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Applied Materials Inc
Applied Materials Inc A Delaware Corporation
Applied Materials Incorporated
Applied Materials Inc A Corporation Of The State Of Delaware U s a
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Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors

Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
08/17/17 new patent  Medical bodily fluid sampling device
08/17/17 new patent  In-situ temperature control during chemical mechanical polishing with a condensed gas
08/17/17 new patent  Reactor gas panel common exhaust
08/17/17 new patent  Particle generation suppresor by dc bias modulation
08/17/17 new patent  Chemical control features in wafer process equipment
08/17/17 new patent  Rotatable substrate support having radio frequency applicator
08/17/17 new patent  Fluorination during ald high-k, fluorination post high-k and use of a post fluorination anneal to engineer fluorine bonding and incorporation
08/17/17 new patent  Manufacturing of high capacity prismatic lithium-ion alloy anodes
08/17/17 new patent  Three-dimensional thin film battery
08/10/17Systems, apparatus, and methods for chemical polishing
08/10/17Process chamber for dielectric gapfill
08/10/17Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplating
08/10/17Oxide etch selectivity systems and methods
08/10/17Semiconductor processing systems having multiple plasma configurations
08/10/17Methods and systems to enhance process uniformity
08/10/17Systems and methods for internal surface conditioning in plasma processing equipment
08/10/17Method for removing native oxide and residue from a iii-v group containing surface
08/10/17Flow distribution plate for surface fluorine reduction
08/10/17Methods for selective etching of a silicon material
08/10/17Integrated layer etch system with multiple type chambers
08/10/17Process chamber for etching low k and other dielectric films
08/10/17Low temperature chuck for plasma processing systems
08/10/17Bolted wafer chuck thermal management wafer processing systems
08/10/17Thermal management wafer processing systems
08/10/17Substrate support chuck cooling for deposition chamber
08/10/17Interface engineering for high capacitance capacitor for liquid crystal display
08/10/17High-k dielectric materials utilized in display devices
08/10/17Substrate support with quadrants
08/03/17Plasma abatement of compounds containing heavy atoms
08/03/17Compact eye module layout
08/03/17Methods for igniting a plasma in a substrate processing chamber
08/03/17Rtp process for directed self-aligned patterns
08/03/17System and method in indium-gallium-arsenide channel height control for sub 7nm finfet
08/03/17Conductive wafer lift pin o-ring gripper with resistor
08/03/17High speed epitaxy system and methods
07/27/17Sputter source for semiconductor process chambers
07/27/17Ceramic showerhead with embedded conductive layers
07/27/17Ceramic slit valve doors and assemblies
07/27/17Gas splitting by time average injection into different zones by fast gas valves
07/27/17Symmetric plasma source to generate pie shaped treatment
07/27/17Dual-feed tunable plasma source
07/27/17Slit valve gate coating and methods for cleaning slit valve gates
07/27/17Methods for in-situ chamber clean in plasma etching processing chamber
07/27/17Acetylide-based silicon precursors and their use as ald/cvd precursors
07/27/17High productivity soak anneal system
07/27/17Systems and methods for detecting the existence of one or more environmental conditions within a substrate processing system
07/27/17Controlling the rf amplitude of an edge ring of a capacitively coupled plasma process device
07/27/17Wafer edge ring lifting solution
07/27/17Process and chemistry of plating of through silicon vias
07/27/17Mask-less fabrication of thin film batteries
07/27/17Sensor system for multi-zone electrostatic chuck
07/20/17Additive manufacturing with laser and plasma
07/20/17Carrier for small pad for chemical mechanical polishing
07/20/17Porous chemical mechanical polishing pads
07/20/17Method and forming porous advanced polishing pads using an additive manufacturing process
07/20/17Chamber component with protective coating suitable for protection against fluorine plasma
07/20/17Resist fortification for magnetic media patterning
07/20/17Rps defect reduction by cyclic clean induced rps cooling
