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Asml Netherlands B v
Asml Netherlands B v And Asml Holding N v
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Asml Netherlands B v patents


Recent patent applications related to Asml Netherlands B v. Asml Netherlands B v is listed as an Agent/Assignee. Note: Asml Netherlands B v may have other listings under different names/spellings. We're not affiliated with Asml Netherlands B v, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asml Netherlands B v-related inventors


 new patent  Compensating for a physical effect in an optical system

A wavefront of a light beam that exits an acousto-optic material is estimated; a control signal for an acousto-optic system that includes the acousto-optic material is generated, the control signal being based on the estimated wavefront of the light beam; and the control signal is applied to the acousto-optic system... Asml Netherlands B v

 new patent  Illumination source for an inspection apparatus, inspection apparatus and inspection method

Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation... Asml Netherlands B v

 new patent  Metrology method and apparatus, computer program and lithographic system

Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a... Asml Netherlands B v

 new patent  Target expansion rate control in an extreme ultraviolet light source

A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a... Asml Netherlands B v

Correction using stack difference

A method including obtaining a fit of data for overlay of a metrology target for a patterning process as a function of a stack difference parameter of the metrology target; and using, by a hardware computer, a slope of the fit (i) to differentiate a metrology target measurement recipe from... Asml Netherlands B v

Method and measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus

Disclosed is a method of measuring a parameter of interest relating to a structure on a substrate, and associated metrology apparatus. The method comprises determining a correction to compensate for the effect of a measurement condition on a measurement signal from a plurality of measurement signals, wherein each of said... Asml Netherlands B v

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion... Asml Netherlands B v

Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devices

A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes.... Asml Netherlands B v

Simulation of lithography using multiple-sampling of angular distribution of source radiation

A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a... Asml Netherlands B v

Source collector apparatus, lithographic apparatus and method

A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation,... Asml Netherlands B v

Method and inspection and metrology

A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and... Asml Netherlands B v

Vacuum system for immersion photolithography

A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The... Asml Netherlands B v

Extreme ultraviolet light source

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first... Asml Netherlands B v

Lithographic apparatus and device manufacturing method

A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that... Asml Netherlands B v

Lithographic apparatus and method in a lithographic process

An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo relative movement. The first surface and the second surface face each other. The first surface accommodates a barrier system to provide a barrier to... Asml Netherlands B v

Support apparatus, lithographic apparatus and device manufacturing method

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder, The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The... Asml Netherlands B v

Lithographic method and apparatus

A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving... Asml Netherlands B v

Method of inspecting a substrate, metrology apparatus, and lithographic system

Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target is illuminated with the measurement beam, the first target being on the substrate. A... Asml Netherlands B v

Lithographic apparatus

A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge... Asml Netherlands B v

Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that,... Asml Netherlands B v

Imprint lithography

A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a... Asml Netherlands B v

Lithographic apparatus and lithographic projection method

A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The... Asml Netherlands B v

Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method

In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first... Asml Netherlands B v

Lithographic method and apparatus

A method comprising illuminating a patterning device (MA′) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation... Asml Netherlands B v

Imprint lithography

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a... Asml Netherlands B v

Metrology recipe selection

A method including evaluating a plurality of substrate measurement recipes for measurement of a metrology target processed using a patterning process, against stack sensitivity and overlay sensitivity, and selecting one or more substrate measurement recipes from the plurality of substrate measurement recipes that have a value of the stack sensitivity... Asml Netherlands B v

Process window identifier

Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method including: obtaining a plurality of features in the area of interest;... Asml Netherlands B v

Lithographic method

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to... Asml Netherlands B v

Measurement apparatus and method

A measurement apparatus for measuring at least one property of an electron bunch or other group of charged particles travelling through a cavity (310), comprises a plurality of electrodes (302-308) arranged around the cavity, a plurality of optical sensors (322-328), wherein the plurality of electrodes are configured to provide signals... Asml Netherlands B v

Wavelength-based optical filtering

An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system... Asml Netherlands B v

Lithographic apparatus and device manufacturing method

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk... Asml Netherlands B v

Substrate holder, lithographic apparatus, device manufacturing method, and manufacturing a substrate holder

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak... Asml Netherlands B v

Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.... Asml Netherlands B v

Metrology method, apparatus and computer program

Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a... Asml Netherlands B v

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise... Asml Netherlands B v

03/15/18 / #20180074411

Lithographic apparatus and method

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the... Asml Netherlands B v

03/15/18 / #20180074416

A lithography apparatus and a manufacturing a device

A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase... Asml Netherlands B v

03/15/18 / #20180077786

Target trajectory metrology in an extreme ultraviolet light source

A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a... Asml Netherlands B v

03/08/18 / #20180067398

Lithographic apparatus and manufacturing a lithographic apparatus

A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific... Asml Netherlands B v

03/08/18 / #20180067401

Substrate placement in immersion lithography

A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of... Asml Netherlands B v

03/08/18 / #20180067900

Method and inspection and metrology

A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical... Asml Netherlands B v

