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Asm Ip Holding B v patents

Recent patent applications related to Asm Ip Holding B v. Asm Ip Holding B v is listed as an Agent/Assignee. Note: Asm Ip Holding B v may have other listings under different names/spellings. We're not affiliated with Asm Ip Holding B v, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asm Ip Holding B v-related inventors




Date Asm Ip Holding B v patents (updated weekly) - BOOKMARK this page
10/19/17 new patent  Combined anneal and selective deposition systems
10/19/17 new patent  Combined anneal and selective deposition process
09/28/17Preventive maintenance system and preventive maintenance method
09/28/17Radial and thickness control via biased multi-port injection settings
09/21/17Aligned carbon nanotubes
09/21/17Substrate supporting plate, thin film deposition apparatus including the same, and thin film deposition method
09/14/17Selective formation of metal silicides
09/14/17Gas distribution improved film uniformity in an epitaxial system
09/14/17Plasma stabilization method and deposition method using the same
09/07/17Emissivity, surface finish and porosity control of semiconductor reactor components
09/07/17Systems and methods for dynamic semiconductor process scheduling
08/31/17Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
08/24/17Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
08/03/17Variable conductance gas distribution apparatus and method
07/27/17Semiconductor device fabrication using etch stop layer
07/06/17Process gas management for an inductively-coupled plasma deposition reactor
06/29/17Method of atomic layer etching using functional group-containing fluorocarbon
06/29/17Methods of forming metal silicides
06/29/17Substrate processing system
06/29/17Atomic layer deposition of iii-v compounds to form v-nand devices
06/22/17Substrate transport device and substrate processing apparatus
06/08/17Film forming apparatus, recording medium, and film forming method
06/01/17Method and system for in-situ formation of intermediate reactive species
06/01/17Methods of forming silicon germanium tin films and structures and devices including the films
06/01/17Silane and borane treatments for titanium carbide films
06/01/17Selective deposition of aluminum and nitrogen containing material
05/25/17Method of depositing thin film
05/18/17Formation of siocn thin films
05/18/17Formation of siocn thin films
05/18/17Process for deposition of titanium oxynitride for use in integrated circuit fabrication
05/11/17Counter flow mixer for process chamber
05/11/17Si precursors for deposition of sin at low temperatures
04/27/17Semiconductor manufacturing system including deposition apparatus
04/27/17Nbmc layers
04/27/17System and gas-phase passivation of a semiconductor surface
04/27/17System and gas-phase passivation of a semiconductor surface
04/20/17Method for depositing dielectric film in trenches by peald
04/20/17Implementing atomic layer deposition for gate dielectrics
04/20/17Photoactive devices and materials
04/13/17Vapor phase deposition of organic films
04/13/17Vapor phase deposition of organic films
04/06/17Removal of surface passivation
04/06/17Tritertbutyl aluminum reactants for vapor deposition
04/06/17Methods of forming metal silicides
04/06/17Deposition of smooth metal nitride films
03/30/17Variable adjustment for precise matching of multiple chamber cavity housings
03/23/17Ald of metal-containing films using cyclopentadienyl compounds
03/02/17Substrate processing apparatus, recording medium, and processing substrates
03/02/17Formation of sin thin films
03/02/17Method for forming aluminum nitride-based film by peald
02/23/17Susceptor and substrate processing apparatus
02/23/17Method for forming sin or sicn film in trenches by peald
02/23/17Susceptor and substrate processing apparatus
02/16/17Deposition apparatus and deposition system having the same
02/16/17Thin film deposition apparatus
02/16/17Methods of forming highly p-type doped germanium tin films and structures and devices including the films
02/09/17Selective deposition on metal or metallic surfaces relative to dielectric surfaces
02/09/17Selective deposition of aluminum and nitrogen containing material
02/09/17Substrate processing apparatus
02/09/17Variable gap hard stop design
02/02/17Apparatuses for thin film deposition
02/02/17Methods and apparatuses for temperature-indexed thin film deposition
02/02/17Methods for thin film deposition
01/26/17Formation of boron-doped titanium metal films with high work function
01/19/17Method for protecting layer by forming hydrocarbon-based extemely thin film
Patent Packs
01/19/17Method for protecting layer by forming hydrocarbon-based extremely thin film
01/12/17Thin film deposition apparatus
01/12/17Pulsed remote plasma method and system
01/12/17Emissivity, surface finish and porosity control of semiconductor reactor components
01/12/17Reactive curing process for semiconductor substrates
01/12/17Magnetic susceptor to baseplate seal
12/29/16System for treatment of deposition reactor
12/29/16Structures including metal carbide material, devices including the structures, and methods of forming same
12/22/16Vapor deposition of lif thin films
12/22/16Method for forming metal chalcogenide thin films on a semiconductor device
12/22/16Metal selenide and metal telluride thin films for semiconductor device applications
12/15/16Reactor system for sublimation of pre-clean byproducts and method thereof
12/08/16Methods for semiconductor passivation by nitridation
12/08/16Methods for semiconductor passivation by nitridation after oxide removal
