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Applied Materials Inc
Applied Materials Inc A Delaware Corporation
Applied Materials Incorporated
Applied Materials Inc A Corporation Of The State Of Delaware U s a
Applied Materials Inc_20100107
Applied Materials Inc_20100121
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Applied Materials Inc_20100128
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Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors

Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
12/07/17 new patent  Effective and novel design for lower particle count and better wafer quality by diffusing the flow inside the chamber
12/07/17 new patent  High pressure ammonia nitridation of tunnel oxide for 3dnand applications
12/07/17 new patent  Sputtering target for pvd chamber
12/07/17 new patent  Integrated cluster tool for selective area deposition
12/07/17 new patent  Halogen-containing silane-based metal silicide as nucleation layer for tungsten ald
12/07/17 new patent  Symmetrical inductively coupled plasma source with symmetrical flow chamber
12/07/17 new patent  Inductively coupled plasma source with multiple dielectric windows and window supporting structure
12/07/17 new patent  Vacuum platform with process chambers for removing carbon contaminants and surface oxide from semiconductor substrates
12/07/17 new patent  Energy efficient communication and display device
12/07/17 new patent  Substrate distance monitoring
12/07/17 new patent  Apparatus and selective deposition
12/07/17 new patent  Method for wafer outgassing control
12/07/17 new patent  Rotary plasma electrical feedthrough
12/07/17 new patent  Dodecadon transfer chamber and processing system having the same
12/07/17 new patent  Workpiece carrier for high power with enhanced edge sealing
12/07/17 new patent  High power electrostatic chuck design with radio frequency coupling
12/07/17 new patent  Electrostatic chuck having properties for optimal thin film deposition or etch processes
12/07/17 new patent  Contour pocket and hybrid susceptor for wafer uniformity
12/07/17 new patent  Hardmask layer for 3d nand staircase structure in semiconductor applications
12/07/17 new patent  Methods for forming fin structures with desired profile for 3d structure semiconductor applications
12/07/17 new patent  Self-centering pedestal heater
11/30/17Mask arrangement for masking a substrate in a processing chamber
11/30/17Plating power supply with headroom control and ethercat interface
11/30/17Non-contact temperature measurement by dual-wavelength shift in brewster's angle
11/30/17Semiconductor device search and classification
11/30/17Apparatus and methods for reducing particles in semiconductor process chambers
11/30/17Processing chamber with irradiance curing lens
11/30/17Substrate support assembly
11/30/17Visual feedback for process control in rtp chambers
11/30/17Electrostatic chuck impedance evaluation
11/30/17Evaporation source for organic material, deposition depositing organic materials in a vacuum chamber having an evaporation source for organic material, and evaporating organic material
11/30/17Dynamic control band for rf plasma current ratio control
11/23/17Structure for relaxed sige buffers including forming
11/23/17Gas distribution showerhead for semiconductor processing
11/23/17Gas distribution showerhead for semiconductor processing
11/23/17Non-shadow frame plasma processing chamber
11/23/17Electroplating apparatus with current crowding adapted contact ring seal and thief electrode
11/23/17Two-step fluorine radical etch of hafnium oxide
11/23/17Systems and methods for improved semiconductor etching and component protection
11/23/17Systems and methods for improved semiconductor etching and component protection
11/23/17Thermal coupled quartz dome heat sink
11/16/17Sensor based auto-calibration wafer
11/16/17Rf choke for gas delivery to an rf driven electrode in a plasma processing apparatus
11/16/17Pyrometer background elimination
11/16/17Integrated controller solution for monitoring and controlling manufacturing equipment
11/16/17Increasing the gas efficiency for an electrostatic chuck
11/16/17Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films
11/16/17Liquid particle counting of semiconductor component parts
11/16/17Pyrometry filter for thermal process chamber
11/16/17Forming non-line-of-sight source drain extension in an nmos finfet using n-doped selective epitaxial growth
