containers and methods for filling liner-based shipping and dispensing containers
10/16/14Method for the recovery of lithium cobalt oxide from lithium ion batteries
10/09/14Adsorbent having utility for co2 capture from gas mixtures
10/02/14Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
08/21/14Systems and methods for capture, storage, and supplying phosphine gas
Patent Packs
08/07/14Antimony and germanium complexes useful for cvd/ald of metal thin films
07/31/14Substantially rigid collapsible container with fold pattern
07/31/14Photoresist removal
07/24/14Pvdf pyrolyzate adsorbent and gas storage and dispensing system utilizing same
07/24/14Nested blow molded liner and overpack and methods of making same
07/24/14Low temperature deposition of phase change memory materials
07/24/14Antimony compounds useful for deposition of antimony-containing materials
07/24/14Antioxidants for post-cmp cleaning formulations
07/10/14Apparatus and stripping solder metals during the recycling of waste electrical and electronic equipment
07/03/14Removal of masking material
05/15/14High-k perovskite materials and methods of making and using the same
05/01/14Liner-based dispensing systems
04/17/14Low temperature gst process
04/03/14Isotopically-enriched boron-containing compounds, and methods of making and using same
03/27/14Refillable ampoule with purge capability
Patent Packs
02/13/14Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
02/06/14Generally cylindrically-shaped liner for use in pressure dispense systems and methods of manufacturing the same
02/06/14Composition and process for selectively etching metal nitrides
01/30/14Carbon adsorbent and process for separating high-octane components from low-octane components in a naptha raffinate stream using such carbon adsorbent
01/23/14Component for solar adsorption refrigeration system and making such component
01/09/14Cluster ion implantation of arsenic and phosphorus
01/02/14Connectors for liner-based dispense containers
12/19/13Sustainable process for reclaiming precious metals and base metals from e-waste
12/19/13Rectangular parallelepiped fluid storage and dispensing vessel
12/12/13High viscosity re-circulation probe
12/12/13Apparatus and process for integrated gas blending
12/05/13Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
12/05/13Carbon adsorbent for hydrogen sulfide removal from gases containing same, and regeneration of adsorbent
11/14/13Carbon pyrolyzate adsorbent having utility for co2 capture and methods of making and using the same
11/14/13Composition for and suppressing titanium nitride corrosion
11/07/13Methods of texturing surfaces for controlled reflection
11/07/13Aqueous cleaner for the removal of post-etch residues
10/31/13Liner-based dispenser
10/31/13Phase change memory structure comprising phase change alloy center-filled with dielectric material
10/24/13Method for recycling of obsolete printed circuit boards
10/24/13Method for preventing the collapse of high aspect ratio structures during drying
10/17/13Etching solution for copper or copper alloy
09/26/13Ion implanter system including remote dopant source, and method comprising same
09/26/13Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition
09/05/13Method and apparatus to help promote contact of gas with vaporized material
08/22/13Liner-based assembly for removing impurities
08/15/13Method and enhanced lifetime and performance of ion source in an ion implantation system
08/08/13Cleaning agent for semiconductor provided with metal wiring
08/01/13Substantially rigid collapsible liner, container and/or liner for replacing glass bottles, and enhanced flexible liners
07/04/13Liquid dispensing systems encompassing gas removal
Social Network Patent Pack
05/30/13Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
05/23/13Endpoint determination for capillary-assisted flow control
05/16/13Doping of zro2 for dram applications
05/09/13Recovery of xe and other high value compounds
05/09/13Germanium antimony telluride materials and devices incorporating same
05/02/13Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
03/28/13Germanium antimony telluride materials and devices incorporating same
03/28/13Carbon materials for carbon implantation
03/21/13Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
03/07/13Liner-based liquid storage and dispensing systems with empty detection capability
Patent Packs
01/31/13Container sealing system
01/31/13Antimony and germanium complexes useful for cvd/ald of metal thin films
01/03/13Prevention of liner choke-off in liner-based pressure dispensation system
01/03/13Low temperature deposition of phase change memory materials
12/27/12Gas storage and dispensing system with monolithic carbon adsorbent
12/13/12Method and enhanced lifetime and performance of ion source in an ion implantation system