03/01/18 / #20180058928

Radiation sensor apparatus

A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the... Asml Netherlands B v

03/01/18 / #20180059552

Metrology measuring a structure formed on a substrate by a lithographic process, lithographic system, and measuring a structure formed on a substrate by a lithographic process

Metrology apparatus and methods are disclosed. In one arrangement, a metrology apparatus comprises an optical system that illuminates a structure with measurement radiation and detects the measurement radiation scattered by the structure. The optical system comprises an array of lenses that focusses the scattered measurement radiation onto a sensor. A... Asml Netherlands B v

03/01/18 / #20180059555

Lithographic apparatus, and device manufacturing method

A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with... Asml Netherlands B v

03/01/18 / #20180059556

Lithographic apparatus

A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the... Asml Netherlands B v

03/01/18 / #20180063935

Optical isolation module

An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different;... Asml Netherlands B v

02/15/18 / #20180045657

Variable corrector of a wave front

An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path... Asml Netherlands B v

02/15/18 / #20180046089

Lithographic apparatus and device manufacturing method

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface... Asml Netherlands B v

02/15/18 / #20180046090

Lithographic apparatus and device manufacturing method involving a liquid confinement structure

In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between... Asml Netherlands B v

02/15/18 / #20180046091

Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method

Disclosed is a patterning device configured to pattern a beam of radiation according to a desired pattern during a lithographic process. The patterning device comprises first features configured to form a first target on a substrate during the lithographic process and second features configured to form a second target on... Asml Netherlands B v

02/15/18 / #20180046094

Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the... Asml Netherlands B v

02/15/18 / #20180046095

Lithographic apparatus and device manufacturing method

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under... Asml Netherlands B v

02/15/18 / #20180046737

Method and inspection and metrology

A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one... Asml Netherlands B v

02/08/18 / #20180039180

Lithographic method and apparatus

A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the... Asml Netherlands B v

02/08/18 / #20180039188

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the... Asml Netherlands B v

02/01/18 / #20180031977

Device and processing a radiation beam with coherence

Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system... Asml Netherlands B v

02/01/18 / #20180031979

Radiation source

A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine... Asml Netherlands B v

02/01/18 / #20180031981

Process variability aware adaptive inspection and metrology

A defect prediction method for a device manufacturing process involving processing one or more patterns onto a substrate, the method including: determining values of one or more processing parameters under which the one or more patterns are processed; and determining or predicting, using the values of the one or more... Asml Netherlands B v

02/01/18 / #20180031982

Radiation system

A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.... Asml Netherlands B v

02/01/18 / #20180034235

Radiation source

A laser system comprises a seed module (33) operable to emit a pulse of a first laser beam followed by a pulse of a second laser beam and a plurality of amplification chambers each comprising a gain medium having a gain, wherein the plurality of amplification chambers are arranged to... Asml Netherlands B v

01/25/18 / #20180024054

Method of measuring a target, substrate, metrology apparatus, and lithographic apparatus

Disclosed is a method of measuring a target, an associated substrate, a metrology apparatus and a lithographic apparatus. In one arrangement the target comprises a layered structure. The layered structure has a first target structure in a first layer and a second target structure in a second layer. The method... Asml Netherlands B v

01/25/18 / #20180024443

Device manufacturing method and patterning devices for use in device manufacturing method

A functional device pattern is formed in a self-aligned multiple patterning process (e.g. SADP, SAQP). A first grid structure is formed on the substrate, the first grid structure including a plurality of elements in a first periodic arrangement. The first grid structure may be formed, for example, by a self-aligned... Asml Netherlands B v

01/25/18 / #20180024446

Thermal conditioning method

A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical... Asml Netherlands B v

01/25/18 / #20180027642

Apparatus for and source material delivery in a laser produced plasma euv light source

A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow... Asml Netherlands B v

01/18/18 / #20180017879

Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting... Asml Netherlands B v

Patent Packs
01/18/18 / #20180017881

Method and design of a metrology target

A method and apparatus are described for providing an accurate and robust measurement of a lithographic characteristic or metrology parameter. The method includes providing a range or a plurality of values for each of a plurality of metrology parameters of a metrology target, providing a constraint for each of the... Asml Netherlands B v

01/11/18 / #20180011014

Method and calculating electromagnetic scattering properties of finite periodic structures

A method of determining electromagnetic scattering properties of a finite periodic structure has the steps: 1002: Calculating a single-cell contrast current density, within a unit-cell supporting domain of a single one of a finite collection of unit cells. 1004: Calculating a scattered electric field outside the finite collection of unit... Asml Netherlands B v

01/11/18 / #20180011029

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source... Asml Netherlands B v

01/11/18 / #20180011398

Method and reticle optimization

A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on... Asml Netherlands B v

01/11/18 / #20180011407

Image log slope (ils) optimization

A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or... Asml Netherlands B v

01/04/18 / #20180004085

Lithographic patterning process and resists to use therein

A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more... Asml Netherlands B v