11/09/17Material source arrangment and nozzle for vacuum deposition
11/09/17Selective cobalt deposition on copper surfaces
11/09/17Full-area counter-flow heat exchange substrate support
11/09/17Apparatus and methods for depositing ald films with enhanced chemical exchange
11/09/17Gas panel reducing exhaust requirements
11/09/17Dual loop susceptor temperature control system
11/09/17Plasma treatment process for in-situ chamber cleaning efficiency enhancemnet in plasma processing chamber
11/09/17Protective metal oxy-fluoride coatings
11/09/17Methods of depositing sicon with c, o and n compositional control
11/09/17Selectively lateral growth of silicon oxide thin film
11/09/17Plasma poisoning to enable selective deposition
11/09/17Selective deposition through formation of self-assembled monolayers
11/09/17Method of selective etching on epitaxial film on source/drain area of transistor
Patent Packs
11/09/17Single use rinse in a linear marangoni drier
11/09/17Robot subassemblies, end effector assemblies, and methods with reduced cracking
11/09/17Systems, apparatus, and methods for an improved substrate handling assembly
11/09/17Lithium metal coating on battery separators
11/02/17Stepped retaining ring
11/02/17Material deposition arrangement, a vacuum deposition depositing material
11/02/17Ceramic coated quartz lid for processing chamber
11/02/17Atomic layer deposition of protective coatings for semiconductor process chamber components
11/02/17Side inject nozzle design for processing chamber
11/02/17Methods and deposition processes
11/02/17Non-disappearing anode for use with dielectric deposition
11/02/17Methods for conformal treatment of dielectric films with low thermal budget
11/02/17Methods for chemical etching of silicon
11/02/17Direct optical heating of substrates
11/02/17Dome cooling using compliant material
Patent Packs
11/02/17Apparatus and methods for a mask inverter
11/02/17System and all wrap around porous silicon formation
10/26/17Apparatus for controlling temperature uniformity of a showerhead
10/26/17Temperature controlled remote plasma clean for exhaust deposit removal
10/26/17Integration of laser processing with deposition of electrochemical device layers
10/26/17Shadow frame support
10/26/17Gas feedthrough assembly
10/26/17Enhanced spatial ald of metals through controlled precursor mixing
10/26/17Chemical delivery chamber for self-assembled monolayer processes
10/26/17Method & apparatus to prevent deposition rate/thickness drift, reduce particle defects & increase remote plasma system lifetime
10/26/17Substrate support pedestal having plasma confinement features
10/26/17Coolant and a method to control the ph and resistivity of coolant used in a heat exchanger
10/26/17Eco-efficiency characterization tool
10/26/17Doped and undoped vanadium oxides for low-k spacer applications
10/26/17Surface functionalization and passivation with a control layer
10/26/17Chemical mechanical polishing apparatus and methods
10/26/17High temperature chuck for plasma processing systems
10/26/17Apparatus for prevention of backside deposition in a spatial ald process chamber
10/26/17Microwave anneal to improve cvd metal gap-fill and throughput
10/26/17Method for pecvd overlay improvement
10/26/17Dynamic wafer leveling/tilting/swiveling during a chemical vapor deposition process
10/26/17System for non radial temperature control for rotating substrates
10/26/17Horizontal gate all around device nanowire air gap spacer formation
10/19/17Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle
10/19/17Chemical mechanical polishing apparatus and methods
10/19/17Nanoparticle based cerium oxide slurries
10/19/17Micro-volume deposition chamber
10/19/1730 nm in-line lpc testing and cleaning of semiconductor processing equipment
10/19/17Rps assisted rf plasma source for semiconductor processing
10/19/17Coating architecture for plasma sprayed chamber components
Social Network Patent Pack
10/19/17Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
10/19/17Apparatus for exhaust cooling
10/19/17Ultra-conformal carbon film deposition
10/19/17Device conformity control by low temperature, low pressure, inductively coupled ammonia-nitrogen trifluoride plasma
10/19/17Multilayer thin film device encapsulation using soft and pliable layer first
10/19/17Multilayer thin film device encapsulation using soft and pliable layer first
10/19/17Energy storage device with wraparound encapsulation
10/19/17Multilayer thin film device encapsulation using soft and pliable layer first
