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Filing Names

Applied Materials Inc
Applied Materials Inc A Delaware Corporation
Applied Materials Incorporated
Applied Materials Inc A Corporation Of The State Of Delaware U s a
Applied Materials Inc_20100107
Applied Materials Inc_20100121
Applied Materials Inc_20131212
Applied Materials Inc_20100128
Applied Materials Inc_20100114

Applied Materials Inc patents

Recent patent applications related to Applied Materials Inc. Applied Materials Inc is listed as an Agent/Assignee. Note: Applied Materials Inc may have other listings under different names/spellings. We're not affiliated with Applied Materials Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Inc-related inventors

Date Applied Materials Inc patents (updated weekly) - BOOKMARK this page
09/30/10Mechanism for continuously varying radial position of a magnetron
11/12/09Deposition and densification process for titanium nitride barrier layers
06/22/17 new patent  Methods for treating exhaust gas in a processing system
06/22/17 new patent  Methods for bonding substrates
06/22/17 new patent  Flat susceptor with grooves for minimizing temperature profile across a substrate
06/22/17 new patent  Anodization architecture for electro-plate adhesion
06/22/17 new patent  Surface acoustic wave sensors in semiconductor processing equipment
06/22/17 new patent  Uniform wafer temperature achievement in unsymmetric chamber environment
06/22/17 new patent  Showerhead having a detachable gas distribution plate
06/22/17 new patent  Gas diffuser having grooved hollow cathodes
06/22/17 new patent  Methods and processing a substrate
06/22/17 new patent  Cleaning method
06/22/17 new patent  Methods for selective etching of a silicon material using hf gas without nitrogen etchants
06/22/17 new patent  Oxide etch selectivity enhancement
06/22/17 new patent  Methods of treating nitride films
06/22/17 new patent  Methods and interactively and dynamically updating a schematic overlay
06/22/17 new patent  Method and depositing cobalt in a feature
06/22/17 new patent  Method to grow thin epitaxial films at low temperature
06/22/17 new patent  Conformal amorphous silicon as nucleation layer for w ald process
06/22/17 new patent  Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
06/15/17Exothermic powders for additive manufacturing
06/15/17Method of processing a substrate support assembly
06/15/17Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
06/15/17Environmental control of systems for photolithography process
06/15/17Matching process controllers for improved matching of process
06/15/17In-situ film annealing with spatial atomic layer deposition
06/15/17Conformal amorphous carbon for spacer and spacer protection applications
06/15/17High speed rotary sorter
06/15/17Methods for forming structures with desired crystallinity for mram applications
06/08/17Method and surface nanoparticle measurement
06/08/17Advanced coating method and materials to prevent hdp-cvd chamber arcing
06/08/17Forming cobalt interconnections on a substrate
06/08/17Continuous liquid level measurement detector for closed metal containers
06/08/17Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
06/08/17Providing dynamic content in context of particular equipment
06/08/17Method and controlling a magnetic field in a plasma chamber
06/08/17Arcing detection plasma processing
06/08/17Methods and solutions for cleaning ingaas (or iii-v) substrates
06/08/17Wafer rotation in a semiconductor chamber
06/08/17High efficiency high accuracy heater driver
06/08/17Method and clamping and declamping substrates using electrostatic chucks
06/08/17Amalgamated cover ring
06/08/17Dielectric/metal barrier integration to prevent copper diffusion
06/08/17Multilayer passivation or etch stop tft
06/01/17Endpoint control of multiple substrate zones of varying thickness in chemical mechanical polishing
06/01/17Vacuum processing mounting a processing system
06/01/17Corrosion control for chamber components
06/01/173d material modification for advanced processing
06/01/17Method and post exposure processing of photoresist wafers
05/25/17Pre-coated shield using in vhf-rf pvd chambers
05/25/17Seal rings in electrochemical processors
05/25/17Particle generation suppresor by dc bias modulation
05/25/17Supercritical carbon dioxide process for low-k thin films
05/25/17Lateral plasma/radical source
05/25/17Growing graphene on substrates
05/25/17Method for modifying epitaxial growth shape
05/25/17Self-aligned shielding of silicon oxide
