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Carl Zeiss Sms Gmbh patents

Recent patent applications related to Carl Zeiss Sms Gmbh. Carl Zeiss Sms Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Sms Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Sms Gmbh, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Sms Gmbh-related inventors

Date Carl Zeiss Sms Gmbh patents (updated weekly) - BOOKMARK this page
12/31/15Scanning particle microscope and determining a position change of a particle beam of the scanning particle microscope
11/19/15Method for measuring a lithography mask or a mask blank
07/16/15Method and device for examining a mask
07/16/15Emulation of reproduction of masks corrected by local density variations
06/18/15Apparatus and correlating images of a photolithographic mask
01/15/15Method for calibrating a position-measuring system and position-measuring system
02/06/14Method and correcting errors on a wafer processed by a photolithographic mask
11/21/13Method for characterizing a structure on a mask and device for carrying out said method
11/07/13Irradiation module for a measuring apparatus
05/23/13Method for determining the performance of a photolithographic mask
03/14/13Autofocus device and autofocussing an imaging device
06/28/12Method and calibration mask for calibrating a position measuring apparatus
06/28/12Mask inspection microscope with variable illumination setting
06/21/12Method and correcting errors on a wafer processed by a photolithographic mask
05/17/12Determination of the relative position of two structures
04/05/12Method for determining the position of a structure within an image and position measuring device for carrying out the method
03/29/12Method for characterizing a feature on a mask and device for carrying out the method
10/06/11Method and measuring structures on photolithography masks
09/22/11Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
09/01/11Apparatus and investigating and/or modifying a sample
08/25/11Device and measuring lithography masks
08/04/11Method for analyzing masks for photolithography
07/28/11Electron beam induced etching
07/28/11Method for electron beam induced deposition of conductive material
07/28/11Electron beam induced etching of layers contaminated with gallium
07/07/11Microscope for reticle inspection with variable illumination settings
04/21/11Method for emulation of a photolithographic process and mask inspection microscope for performing the method
11/25/10Method for processing an object with miniaturized structures
10/28/10Particle-optical system
10/21/10Method for repairing phase shift masks
10/07/10Verification repairs on photolithography masks
10/07/10Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure
09/23/10Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage
04/22/10Method for determination of residual errors
12/10/09Endoscope apparatus
08/27/09Charged particle beam exposure system
06/04/09Charged particle beam exposure system and beam manipulating arrangement

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Carl Zeiss Sms Gmbh in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Carl Zeiss Sms Gmbh with additional patents listed. Browse our Agent directory for other possible listings. Page by