12/13/12Ventilation gas management systems and processes
12/06/12Nanoporous articles and methods of making same
11/29/12Photoresist removal
11/22/12Liquid dispensing systems with gas removal and sensing capabilities
11/08/12Copper cleaning and protection formulations
10/25/12Substantially rigid collapsible liner and flexible gusseted or non-gusseted liners and methods of manufacturing the same and methods for limiting choke-off in liners
10/04/12Ion implantation system and method
08/02/12Zirconium, hafnium and titanium precursors for atomic layer deposition of corresponding metal-containing films
07/26/12Liquid handling system with electronic information storage
07/19/12Pvdf pyrolyzate adsorbent and gas storage and dispensing system utilizing same
07/12/12Composition and low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
06/21/12Method and apparatus to help promote contact of gas with vaporized material
06/21/12Monosilane or disilane derivatives and low temperature deposition of silicon-containing films using the same
06/07/12Fluid processing systems and methods
06/07/12Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
06/07/12Method and enhanced lifetime and performance of ion source in an ion implantation system
05/31/12Fluid monitoring apparatus
05/31/12Silicon removal from surfaces and forming high k metal gate structures using same
05/24/12Doped zro2 capacitor materials and structures
05/10/12Ion implantation tool cleaning apparatus and method
05/10/12Tpir monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same
05/10/12Low temperature gst process
05/03/12Amorphous ge/te deposition process
05/03/12Isotopically-enriched boron-containing compounds, and methods of making and using same
Patent Packs
03/15/12Method and composition for depositing ruthenium with assistive metal species
03/08/12Ion source cleaning in semiconductor processing systems
03/01/12Apparatus and preparation of compounds or intermediates thereof from a solid material, and using such compounds and intermediates
02/23/12Compositions and the removal of photoresist for a wafer rework application
02/02/12Non-amine post-cmp composition and use
01/19/12Lithographic tool in situ clean formulations
12/15/11Gas storage and dispensing system with monolithic carbon adsorbent
11/24/11Fluid storage and dispensing vessels having colorimetrically verifiable leak-tightness and making same
11/17/11Rectangular parallelepiped fluid storage and dispensing vessel
11/10/11Composition and recycling semiconductor wafers having low-k dielectric materials thereon
10/27/11Ion source cleaning in semiconductor processing systems
10/27/11High concentration nitrogen-containing germanium telluride based memory devices and processes of making
10/27/11Antimony and germanium complexes useful for cvd/ald of metal thin films
10/20/11Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
09/29/11Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
09/22/11Fluid storage and dispensing systems and processes
09/22/11Fluid storage and dispensing systems, and fluid supply processes comprising same
09/15/11Nanoporous articles and methods of making same
08/11/11Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
08/04/11Oxidizing aqueous cleaner for the removal of post-etch residues
Social Network Patent Pack
07/28/11Gesbte material including superflow layer(s), and use of ge to prevent interaction of te from sbxtey and gextey resulting in high te content and film crystallinity
07/28/11Composition and low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
07/14/11Source reagent compositions and forming metal films on a substrate by chemical vapor deposition
07/07/11Monosilane or disilane derivatives and low temperature deposition of silicon-containing films using the same
06/30/11Isotopically-enriched boron-containing compounds, and methods of making and using same
06/16/11Removal of masking material
06/09/11Composition and low temperature deposition of silicon-containing films
05/19/11Non-selective oxide etch wet clean composition and use
05/12/11Antimony compounds useful for deposition of antimony-containing materials
04/28/11Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
04/28/11Isotopically-enriched boron-containing compounds, and methods of making and using same
03/17/11Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
03/10/11Metal aminotroponiminates, bis-oxazolinates and guanidinates
03/03/11Component for solar adsorption refrigeration system and making such component
03/03/11Method and apparatus to help promote contact of gas with vaporized material
02/17/11Composition and removing ion-implanted photoresist
01/27/11Carbon materials for carbon implantation
01/13/11Solvent-free synthesis of soluble nanocrystals
01/06/11Hollow gst structure with dielectric fill
12/16/10Composition and low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Social Network Patent Pack
