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Asml Netherlands B v
Asml Netherlands B v And Asml Holding N v
Asml Netherlands B v_20100114
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Asml Netherlands B v patents

Recent patent applications related to Asml Netherlands B v. Asml Netherlands B v is listed as an Agent/Assignee. Note: Asml Netherlands B v may have other listings under different names/spellings. We're not affiliated with Asml Netherlands B v, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Asml Netherlands B v-related inventors




Date Asml Netherlands B v patents (updated weekly) - BOOKMARK this page
06/22/17 new patent  Focus control arrangement and method
06/22/17 new patent  Focus monitoring arrangement and inspection apparatus including such an arrangement
06/22/17 new patent  Optimization flows of source, mask and projection optics
06/22/17 new patent  Fluid handling structure, immersion lithographic apparatus, and device manufacturing method
06/22/17 new patent  Lithographic apparatus and method
06/22/17 new patent  Process flagging and cluster detection without requiring reconstruction
06/22/17 new patent  Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
06/22/17 new patent  Optimization of target arrangement and associated target
06/22/17 new patent  Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
06/22/17 new patent  Fluid handling structure, a lithographic apparatus and a device manufacturing method
06/22/17 new patent  Lithographic apparatus and device manufacturing method
06/22/17 new patent  Lithographic apparatus and device manufacturing method
06/22/17 new patent  Inspection apparatus and method
06/22/17 new patent  Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
06/22/17 new patent  Online calibration for repetition rate dependent performance variables
06/22/17 new patent  Euv lpp source with improved dose control by tracking dose over specified window
06/08/17Methods and measuring a property of a substrate
06/08/17Statistical hierarchical reconstruction from metrology data
06/08/17Position measurement with illumination profile having regions confined to peripheral portion of pupil
06/08/17Lithographic apparatus, spectral purity filter and device manufacturing method
06/08/17Lithographic method and apparatus
06/08/17Method for determining a process window for a lithographic process, associated apparatuses and a computer program
06/08/17Lithographic apparatus and device manufacturing method
06/08/17Patterning device support, lithographic apparatus, and controlling patterning device temperature
06/08/17Lithographic apparatus and device manufacturing method
06/01/17Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
06/01/17Lithographic apparatus and device manufacturing method
06/01/17Lithographic apparatus and device manufacturing method
06/01/17Metrology target, method and apparatus, computer program and lithographic system
05/18/17Etch variation tolerant optimization
05/18/17Lithographic apparatus and device manufacturing method
05/11/17Lithographic apparatus and method
05/11/17Lithographic apparatus, device manufacturing method and clamping an object
05/11/17Lithographic apparatus and a manufacturing a device using a lithographic apparatus
05/04/17Method of operating a patterning device and lithographic apparatus
04/27/17Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a measuring reflectivity and a measuring a dose of euv radiation
04/20/17Lithographic apparatus, transferring a substrate and device manufacturing method
04/20/17Lithographic apparatus and exposure method
04/13/17Method and inspection and metrology
04/13/17Lithographic apparatus and device manufacturing method
04/13/17Methods and simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
04/06/17Metrology method and apparatus, computer program and lithographic system
04/06/17Lithographic apparatus, a projection system and a device manufacturing method
04/06/17Optical isolation module
03/30/17Lithographic apparatus
03/30/17Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes
03/30/17Metrology method, target and substrate
03/30/17Support apparatus, lithographic apparatus and device manufacturing method
03/30/17Reduction of periodic oscillations in a source plasma chamber
03/23/17Pattern placement error aware optimization
03/23/17Minimizing grazing incidence reflections for reliable euv power measurements
03/16/17Substrate table, a lithographic apparatus and a device manufacturing method
03/16/17Vacuum system for immersion photolithography
03/09/17Estimating deformation of a patterning device and/or a change in its position
03/09/17Metrology method and apparatus, substrate, lithographic system and device manufacturing method
