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Asm America Inc patents

Recent patent applications related to Asm America Inc. Asm America Inc is listed as an Agent/Assignee. Note: Asm America Inc may have other listings under different names/spellings. We're not affiliated with Asm America Inc, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asm America Inc-related inventors




Date Asm America Inc patents (updated weekly) - BOOKMARK this page
01/12/17Selective etching of reactor surfaces
09/29/16Vapor flow control atomic layer deposition
08/11/16Reaction system for growing a thin film
07/02/15Process feed management for semiconductor substrate processing
05/08/14Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds
03/27/14Tin precursors for vapor deposition and deposition processes
01/09/14Plasma-enhanced atomic layer deposition of conductive material over dielectric layers
09/19/13Load lock having secondary isolation chamber
09/12/13Methods and apparatuses for epitaxial films with high germanium content
06/27/13Vapor flow control atomic layer deposition
06/20/13In-situ pre-clean prior to epitaxy
06/13/13Thermocouple assembly with guarded thermocouple junction
05/02/13Heater jacket for a fluid line
05/02/13Deposition valve assembly and heating the same
05/02/13Susceptor with ring to limit backside deposition
01/31/13Methods and a gas panel with constant gas flow
01/24/13Pressure transmitter for a semiconductor processing environment
01/03/13Method for minimizing contamination in semiconductor processing chamber
12/06/12Thermocouple
11/22/12High throughput cyclical epitaxial deposition and etch process
10/25/12Reaction system for growing a thin film
09/27/12Selective epitaxial formation of semiconductive films
09/20/12Substrate temperature uniformity during rapid substrate heating
06/21/12Precursor delivery system
04/26/12Ternary metal alloys with tunable stoichiometries
04/05/12Gas mixer and manifold assembly for ald reactor
02/09/12Reaction apparatus having multiple adjustable exhaust ports
11/10/11Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
10/20/11Ald of metal silicate films
08/18/11Reactive site deactivation against vapor deposition
07/07/11High temperature ald inlet manifold
05/19/11Cyclical epitaxial deposition and etch
03/03/11High concentration water pulses for atomic layer deposition
02/03/11Deposition of ruthenium or ruthenium dioxide
11/11/10Thermocouple assembly with guarded thermocouple junction
11/11/10Thermocouple
11/11/10Smart temperature measuring device
11/04/10Selective etching of reactor surfaces
10/07/10Substrate reactor with adjustable injectors for mixing gases within reaction chamber
08/12/10Method and minimizing contamination in semiconductor processing chamber
08/05/10Plasma-enhanced atomic layer deposition of conductive material over dielectric layers
07/29/10Load lock having secondary isolation chamber
07/08/10Gap maintenance for opening to process chamber
06/10/10Methods of depositing electrically active doped crystalline si-containing films
06/10/10Thermocouple
05/13/10Reaction chamber
05/06/10Self-centering susceptor ring assembly
05/06/10Substrate holder with varying density
05/06/10Deposition from liquid sources
04/22/10Etching high-k materials
04/15/10Substrate support system for reduced autodoping and backside deposition
04/15/10Separate injection of reactive species in selective formation of films
02/11/10Susceptor ring
01/28/10Method of forming non-conformal layers
01/21/10Process for deposition of semiconductor films
01/14/10Epitaxial semiconductor deposition methods and structures
12/24/09Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds
12/17/09Thermocouple
12/17/09Method to form ultra high quality silicon-containing compound layers
11/19/09Process and treating wafers
11/12/09Porous substrate holder with thinned portions
11/12/09Plasma-enhanced pulsed deposition of metal carbide films
10/29/09Plasma-enhanced deposition process for forming a metal oxide thin film and related structures
08/27/09Doping with ald technology
08/06/09Gas mixer and manifold assembly for ald reactor
Patent Packs
07/30/09Epitaxial growth of relaxed silicon germanium layers
07/23/09Air ventilation system
07/16/09Method for growing thin films
06/25/09Redundant temperature sensor for semiconductor processing chambers
06/25/09Separate injection of reactive species in selective formation of films
06/11/09Calibration of temperature control system for semiconductor processing chamber
05/07/09Methods of selectively depositing silicon-containing films
04/30/09Reaction apparatus having multiple adjustable exhaust ports
04/30/09Inhibitors for selective deposition of silicon containing films
04/23/09Reactor with small linear lamps for localized heat control and improved temperature uniformity
03/26/09Method for forming a dielectric stack
03/19/09Stressor for engineered strain on channel
02/26/09Thermocouple
01/28/10Method of forming non-conformal layers
01/21/10Process for deposition of semiconductor films
Patent Packs
01/14/10Epitaxial semiconductor deposition methods and structures







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