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Applied Materials Israel Ltd patents


Recent patent applications related to Applied Materials Israel Ltd. Applied Materials Israel Ltd is listed as an Agent/Assignee. Note: Applied Materials Israel Ltd may have other listings under different names/spellings. We're not affiliated with Applied Materials Israel Ltd, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Applied Materials Israel Ltd-related inventors


Multi mode system with a dispersion x-ray detector

A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX... Applied Materials Israel Ltd

Method of deep learning-based examination of a semiconductor specimen and system thereof

There are provided system and method of classifying defects in a semiconductor specimen. The method comprises: upon obtaining by a computer a Deep Neural Network (DNN) trained to provide classification-related attributes enabling minimal defect classification error, processing a fabrication process (FP) sample using the obtained trained DNN; and, resulting from... Applied Materials Israel Ltd

Method of deep learining-based examination of a semiconductor specimen and system thereof

There are provided system and method of segmentation a fabrication process (FP) image obtained in a fabrication of a semiconductor specimen. The method comprises: upon obtaining a Deep Neural Network (DNN) trained to provide segmentation-related data, processing a fabrication process (FP) sample using the obtained trained DNN and, resulting from... Applied Materials Israel Ltd

Inspection inspecting a sample by using a plurality of spaced apart beams

An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured... Applied Materials Israel Ltd

Method and system for scanning an object

A method for scanning an object with a charged particle beam, the method may include repeating, for each pair of scan lines out of multiple pairs of scan lines, the stages of: (i) deflecting the charged particle beam along a first direction, thereby scanning the object along a first scan... Applied Materials Israel Ltd

High voltage electron beam system and method

A high voltage inspection system that includes a vacuum chamber; electron optics that is configured to direct an electron beam towards an upper surface of a substrate; a substrate support module that comprises a chuck and a housing; wherein the chuck is configured to support a substrate; wherein the housing... Applied Materials Israel Ltd

Detection module, inspection system and a obtaining multipe sensing results

A detection module that includes a readout circuit and detector having a group of sensing elements. The group is configured to detect multiple beams. The multiple beams resulted from an illumination of a substrate, by an illumination module, by multiple electron beams. The readout circuit is configured to: (a) receive... Applied Materials Israel Ltd

Chuck for supporting a wafer

According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different... Applied Materials Israel Ltd

Objective lens arrangement usable in particle-optical systems

An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole... Applied Materials Israel Ltd

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle... Applied Materials Israel Ltd

System and design based inspection

A system for design based inspection of a lithographic mask of a first layer of an article, the system may include a decision module and a memory module; wherein the memory module is configured to store (a) first layer information about an outcome of an illumination of the lithographic mask... Applied Materials Israel Ltd

Optical module and a detection method

An optical module that includes (a) an optical interface that includes an input surface and an output surface, and (b) a scintillator that has a flat surface. The scintillator is configured emit emitted light through the flat surface in response to an impingement of a charged particle on the scintillator.... Applied Materials Israel Ltd

System and multi-location zapping

A system for zapping a wafer, the system may include a pulse generation unit that is configured to generate (a) first zapping pulses for causing a breakdown in a first location of a backside insulating layer of a wafer, and (b) second zapping pulses for causing a breakdown in a... Applied Materials Israel Ltd

Arc detector and a detecting arcs

A system comprising: a first high voltage unit that is coupled via a high voltage supply cable to a second high voltage unit; a transformer that is configured to magnetically couple the high voltage supply cable to windings of a transformer; and a detection unit that is configured to monitor... Applied Materials Israel Ltd

System for discharging an area that is scanned by an electron beam

A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to... Applied Materials Israel Ltd

Technique for measuring overlay between layers of a multilayer structure

A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing... Applied Materials Israel Ltd

Multi mode systems with retractable detectors

A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam... Applied Materials Israel Ltd

Multi mode system with a dispersion x-ray detector

A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX... Applied Materials Israel Ltd

Inspection system and a evaluating an exit pupil of an inspection system

An inspection system that may include a first detection module, an illumination and collection module, and a processor. The illumination and collection module and the first detection module may be configured to execute one or more illumination and collection iterations. Each inspection iteration may include: illuminating with illuminating radiation multiple... Applied Materials Israel Ltd

