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Carl Zeiss Sms Gmbh patents

Recent patent applications related to Carl Zeiss Sms Gmbh. Carl Zeiss Sms Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Sms Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Sms Gmbh, we're just tracking patents.

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Date Carl Zeiss Sms Gmbh patents (updated weekly) - BOOKMARK this page
12/31/15Scanning particle microscope and determining a position change of a particle beam of the scanning particle microscope
11/19/15Method for measuring a lithography mask or a mask blank
07/16/15Method and device for examining a mask
07/16/15Emulation of reproduction of masks corrected by local density variations
06/18/15Apparatus and correlating images of a photolithographic mask
01/15/15Method for calibrating a position-measuring system and position-measuring system
02/06/14Method and correcting errors on a wafer processed by a photolithographic mask
11/21/13Method for characterizing a structure on a mask and device for carrying out said method
11/07/13Irradiation module for a measuring apparatus
05/23/13Method for determining the performance of a photolithographic mask
03/14/13Autofocus device and autofocussing an imaging device
06/28/12Method and calibration mask for calibrating a position measuring apparatus
06/28/12Mask inspection microscope with variable illumination setting
06/21/12Method and correcting errors on a wafer processed by a photolithographic mask
05/17/12Determination of the relative position of two structures
04/05/12Method for determining the position of a structure within an image and position measuring device for carrying out the method
03/29/12Method for characterizing a feature on a mask and device for carrying out the method
10/06/11Method and measuring structures on photolithography masks
09/22/11Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
09/01/11Apparatus and investigating and/or modifying a sample
08/25/11Device and measuring lithography masks
08/04/11Method for analyzing masks for photolithography
07/28/11Electron beam induced etching
07/28/11Method for electron beam induced deposition of conductive material
07/28/11Electron beam induced etching of layers contaminated with gallium
07/07/11Microscope for reticle inspection with variable illumination settings
04/21/11Method for emulation of a photolithographic process and mask inspection microscope for performing the method
11/25/10Method for processing an object with miniaturized structures
10/28/10Particle-optical system
10/21/10Method for repairing phase shift masks
10/07/10Verification repairs on photolithography masks
10/07/10Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure
09/23/10Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage
04/22/10Method for determination of residual errors
12/10/09Endoscope apparatus
08/27/09Charged particle beam exposure system
06/04/09Charged particle beam exposure system and beam manipulating arrangement







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