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Applied Materials Inc
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Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors




Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
03/23/17 new patent  Evaporation source for organic material
03/23/17 new patent  Shadow frame with non-uniform gas flow clearance for improved cleaning
03/23/17 new patent  Showerhead support structures
03/23/17 new patent  Ambient laminar gas flow distribution in laser processing systems
03/23/17 new patent  3d printed magnetron having enhanced cooling characteristics
03/23/17 new patent  Low temperature conformal deposition of silicon nitride on high aspect ratio structures
03/23/17 new patent  Apparatus and selective deposition
03/23/17 new patent  Cleaning method
03/23/17 new patent  Titanium-compound based hard mask films
03/23/17 new patent  Method of enabling seamless cobalt gap-fill
03/23/17 new patent  Amorphization layer, selective, defect free superactivation
03/23/17 new patent  Large area dual substrate processing system
03/16/17Selectively openable support platen for additive manufacturing
03/16/17Fabrication of base plate, fabrication of enclosure, and fabrication of support posts in additive manufacturing
03/16/17Pulse train annealing method and apparatus
03/16/17Scheduling in manufacturing environments
03/16/17Planning for manufacturing environments
03/16/17Substrate support with real time force and film stress control
03/16/17Plasma module with slotted ground plate
03/16/17One-piece process kit shield for reducing the impact of an electric field near the substrate
03/16/17Substrate carrier using the same
03/16/17System to detect wafer arcing in semiconductor manufacturing equipment
03/09/17Evaporation system with measurement unit
03/09/17Apparatus and thin-film processing applications
03/09/17Line edge roughness reduction via step size alteration
03/09/17Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
03/09/17Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
03/09/17Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasma chambers
03/09/17Process chamber for cyclic and selective material removal and etching
03/09/17Methods and uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices
03/02/17Method for removing aluminum fluoride contamination from semiconductor processing equipment
03/02/17Deposition platform for flexible substrates and operation thereof
03/02/17Plasma etching systems and methods with secondary plasma injection
03/02/17Methods and in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers
03/02/17Nanocrystaline diamond carbon film for 3d nand hardmask application
03/02/17Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in pecvd system
03/02/17Methods of depositing metal films using metal oxyhalide precursors
03/02/17In-situ removable electrostatic chuck
03/02/17Electrostatic carrier for thin substrate handling
03/02/17Vnand tensile thick teos oxide
03/02/17Battery separator with dielectric coating
02/23/17Heating source for spatial atomic layer deposition
02/23/17Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control
02/23/17Methods and co-sputtering multiple targets
02/23/17High temperature thermal ald silicon nitride films
02/23/17Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3d structure semiconductor applications
02/16/17Topography prediction using system state information
02/16/17Methods for producing interconnects in semiconductor devices
02/16/17Electrostatic chuck with electrostatic fluid seal for containing backside gas
02/09/17Method and the selective deposition of epitaxial germanium stressor alloys
02/09/17Low temperature ald on semiconductor and metallic surfaces
02/09/17Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ald
02/09/17Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
02/09/17Oxide etch selectivity systems and methods
02/09/17Gas-phase silicon oxide selective etch
02/09/17Thermal management wafer processing systems
02/09/17Bolted wafer chuck thermal management wafer processing systems
02/09/17Thin heated substrate support
02/09/17Process sheet resistance uniformity improvement using multiple melt laser exposures
02/09/17Ceramic heater and esc with enhanced wafer edge performance
02/09/17Integrated bit-line airgap formation and gate stack post clean
02/09/17Structure for relaxed sige buffers including forming
02/02/17High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
Patent Packs
02/02/17Batch processing chamber
02/02/17Rotating substrate laser anneal
02/02/17Locally heated multi-zone substrate support
02/02/17Substrate lift pin actuator
01/26/17Additive manufacturing with pre-heating
01/26/17Exothermic powders for additive manufacturing
01/26/17A processing processing devices, particularly devices including organic materials therein, and transferring an evaporation source from a processing vacuum chamber to a maintenance vacuum chamber or from the maintenance vacuum chamber to the processing vacuum chamber
01/26/17Heteroleptic diazadiene-containing tungsten precursors for thin film deposition
01/26/17Electroplating apparatus with electrolyte agitation
01/26/17Method and gas abatement
01/19/17Brace structures for additive manufacturing
01/19/17Selective material dispensing in additive manufacturing
01/19/17Deposition of metal films using beta-hydrogen free precursors
01/19/17Pecvd process
01/19/17Inert anode electroplating processor and replenisher
Patent Packs
