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Asml Holding N v
Asml Holding N v_20100107
  

Asml Holding N v patents

Recent patent applications related to Asml Holding N v. Asml Holding N v is listed as an Agent/Assignee. Note: Asml Holding N v may have other listings under different names/spellings. We're not affiliated with Asml Holding N v, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asml Holding N v-related inventors




Date Asml Holding N v patents (updated weekly) - BOOKMARK this page
03/09/17Estimating deformation of a patterning device and/or a change in its position
03/09/17Lithographic apparatus
02/16/17Lithographic apparatus and device manufacturing method
02/02/17Lithographic apparatus and device manufacturing method
01/12/17Coil assembly, electromagnetic actuator, stage positioning device, lithographic apparatus and device manufacturing method
12/08/16High numerical aperture objective lens system
08/04/16Polarization independent interferometer
07/21/16Method and apparatuses for optical pupil symmetrization
03/31/16High numerical aperture objective lens system
03/17/16Rapid exchange device for lithography reticles
12/24/15Lithographic apparatus and method
12/10/15Gas flow optimization in reticle stage environment
11/12/15Lithographic apparatus and device manufacturing method
10/22/15Patterning device support, lithographic apparatus, and controlling patterning device temperature
10/01/15Lithographic substrate and a device
10/01/15Patterning device support and lithographic apparatus
10/01/15Patterning device manipulating system and lithographic apparatuses
09/10/15Linear motor and lithography arrangement including linear motor
08/27/15Reticle cooling system in a lithographic apparatus
08/27/15Reticle cleaning by means of sticky surface
08/20/15Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method
08/06/15Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
08/06/15Real-time reticle curvature sensing
07/30/15Quantitative reticle distortion measurement system
07/30/15Reticle heater to keep reticle heating uniform
07/09/15Heating and cooling systems in a lithographic apparatus
06/18/15Lithographic apparatus
04/30/15Catadioptric illumination system for metrology
04/23/15Position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method, optical element
03/26/15Compact self-contained holographic and interferometric apparatus
02/12/15Patterning device support
10/09/14Lithographic apparatus and device manufacturing method
09/18/14Lithographic apparatus and device manufacturing method
08/21/14Immersion photolithography system and method using microchannel nozzles
08/21/14Shear-layer chuck for lithographic apparatus
07/10/14Alignment target contrast in a lithographic double patterning process
05/29/14Lithographic apparatus and device manufacturing method
04/10/14Gas gauge compatible with vacuum environments
04/10/14Optical system, inspection system and manufacturing method
01/16/14Shear-layer chuck for lithographic apparatus
11/21/13Electrostatic clamp, lithographic apparatus and manufacturing an electrostatic clamp
10/24/13Lithographic apparatuses and methods for compensating for eigenmode coupling
10/03/13Tunable wavelength illumination system
07/04/13Catadioptric objective for scatterometry
04/25/13Lithographic apparatus and device manufacturing method
03/14/13Linear motor and lithography arrangement including linear motor
02/07/13Electrostatic clamp, lithographic apparatus and manufacturing an electrostatic clamp
01/10/13Linear motor magnetic shield apparatus
01/10/13System and using a two part cover and a box for protecting a reticle
01/10/13Optical component fabrication using coated substrates
10/18/12Double euv illumination uniformity correction system and method
10/04/12Lithographic apparatus and device manufacturing method
08/09/12Pulse to pulse energy equalization of light beam intensity
07/05/12Time differential reticle inspection
06/07/12Patterning device support
06/07/12Immersion photolithography system and method using microchannel nozzles
05/17/12Low and high pressure proximity sensors
04/19/12Shared compliance in a rapid exchange device for reticles, and reticle stage
04/12/12Surface inspection system with advanced illumination
04/12/12Image-compensating addressable electrostatic chuck system
04/05/12Object inspection systems and methods
02/02/12Reticle cooling in a lithographic apparatus