03/09/17Lithographic apparatus
03/02/17Method and measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
02/23/17Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
02/23/17Reduction of hotspots of dense features
02/23/17Lithographic system
02/23/17Substrate table, a lithographic apparatus and a manufacturing a device using a lithographic apparatus
02/23/17Lithographic apparatus and device manufacturing method
02/16/17Lithographic apparatus and device manufacturing method
02/16/17Inspection apparatus, inspection method and manufacturing method
02/16/17Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
Patent Packs
02/16/17Lithographic apparatus and device manufacturing method
02/16/17Lithographic apparatus and device manufacturing method
02/16/17Cleaning apparatus and associated low pressure chamber apparatus
02/16/17Computational wafer inspection
02/16/17Target expansion rate control in an extreme ultraviolet light source
02/16/17Stabilizing euv light power in an extreme ultraviolet light source
02/16/17Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
02/16/17Systems and methods for controlling euv energy generation using pulse intensity
02/09/17Controlled fluid flow for cleaning an optical element
02/09/17Substrate holder and manufacturing a substrate holder
02/09/17Flows of optimization for lithographic processes
02/09/17Lithographic apparatus and device manufacturing method
02/09/17Lithographic apparatus and device manufacturing method
02/02/17Inspection apparatus, inspection method and manufacturing method
02/02/17Lithographic apparatus, positioning an object in a lithographic apparatus and device manufacturing method
Patent Packs
02/02/17Lithographic apparatus and device manufacturing method
01/26/17Inspection apparatus, inspection method, lithographic apparatus and manufacturing method
01/26/17Lithographic apparatus
01/26/17Lithographic apparatus and device manufacturing method
01/19/17Pellicle for reticle and multilayer mirror
01/19/17Methods and simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
01/12/17Model for calculating a stochastic variation in an arbitrary pattern
01/12/17Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method
01/12/17Method for a lithographic apparatus
01/12/17Stage positioning system and lithographic apparatus
01/12/17Coil assembly, electromagnetic actuator, stage positioning device, lithographic apparatus and device manufacturing method
01/12/17Lithographic apparatus and device manufacturing method
01/12/17Lithographic apparatus
01/05/17Lithographic apparatus and device manufacturing method
12/29/16Component for a radiation source, associated radiation source and lithographic apparatus
12/29/16Fluid handling structure, a lithographic apparatus and a device manufacturing method
12/29/16Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
12/29/16Lithographic measuring overlay error and a device manufacturing method
12/29/16Multi-stage system, a control method therefor, and a lithographic apparatus
12/29/16Substrate holder, lithographic apparatus, device manufacturing method, and manufacturing a substrate holder
12/29/16System for positioning an object in lithography
12/29/16Imprint lithography
12/22/16Method of metrology, inspection apparatus, lithographic system and device manufacturing method
12/22/16Lithographic apparatus with data processing apparatus
12/22/16Lithographic apparatus and device manufacturing method
12/22/16Lithographic apparatus and device manufacturing method
12/22/16Sensor system, substrate handling system and lithographic apparatus
12/22/16Recipe selection based on inter-recipe consistency
12/15/16Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method
12/15/16Immersion liquid, exposure apparatus, and exposure process
Social Network Patent Pack
12/08/16Lithographic method to apply a pattern to a substrate and lithographic apparatus
12/08/16Three-dimensional mask model for photolithography simulation
12/01/16Euv optical element having blister-resistant multilayer cap
12/01/16Measuring a process parameter for a manufacturing process involving lithography
12/01/16Rotatable frame, lithographic apparatus, projection system, focusing radiation and device manufacturing method
12/01/16Lithographic apparatus and device manufacturing method
12/01/16Lithographic apparatus and device manufacturing method
12/01/16Substrate holder, lithographic apparatus, device manufacturing method, and manufacturing a substrate holder
11/24/16Lithographic apparatus and in-line cleaning apparatus
11/17/16Metrology method and apparatus, substrate, lithographic system and device manufacturing method
Patent Packs