11/24/16Apparatus and method related to reaction chamber with shutter system
Patent Packs
11/17/16Substrate processing system and installing plc software
10/27/16Structures and devices including germanium-tin films and methods of forming same
10/20/16Atomic layer deposition of silicon carbon nitride based materials
10/20/16Cyclic doped aluminum nitride deposition
10/13/16Deposition apparatus and deposition method
10/06/16Semiconductor processing reactor and components thereof
09/29/16Method of forming thin film
09/22/16Atomic layer deposition apparatus
09/15/16Atomic layer deposition of metal phosphates and lithium silicates
09/15/16Pre-clean chamber and process with substrate tray for changing substrate temperature
09/15/16Cross-flow reactor and method
09/15/16Multi-zone reactor, system including the reactor, and using the same
09/01/16Plasma pre-clean module and process
08/25/16Removal of surface passivation
08/18/16Semiconductor manufacturing apparatus
08/18/16Method for forming film having low resistance and shallow junction depth
08/18/16Method for forming oxide layer by oxidizing semiconductor substrate with hydrogen peroxide
08/11/16Ald of metal-containing films using cyclopentadienyl compounds
08/04/16Selective deposition
08/04/16Film forming apparatus
08/04/16Synthesis and use of precursors for ald of group va element containing thin films
07/21/16Method of plasma-enhanced atomic layer etching
07/14/16Sulfur-containing thin films
07/07/16Silane and borane treatments for titanium carbide films
06/30/16Germanium oxide pre-clean module and process
06/23/16High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
06/23/16Semiconductor device and manufacturing method thereof
06/23/16Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
06/16/16Method for depositing metal-containing film using particle-reduction step
06/16/16Cyclical deposition of germanium
Social Network Patent Pack
06/02/16Film forming apparatus
06/02/16Atomic layer deposition of geo2
05/26/16Cyclic aluminum oxynitride deposition
05/19/16Method for depositing thin film
05/19/16Process for forming silicon-filled openings with a reduced occurrence of voids
05/12/16Semiconductor structure and device and methods of forming same using selective epitaxial process
05/05/16Method of mounting substrate support in chamber, dismounting substrate support and auxiliary transport tool
04/28/16Method and system for treatment of deposition reactor
04/28/16Titanium aluminum and tantalum aluminum thin films
04/07/16Variable conductance gas distribution apparatus and method
Patent Packs
04/07/16Multiple vapor sources for vapor deposition
04/07/16Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
03/31/16Method for hydrophobization of surface of silicon-containing film by ald
03/31/16Method for depositing films on semiconductor wafers
03/17/16Deposition of sin
03/17/16Process for densifying nitride film
03/10/16Assembly of liner and flange for vertical furnace as well as a vertical process furnace
03/03/16Method of depositing thin film
03/03/16Deposition apparatus and cleansing method using the same
02/25/16Method and system for in situ formation of gas-phase compounds
02/04/16Apparatus and transporting wafers between wafer carrier and process tool under vacuum
01/28/16Showerhead assembly and components thereof
01/28/16Substrate processing system, storage medium and registering new device
01/21/16Process for forming silicon-filled openings with a reduced occurrence of voids
01/21/16Process for forming silicon-filled openings with a reduced occurrence of voids
01/21/16Apparatus and adjusting a pedestal assembly for a reactor
01/21/16Local temperature control of susceptor heater for increase of temperature uniformity
01/14/16Semiconductor reaction chamber with plasma capabilities
01/14/16Apparatus and pre-baking substrate upstream of process chamber
12/31/15Substrate transferring arm and substrate transferring apparatus including the same
12/17/15Substrate processing apparatus and substrate processing method
12/10/15Reactive curing process for semiconductor substrates
11/26/15Semiconductor processing assembly and facility
11/19/15Method for reducing particle generation at bevel portion of substrate
11/05/15Low-oxidation plasma-assisted process
10/29/15Lockout tagout for semiconductor vacuum valve
10/29/15Substrate processing apparatus
10/22/15Dual selective deposition
10/22/15Substrate processing apparatus
10/22/15Modular vertical furnace processing system
Patent Packs
10/22/15Fluorine-containing conductive films
10/08/15Method for stabilizing reaction chamber pressure
10/08/15Deposition of boron and carbon containing materials
10/08/15Anti-slip end effector for transporting workpiece using van der waals force
10/01/15Plasma atomic layer deposition
10/01/15Method and system for delivering hydrogen peroxide to a semiconductor processing chamber
09/24/15Removable substrate tray and assembly and reactor including same
09/24/15Method for performing uniform processing in gas system-sharing multiple reaction chambers
09/24/15Gas distribution system, reactor including the system, and methods of using the same
09/24/15Gas-phase reactor and system having exhaust plenum and components thereof
09/24/15Plasma pre-clean module and process
09/10/15Film forming apparatus, and manufacturing semiconductor device
08/27/15Gas supply manifold and supplying gases to chamber using same
08/13/15Atomic layer deposition of aluminum fluoride thin films
08/06/15Selective deposition of metals, metal oxides, and dielectrics
