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Applied Materials Inc
Applied Materials Inc A Delaware Corporation
Applied Materials Incorporated
Applied Materials Inc A Corporation Of The State Of Delaware U s a
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Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors

Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
04/27/17 new patent  Applying dimensional reduction to spectral data from polishing substrates
04/27/17 new patent  Deposition of conformal and gap-fill amorphous silicon thin-films
04/27/17 new patent  Bottom-up gap-fill by surface poisoning treatment
04/27/17 new patent  High productivity pecvd tool for wafer processing of semiconductor manufacturing
04/27/17 new patent  Methods of depositing flowable films comprising sio and sin
04/27/17 new patent  Optical fiber temperature sensors, temperature monitoring apparatus, and manufacturing methods
04/27/17 new patent  Extreme ultraviolet lithography mask blank manufacturing system and operation therefor
04/27/17 new patent  Substrate processing apparatus and methods
04/27/17 new patent  Biasable flux optimizer / collimator for pvd sputter chamber
04/27/17 new patent  Chemical infiltration into porous dielectric films
04/27/17 new patent  Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications
04/27/17 new patent  Systems and methods for low resistivity physical vapor deposition of a tungsten film
04/27/17 new patent  Gapfill film modification for advanced cmp and recess flow
04/27/17 new patent  Robot assemblies, substrate processing apparatus, and methods for transporting substrates in electronic device manufacturing
04/27/17 new patent  Methods for reducing copper overhang in a feature of a substrate
04/20/17Corrosion resistant retaining rings
04/20/17External clamp ring for a checmical mechanical polishing carrier head
04/20/17Chamber leak and gas contaimination detection
04/20/17Chamber pressure control chemical vapor deposition systems
04/20/17Radial waveguide post-match control of microwaves
04/20/17Tunable gas delivery assembly with internal diffuser and angular injection
04/20/17Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
04/20/17Conformal doping in 3d si structure using conformal dopant deposition
04/20/17Substrate carrier system
04/20/17Pixelated capacitance controlled esc
04/20/17High aspect ratio 3-d flash memory device
04/13/17Polishing apparatus having optical monitoring of substrates for uniformity control and separate endpoint system
04/13/17Advanced polishing pads having compositional gradients by use of an additive manufacturing process
04/13/17Showerhead assembly with multiple fluid delivery zones
04/13/17Showerhead with reduced backside plasma ignition
04/13/17Method of fabricating a color filter array using a multilevel structure
04/13/17Rf pulse reflection reduction for processing substrates
04/13/17Ultra-high modulus and etch selectivity boron-carbon hardmask films
04/13/17Diode laser for wafer heating for epi processes
04/13/17Substrate carrier for active/passive bonding and de-bonding of a substrate
04/13/17Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
04/13/17Structure and fabricating three-dimensional (3d) metal-insulator-metal (mim) capacitor and resistor in semi-additive plating metal wiring
04/13/17Lamp base adapter design for baseless lamps
04/06/17Overlay error correction
04/06/17Diffuser temperature control
04/06/17Methods of etching films with reduced surface roughness
04/06/17Rf power delivery regulation for processing substrates
04/06/17Integrated process kit for a substrate processing chamber
04/06/17Reduced volume processing chamber
04/06/17Methods for pre-cleaning conductive materials on a substrate
04/06/17Drying process for high aspect ratio features
04/06/17Substrate support and baffle apparatus
04/06/17Method of modifying epitaxial growth shape on source drain area of transistor
04/06/17Methods for atomic level resolution and plasma processing control
04/06/17Substrate processing apparatus and methods
04/06/17Small thermal mass pressurized chamber
04/06/17Methodology for chamber performance matching for semiconductor equipment
04/06/17Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
04/06/17Rf power delivery with approximated saw tooth wave pulsing
03/30/17Apparatus for processing of a material on a substrate and measuring optical properties of a material processed on a substrate
03/30/17Process kit shield and physical vapor deposition chamber having same
03/30/17High temperature vapor delivery system and method
03/30/17Method for microwave processing of photosensitive polyimides
03/30/17Methods and vibration damping stage
03/30/17Remote plasma and electron beam generation system for a plasma reactor
03/30/17Grooved backing plate for standing wave compensation
03/30/17Plasma reactor for processing a workpiece with an array of plasma point sources
03/30/17Methods for forming a silicon containing dielectric film using a gas mixture with ar gas dilusion
Patent Packs
03/30/17Self-aligned multiple spacer patterning schemes for advanced nanometer technology
03/30/17Silicide phase control by confinement
03/30/17Loadlock integrated bevel etcher system
03/30/17High temperature electrostatic chuck bonding adhesive
03/30/17Selective silicon dioxide deposition using phosphonic acid self assembled monolayers as nucleation inhibitor
03/30/17Peak-based endpointing for chemical mechanical polishing
03/30/17Evaporation source for organic material
03/23/17Evaporation source for organic material
03/23/17Shadow frame with non-uniform gas flow clearance for improved cleaning
03/23/17Showerhead support structures
03/23/17Ambient laminar gas flow distribution in laser processing systems