01/19/17Process for removing contamination on ruthenium surface
01/19/17Quarter wave light splitting
01/19/17Adjustable process spacing, centering, and improved gas conductance
01/19/17Method of selective epitaxy
01/19/17Metal removal with reduced surface roughness
01/19/17Methods and substrate edge cleaning
01/19/17Uv-assisted material injection into porous films
01/19/17Horizontal gate all around device isolation
01/19/17Methods for forming structures with desired crystallinity for mram applications
01/19/17Fluorine-containing polymerized hmdso applications for oled thin film encapsulation
01/12/17Wafer electroplating chuck assembly
01/12/17Electroplating apparatus with membrane tube shield
01/12/17Uv-assisted reactive ion etch for copper
01/12/17Etch rate and critical dimension uniformity by selection of focus ring material
01/12/17Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices
01/12/17Adjustable remote dissociation
01/12/17Sion gradient concept
01/05/17Textured membrane for a multi-chamber carrier head
01/05/17Process kit having tall deposition ring and deposition ring clamp
01/05/17Correction of non-uniform patterns using time-shifted exposures
01/05/17Semiconductor device
01/05/17Selective deposition of silicon oxide films
01/05/17Batch processing apparatus
01/05/17Pixelated capacitance controlled esc
01/05/17Method to reduce trap-induced capacitance in interconnect dielectric barrier stack
01/05/17Plasma enhanced thermal evaporator
12/29/16Temperature controlled additive manufacturing
12/29/16Recursive inject improved distribution of gas
12/29/16Method and apparatus to abate pyrophoric byproducts from ion implant process
12/29/16Glass ceramic for ultraviolet lithography and manufacturing thereof
Social Network Patent Pack
12/29/16Interconnect integration for sidewall pore seal and via cleanliness
12/22/16Material dispensing and compaction in additive manufacturing
12/22/16Material dispensing and compaction in additive manufacturing
12/22/16Gas control in process chamber
12/22/16Injector for batch processing and methods of use
12/22/16In-situ metrology thickness measurement during pecvd processes
12/22/16Multiple electrode substrate support assembly and phase control system
12/22/16Methods for depositing dielectric films via physical vapor deposition processes
12/22/16Deposition methods for uniform and conformal hybrid titanium oxide films
12/22/16Pvd deposition and anneal of multi-layer metal-dielectric film
Patent Packs
12/22/16Method and microwave assisted chalcogen radicals generation for 2-d materials
12/22/16Method for forming interconnects
12/22/16Methods for forming low resistivity interconnects
12/22/16Limiting adjustment of polishing rates during substrate polishing
12/15/16Atomic layer deposition processing chamber permitting low-pressure tool replacement
12/15/16Injector for semiconductor epitaxy growth
12/15/16Apparatus for sensing a level of a processing medium in a delivery apparatus
12/15/16Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
12/15/16Wafer carrier for smaller wafers and wafer pieces
12/08/16Printed chemical mechanical polishing pad having abrasives therein and system for printing
12/08/16Mask for deposition using the mask
12/08/16Susceptor position and rotation apparatus and methods of use
12/08/16Method of forming metal and metal alloy features
12/08/16Immersion field guided exposure and post-exposure bake process
12/08/16Process chamber
12/08/16Apparatus for decreasing substrate temperature non-uniformity
12/08/16Gas chamber ports
12/08/16Transparent electrostatic carrier
12/08/16Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
12/08/16Shutter disk for physical vapor deposition chamber
12/01/16High speed epi system and chamber concepts
12/01/16Retaining ring having inner surfaces with features
12/01/16Apparatus for printing a chemical mechanical polishing pad
12/01/16Grounding of conductive mask for deposition processes
12/01/16Electroplating apparatus
12/01/16Heat shield ring for high growth rate epi chamber
12/01/16Process chamber with reflector
12/01/16Methods for texturing a chamber component and chamber components having a textured surface
12/01/16Dual endpoint detection for advanced phase shift and binary photomasks
12/01/16Hard mask for patterning magnetic tunnel junctions
Patent Packs
12/01/16Plasma curing of pecvd hmdso film for oled applications
12/01/16Methods and a microwave batch curing process
11/24/16Methods and forming a resist array using chemical mechanical planarization
11/24/16Powders for additive manufacturing
11/24/16Deposition ring and electrostatic chuck for physical vapor deposition chamber
11/24/16Roller for spreading of a flexible substrate, processing a flexible substrate and operating thereof
11/24/16Substrate carrier door assemblies, substrate carriers, and methods including magnetic door seal
11/24/16Annular baffle
11/24/16Monitoring system for deposition and operation thereof
11/24/16Extreme ultraviolet lithography system having chuck assembly and manufacturing thereof
11/24/16Methods and systems for applying run-to-run control and virtual metrology to reduce equipment recovery time
11/24/16Deposition of solid state electrolyte on electrode layers in electrochemical devices
11/24/16Electrostatic puck assembly with metal bonded backing plate for high temperature processes
11/24/16Method for forming group iii/v conformal layers on silicon substrates
11/24/16Azimuthally tunable multi-zone electrostatic chuck
11/17/16Methods for increasing the rate of electrochemical deposition