10/19/17Energy storage device with encapsulation anchoring
10/19/17Thin film device encapsulation using volume change accommodating materials
Patent Packs
10/19/17System and maskless thin film battery fabrication
10/19/17Device and maskless thin film etching
10/19/17Thin film battery device and formation
10/19/17Thin film battery device and formation
10/19/17Thin film battery device having recessed substrate and formation
10/19/17Energy storage device having an interlayer between electrode and electrolyte layer
10/19/17Optically heated substrate support assembly with removable optical fibers
10/12/17Fluorine reduction with scope with controlled oxidation
10/12/17Solution precursor plasma spray of ceramic coating for semiconductor chamber applications
10/12/17Method to reduce line waviness
10/12/17Plasma-enhanced anneal chamber for wafer outgassing
10/12/17Hkmg integration
10/12/17Semiconductor processing chamber
10/12/17Vacuum chuck pressure control system
10/12/17Methods for forming 2-dimensional self-aligned vias
10/05/17Cleaning process that precipitates yttrium oxy-flouride
10/05/17Low temperature fluoride glasses and glazes
10/05/17Fluoride glazes from fluorine ion treatment
10/05/17Apparatus and providing a uniform flow of gas
10/05/17Electroplating wafers having a notch
10/05/17Smart tool monitoring system
10/05/17Aerosol deposition coating for semiconductor chamber components
10/05/17Integrated metrology and process tool to enable local stress/overlay correction
10/05/17Apparatus and methods for wafer rotation in carousel susceptor
10/05/17High solids content paste formulations for secondary battery electrode
10/05/17Laser patterned thin film battery
10/05/17Mixed-platform apparatus, systems, and methods for substrate processing
09/28/17Chamber components with polished internal apertures
09/28/17Polishing system with local area rate control and oscillation mode
09/28/17Local area polishing system and polishing pad assemblies for a polishing system
Patent Packs
09/28/17Chamber liner for high temperature processing
09/28/17Apparatus and methods to remove residual precursor inside gas lines post-deposition
09/28/17Substrate support assembly with non-uniform gas flow clearance
09/28/17Alumina layer formation on aluminum surface to protect aluminum parts
09/28/17Electroplating contact ring with radially offset contact fingers
09/28/17Susceptor support
09/28/17Ceramic heater with enhanced rf power delivery
09/28/17Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
09/28/17Electrochemical cell with protected negative electrode
09/28/17Special lipon mask to increase lipon ionic conductivity and tfb fabrication yield
09/28/17Electrochemical device stacks including interlayers for reducing interfacial resistance and over-potential
09/21/17Symmetric plasma process chamber
09/21/17Oriented laser activated processing chamber
09/21/17Substrate support assembly having metal bonded protective layer
09/21/17Method and reducing radiation induced change in semiconductor structures
09/21/17In-situ temperature measurement in a noisy environment
09/21/17Methods and assemblies for gas flow ratio control
09/21/17Methods and assemblies for gas flow ratio control
09/21/17Methods for gapfill in high aspect ratio structures
09/14/17Substrate processing system having susceptorless substrate support with enhanced substrate heating control
Social Network Patent Pack
09/14/17Pad structure and fabrication methods
09/14/17Plasma resistant coating with tailorable coefficient of thermal expansion
09/14/17Method for electrochemically grown yttria or yttrium oxide on semiconductor processing equipment
09/14/17Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment
09/14/17Intelligent hardstop for gap detection and control mechanism
09/14/17Apparatus for cost-effective conversion of unsupervised fault detection (fd) system to supervised fd system
09/14/17Heated substrate support
09/14/17Selective deposition of silicon nitride films for spacer applications
09/14/17Methods and selective dry etch
09/14/17Bottom processing
09/14/17Multiple wafer rotary processing
09/14/17Multi-zone pedestal for plasma processing
09/14/17Method to remove residual charge on a electrostatic chuck during the de-chucking step
09/14/17Support cylinder for thermal processing cylinder
09/07/17Methods and controlling ion fraction in physical vapor deposition processes
09/07/17In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