07/20/17Pecvd tungsten containing hardmask films and methods of making
07/20/17Hybrid carbon hardmask for lateral hardmask recess reduction
07/20/17Oxygen vacancy of igzo passivation by fluorine treatment
07/13/17Source rf power split inner coil to improve bcd and etch depth performance
07/13/17Atomic layer etching system with remote plasma source and dc electrode
Patent Packs
07/13/17Minimization of ring erosion during plasma processes
07/13/17Hydrogen plasma based cleaning process for etch hardware
07/13/17Co or ni and cu integration for small and large features in integrated circuits
07/06/17Materials and formulations for three-dimensional printing
07/06/17Non-metallic thermal cvd/ald gas injector and purge system
07/06/17Cooled gas feed block with baffle and nozzle for hdp-cvd
07/06/17Systems and methods for shielding features of a workpiece during electrochemical deposition
07/06/17Inductive plasma source with metallic shower head using b-field concentrator
07/06/17Methods for depositing fluorine/carbon-free conformal tungsten
07/06/17Quad chamber and platform having multiple quad chambers
07/06/17Method for fabricating nanowires for horizontal gate all around devices for semiconductor applications
07/06/17High temperature heater for processing chamber
06/29/17Additive manufacturing with laser and gas flow
06/29/17Methods and stable substrate processing with multiple rf power supplies
06/29/17Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake
Patent Packs
06/29/17Apparatus and reducing substrate sliding in process chambers
06/22/17Methods for treating exhaust gas in a processing system
06/22/17Methods for bonding substrates
06/22/17Flat susceptor with grooves for minimizing temperature profile across a substrate
06/22/17Anodization architecture for electro-plate adhesion
06/22/17Surface acoustic wave sensors in semiconductor processing equipment
06/22/17Uniform wafer temperature achievement in unsymmetric chamber environment
06/22/17Showerhead having a detachable gas distribution plate
06/22/17Gas diffuser having grooved hollow cathodes
06/22/17Methods and processing a substrate
06/22/17Cleaning method
06/22/17Methods for selective etching of a silicon material using hf gas without nitrogen etchants
06/22/17Oxide etch selectivity enhancement
06/22/17Methods of treating nitride films
06/22/17Methods and interactively and dynamically updating a schematic overlay
06/22/17Method and depositing cobalt in a feature
06/22/17Method to grow thin epitaxial films at low temperature
06/22/17Conformal amorphous silicon as nucleation layer for w ald process
06/22/17Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
06/15/17Exothermic powders for additive manufacturing
06/15/17Method of processing a substrate support assembly
06/15/17Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
06/15/17Environmental control of systems for photolithography process
06/15/17Matching process controllers for improved matching of process
06/15/17In-situ film annealing with spatial atomic layer deposition
06/15/17Conformal amorphous carbon for spacer and spacer protection applications
06/15/17High speed rotary sorter
06/15/17Methods for forming structures with desired crystallinity for mram applications
06/08/17Method and surface nanoparticle measurement
06/08/17Advanced coating method and materials to prevent hdp-cvd chamber arcing
Social Network Patent Pack
06/08/17Forming cobalt interconnections on a substrate
06/08/17Continuous liquid level measurement detector for closed metal containers
06/08/17Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
06/08/17Providing dynamic content in context of particular equipment
06/08/17Method and controlling a magnetic field in a plasma chamber
06/08/17Arcing detection plasma processing
06/08/17Methods and solutions for cleaning ingaas (or iii-v) substrates
06/08/17Wafer rotation in a semiconductor chamber
06/08/17High efficiency high accuracy heater driver
06/08/17Method and clamping and declamping substrates using electrostatic chucks
Patent Packs
06/08/17Amalgamated cover ring
06/08/17Dielectric/metal barrier integration to prevent copper diffusion
06/08/17Multilayer passivation or etch stop tft
06/01/17Endpoint control of multiple substrate zones of varying thickness in chemical mechanical polishing
06/01/17Vacuum processing mounting a processing system
06/01/17Corrosion control for chamber components