08/06/15Anti-slip end-effector for transporting workpiece
07/30/15Method of making a wire-based semiconductor device
07/02/15Process gas management for an inductively-coupled plasma deposition reactor
06/25/15Silane and borane treatments for titanium carbide films
06/25/15Cyclical deposition of germanium
Social Network Patent Pack
06/18/15Chamber sealing member
06/18/15Sulfur-containing thin films
06/18/15Sulfur-containing thin films
06/11/15Atomic layer deposition of silicon carbon nitride based materials
05/28/15Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition
05/28/15Metal oxide protective layer for a semiconductor device
05/21/15Method and system to reduce outgassing in a reaction chamber
05/14/15Method for forming conformal carbon films, structures and devices including a conformal carbon film, and system of forming same
05/07/15Method of depositing thin film
05/07/15Method of depositing thin film
04/30/15Deposition apparatus
04/30/15Method for trimming carbon-containing film at reduced trimming rate
04/30/15Method for treating sioch film with hydrogen plasma
04/16/15Deposition of boron and carbon containing materials
04/16/15Deposition of boron and carbon containing materials
04/09/15Susceptor heater and heating a substrate
04/09/15Combination cvd/ald method, source and pulse profile modification
04/09/15Method for forming ti-containing film by peald using tdmat or tdeat
04/02/15Semiconductor structure and device and methods of forming same using selective epitaxial process
03/19/15Method for forming oxide film by plasma-assisted processing
Social Network Patent Pack
03/05/15Method for restoring porous surface of dielectric layer by uv light-assisted ald
02/26/15Method for forming sioch film using organoaminosilane annealing
02/19/15Methods of forming films including germanium tin and structures and devices including the films
01/22/15Method of making a resistive random access memory device
01/22/15Method of making a resistive random access memory device
01/22/15Semiconductor reaction chamber with plasma capabilities
01/15/15Doped semiconductor films and processing
01/15/15Method and system to reduce outgassing in a reaction chamber
12/18/14Method for controlling in-plane uniformity of substrate processed by plasma-assisted process
11/27/14Method for forming film by plasma-assisted deposition using two-frequency combined pulsed rf power
11/20/14Deposition apparatus
10/30/14Method of making a resistive random access memory device with metal-doped resistive switching layer
10/30/14Method of making a resistive random access memory device
10/23/14Connector with air extraction
10/09/14Wafer boat having dual pitch
09/18/14Silane or borane treatment of metal thin films
09/18/14Deposition of smooth metal nitride films
09/18/14Si precursors for deposition of sin at low temperatures
09/18/14Si precursors for deposition of sin at low temperatures
09/18/14Si precursors for deposition of sin at low temperatures
09/11/14Method and systems for in-situ formation of intermediate reactive species
09/11/14Pulsed remote plasma method and system
08/07/14Multi-step etching compounds containing a metal
08/07/14Method and system for treatment of deposition reactor
07/31/14Method for forming layer constituted by repeated stacked layers
07/24/14Deposition apparatus
06/26/14Methods for increasing growth rate of thin films
06/26/14Single-and dual-chamber module-attachable wafer-handling chamber
05/29/14Scheduler for processing system
05/22/14Method for forming insulation film using non-halide precursor having four or more silicons
Social Network Patent Pack
05/01/14Uv irradiation apparatus with cleaning mechanism and cleaning uv irradiation apparatus
04/24/14Deposition apparatus
04/17/14Semiconductor reaction chamber showerhead
04/17/14Vapor deposition of lif thin films
04/10/14Heating/cooling pedestal for semiconductor-processing apparatus
04/10/14Uv-curing apparatus provided with wavelength-tuned excimer lamp and processing semiconductor substrate using same
03/27/14Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
03/13/14Deposition apparatus and depositing thin film using the same
03/06/14Systems and methods for mass flow controller verification
03/06/14Method for stabilizing plasma ignition
03/06/14Atomic layer deposition of geo2
03/06/14Systems and methods for dynamic semiconductor process scheduling
02/13/14Deposition apparatus
02/13/14Method for supplying gas with flow rate gradient over substrate
02/06/14Method of parallel shift operation of multiple reactors
02/06/14Apparatus and calculating a wafer position in a processing chamber under process conditions
01/30/14Method of making a wire-based semiconductor device
01/16/14Method for forming aluminum oxide film using al compound containing alkyl group and alkoxy or alkylamine group
01/02/14Susceptor heater and heating a substrate
12/19/13Method for repairing damage of dielectric film by cyclic processes
12/12/13Method for forming silicon-containing dielectric film by cyclic deposition with side wall coverage control
12/05/13Processes and structures for dopant profile control in epitaxial trench fill
11/21/13Methods for forming multi-component thin films
11/07/13Phase-stabilized thin films, structures and devices including the thin films, and methods of forming same
10/31/13Wafer boat
10/24/13Vertical furnace with circumferentially distributed gas inlet system
10/17/13Vertical wafer boat
09/26/13Deposition apparatus
09/19/13Method for forming si-containing film using two precursors by ald







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