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Axcelis Technologies Inc patents

Recent patent applications related to Axcelis Technologies Inc. Axcelis Technologies Inc is listed as an Agent/Assignee. Note: Axcelis Technologies Inc may have other listings under different names/spellings. We're not affiliated with Axcelis Technologies Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "A" | Axcelis Technologies Inc-related inventors




Date Axcelis Technologies Inc patents (updated weekly) - BOOKMARK this page
05/11/17Ion source liner having a lip for ion implantation systems
02/09/17High throughput cooled ion implantation system and method
08/25/16Bipolar wafer charge monitor system and ion implantation system comprising same
06/30/16Wafer clamp detection based on vibration or acoustic characteristic analysis
06/30/16Combined electrostatic lens system for ion implantation
06/30/16Combined multipole magnet and dipole scanning magnet
06/30/16Systems and methods for beam angle adjustment in ion implanters with beam decelaration
06/30/16Beam profiling speed enhancement for scanned beam implanters
06/30/16Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle device
06/30/16System and method to improve productivity of hybrid scan ion beam implanters
06/23/16Laser-induced borane production for ion implantation
03/24/16System and electrostatic clamping of workpieces
12/31/15High throughput heated ion implantation system and method
12/10/15Ion implantation source with textured interior surfaces
11/05/15Angular scanning using angular energy filter
08/13/15Multi fluid cooling system for large temperature range chuck
08/13/15Constant mass flow multi-level coolant path electrostatic chuck
08/13/15Variable electrode pattern for versatile electrostatic clamp operation
07/30/15Method for enhancing beam utilization in a scanned beam ion implanter
07/16/15Ion implantation system and method with variable energy control
06/25/15Reduced trace metals contamination ion source for an ion implantation system
01/01/15Multi-resistivity johnsen-rahbek electrostatic clamp
07/03/14Charge integration based electrostatic clamp health monitor
03/06/14Implant-induced damage control in ion implantation
02/06/14In-vacuum high speed pre-chill and post-heat stations
12/05/13Inert atmospheric pressure pre-chill and post-heat
11/21/13Inline capacitive ignition of inductively coupled plasma ion source
11/21/13Method and cleaning residue from an ion source component
07/18/13Beam line design to reduce energy contamination
06/27/13Plasma generating apparatus and process for simultaneous exposure of a workpiece to electromagnetic radiation and plasma
06/13/13System and ion implantation with improved productivity and uniformity
06/06/13Automatic control system for selection and optimization of co-gas flow levels
04/25/13Method and improved uniformity control with dynamic beam shaping
01/31/13System and ion implantation with improved productivity and uniformity
11/29/12Mass analysis variable exit aperture
11/08/12Rf coupled plasma abatement system comprising an integrated power oscillator
10/25/12Vacuum system cold trap filter
10/04/12Method and improved uniformity control with dynamic beam shaping
10/04/12Charged particle cancer therapy patient positioning method and apparatus
10/04/12Uniformity of a scanned ion beam
09/20/12Fluid distribution members and/or assemblies
07/26/12Microwave plasma electron flood
07/26/12Carbon implantation process and carbon ion precursor composition
06/28/12Dose measurement method using calorimeter
05/17/12Hydrogen cogas for carbon implant
05/17/12Implementation of co-gases for germanium and boron ion implants
02/02/12Plasma mediated ashing processes
02/02/12Versatile beam glitch detection system
12/08/11Effective algorithm for warming a twist axis for cold ion implantations
12/08/11Heated electrostatic chuck including mechanical clamp capability at high temperature
12/08/11Heated annulus chuck
12/01/11Post implant wafer heating using light
12/01/11Heated rotary seal and bearing for chilled ion implantation system
12/01/11Active dew point sensing and load lock venting to prevent condensation on workpieces
12/01/11Matched coefficient of thermal expansion for an electrostatic chuck
11/10/11Throughput enhancement for scanned beam ion implanters
11/03/11Magnetic scanning system with improved efficiency
10/27/11Silaborane implantation processes
09/22/11Plasma mediated ashing processes
09/08/11Method for improving implant uniformity during photoresist outgassing
07/28/11Thermal isolation assemblies for wafer transport apparatus and methods of use thereof
07/14/11Aromatic molecular carbon implantation processes
06/09/11Substantially non-oxidizing plasma treatment devices and processes
05/12/11Method and cleaning residue from an ion source component
05/05/11Method and system for increasing beam current above a maximum energy for a charge state
Patent Packs
02/17/11Wide area radio frequency plasma processing multiple substrates
02/03/11Method of doping semiconductors
01/20/11Adjustable louvered plasma electron flood enclosure
01/06/11Use of beam scanning to improve uniformity and productivity of a 2d mechanical scan implantation system
12/09/10System and ion implantation with improved productivity and uniformity
11/18/10Method and system for detection of solid materials in a plasma using an electromagnetic circuit
07/29/10Non-condensing thermos chuck
07/22/10Ion beam angle calibration and emittance measurement system for ribbon beams
07/22/10Enhanced low energy ion beam transport in ion implantation
07/08/10Vapor compression refridgeration chuck for ion implanters
06/24/10Ion implantation with diminished scanning field effects
06/24/10Electrostatic chuck shielding mechanism
06/10/10De-clamping wafers from an electrostatic chuck
06/10/10Electrostatic chuck with compliant coat
05/27/10Front end of line plasma mediated ashing processes and apparatus
Patent Packs
05/06/10Wafer grounding electrostatic clamps
05/06/10Electrostatic chuck ground punch
03/25/10Extraction electrode manipulator
03/18/10Adjustable deflection optics for ion implantation
03/04/10Plasma ashing apparatus and endpoint detection process
02/18/10System and beam energy identification for single wafer ion implantation
01/21/10Method and measurement of beam angle in ion implantation
12/31/09Ion implanter having combined hybrid and double mechanical scan architecture
12/31/09Post-decel magnetic energy filter for ion implantation systems
12/31/09Low-inertia multi-axis multi-directional mechanically scanned ion implantation system
12/31/09System and reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
12/31/09System and controlling broad beam uniformity
12/24/09Methods for implanting b22hx and its ionized lower mass byproducts
12/24/09Patient positioning method and apparatus used in conjunction with a charged particle cancer therapy system
12/24/09Method and intensity control of a charged particle beam extracted from a synchrotron
11/12/09Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process
11/05/09System and performing uniform dose implantation under adverse conditions
11/05/09Gas bearing electrostatic chuck
10/29/09Ion source with adjustable aperture
10/29/09Low contamination, low energy beamline architecture for high current ion implantation
09/24/09Extraction electrode system for high current ion implanter
08/27/09Processes for curing silicon based low-k dielectric materials
08/13/09Methods for in situ surface treatment in an ion implantation system
07/30/09Remote wafer presence detection with passive rfid
05/07/09Double plasma ion source
02/05/09Elevated temperature rf ion source







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