11/17/16Chamber component with wear indicator
11/17/16Deposition of silicon and oxygen-containing films without an oxidizer
11/17/16Absorbing lamphead face
11/17/16Tungsten films by organometallic or silane pre-treatment of substrate
Social Network Patent Pack
11/17/16Horizontal gate all around and finfet device isolation
11/17/16Encapsulating film stacks for oled applications
11/10/16Substrate rotary loader
11/10/16Rare-earth oxide based monolithic chamber material
11/10/16Rare-earth oxide based monolithic chamber material
11/10/16Ion beam sputtering with ion assisted deposition for coatings on chamber components
11/10/16Ion assisted deposition top coat of rare-earth oxide
11/10/16Method for controlling a processing system
11/10/16Apparatus for selectively sealing a gas feedthrough
11/10/16Customized pupil stop shape for control of edge profile in laser annealing systems
11/10/16Method for improving cd micro-loading in photomask plasma etching
11/10/16Resist hardening and development processes for semiconductor device manufacturing
11/10/16Methods and electrostatic chuck repair and refurbishment
11/10/16Tunable temperature controlled substrate support assembly
11/10/16Methods and controlling substrate uniformity
11/03/16Rare-earth oxide based monolithic chamber material
11/03/16Thin film encapsulation processing system and process kit permitting low-pressure tool replacement
11/03/16Oxidized showerhead and process kit parts and methods of using same
11/03/16Inspection of regions of interest using an electron beam system
11/03/16Dual-channel showerhead for formation of film stacks
Social Network Patent Pack
11/03/16Selective deposition of thin film dielectrics using surface blocking chemistry
11/03/16Methods for depositing low k and low wet etch rate dielectric thin films
11/03/16Methods for selective deposition of metal silicides via atomic layer deposition cycles
11/03/16Methods and correcting substrate deformity
11/03/16Methods and cleaning a substrate
11/03/16Method and controlling plasma near the edge of a substrate
11/03/16Method for depositing a diffusion barrier layer and a metal conductive layer
11/03/16Gallium arsenide based materials used in thin film transistor applications
11/03/16Internal chamber rotation motor, alternative rotation
10/27/16Process kit including flow isolator ring
10/27/16Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate
10/27/16Symmetric plasma process chamber
10/27/16Symmetric plasma process chamber
10/27/16Symmetric plasma process chamber
10/27/16Symmetric plasma process chamber
10/27/16In-situ etch rate determination for chamber clean endpoint
10/27/16Plasma treatment to improve adhesion between hardmask film and silicon oxide film
10/27/16Cleaning high aspect ratio vias
10/27/16Wafer swapper
10/27/16Loadlock apparatus, cooling plate assembly, and electronic device processing systems and methods
10/27/16External substrate rotation in a semiconductor processing system
10/20/16Demagnetization of magnetic media by c doping for hdd patterned media application
10/20/16Ground return for plasma processes
10/20/16Electroplating wafers having a notch
10/20/16Enhanced re-hosting capability for legacy hardware and software
10/20/16Edge ring for bevel polymer reduction
10/20/16Deposition of si-h free silicon nitride
10/20/16Gas flow profile modulated control of overlay in plasma cvd films
10/20/16Single platform, multiple cycle spacer deposition and etch
10/20/16Gas-phase silicon nitride selective etch
Social Network Patent Pack
10/20/16Spacer formation process with flat top profile
10/20/16Utlization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films
10/20/16Buffer chamber wafer heating mechanism and supporting robot
10/20/16Method for hybrid encapsulation of an organic light emitting diode
10/20/16Electrochemical cell with solid and liquid electrolytes
10/20/16Methods for forming cobalt interconnects
10/13/16Method and hardware for cleaning uv chambers
10/13/16Microelectronic substrate electro processing system
10/13/16Process gas preheating double-sided multi-substrate batch processing
10/13/16Laser annealing and electric field
10/13/16Apparatus for treating a gas in a conduit
10/13/16Semiconductor processing with dc assisted rf power for improved control
10/13/16Method for forming spacers for a transistor gate
10/13/16Apparatus and selective oxidation at lower temperature using remote plasma source
10/13/16Method to enhance growth rate for selective epitaxial growth
10/13/16Methods of etchback profile tuning
10/13/16Support cylinder for thermal processing chamber
10/13/16Dielectric constant recovery
10/06/16Mask etch for patterning
10/06/16Apparatus and uv treatment, chemical treatment, and deposition
10/06/16Field guided post exposure bake application for photoresist microbridge defects
10/06/16Methods for removing contamination from surfaces in substrate processing systems
10/06/16Crystallization methods
10/06/16Methods for manufacturing a spacer with desired profile in an advanced patterning process
10/06/16Cyclic spacer etching process with improved profile control
10/06/16Cyclic spacer etching process with improved profile control
10/06/16Methods of etching films comprising transition metals
10/06/16Process of filling the high aspect ratio trenches by co-flowing ligands during thermal cvd
10/06/16Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3d nand memory devices







ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009



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