12/16/10Apparatus and hydrogen generation from gaseous hydride
12/16/10Antimony and germanium complexes useful for cvd/ald of metal thin films
11/18/10Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition
11/11/10Composition and low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
11/11/10Low ph post-cmp residue removal composition and use
11/04/10Novel bismuth precursors for cvd/ald of thin films
10/28/10Zirconium precursors useful in atomic layer deposition of zirconium-containing films
10/14/10Non-fluoride containing composition for the removal of residue from a microelectronic device
10/07/10Solid precursor-based delivery of fluid utilizing controlled solids morphology
09/30/10Chemical mechanical polishing compositions for copper and associated materials and using same
09/23/10Tantalum amido-complexes with chelate ligands useful for cvd and ald of tan and ta205 thin films
09/09/10Apparatus and process for integrated gas blending
09/02/10Composition and low temperature deposition of silicon-containing films
08/26/10Fluid storage and dispensing systems, and fluid supply processes comprising same
08/26/10Tantalum amide complexes for depositing tantalum-containing films, and making same
08/26/10Photometrically modulated delivery of reagents
08/19/10Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
08/19/10In situ generation of ruo4 for ald of ru and ru related materials
08/19/10Group iv complexes as cvd and ald precursors for forming metal-containing thin films
07/22/10Gas delivery system with integrated valve manifold functionality for sub-atmospheric and super-atmospheric pressure applications
07/15/10Compositions and methods for the selective removal of silicon nitride
07/01/10Liquid cleaner for the removal of post-etch residues
07/01/10Precursors for silicon dioxide gap fill
06/24/10Cleaning of semiconductor processing systems
06/17/10Liquid handling system with electronic information storage
06/10/10Feedback control maintaining constant resistance operation of electrically heated elements
06/03/10Liquid dispensing systems encompassing gas removal
06/03/10Copper (i) compounds useful as deposition precursors of copper thin films
05/27/10Systems and methods for material blending and distribution
05/06/10Zirconium, hafnium, titanium, and silicon precursors for ald/cvd
Social Network Patent Pack
05/06/10Methods for stripping material for wafer reclamation
05/06/10Method of forming ultra-shallow junctions for semiconductor devices
05/06/10Fluid storage and dispensing systems and processes
04/22/10Precursor compositions for ald/cvd of group ii ruthenate thin films
04/08/10Stabilization of polymer-silica dispersions for chemical mechanical polishing slurry applications
03/18/10Composition and process for the selective remove of tisin
03/18/10Composition and low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
03/11/10Pressure-based gas delivery reducing risks associated with storage and delivery of high pressure gases
03/11/10Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
03/04/10Compositions and methods for the removal of photoresist for a wafer rework application
02/11/10Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
02/04/10Prevention of liner choke-off in liner-based pressure dispensation system
01/28/10Precursors for cvd/ald of metal-containing films
01/07/10Systems and methods for managing material storage vessels having information storage elements
12/31/09Systems and devices for mixing substances and methods of making same
12/24/09Liner-based liquid storage and dispensing systems with empty detection capability
12/10/09Formulations for removing cooper-containing post-etch residue from microelectronic devices
12/10/09Apparatus and process for sensing fluoro species in semiconductor processing systems
12/10/09Antimony and germanium complexes useful for cvd/ald of metal thin films
12/03/09Barrier fluoropolymer film-based liners and packaging comprising same
11/12/09Low ph mixtures for the removal of high density implanted resist
11/12/09Composition and low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
11/05/09Semiconductor manufacturing facility utilizing exhaust recirculation
11/05/09Bicyclic guanidinates and bridging diamides as cvd/ald precursors
09/24/09Antioxidants for post-cmp cleaning formulations
08/27/09Integrated chemical mechanical polishing composition and process for single platen processing
08/27/09Compositions and methods for selective removal of metal or metal alloy after metal silicide formation
08/27/09Material storage and dispensing packages and methods
08/27/09Tellurium compounds useful for deposition of tellurium containing materials







ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009



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