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Az Electronic Materials luxembourg S a r l
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Az Electronic Materials luxembourg S a r l patents

Recent patent applications related to Az Electronic Materials luxembourg S a r l. Az Electronic Materials luxembourg S a r l is listed as an Agent/Assignee. Note: Az Electronic Materials luxembourg S a r l may have other listings under different names/spellings. We're not affiliated with Az Electronic Materials luxembourg S a r l, we're just tracking patents.

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Date Az Electronic Materials luxembourg S a r l patents (updated weekly) - BOOKMARK this page
02/16/17Copolymerized polysilazane, manufacturing method therefor, composition comprising same, and forming siliceous film using same
12/15/16Hybrid material for optoelectronic applications
09/15/16Silicon-containing heat- or photo-curable composition
08/25/16Block copolymers with surface-active junction groups, compositions and processes thereof
08/25/16Film-forming composition and film-forming method using same
08/11/16Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
07/07/16Composite of silicon oxide nanoparticles and silsesquioxane polymer, producing same, and composite material produced using composite thereof
06/30/16Coating composition
06/16/16Encapsulation material for light emitting diodes
05/05/16Silicon containing block copolymers for direct self-assembly application
05/05/16Defect reduction methods and composition for via formation in directed self-assembly patterning
04/21/16Rinsing liquid for lithography and pattern forming method using same
01/14/16Composition for forming fine resist pattern, and pattern formation method using same
01/14/16Composition for forming topcoat layer and resist pattern formation method employing the same
01/07/16Fine resist pattern-forming composition and pattern forming method using same
11/19/15Composite of metal oxide nanoparticles and silsesquioxane polymer, producing same, and composite material produced using composite thereof
11/19/15Negative-working photosensitive siloxane composition
11/19/15Composition for forming overlay film, and resist pattern formation method employing the same
10/29/15Antireflective coating compositions and processes thereof
10/29/15Antireflective coating compositions and processes thereof
10/22/15Method for forming of siliceous film and siliceous film formed using same
10/22/15Aromatic imide compound and producing same
10/15/15Positive-type photosensitive siloxane composition
09/17/15Substrate processing method, substrate processing apparatus, manufacturing semiconductor device and non-transitory computer-readable recording medium
09/10/15Method for forming dense silicic film
09/10/15Composition for forming fine resist pattern and pattern formation method using same
08/13/15Bottom antireflective materials and compositions
07/16/15Spin coatable metallic hard mask compositions and processes thereof
07/16/15Polyoxometalate and heteropolyoxometalate compositions and methods for their use
05/21/15Overlay film forming composition and resist pattern formation method using same
04/30/15Composition for forming resist underlayer
04/02/15Underlayer composition for promoting self assembly and making and using
03/05/15Negative-working photosensitive siloxane composition
03/05/15Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
01/01/15Spin-on compositions of soluble metal oxide carboxylates and methods of their use
12/18/14Antireflective coating composition and process thereof
11/20/14Composition comprising a polymeric thermal acid generator and processes thereof
11/13/14Template for self assembly and making a self assembled pattern
10/02/14Bottom antireflective materials and compositions
07/10/14Compositions of neutral layer for directed self assembly block copolymers and processes thereof
06/12/14Stable metal compounds, their compositions and methods
06/05/14Methods and materials for removing metals in block copolymers
06/05/14Positive working photosensitive material
03/27/14Developable bottom anti-reflective coating
02/06/14Antireflective coating composition and process thereof
12/19/13Antireflective compositions and methods of using same
12/19/13Positive photosensitive material
12/19/13Negative-working thick film photoresist
12/12/13Neutral layer polymer composition for directed self assembly and processes thereof
11/28/13Method for producing silicon dioxide film
09/12/13Methods and materials for removing metals in block copolymers
11/22/12Polysilazane-containing composition capable of forming a dense siliceous film
12/12/13Neutral layer polymer composition for directed self assembly and processes thereof







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