01/04/18 / #20180004095

Illumination system for a lithographic or inspection apparatus

An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be... Asml Netherlands B v

01/04/18 / #20180004100

Immersion liquid, exposure apparatus, and exposure process

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.... Asml Netherlands B v

01/04/18 / #20180006425

Online calibration for repetition rate dependent performance variables

Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable... Asml Netherlands B v

12/21/17 / #20170361359

Controlled fluid flow for cleaning an optical element

A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface... Asml Netherlands B v

12/21/17 / #20170363948

A fluid handling structure, a lithographic apparatus and a device manufacturing method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the... Asml Netherlands B v

12/21/17 / #20170363964

Sensor, lithographic apparatus and device manufacturing method

A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal... Asml Netherlands B v

12/21/17 / #20170363965

Projection system

A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate... Asml Netherlands B v

12/21/17 / #20170363969

Method & obtaining diagnostic information relating to a lithographic manufacturing process, lithographic processing system including diagnostic apparatus

A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image... Asml Netherlands B v

12/21/17 / #20170363973

Reticle cooling by non-uniform gas flow

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create... Asml Netherlands B v

Patent Packs
12/14/17 / #20170357155

Metrology methods, metrology apparatus and device manufacturing method

A metrology apparatus uses radiation (304) in an EUV waveband. A first detection system (333) includes a spectroscopic grating (312) and a detector (313) for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation... Asml Netherlands B v

12/14/17 / #20170357159

Lithographic method and apparatus

A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.... Asml Netherlands B v

12/14/17 / #20170357161

Lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of... Asml Netherlands B v

12/14/17 / #20170357165

Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Asml Netherlands B v

12/14/17 / #20170357911

Feature search by machine learning

A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: obtaining a target feature; generating a perturbed target feature from the target feature by applying a perturbation thereto; generating a set of training examples... Asml Netherlands B v

12/07/17 / #20170350829

Diffraction based overlay metrology tool and diffraction based overlay metrology

Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together... Asml Netherlands B v

12/07/17 / #20170351187

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning... Asml Netherlands B v

11/30/17 / #20170343390

Encoder, position measurement system and lithographic apparatus

An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second... Asml Netherlands B v

11/30/17 / #20170343904

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the... Asml Netherlands B v

11/30/17 / #20170345138

Method and image analysis

A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may... Asml Netherlands B v

11/23/17 / #20170336712

Method and using patterning device topography induced phase

A method including obtaining calculated wavefront phase information caused by a three-dimensional topography of a pattern of a lithographic patterning device, and computing, using a computer processor, an imaging effect of the three-dimensional topography of the patterning device pattern based on the calculated wavefront information.... Asml Netherlands B v

11/23/17 / #20170336713

Method and image analysis

A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may... Asml Netherlands B v

11/16/17 / #20170329218

Imprint lithography

A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a... Asml Netherlands B v

11/16/17 / #20170329231

Method and using patterning device topography induced phase

A method includes measuring a three-dimensional topography of a feature of a pattern of a lithography patterning device and calculating from the measurements wavefront phase information caused by the three-dimensional topography of the pattern.... Asml Netherlands B v

11/16/17 / #20170329218

Imprint lithography

A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a... Asml Netherlands B v

11/16/17 / #20170329235

Rule-based deployment of assist features

Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve, of a portion of a design layout used in a patterning process for imaging that portion onto a substrate using a lithographic apparatus. The methods include determining or adjusting one or more... Asml Netherlands B v

11/16/17 / #20170329240

Lithographic apparatus and device manufacturing method

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature... Asml Netherlands B v

11/09/17 / #20170322497

Method and generating illuminating radiation

An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each... Asml Netherlands B v

11/09/17 / #20170322499

Radiation source and lithographic apparatus

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of... Asml Netherlands B v

11/02/17 / #20170312826

Substrate holder and manufacturing a substrate holder

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls... Asml Netherlands B v

11/02/17 / #20170314915

Metrology method and apparatus, lithographic system, device manufacturing method and substrate

A lithographic process is used to form a plurality of target structures distributed at a plurality of locations across a substrate and having overlaid periodic structures with a number of different overlay bias values distributed across the target structures. At least some of the target structures comprising a number of... Asml Netherlands B v

11/02/17 / #20170315055

Method and determining the property of a structure, device manufacturing method

A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation... Asml Netherlands B v

11/02/17 / #20170315441

Method and using patterning device topography induced phase

A method including obtaining wavefront phase information caused by a three-dimensional topography of a pattern of a lithographic patterning device, and based on the wavefront phase information, adjusting a physical parameter of the pattern.... Asml Netherlands B v

11/02/17 / #20170315449

Euv exposure apparatus with reflective elements having reduced influence of temperature variation

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of... Asml Netherlands B v

11/02/17 / #20170315450

Lithographic apparatus and method

A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements... Asml Netherlands B v

11/02/17 / #20170315454

Object holder and lithographic apparatus

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first... Asml Netherlands B v

11/02/17 / #20170315456

Hhg source, inspection performing a measurement

Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of... Asml Netherlands B v








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