06/01/173d material modification for advanced processing
06/01/17Method and post exposure processing of photoresist wafers
05/25/17Pre-coated shield using in vhf-rf pvd chambers
05/25/17Seal rings in electrochemical processors
05/25/17Particle generation suppresor by dc bias modulation
05/25/17Supercritical carbon dioxide process for low-k thin films
05/25/17Lateral plasma/radical source
05/25/17Growing graphene on substrates
05/25/17Method for modifying epitaxial growth shape
05/25/17Self-aligned shielding of silicon oxide
05/25/17Self-aligned shielding of silicon oxide
05/25/17On-board metrology (obm) design and implication in process tool
05/25/17Methods for forming low-resistance contacts through integrated process flow systems
05/25/17Semiconductor processing method and semiconductor device
05/25/17Materials for tensile stress and low contact resistance and forming
05/25/17Configurations of solid state thin film batteries
05/18/17Apparatus and forming a polishing pads by use of an additive manufacturing process
05/18/17Copolymerized high temperature bonding component
05/18/17Low vapor pressure aerosol-assisted cvd
05/18/17Inert anode electroplating processor and replenisher with anionic membranes
05/18/17Apparatus and methods for photomask backside cleaning
05/18/17Method and determining when to perform or trigger events in semi-conductor processing equipment
05/18/17Uniform low electron temperature plasma source with reduced wafer charging and independent control over radical composition
05/18/17Low vapor pressure aerosol-assisted cvd
Patent Packs
05/18/17Substrate support assembly with deposited surface features
05/18/17Techniques for filling a structure using selective surface modification
05/11/17Ion assisted deposition for rare-earth oxide based coatings
05/11/17Multizone control of lamps in a conical lamphead using pyrometers
05/11/17Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
05/11/17Extreme ultraviolet reflective element with multilayer stack and manufacturing thereof
05/11/17Wafer point by point analysis and data presentation
05/11/17Rare-earth oxide based coatings based on ion assisted deposition
05/11/17Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
05/11/17Integrated process and structure to form iii-v channel for sub-7nm cmos devices
05/11/17Methods for selective etching of a silicon material
05/11/17Cooling base with spiral channels for esc
05/11/17Techniques for combining cmp process tracking data with 3d printed cmp consumables
05/11/17Bottom processing
05/11/17Method of igzo and zno tft fabrication with pecvd sio2 passivation
05/04/17Apparatus and forming a polishing article that has a desired zeta potential
05/04/17Nitrogen-containing ligands and their use in atomic layer deposition methods
05/04/17Method and cleaning a cvd chamber
05/04/17Methods for thin film material deposition using reactive plasma-free physical vapor deposition
05/04/17Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
Social Network Patent Pack
05/04/17Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide
05/04/17Rps assisted rf plasma source for semiconductor processing
05/04/17Selectively lateral growth of silicon oxide thin film
05/04/17Low temp single precursor arc hard mask for multilayer patterning application
05/04/17Process of selective epitaxial growth for void free gap fill
05/04/17Flow controlled liner having spatially distributed gas passages
05/04/17Biasable rotatable electrostatic chuck
05/04/17Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
05/04/17Endpointing detection for chemical mechanical polishing based on spectrometry
05/04/17Combo amorphous and ltps transistors
04/27/17Applying dimensional reduction to spectral data from polishing substrates
04/27/17Deposition of conformal and gap-fill amorphous silicon thin-films
04/27/17Bottom-up gap-fill by surface poisoning treatment
04/27/17High productivity pecvd tool for wafer processing of semiconductor manufacturing
04/27/17Methods of depositing flowable films comprising sio and sin
04/27/17Optical fiber temperature sensors, temperature monitoring apparatus, and manufacturing methods
04/27/17Extreme ultraviolet lithography mask blank manufacturing system and operation therefor
04/27/17Substrate processing apparatus and methods
04/27/17Biasable flux optimizer / collimator for pvd sputter chamber
04/27/17Chemical infiltration into porous dielectric films
