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Applied Materials Inc
Applied Materials Inc A Delaware Corporation
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Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors




Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
06/22/17 new patent  Methods for treating exhaust gas in a processing system
06/22/17 new patent  Methods for bonding substrates
06/22/17 new patent  Flat susceptor with grooves for minimizing temperature profile across a substrate
06/22/17 new patent  Anodization architecture for electro-plate adhesion
06/22/17 new patent  Surface acoustic wave sensors in semiconductor processing equipment
06/22/17 new patent  Uniform wafer temperature achievement in unsymmetric chamber environment
06/22/17 new patent  Showerhead having a detachable gas distribution plate
06/22/17 new patent  Gas diffuser having grooved hollow cathodes
06/22/17 new patent  Methods and processing a substrate
06/22/17 new patent  Cleaning method
06/22/17 new patent  Methods for selective etching of a silicon material using hf gas without nitrogen etchants
06/22/17 new patent  Oxide etch selectivity enhancement
06/22/17 new patent  Methods of treating nitride films
06/22/17 new patent  Methods and interactively and dynamically updating a schematic overlay
06/22/17 new patent  Method and depositing cobalt in a feature
06/22/17 new patent  Method to grow thin epitaxial films at low temperature
06/22/17 new patent  Conformal amorphous silicon as nucleation layer for w ald process
06/22/17 new patent  Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
06/15/17Exothermic powders for additive manufacturing
06/15/17Method of processing a substrate support assembly
06/15/17Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
06/15/17Environmental control of systems for photolithography process
06/15/17Matching process controllers for improved matching of process
06/15/17In-situ film annealing with spatial atomic layer deposition
06/15/17Conformal amorphous carbon for spacer and spacer protection applications
06/15/17High speed rotary sorter
06/15/17Methods for forming structures with desired crystallinity for mram applications
06/08/17Method and surface nanoparticle measurement
06/08/17Advanced coating method and materials to prevent hdp-cvd chamber arcing
06/08/17Forming cobalt interconnections on a substrate
06/08/17Continuous liquid level measurement detector for closed metal containers
06/08/17Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
06/08/17Providing dynamic content in context of particular equipment
06/08/17Method and controlling a magnetic field in a plasma chamber
06/08/17Arcing detection plasma processing
06/08/17Methods and solutions for cleaning ingaas (or iii-v) substrates
06/08/17Wafer rotation in a semiconductor chamber
06/08/17High efficiency high accuracy heater driver
06/08/17Method and clamping and declamping substrates using electrostatic chucks
06/08/17Amalgamated cover ring
06/08/17Dielectric/metal barrier integration to prevent copper diffusion
06/08/17Multilayer passivation or etch stop tft
06/01/17Endpoint control of multiple substrate zones of varying thickness in chemical mechanical polishing
06/01/17Vacuum processing mounting a processing system
06/01/17Corrosion control for chamber components
06/01/173d material modification for advanced processing
06/01/17Method and post exposure processing of photoresist wafers
05/25/17Pre-coated shield using in vhf-rf pvd chambers
05/25/17Seal rings in electrochemical processors
05/25/17Particle generation suppresor by dc bias modulation
05/25/17Supercritical carbon dioxide process for low-k thin films
05/25/17Lateral plasma/radical source
05/25/17Growing graphene on substrates
05/25/17Method for modifying epitaxial growth shape
05/25/17Self-aligned shielding of silicon oxide
05/25/17Self-aligned shielding of silicon oxide
05/25/17On-board metrology (obm) design and implication in process tool
05/25/17Methods for forming low-resistance contacts through integrated process flow systems
05/25/17Semiconductor processing method and semiconductor device
05/25/17Materials for tensile stress and low contact resistance and forming
05/25/17Configurations of solid state thin film batteries
05/18/17Apparatus and forming a polishing pads by use of an additive manufacturing process
05/18/17Copolymerized high temperature bonding component
Patent Packs
05/18/17Low vapor pressure aerosol-assisted cvd
05/18/17Inert anode electroplating processor and replenisher with anionic membranes
05/18/17Apparatus and methods for photomask backside cleaning
05/18/17Method and determining when to perform or trigger events in semi-conductor processing equipment
05/18/17Uniform low electron temperature plasma source with reduced wafer charging and independent control over radical composition
05/18/17Low vapor pressure aerosol-assisted cvd
05/18/17Substrate support assembly with deposited surface features
05/18/17Techniques for filling a structure using selective surface modification
05/11/17Ion assisted deposition for rare-earth oxide based coatings
05/11/17Multizone control of lamps in a conical lamphead using pyrometers
05/11/17Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
05/11/17Extreme ultraviolet reflective element with multilayer stack and manufacturing thereof
05/11/17Wafer point by point analysis and data presentation
05/11/17Rare-earth oxide based coatings based on ion assisted deposition
05/11/17Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
Patent Packs
05/11/17Integrated process and structure to form iii-v channel for sub-7nm cmos devices
05/11/17Methods for selective etching of a silicon material