09/07/17Self-assembled monolayer blocking with intermittent air-water exposure
09/07/17Methods and conserving electronic device manufacturing resources
09/07/17Substrate support assembly for high temperature processes
09/07/17Universal process kit
Social Network Patent Pack
09/07/17Doping control of metal nitride films
08/31/17Window in thin polishing pad
08/31/17High purity metallic top coat for semiconductor manufacturing components
08/31/17Enhanced plating bath and additive chemistries for cobalt plating
08/31/17Method for inter-chamber process
08/31/17Stiction-free drying process with contaminant removal for high-aspect ratio semiconductor device str
08/31/17Electrostatic chuck having thermally isolated zones with minimal crosstalk
08/31/17Electrostatic chuck optimized for refurbishment
08/31/17Fluoro polymer contact layer to carbon nanotube chuck
08/31/17Methods for integration of organic and inorganic materials for oled encapsulating structures
08/31/17Evaporation source having multiple source ejection directions
08/24/17Lid assembly for a processing system to facilitate sequential deposition techniques
08/24/17Systems, apparatus, and methods for an electromagnetic interference shielding optical polarizer
08/24/17Showerhead having an extended detachable gas distribution plate
08/24/17Cyclic oxide spacer etch process
08/24/17Method and forming porous silicon layers
08/24/17Carrier head membrane with a bead
08/24/17Thin film transistor fabrication utlizing an interface layer on a metal electrode layer
08/24/17Parallel plate inline substrate processing tool
08/24/17System for depositing one or more layers on a substrate supported by a carrier and method using the same
08/17/17Medical bodily fluid sampling device
08/17/17In-situ temperature control during chemical mechanical polishing with a condensed gas
08/17/17Reactor gas panel common exhaust
08/17/17Particle generation suppresor by dc bias modulation
08/17/17Chemical control features in wafer process equipment
08/17/17Rotatable substrate support having radio frequency applicator
08/17/17Fluorination during ald high-k, fluorination post high-k and use of a post fluorination anneal to engineer fluorine bonding and incorporation
08/17/17Manufacturing of high capacity prismatic lithium-ion alloy anodes
08/17/17Three-dimensional thin film battery
08/10/17Systems, apparatus, and methods for chemical polishing
Social Network Patent Pack
08/10/17Process chamber for dielectric gapfill
08/10/17Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplating
08/10/17Oxide etch selectivity systems and methods
08/10/17Semiconductor processing systems having multiple plasma configurations
08/10/17Methods and systems to enhance process uniformity
08/10/17Systems and methods for internal surface conditioning in plasma processing equipment
08/10/17Method for removing native oxide and residue from a iii-v group containing surface
08/10/17Flow distribution plate for surface fluorine reduction
08/10/17Methods for selective etching of a silicon material
08/10/17Integrated layer etch system with multiple type chambers
08/10/17Process chamber for etching low k and other dielectric films
08/10/17Low temperature chuck for plasma processing systems
08/10/17Bolted wafer chuck thermal management wafer processing systems
08/10/17Thermal management wafer processing systems
08/10/17Substrate support chuck cooling for deposition chamber
08/10/17Interface engineering for high capacitance capacitor for liquid crystal display
08/10/17High-k dielectric materials utilized in display devices
08/10/17Substrate support with quadrants
08/03/17Plasma abatement of compounds containing heavy atoms
08/03/17Compact eye module layout
08/03/17Methods for igniting a plasma in a substrate processing chamber
08/03/17Rtp process for directed self-aligned patterns
08/03/17System and method in indium-gallium-arsenide channel height control for sub 7nm finfet
08/03/17Conductive wafer lift pin o-ring gripper with resistor
08/03/17High speed epitaxy system and methods
07/27/17Sputter source for semiconductor process chambers
07/27/17Ceramic showerhead with embedded conductive layers
07/27/17Ceramic slit valve doors and assemblies
07/27/17Gas splitting by time average injection into different zones by fast gas valves

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Applied Materials Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Applied Materials Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by