05/25/17Self-aligned shielding of silicon oxide
05/25/17On-board metrology (obm) design and implication in process tool
05/25/17Methods for forming low-resistance contacts through integrated process flow systems
05/25/17Semiconductor processing method and semiconductor device
05/25/17Materials for tensile stress and low contact resistance and forming
05/25/17Configurations of solid state thin film batteries
05/18/17Apparatus and forming a polishing pads by use of an additive manufacturing process
05/18/17Copolymerized high temperature bonding component
Patent Packs
05/18/17Low vapor pressure aerosol-assisted cvd
05/18/17Inert anode electroplating processor and replenisher with anionic membranes
05/18/17Apparatus and methods for photomask backside cleaning
05/18/17Method and determining when to perform or trigger events in semi-conductor processing equipment
05/18/17Uniform low electron temperature plasma source with reduced wafer charging and independent control over radical composition
05/18/17Low vapor pressure aerosol-assisted cvd
05/18/17Substrate support assembly with deposited surface features
05/18/17Techniques for filling a structure using selective surface modification
05/11/17Ion assisted deposition for rare-earth oxide based coatings
05/11/17Multizone control of lamps in a conical lamphead using pyrometers
05/11/17Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
05/11/17Extreme ultraviolet reflective element with multilayer stack and manufacturing thereof
05/11/17Wafer point by point analysis and data presentation
05/11/17Rare-earth oxide based coatings based on ion assisted deposition
05/11/17Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
Patent Packs
05/11/17Integrated process and structure to form iii-v channel for sub-7nm cmos devices
05/11/17Methods for selective etching of a silicon material
05/11/17Cooling base with spiral channels for esc
05/11/17Techniques for combining cmp process tracking data with 3d printed cmp consumables
05/11/17Bottom processing
05/11/17Method of igzo and zno tft fabrication with pecvd sio2 passivation
05/04/17Apparatus and forming a polishing article that has a desired zeta potential
05/04/17Nitrogen-containing ligands and their use in atomic layer deposition methods
05/04/17Method and cleaning a cvd chamber
05/04/17Methods for thin film material deposition using reactive plasma-free physical vapor deposition
05/04/17Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
05/04/17Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide
05/04/17Rps assisted rf plasma source for semiconductor processing
05/04/17Selectively lateral growth of silicon oxide thin film
05/04/17Low temp single precursor arc hard mask for multilayer patterning application
05/04/17Process of selective epitaxial growth for void free gap fill
05/04/17Flow controlled liner having spatially distributed gas passages
05/04/17Biasable rotatable electrostatic chuck
05/04/17Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
05/04/17Endpointing detection for chemical mechanical polishing based on spectrometry
05/04/17Combo amorphous and ltps transistors
04/27/17Applying dimensional reduction to spectral data from polishing substrates
04/27/17Deposition of conformal and gap-fill amorphous silicon thin-films
04/27/17Bottom-up gap-fill by surface poisoning treatment
04/27/17High productivity pecvd tool for wafer processing of semiconductor manufacturing
04/27/17Methods of depositing flowable films comprising sio and sin
04/27/17Optical fiber temperature sensors, temperature monitoring apparatus, and manufacturing methods
04/27/17Extreme ultraviolet lithography mask blank manufacturing system and operation therefor
04/27/17Substrate processing apparatus and methods
04/27/17Biasable flux optimizer / collimator for pvd sputter chamber
Social Network Patent Pack
04/27/17Chemical infiltration into porous dielectric films
04/27/17Variable frequency microwave (vfm) processes and applications in semiconductor thin film fabrications
04/27/17Systems and methods for low resistivity physical vapor deposition of a tungsten film
04/27/17Gapfill film modification for advanced cmp and recess flow
04/27/17Robot assemblies, substrate processing apparatus, and methods for transporting substrates in electronic device manufacturing
04/27/17Methods for reducing copper overhang in a feature of a substrate
04/20/17Corrosion resistant retaining rings
04/20/17External clamp ring for a checmical mechanical polishing carrier head
04/20/17Chamber leak and gas contaimination detection
