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Asml Holding N v
Asml Holding N v_20100107

Asml Holding N v patents


Recent patent applications related to Asml Holding N v. Asml Holding N v is listed as an Agent/Assignee. Note: Asml Holding N v may have other listings under different names/spellings. We're not affiliated with Asml Holding N v, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asml Holding N v-related inventors


 new patent  Variable corrector of a wave front

An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path... Asml Holding N v

Reticle cooling by non-uniform gas flow

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create... Asml Holding N v

Lithographic apparatus with a patterning device environment

A lithographic apparatus injects gas between a patterning device and a patterning device masking blade to help protect the patterning device from contamination. The gas may be injected into the space defined between the patterning device and the patterning device blade by one or more gas supply nozzles that are... Asml Holding N v

Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Asml Holding N v

Feedback control system of an alignment system

An alignment system having long term stability in illumination center wavelength is discussed. The alignment system includes a tunable radiation source and a feedback control system. The tunable radiation source includes a light source configured to provide a broadband radiation beam and a tunable multi-passband filter configured to filter the... Asml Holding N v

Patterning device support, lithographic apparatus, and controlling patterning device temperature

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support... Asml Holding N v

Immersion photolithography system and method using microchannel nozzles

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Asml Holding N v

Method and spectrally broadening radiation

A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having... Asml Holding N v

Beam homogenizer, illumination system and metrology system

A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to... Asml Holding N v

An electrostatic clamp and a manufacturing the same

An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the... Asml Holding N v

Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method

A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass,... Asml Holding N v

Lithographic apparatus, a dryer and a removing liquid from a surface

A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single... Asml Holding N v

Compact two-sided reticle inspection system

An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle... Asml Holding N v

Alignment sensor and lithographic apparatus

An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength... Asml Holding N v

Method and device for focusing in an inspection system

An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation... Asml Holding N v

Substrate support, loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method

A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section... Asml Holding N v

Flexible illuminator

A method is disclosed that includes splitting a beam of radiation into a first part of the beam having a first polarization and a second part of the beam having a second polarization, forming a first beam with a first polarization distribution between the first polarization and the second polarization... Asml Holding N v

Position measurement with illumination profile having regions confined to peripheral portion of pupil

An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited... Asml Holding N v

Patterning device support, lithographic apparatus, and controlling patterning device temperature

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support... Asml Holding N v

Estimating deformation of a patterning device and/or a change in its position

A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions... Asml Holding N v

Lithographic apparatus

A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas... Asml Holding N v

Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Asml Holding N v

Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Asml Holding N v

Coil assembly, electromagnetic actuator, stage positioning device, lithographic apparatus and device manufacturing method

A coil assembly for an electromagnetic actuator or motor, includes a magnetic core including at least one pair of slots; a coil, at least partly mounted inside the at least one pair of slots; and a cooling member, the cooling member being mounted to a surface of the coil.... Asml Holding N v








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