Social Network Patent Pack
04/27/17Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications
04/27/17Systems and methods for low resistivity physical vapor deposition of a tungsten film
04/27/17Gapfill film modification for advanced cmp and recess flow
04/27/17Robot assemblies, substrate processing apparatus, and methods for transporting substrates in electronic device manufacturing
04/27/17Methods for reducing copper overhang in a feature of a substrate
04/20/17Corrosion resistant retaining rings
04/20/17External clamp ring for a checmical mechanical polishing carrier head
04/20/17Chamber leak and gas contaimination detection
04/20/17Chamber pressure control chemical vapor deposition systems
04/20/17Radial waveguide post-match control of microwaves
04/20/17Tunable gas delivery assembly with internal diffuser and angular injection
04/20/17Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
04/20/17Conformal doping in 3d si structure using conformal dopant deposition
04/20/17Substrate carrier system
04/20/17Pixelated capacitance controlled esc
04/20/17High aspect ratio 3-d flash memory device
04/13/17Polishing apparatus having optical monitoring of substrates for uniformity control and separate endpoint system
04/13/17Advanced polishing pads having compositional gradients by use of an additive manufacturing process
04/13/17Showerhead assembly with multiple fluid delivery zones
04/13/17Showerhead with reduced backside plasma ignition
04/13/17Method of fabricating a color filter array using a multilevel structure
04/13/17Rf pulse reflection reduction for processing substrates
04/13/17Ultra-high modulus and etch selectivity boron-carbon hardmask films
04/13/17Diode laser for wafer heating for epi processes
04/13/17Substrate carrier for active/passive bonding and de-bonding of a substrate
04/13/17Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
04/13/17Structure and fabricating three-dimensional (3d) metal-insulator-metal (mim) capacitor and resistor in semi-additive plating metal wiring
04/13/17Lamp base adapter design for baseless lamps
04/06/17Overlay error correction
04/06/17Diffuser temperature control
Social Network Patent Pack
04/06/17Methods of etching films with reduced surface roughness
04/06/17Rf power delivery regulation for processing substrates
04/06/17Integrated process kit for a substrate processing chamber
04/06/17Reduced volume processing chamber
04/06/17Methods for pre-cleaning conductive materials on a substrate
04/06/17Drying process for high aspect ratio features
04/06/17Substrate support and baffle apparatus
04/06/17Method of modifying epitaxial growth shape on source drain area of transistor
04/06/17Methods for atomic level resolution and plasma processing control
04/06/17Substrate processing apparatus and methods
04/06/17Small thermal mass pressurized chamber
04/06/17Methodology for chamber performance matching for semiconductor equipment
04/06/17Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
04/06/17Rf power delivery with approximated saw tooth wave pulsing
03/30/17Apparatus for processing of a material on a substrate and measuring optical properties of a material processed on a substrate
03/30/17Process kit shield and physical vapor deposition chamber having same
03/30/17High temperature vapor delivery system and method
03/30/17Method for microwave processing of photosensitive polyimides
03/30/17Methods and vibration damping stage
03/30/17Remote plasma and electron beam generation system for a plasma reactor
03/30/17Grooved backing plate for standing wave compensation
03/30/17Plasma reactor for processing a workpiece with an array of plasma point sources
03/30/17Methods for forming a silicon containing dielectric film using a gas mixture with ar gas dilusion
03/30/17Self-aligned multiple spacer patterning schemes for advanced nanometer technology
03/30/17Silicide phase control by confinement
03/30/17Loadlock integrated bevel etcher system
03/30/17High temperature electrostatic chuck bonding adhesive
03/30/17Selective silicon dioxide deposition using phosphonic acid self assembled monolayers as nucleation inhibitor
03/30/17Peak-based endpointing for chemical mechanical polishing

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Applied Materials Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Applied Materials Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by