04/20/17Chamber pressure control chemical vapor deposition systems
Patent Packs
04/20/17Radial waveguide post-match control of microwaves
04/20/17Tunable gas delivery assembly with internal diffuser and angular injection
04/20/17Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
04/20/17Conformal doping in 3d si structure using conformal dopant deposition
04/20/17Substrate carrier system
04/20/17Pixelated capacitance controlled esc
04/20/17High aspect ratio 3-d flash memory device
04/13/17Polishing apparatus having optical monitoring of substrates for uniformity control and separate endpoint system
04/13/17Advanced polishing pads having compositional gradients by use of an additive manufacturing process
04/13/17Showerhead assembly with multiple fluid delivery zones
04/13/17Showerhead with reduced backside plasma ignition
04/13/17Method of fabricating a color filter array using a multilevel structure
04/13/17Rf pulse reflection reduction for processing substrates
04/13/17Ultra-high modulus and etch selectivity boron-carbon hardmask films
04/13/17Diode laser for wafer heating for epi processes
04/13/17Substrate carrier for active/passive bonding and de-bonding of a substrate
04/13/17Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods
04/13/17Structure and fabricating three-dimensional (3d) metal-insulator-metal (mim) capacitor and resistor in semi-additive plating metal wiring
04/13/17Lamp base adapter design for baseless lamps
04/06/17Overlay error correction
04/06/17Diffuser temperature control
04/06/17Methods of etching films with reduced surface roughness
04/06/17Rf power delivery regulation for processing substrates
04/06/17Integrated process kit for a substrate processing chamber
04/06/17Reduced volume processing chamber
04/06/17Methods for pre-cleaning conductive materials on a substrate
04/06/17Drying process for high aspect ratio features
04/06/17Substrate support and baffle apparatus
04/06/17Method of modifying epitaxial growth shape on source drain area of transistor
04/06/17Methods for atomic level resolution and plasma processing control
Patent Packs
04/06/17Substrate processing apparatus and methods
04/06/17Small thermal mass pressurized chamber
04/06/17Methodology for chamber performance matching for semiconductor equipment
04/06/17Methods for depositing dielectric barrier layers and aluminum containing etch stop layers
04/06/17Rf power delivery with approximated saw tooth wave pulsing
03/30/17Apparatus for processing of a material on a substrate and measuring optical properties of a material processed on a substrate
03/30/17Process kit shield and physical vapor deposition chamber having same
03/30/17High temperature vapor delivery system and method
03/30/17Method for microwave processing of photosensitive polyimides
03/30/17Methods and vibration damping stage
03/30/17Remote plasma and electron beam generation system for a plasma reactor
03/30/17Grooved backing plate for standing wave compensation
03/30/17Plasma reactor for processing a workpiece with an array of plasma point sources
03/30/17Methods for forming a silicon containing dielectric film using a gas mixture with ar gas dilusion
03/30/17Self-aligned multiple spacer patterning schemes for advanced nanometer technology
03/30/17Silicide phase control by confinement
03/30/17Loadlock integrated bevel etcher system
03/30/17High temperature electrostatic chuck bonding adhesive
03/30/17Selective silicon dioxide deposition using phosphonic acid self assembled monolayers as nucleation inhibitor
03/30/17Peak-based endpointing for chemical mechanical polishing
Social Network Patent Pack
03/30/17Evaporation source for organic material
03/23/17Evaporation source for organic material
03/23/17Shadow frame with non-uniform gas flow clearance for improved cleaning
03/23/17Showerhead support structures
03/23/17Ambient laminar gas flow distribution in laser processing systems
03/23/173d printed magnetron having enhanced cooling characteristics
03/23/17Low temperature conformal deposition of silicon nitride on high aspect ratio structures
03/23/17Apparatus and selective deposition
03/23/17Cleaning method
03/23/17Titanium-compound based hard mask films
03/23/17Method of enabling seamless cobalt gap-fill
03/23/17Amorphization layer, selective, defect free superactivation
03/23/17Large area dual substrate processing system
03/16/17Selectively openable support platen for additive manufacturing
03/16/17Fabrication of base plate, fabrication of enclosure, and fabrication of support posts in additive manufacturing