11/17/16Substrate holder and support table for lithography
11/17/16Radiation source
11/17/16Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
11/17/16Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and performing a measurement operation on a substrate
11/17/16Metrology method and apparatus, substrate, lithographic system and device manufacturing method
11/17/16Method of determining a measurement subset of metrology points on a substrate, associated apparatus and computer program
11/17/16Support device, lithographic apparatus and device manufacturing method
11/10/16Metrology method and apparatus, computer program and lithographic system
11/10/16Inspection method and apparatus, and lithographic apparatus
11/10/16Inspection methods, substrates having metrology targets, lithographic system and device manufacturing method
11/03/16Inspection apparatus and methods, lithographic system and device manufacturing method
11/03/16Inspection method and apparatus and lithographic apparatus
11/03/16Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
10/27/16Beam position sensor
10/27/16Apparatus and manufacturing a pellicle, and a pellicle
10/27/16Actuation mechanism, optical apparatus and lithography apparatus
10/27/16Yield estimation and control
10/27/16Method and measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatus
10/27/16Metrology method and apparatus, computer program and lithographic system
10/27/16Inspection method, lithographic apparatus, mask and substrate
10/27/16Radiation source, metrology apparatus, lithographic system and device manufacturing method
10/27/16Actuation mechanism, optical apparatus and lithography apparatus
10/20/16Fluid handling structure, lithographic apparatus and device manufacturing method
10/20/16Radiation source, metrology apparatus, lithographic system and device manufacturing method
10/13/16Method and inspection and metrology
10/13/16Lithographic apparatus and device manufacturing method
10/13/16Lithographic apparatus and device manufacturing method
10/13/16Electron injector and free electron laser
10/06/16Inspection measuring properties of a target structure, methods of operating an optical system, manufacturing devices
10/06/16Method, apparatus and substrates for lithographic metrology
Patent Packs
09/29/16Metrology methods, metrology apparatus and device manufacturing method
09/29/16An apparatus, a device and a device manufacturing method
09/29/16Lithographic apparatus and device manufacturing method
09/29/16Lithographic apparatus and device manufacturing method
09/22/16Methods and calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereof
09/22/16Lithographic method and apparatus
09/22/16Target material supply an extreme ultraviolet light source
09/22/16Radiation source and lithography
09/22/16Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
09/22/16Lithographic apparatus and device manufacturing method
09/22/16Radiation source
09/15/16Method of characterizing, forming a model, simulating, mask manufacturing manufacturing method
09/15/16Methodology to generate a guiding template for directed self-assembly
09/15/16Lithography apparatus, patterning device, and lithographic method
09/15/16Method and inspection and metrology
09/08/16Method and inspection and metrology
09/01/16Inspection apparatus to detect a target located within a pattern for lithography
09/01/16Method and design of a metrology target
09/01/16Radiation source device, lithographic apparatus and device manufacturing method
09/01/16Object positioning in lithography
Social Network Patent Pack
09/01/16Extreme ultraviolet light source
09/01/16Photon source, metrology apparatus, lithographic system and device manufacturing method
08/25/16Method and system for lithography process-window-maximizing optical proximity correction
08/25/16Methods and obtaining diagnostic information relating to an industrial process
08/25/16Method and inspection and metrology
08/18/16Lithographic apparatus and device manufacturing method
08/11/16Method and improving measurement accuracy
08/11/16Profile aware source-mask optimization
08/11/16Substrate holder, lithographic apparatus, device manufacturing method, and manufacturing a substrate holder
08/04/16Stage apparatus, lithographic apparatus and positioning an object table
08/04/16Metrology method and apparatus, computer program and lithographic system
08/04/16Metrology method, metrology apparatus and device manufacturing method
08/04/16Methods and calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
08/04/16Polarization independent interferometer
08/04/16Beam delivery apparatus and method
07/21/16Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
07/21/16Lithographic apparatus and surface cleaning method