05/11/17Cooling base with spiral channels for esc
05/11/17Techniques for combining cmp process tracking data with 3d printed cmp consumables
05/11/17Bottom processing
05/11/17Method of igzo and zno tft fabrication with pecvd sio2 passivation
05/04/17Apparatus and forming a polishing article that has a desired zeta potential
05/04/17Nitrogen-containing ligands and their use in atomic layer deposition methods
05/04/17Method and cleaning a cvd chamber
05/04/17Methods for thin film material deposition using reactive plasma-free physical vapor deposition
05/04/17Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
05/04/17Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide
05/04/17Rps assisted rf plasma source for semiconductor processing
05/04/17Selectively lateral growth of silicon oxide thin film
05/04/17Low temp single precursor arc hard mask for multilayer patterning application
05/04/17Process of selective epitaxial growth for void free gap fill
05/04/17Flow controlled liner having spatially distributed gas passages
05/04/17Biasable rotatable electrostatic chuck
05/04/17Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
05/04/17Endpointing detection for chemical mechanical polishing based on spectrometry
05/04/17Combo amorphous and ltps transistors
04/27/17Applying dimensional reduction to spectral data from polishing substrates
04/27/17Deposition of conformal and gap-fill amorphous silicon thin-films
04/27/17Bottom-up gap-fill by surface poisoning treatment
04/27/17High productivity pecvd tool for wafer processing of semiconductor manufacturing
04/27/17Methods of depositing flowable films comprising sio and sin
04/27/17Optical fiber temperature sensors, temperature monitoring apparatus, and manufacturing methods
04/27/17Extreme ultraviolet lithography mask blank manufacturing system and operation therefor
04/27/17Substrate processing apparatus and methods
04/27/17Biasable flux optimizer / collimator for pvd sputter chamber
Social Network Patent Pack
04/27/17Chemical infiltration into porous dielectric films
04/27/17Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications
04/27/17Systems and methods for low resistivity physical vapor deposition of a tungsten film
04/27/17Gapfill film modification for advanced cmp and recess flow
04/27/17Robot assemblies, substrate processing apparatus, and methods for transporting substrates in electronic device manufacturing
04/27/17Methods for reducing copper overhang in a feature of a substrate
04/20/17Corrosion resistant retaining rings
04/20/17External clamp ring for a checmical mechanical polishing carrier head
04/20/17Chamber leak and gas contaimination detection
04/20/17Chamber pressure control chemical vapor deposition systems
Patent Packs
04/20/17Radial waveguide post-match control of microwaves
04/20/17Tunable gas delivery assembly with internal diffuser and angular injection
04/20/17Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
04/20/17Conformal doping in 3d si structure using conformal dopant deposition
04/20/17Substrate carrier system
04/20/17Pixelated capacitance controlled esc
04/20/17High aspect ratio 3-d flash memory device
04/13/17Polishing apparatus having optical monitoring of substrates for uniformity control and separate endpoint system
04/13/17Advanced polishing pads having compositional gradients by use of an additive manufacturing process
04/13/17Showerhead assembly with multiple fluid delivery zones
04/13/17Showerhead with reduced backside plasma ignition
04/13/17Method of fabricating a color filter array using a multilevel structure
04/13/17Rf pulse reflection reduction for processing substrates
04/13/17Ultra-high modulus and etch selectivity boron-carbon hardmask films
04/13/17Diode laser for wafer heating for epi processes
04/13/17Substrate carrier for active/passive bonding and de-bonding of a substrate
04/13/17Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
04/13/17Structure and fabricating three-dimensional (3d) metal-insulator-metal (mim) capacitor and resistor in semi-additive plating metal wiring
04/13/17Lamp base adapter design for baseless lamps
04/06/17Overlay error correction
04/06/17Diffuser temperature control
04/06/17Methods of etching films with reduced surface roughness
04/06/17Rf power delivery regulation for processing substrates
04/06/17Integrated process kit for a substrate processing chamber
04/06/17Reduced volume processing chamber
04/06/17Methods for pre-cleaning conductive materials on a substrate
04/06/17Drying process for high aspect ratio features
04/06/17Substrate support and baffle apparatus
04/06/17Method of modifying epitaxial growth shape on source drain area of transistor
04/06/17Methods for atomic level resolution and plasma processing control
Patent Packs
04/06/17Substrate processing apparatus and methods
04/06/17Small thermal mass pressurized chamber
04/06/17Methodology for chamber performance matching for semiconductor equipment
04/06/17Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
04/06/17Rf power delivery with approximated saw tooth wave pulsing
03/30/17Apparatus for processing of a material on a substrate and measuring optical properties of a material processed on a substrate
03/30/17Process kit shield and physical vapor deposition chamber having same
03/30/17High temperature vapor delivery system and method
03/30/17Method for microwave processing of photosensitive polyimides
03/30/17Methods and vibration damping stage
03/30/17Remote plasma and electron beam generation system for a plasma reactor
03/30/17Grooved backing plate for standing wave compensation
03/30/17Plasma reactor for processing a workpiece with an array of plasma point sources
03/30/17Methods for forming a silicon containing dielectric film using a gas mixture with ar gas dilusion