02/02/12High numerical aperture catadioptric objectives without obscuration and applications thereof
01/05/12Reticle clamping system
12/22/11Catadioptric illumination system for metrology
Patent Packs
11/17/11Optical system, inspection system and manufacturing method
11/10/11Immersion photolithography system and method using microchannel nozzles
11/10/11Immersion photolithography system and method using microchannel nozzles
11/03/11Dual containment system for transporting a fluid through a "rolling loop" cable duct
10/27/11Systems and methods for thermally-induced aberration correction in immersion lithography
10/20/11Pulse modifier with adjustable etendue
09/22/11Lithographic apparatus, an illumination system, a projection system and a manufacturing a device using a lithographic apparatus
06/23/11Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus
06/09/11Lithographic apparatus and device manufacturing method
05/26/11Immersion photolithography system and method using inverted wafer-projection optics interface
05/12/11Apparatus for supporting and optical element, and making same
04/07/11Anti-reflective coating for optical elements
03/31/11Method utilizing an electrooptic modulator
02/10/11Robot for in-vacuum use
01/27/11Diffraction elements for alignment targets
Patent Packs
01/20/11Shear-layer chuck for lithographic apparatus
01/06/11System and using a two part cover and a box for protecting a reticle
12/02/10Pulse stretcher with reduced energy density on optical components
11/18/10Folded optical encoder and applications for same
11/11/10Scanning euv interference imaging for extremely high resolution patterning
10/28/10System and method to increase surface tension and contact angle in immersion lithography
10/28/10Side seal for wet lens elements
10/14/10Optical system for increasing illumination efficiency of a patterning device
09/30/10Shock absorbing fluidic actuator
08/05/10Reticle support that reduces reticle slippage
07/01/10Euv mask inspection
07/01/10Linear motor magnetic shield apparatus
07/01/10Optically compensated unidirectional reticle bender
06/17/10Euv mask inspection system
06/17/10Reticle inspection systems and method
05/27/10Bonding silicon silicon carbide to glass ceramics
05/06/10Reverse flow gas gauge proximity sensor
04/29/10Fluid assisted gas gauge proximity sensor
04/01/10Inspection apparatus, lithographic sphero-chromatic aberration correction
02/25/10Particle detection on an object surface
02/25/10Catadioptric optical system for scatterometry
02/11/10Full wafer width scanning using steps and scan system
02/04/10Cooling of actuator coils
02/04/10Actuator system using multiple piezoelectric actuators
01/07/10Systems and methods for minimizing scattered light in multi-slm maskless lithography
12/31/09Parallel process focus compensation
12/17/09Pulse to pulse energy equalization of light beam intensity
12/10/09Particle detection on patterning devices with arbitrary patterns
12/10/09Lithographic apparatus and device manufacturing method
10/15/09High numerical aperture catadioptric objectives without obscuration and applications thereof
Social Network Patent Pack
10/15/09Robot position calibration tool (rpct)
10/08/09Optical system for transforming numerical aperture
08/13/09Tunable alignment geometry
07/16/09Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method
06/25/09Beam characterization monitor for sensing pointing or angle of an optical beam
06/25/09Systems and methods for lithographic illuminator beam deviation measurement and calibration using grating sensors
06/18/09Off-axis catadioptric projection optical system for lithography
06/18/09Pre-filter for a servo control loop, and applications thereof
05/14/09Thin film continuous spatially modulated grey attenuators and filters
04/30/09Systems and methods for insitu lens cleaning using ozone in immersion lithography
Patent Packs
04/16/09Securing authenticity of integrated circuit chip
04/02/09Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus
03/19/09Laminar flow gas curtains for lithographic applications
02/19/09Real time telecentricity measurement
02/19/09Beam positioning and pointing
02/19/09Illumination system with low telecentricity error and dynamic telecentricity correction
02/05/09Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
01/07/10Systems and methods for minimizing scattered light in multi-slm maskless lithography







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