03/23/173d printed magnetron having enhanced cooling characteristics
03/23/17Low temperature conformal deposition of silicon nitride on high aspect ratio structures
03/23/17Apparatus and selective deposition
03/23/17Cleaning method
Patent Packs
03/23/17Titanium-compound based hard mask films
03/23/17Method of enabling seamless cobalt gap-fill
03/23/17Amorphization layer, selective, defect free superactivation
03/23/17Large area dual substrate processing system
03/16/17Selectively openable support platen for additive manufacturing
03/16/17Fabrication of base plate, fabrication of enclosure, and fabrication of support posts in additive manufacturing
03/16/17Pulse train annealing method and apparatus
03/16/17Scheduling in manufacturing environments
03/16/17Planning for manufacturing environments
03/16/17Substrate support with real time force and film stress control
03/16/17Plasma module with slotted ground plate
03/16/17One-piece process kit shield for reducing the impact of an electric field near the substrate
03/16/17Substrate carrier using the same
03/16/17System to detect wafer arcing in semiconductor manufacturing equipment
03/09/17Evaporation system with measurement unit
03/09/17Apparatus and thin-film processing applications
03/09/17Line edge roughness reduction via step size alteration
03/09/17Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
03/09/17Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
03/09/17Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasma chambers
03/09/17Process chamber for cyclic and selective material removal and etching
03/09/17Methods and uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices
03/02/17Method for removing aluminum fluoride contamination from semiconductor processing equipment
03/02/17Deposition platform for flexible substrates and operation thereof
03/02/17Plasma etching systems and methods with secondary plasma injection
03/02/17Methods and in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers
03/02/17Nanocrystaline diamond carbon film for 3d nand hardmask application
03/02/17Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in pecvd system
03/02/17Methods of depositing metal films using metal oxyhalide precursors
03/02/17In-situ removable electrostatic chuck
Social Network Patent Pack
03/02/17Electrostatic carrier for thin substrate handling
03/02/17Vnand tensile thick teos oxide
03/02/17Battery separator with dielectric coating
02/23/17Heating source for spatial atomic layer deposition
02/23/17Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control
02/23/17Methods and co-sputtering multiple targets
02/23/17High temperature thermal ald silicon nitride films
02/23/17Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3d structure semiconductor applications
02/16/17Topography prediction using system state information
02/16/17Methods for producing interconnects in semiconductor devices
Patent Packs
02/16/17Electrostatic chuck with electrostatic fluid seal for containing backside gas
02/09/17Method and the selective deposition of epitaxial germanium stressor alloys
02/09/17Low temperature ald on semiconductor and metallic surfaces
02/09/17Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ald
02/09/17Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
02/09/17Oxide etch selectivity systems and methods
02/09/17Gas-phase silicon oxide selective etch
02/09/17Thermal management wafer processing systems
02/09/17Bolted wafer chuck thermal management wafer processing systems
02/09/17Thin heated substrate support
02/09/17Process sheet resistance uniformity improvement using multiple melt laser exposures
02/09/17Ceramic heater and esc with enhanced wafer edge performance
02/09/17Integrated bit-line airgap formation and gate stack post clean
02/09/17Structure for relaxed sige buffers including forming
02/02/17High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
02/02/17Batch processing chamber
02/02/17Rotating substrate laser anneal
02/02/17Locally heated multi-zone substrate support
02/02/17Substrate lift pin actuator
01/26/17Additive manufacturing with pre-heating
01/26/17Exothermic powders for additive manufacturing
01/26/17A processing processing devices, particularly devices including organic materials therein, and transferring an evaporation source from a processing vacuum chamber to a maintenance vacuum chamber or from the maintenance vacuum chamber to the processing vacuum chamber
01/26/17Heteroleptic diazadiene-containing tungsten precursors for thin film deposition
01/26/17Electroplating apparatus with electrolyte agitation
01/26/17Method and gas abatement
01/19/17Brace structures for additive manufacturing
01/19/17Selective material dispensing in additive manufacturing
01/19/17Deposition of metal films using beta-hydrogen free precursors
01/19/17Pecvd process
01/19/17Inert anode electroplating processor and replenisher
Patent Packs
01/19/17Process for removing contamination on ruthenium surface
01/19/17Quarter wave light splitting
01/19/17Adjustable process spacing, centering, and improved gas conductance
01/19/17Method of selective epitaxy
01/19/17Metal removal with reduced surface roughness
01/19/17Methods and substrate edge cleaning
01/19/17Uv-assisted material injection into porous films
01/19/17Horizontal gate all around device isolation
01/19/17Methods for forming structures with desired crystallinity for mram applications
01/19/17Fluorine-containing polymerized hmdso applications for oled thin film encapsulation
01/12/17Wafer electroplating chuck assembly
01/12/17Electroplating apparatus with membrane tube shield
01/12/17Uv-assisted reactive ion etch for copper
01/12/17Etch rate and critical dimension uniformity by selection of focus ring material