03/30/17Self-aligned multiple spacer patterning schemes for advanced nanometer technology
03/30/17Silicide phase control by confinement
03/30/17Loadlock integrated bevel etcher system
03/30/17High temperature electrostatic chuck bonding adhesive
03/30/17Selective silicon dioxide deposition using phosphonic acid self assembled monolayers as nucleation inhibitor
03/30/17Peak-based endpointing for chemical mechanical polishing
Social Network Patent Pack
03/30/17Evaporation source for organic material
03/23/17Evaporation source for organic material
03/23/17Shadow frame with non-uniform gas flow clearance for improved cleaning
03/23/17Showerhead support structures
03/23/17Ambient laminar gas flow distribution in laser processing systems
03/23/173d printed magnetron having enhanced cooling characteristics
03/23/17Low temperature conformal deposition of silicon nitride on high aspect ratio structures
03/23/17Apparatus and selective deposition
03/23/17Cleaning method
03/23/17Titanium-compound based hard mask films
03/23/17Method of enabling seamless cobalt gap-fill
03/23/17Amorphization layer, selective, defect free superactivation
03/23/17Large area dual substrate processing system
03/16/17Selectively openable support platen for additive manufacturing
03/16/17Fabrication of base plate, fabrication of enclosure, and fabrication of support posts in additive manufacturing
03/16/17Pulse train annealing method and apparatus
03/16/17Scheduling in manufacturing environments
03/16/17Planning for manufacturing environments
03/16/17Substrate support with real time force and film stress control
03/16/17Plasma module with slotted ground plate
Social Network Patent Pack
03/16/17One-piece process kit shield for reducing the impact of an electric field near the substrate
03/16/17Substrate carrier using the same
03/16/17System to detect wafer arcing in semiconductor manufacturing equipment
03/09/17Evaporation system with measurement unit
03/09/17Apparatus and thin-film processing applications
03/09/17Line edge roughness reduction via step size alteration
03/09/17Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
03/09/17Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
03/09/17Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasma chambers
03/09/17Process chamber for cyclic and selective material removal and etching
03/09/17Methods and uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices
03/02/17Method for removing aluminum fluoride contamination from semiconductor processing equipment
03/02/17Deposition platform for flexible substrates and operation thereof
03/02/17Plasma etching systems and methods with secondary plasma injection
03/02/17Methods and in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers
03/02/17Nanocrystaline diamond carbon film for 3d nand hardmask application
03/02/17Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in pecvd system
03/02/17Methods of depositing metal films using metal oxyhalide precursors
03/02/17In-situ removable electrostatic chuck
03/02/17Electrostatic carrier for thin substrate handling
03/02/17Vnand tensile thick teos oxide
03/02/17Battery separator with dielectric coating
02/23/17Heating source for spatial atomic layer deposition
02/23/17Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control
02/23/17Methods and co-sputtering multiple targets
02/23/17High temperature thermal ald silicon nitride films
02/23/17Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3d structure semiconductor applications
02/16/17Topography prediction using system state information
02/16/17Methods for producing interconnects in semiconductor devices
02/16/17Electrostatic chuck with electrostatic fluid seal for containing backside gas
Social Network Patent Pack
02/09/17Method and the selective deposition of epitaxial germanium stressor alloys
02/09/17Low temperature ald on semiconductor and metallic surfaces
02/09/17Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ald
02/09/17Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
02/09/17Oxide etch selectivity systems and methods
02/09/17Gas-phase silicon oxide selective etch
02/09/17Thermal management wafer processing systems
02/09/17Bolted wafer chuck thermal management wafer processing systems
02/09/17Thin heated substrate support
02/09/17Process sheet resistance uniformity improvement using multiple melt laser exposures
02/09/17Ceramic heater and esc with enhanced wafer edge performance
02/09/17Integrated bit-line airgap formation and gate stack post clean
02/09/17Structure for relaxed sige buffers including forming
02/02/17High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
02/02/17Batch processing chamber
02/02/17Rotating substrate laser anneal
02/02/17Locally heated multi-zone substrate support
02/02/17Substrate lift pin actuator
01/26/17Additive manufacturing with pre-heating
01/26/17Exothermic powders for additive manufacturing
01/26/17A processing processing devices, particularly devices including organic materials therein, and transferring an evaporation source from a processing vacuum chamber to a maintenance vacuum chamber or from the maintenance vacuum chamber to the processing vacuum chamber
01/26/17Heteroleptic diazadiene-containing tungsten precursors for thin film deposition
01/26/17Electroplating apparatus with electrolyte agitation
01/26/17Method and gas abatement
01/19/17Brace structures for additive manufacturing
01/19/17Selective material dispensing in additive manufacturing
01/19/17Deposition of metal films using beta-hydrogen free precursors
01/19/17Pecvd process
01/19/17Inert anode electroplating processor and replenisher







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