03/16/17Pulse train annealing method and apparatus
03/16/17Scheduling in manufacturing environments
03/16/17Planning for manufacturing environments
03/16/17Substrate support with real time force and film stress control
03/16/17Plasma module with slotted ground plate
Social Network Patent Pack
03/16/17One-piece process kit shield for reducing the impact of an electric field near the substrate
03/16/17Substrate carrier using the same
03/16/17System to detect wafer arcing in semiconductor manufacturing equipment
03/09/17Evaporation system with measurement unit
03/09/17Apparatus and thin-film processing applications
03/09/17Line edge roughness reduction via step size alteration
03/09/17Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
03/09/17Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
03/09/17Method and apparatus of achieving high input impedance without using ferrite materials for rf filter applications in plasma chambers
03/09/17Process chamber for cyclic and selective material removal and etching
03/09/17Methods and uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices
03/02/17Method for removing aluminum fluoride contamination from semiconductor processing equipment
03/02/17Deposition platform for flexible substrates and operation thereof
03/02/17Plasma etching systems and methods with secondary plasma injection
03/02/17Methods and in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers
03/02/17Nanocrystaline diamond carbon film for 3d nand hardmask application
03/02/17Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in pecvd system
03/02/17Methods of depositing metal films using metal oxyhalide precursors
03/02/17In-situ removable electrostatic chuck
03/02/17Electrostatic carrier for thin substrate handling
03/02/17Vnand tensile thick teos oxide
03/02/17Battery separator with dielectric coating
02/23/17Heating source for spatial atomic layer deposition
02/23/17Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control
02/23/17Methods and co-sputtering multiple targets
02/23/17High temperature thermal ald silicon nitride films
02/23/17Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3d structure semiconductor applications
02/16/17Topography prediction using system state information
02/16/17Methods for producing interconnects in semiconductor devices
02/16/17Electrostatic chuck with electrostatic fluid seal for containing backside gas
Social Network Patent Pack
02/09/17Method and the selective deposition of epitaxial germanium stressor alloys
02/09/17Low temperature ald on semiconductor and metallic surfaces
02/09/17Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ald
02/09/17Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
02/09/17Oxide etch selectivity systems and methods
02/09/17Gas-phase silicon oxide selective etch
02/09/17Thermal management wafer processing systems
02/09/17Bolted wafer chuck thermal management wafer processing systems
02/09/17Thin heated substrate support
02/09/17Process sheet resistance uniformity improvement using multiple melt laser exposures
02/09/17Ceramic heater and esc with enhanced wafer edge performance
02/09/17Integrated bit-line airgap formation and gate stack post clean
02/09/17Structure for relaxed sige buffers including forming
02/02/17High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
02/02/17Batch processing chamber
02/02/17Rotating substrate laser anneal
02/02/17Locally heated multi-zone substrate support
02/02/17Substrate lift pin actuator
01/26/17Additive manufacturing with pre-heating
01/26/17Exothermic powders for additive manufacturing
01/26/17A processing processing devices, particularly devices including organic materials therein, and transferring an evaporation source from a processing vacuum chamber to a maintenance vacuum chamber or from the maintenance vacuum chamber to the processing vacuum chamber
01/26/17Heteroleptic diazadiene-containing tungsten precursors for thin film deposition
01/26/17Electroplating apparatus with electrolyte agitation
01/26/17Method and gas abatement
01/19/17Brace structures for additive manufacturing
01/19/17Selective material dispensing in additive manufacturing
01/19/17Deposition of metal films using beta-hydrogen free precursors
01/19/17Pecvd process
01/19/17Inert anode electroplating processor and replenisher

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Applied Materials Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Applied Materials Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by