01/12/17Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices
01/12/17Adjustable remote dissociation
01/12/17Sion gradient concept
01/05/17Textured membrane for a multi-chamber carrier head
01/05/17Process kit having tall deposition ring and deposition ring clamp
01/05/17Correction of non-uniform patterns using time-shifted exposures
Social Network Patent Pack
01/05/17Semiconductor device
01/05/17Selective deposition of silicon oxide films
01/05/17Batch processing apparatus
01/05/17Pixelated capacitance controlled esc
01/05/17Method to reduce trap-induced capacitance in interconnect dielectric barrier stack
01/05/17Plasma enhanced thermal evaporator
12/29/16Temperature controlled additive manufacturing
12/29/16Recursive inject improved distribution of gas
12/29/16Method and apparatus to abate pyrophoric byproducts from ion implant process
12/29/16Glass ceramic for ultraviolet lithography and manufacturing thereof
12/29/16Interconnect integration for sidewall pore seal and via cleanliness
12/22/16Material dispensing and compaction in additive manufacturing
12/22/16Material dispensing and compaction in additive manufacturing
12/22/16Gas control in process chamber
12/22/16Injector for batch processing and methods of use
12/22/16In-situ metrology thickness measurement during pecvd processes
12/22/16Multiple electrode substrate support assembly and phase control system
12/22/16Methods for depositing dielectric films via physical vapor deposition processes
12/22/16Deposition methods for uniform and conformal hybrid titanium oxide films
12/22/16Pvd deposition and anneal of multi-layer metal-dielectric film
Social Network Patent Pack
12/22/16Method and microwave assisted chalcogen radicals generation for 2-d materials
12/22/16Method for forming interconnects
12/22/16Methods for forming low resistivity interconnects
12/22/16Limiting adjustment of polishing rates during substrate polishing
12/15/16Atomic layer deposition processing chamber permitting low-pressure tool replacement
12/15/16Injector for semiconductor epitaxy growth
12/15/16Apparatus for sensing a level of a processing medium in a delivery apparatus
12/15/16Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
12/15/16Wafer carrier for smaller wafers and wafer pieces
12/08/16Printed chemical mechanical polishing pad having abrasives therein and system for printing
12/08/16Mask for deposition using the mask
12/08/16Susceptor position and rotation apparatus and methods of use
12/08/16Method of forming metal and metal alloy features
12/08/16Immersion field guided exposure and post-exposure bake process
12/08/16Process chamber
12/08/16Apparatus for decreasing substrate temperature non-uniformity
12/08/16Gas chamber ports
12/08/16Transparent electrostatic carrier
12/08/16Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
12/08/16Shutter disk for physical vapor deposition chamber
12/01/16High speed epi system and chamber concepts
12/01/16Retaining ring having inner surfaces with features
12/01/16Apparatus for printing a chemical mechanical polishing pad
12/01/16Grounding of conductive mask for deposition processes
12/01/16Electroplating apparatus
12/01/16Heat shield ring for high growth rate epi chamber
12/01/16Process chamber with reflector
12/01/16Methods for texturing a chamber component and chamber components having a textured surface
12/01/16Dual endpoint detection for advanced phase shift and binary photomasks
12/01/16Hard mask for patterning magnetic tunnel junctions
Social Network Patent Pack
12/01/16Plasma curing of pecvd hmdso film for oled applications
12/01/16Methods and a microwave batch curing process
11/24/16Methods and forming a resist array using chemical mechanical planarization
11/24/16Powders for additive manufacturing
11/24/16Deposition ring and electrostatic chuck for physical vapor deposition chamber
11/24/16Roller for spreading of a flexible substrate, processing a flexible substrate and operating thereof
11/24/16Substrate carrier door assemblies, substrate carriers, and methods including magnetic door seal
11/24/16Annular baffle
11/24/16Monitoring system for deposition and operation thereof
11/24/16Extreme ultraviolet lithography system having chuck assembly and manufacturing thereof
11/24/16Methods and systems for applying run-to-run control and virtual metrology to reduce equipment recovery time
11/24/16Deposition of solid state electrolyte on electrode layers in electrochemical devices
11/24/16Electrostatic puck assembly with metal bonded backing plate for high temperature processes
11/24/16Method for forming group iii/v conformal layers on silicon substrates
11/24/16Azimuthally tunable multi-zone electrostatic chuck
11/17/16Methods for increasing the rate of electrochemical deposition
11/17/16Chamber component with wear indicator
11/17/16Deposition of silicon and oxygen-containing films without an oxidizer
11/17/16Absorbing lamphead face
11/17/16Tungsten films by organometallic or silane pre-treatment of substrate
11/17/16Horizontal gate all around and finfet device isolation
11/17/16Encapsulating film stacks for oled applications
11/10/16Substrate rotary loader
11/10/16Rare-earth oxide based monolithic chamber material
11/10/16Rare-earth oxide based monolithic chamber material
11/10/16Ion beam sputtering with ion assisted deposition for coatings on chamber components
11/10/16Ion assisted deposition top coat of rare-earth oxide
11/10/16Method for controlling a processing system
11/10/16Apparatus for selectively sealing a gas feedthrough

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Applied Materials Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Applied Materials Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by