07/21/16Lithographic apparatus and device manufacturing method
07/21/16Methodology to generate guiding templates for directed self-assembly
07/14/16System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production
Social Network Patent Pack
07/14/16Lithographic apparatus and method
07/07/16Euv exposure apparatus with reflective elements having reduced influence of temperature variation
07/07/16Radiation source and lithographic apparatus
07/07/16Immersion lithographic apparatus
07/07/16Lithographic apparatus, programmable patterning device and lithographic method
07/07/16Imprint lithography apparatus and method
06/30/16Optical element and optical system for euv lithography, and treating such an optical element
06/30/16Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
06/30/16Extreme ultraviolet light source
06/23/16Method of designing lithography features by self-assembly of block copolymer
06/23/16Faceted euv optical element
06/23/16Lithographic apparatus, cover for use in a lithographic designing a cover for use in a lithographic apparatus
06/23/16Lithographic apparatus and a device manufacturing method
06/23/16Determination and application of non-monotonic dose sensitivity
06/23/16Substrate and patterning device for use in metrology, metrology manufacturing method
06/23/16Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method
06/16/16Substrate table, a lithographic apparatus and a device manufacturing method
06/16/16Lithography system and a machine learning controller for such a lithography system
06/16/16Substrate holder, lithographic apparatus, device manufacturing method, and manufacturing a substrate holder
06/16/16Variable radius mirror dichroic beam splitter module for extreme ultraviolet source
06/16/16Apparatus for and source material delivery in a laser produced plasma euv light source
06/09/16Apparatus for and temperature compensation in high power focusing system for euv lpp source
06/09/16Metrology method, computer product and system
06/09/16Metrology method and apparatus, lithographic system and device manufacturing method
06/09/16System and isolating gain elements in a laser system
06/02/16Method and inspection apparatus and computer program product for assessing a quality of reconstruction of a value of a parameter of interest of a structure
06/02/16Method and inspection apparatus and computer program product for assessing a quality of reconstruction of a value of a parameter of interest of a structure
06/02/16Fluid handling structure, lithographic apparatus and device manufacturing method
05/26/16Metrology method and apparatus
05/26/16Radiation source for an euv optical lithographic apparatus, and lithographic apparatus comprising such a radiation source
Social Network Patent Pack
05/26/16Lithographic method
05/26/16Droplet generator steering system
05/19/16Lithographic apparatus and device manufacturing method
05/19/16Process based metrology target design
05/05/16Lithographic apparatus and a operating the apparatus
05/05/16Lithographic apparatus and device manufacturing method
05/05/16Apparatus for and supplying target material
04/28/16Lithographic apparatus and method
04/28/16Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method
04/28/16Lithographic apparatus and a device manufacturing method
04/21/16Lithographic apparatus
04/21/16Lithographic apparatus, positioning system for use in a lithographic apparatus and method
04/21/16Source mask optimization to reduce stochastic effects
04/14/16Fluid handling structure, a lithographic apparatus and a device manufacturing method
04/14/16Lithographic apparatus and device manufacturing method
04/07/16Inspection method and apparatus, substrates for use therein and device manufacturing method
04/07/16Focus monitoring arrangement and inspection apparatus including such an arrangement
03/31/16Inspection apparatus and device manufacturing method
03/31/16Method of and in-situ repair of reflective optic
03/24/16Lithographic apparatus and device manufacturing method
03/24/16Process window identifier
03/24/16Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing method
03/17/16Rapid exchange device for lithography reticles
03/17/16Alignment sensor, lithographic apparatus and alignment method
03/17/16Positioning system, a lithographic apparatus and a positional control
03/17/16Method of simulating formation of lithography features by self-assembly of block copolymers
03/10/16Lithographic apparatus and device manufacturing method
03/10/16Method of controlling a radiation source and lithographic apparatus comprising the radiation source
03/10/16Lithographic apparatus and device manufacturing method







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