System and selective zapping

A system for zapping a wafer, the system includes a pulse generator; a sensor; a first conductive interface; a second conductive interface; a controller; wherein the pulse generator is configured to generate zapping pulses; wherein the first conductive interface is configured to provide the zapping pulses to a first location... Applied Materials Israel Ltd

Cd-sem technique for wafers fabrication control

A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference... Applied Materials Israel Ltd

Method of deep learining-based examination of a semiconductor specimen and system thereof

There are provided system and method of examining a semiconductor specimen. The method comprises: upon obtaining a Deep Neural Network (DNN) trained for a given examination-related application within a semiconductor fabrication process, processing together one or more fabrication process (FP) images using the obtained trained DNN, wherein the DNN is... Applied Materials Israel Ltd

System and printability based inspection

According to an embodiment of the invention there may be provided a system for assigning lithographic mask inspection process parameters. The system may include a search module, a decision module and a memory module. The memory module may be configured to store an expected image expected to be formed on... Applied Materials Israel Ltd

System and patch based inspection

An inspection system that may include a processor and a memory module; wherein the memory module is configured to store a first image of an area of an object and a second image of the area of the object; wherein the processor is configured to generate a synthetic image of... Applied Materials Israel Ltd

Technique for visualizing elements in images by color coding

A technique for visualizing elements in images by applying a color coding procedure to data which comprises an initial image and segmentation results based on N labels. The segmentation results comprise information on segmentation uncertainty. The color coding procedure constructs a resulting colored image based on the initial image and... Applied Materials Israel Ltd

Scanning an object using multiple mechanical stages

A method for scanning an object, the method may include moving an object by a first mechanical stage that follows a first scan pattern; introducing multiple movements, by a second mechanical stage, between the object and the first mechanical stage while the first mechanical stage follows the first scan pattern;... Applied Materials Israel Ltd

Technique for measuring overlay between layers of a multilayer structure

A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing... Applied Materials Israel Ltd

Review of suspected defects using one or more reference dies

A system for reviewing a wafer, the system may include a memory unit that is configured to store information about locations of a set of suspected defects that are located at multiple dice of the wafer; electron optics that is configured to obtain images of reference elements, wherein the reference... Applied Materials Israel Ltd

Method and system for optimizing configurable parameters of inspection tools

A method, computer product and system for optimization of configurable parameters of inspection tools are provided. The method includes applying a heuristic that utilizes a prioritized sequence of selections of configurable parameters. For each configuration setting of the heuristic the method includes providing a set of local scan images of... Applied Materials Israel Ltd

Systems and methods for inspecting an object

A system, including an illumination module that comprises (a) a first traveling lens acousto-optic device; (b) a light source for illuminating the first traveling lens to provide an input beam that propagates along a first direction; (c) illumination optics for outputting an output beam that scans the object at a... Applied Materials Israel Ltd

Method for inspecting an object with an array of beams

According to an embodiment of the invention there may be provided a system for inspecting an object, the system may include a traveling lens acousto-optic device that is configured to generate a sequence of traveling lenses that propagate through an active region of the traveling lens acousto-optic device; an illumination... Applied Materials Israel Ltd

Imaging low electron yield regions with a charged beam imager

A system that may include a processor, wherein the processor comprise an image waveform finder, a synthetic image generator and an output image generator; wherein the processor is configured to (i) receive or generate multiple images of a region of the object; wherein the region has an electron yield that... Applied Materials Israel Ltd

System and setting a temperature of an object within a chamber

A system that may include a chamber, a motorized system, a chuck, a controller, multiple temperature sensors and a cooling module; wherein the chuck is configured to support an object that is positioned within the chamber; wherein the motorized system is configured to move the chuck in relation to the... Applied Materials Israel Ltd

System and scanning an object with an electron beam

A method and a charged particle beam system that includes charged particle beam optics and a movable stage; wherein the movable stage is configured to introduce a movement between the object and charged particle beam optics; wherein the movement is of a constant velocity and along a first direction; wherein... Applied Materials Israel Ltd

System and controlling specimen outgassing

According to an embodiment of the invention there may be provided a system that may include a specimen chamber, an exchange chamber, a pressure monitor; and a controller. The exchange chamber may be configured to (i) receive a specimen when an exchange chamber pressure maintained within the exchange chamber is... Applied Materials Israel Ltd








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