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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Catadioptric projection  objective with intermediate images

Carl Zeiss Smt

Catadioptric projection objective with intermediate images

Projection exposure  microlithography comprising an optical distance measurement system

Carl Zeiss Smt

Projection exposure microlithography comprising an optical distance measurement system

Diffractive optical element and measuring method

Carl Zeiss Smt

Diffractive optical element and measuring method



Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015021243107/30/15  new patent  Projection exposure system for microlithography with a measurement device
22015020508407/23/15 Catadioptric projection objective with intermediate images
32015019843707/16/15 Projection exposure microlithography comprising an optical distance measurement system
42015019843807/16/15 Diffractive optical element and measuring method
52015019889107/16/15 Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
62015019889207/16/15 Arrangement for actuating at least one optical element in an optical system
72015019889407/16/15 Monitor system for determining orientations of mirror elements and euv lithography system
82015019286007/09/15 Illumination optical unit for euv projection lithography
92015019423007/09/15 Euv collector
102015018546907/02/15 Method for regulating the tilting of a mirror element
112015018562107/02/15 Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
122015018562207/02/15 Illumination system of a microlithographic projection exposure apparatus
132015017762306/25/15 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
142015017762606/25/15 Blocking element for protecting optical elements in projection exposure apparatuses
152015016867406/18/15 Mirror arrangement for an euv projection exposure apparatus, operating the same, and euv projection exposure apparatus
162015016884406/18/15 Mirror arrangement for a lithography producing the same
172015016884606/18/15 Optical element unit for exposure processes
182015016884906/18/15 Method of operating a microlithographic apparatus
192015016885306/18/15 Lithography apparatus with restricted movement relative to floor and related method
202015017316306/18/15 Euv light source for generating a usable output beam for a projection exposure apparatus
212015016056106/11/15 Mirror
222015016056206/11/15 System correction from long timescales
232015016056506/11/15 Projection exposure methods and systems
242015016056606/11/15 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
252015015365006/04/15 Method for operating a microlithographic projection exposure apparatus
262015015365206/04/15 Method for adjusting an illumination setting
272015015365406/04/15 Illumination system of a microlithographic projection exposure apparatus
282015014618305/28/15 Illumination system of a microlithographic projection exposure apparatus
292015014618405/28/15 Illumination system of a microlithographic projection exposure apparatus
302015013852005/21/15 Holding device for an optical element in an objective
312015013701205/21/15 Euv light source
322015013852105/21/15 Lens module comprising at least one exchangeable optical element
332015012407505/07/15 Optical imaging device and imaging microscopy
342015012423305/07/15 Illumination system for an euv projection lithographic projection exposure apparatus
352015012596805/07/15 Optical system and use
362015011670304/30/15 Reflective optical element
372015010959104/23/15 Optical imaging device with thermal attenuation
382015010332604/16/15 Optical element
392015010332704/16/15 Lithography apparatus with segmented mirror
402015010342604/16/15 Method and cooling system for cooling an optical element for euv applications
412015009806804/09/15 Device for controlling temperature of an optical element
422015009807104/09/15 Optical arrangement for three-dimensionally patterning a material layer
432015009807204/09/15 Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
442015009814004/09/15 Optical element unit
452015009217404/02/15 Illumination optical unit
462015008527103/26/15 Projection exposure controlling a projection exposure apparatus
472015008527203/26/15 Optical system of a microlithographic projection exposure apparatus
482015007067103/12/15 Illumination system of a microlithographic projection exposure apparatus
492015007067703/12/15 Projection exposure projection lithography
502015007078903/12/15 Replacement an optical element
512015006254903/05/15 Assembly for a projection exposure euv projection lithography
522015006255103/05/15 Optical system, in particular of a microlithographic projection exposure apparatus
532015006259603/05/15 Optical imaging arrangement with multiple metrology support units
542015006268203/05/15 Correction of optical elements by correction light irradiated in a flat manner
552015006272503/05/15 Catadioptric projection objective comprising deflection mirrors and projection exposure method
562015005510802/26/15 Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
572015005510902/26/15 Projection objective for a microlithographic projection exposure apparatus
582015005511002/26/15 Illumination optical unit for projection lithography
592015005511102/26/15 Reflective optical element and euv lithography appliance
602015005511202/26/15 Lithography producing a mirror arrangement
612015005521202/26/15 Catadioptric projection objective
622015005521402/26/15 Catadioptric projection objective
632015004931902/19/15 Microlithography projection optical system, tool and production
642015004932002/19/15 Projection exposure method, system and objective
652015004932102/19/15 Facet mirror
662015004297402/12/15 Illumination optical unit and optical system for euv projection lithography
672015004297502/12/15 Projection exposure tool for microlithography and microlithographic imaging
682015004306002/12/15 Optical elements comprising magnetostrictive material
692015003611502/05/15 Illumination optical unit for euv projection lithography
702015002947701/29/15 Optical system for a microlithographic projection exposure apparatus
712015002947901/29/15 Projection exposure method and projection exposure microlithography
722015002948001/29/15 Optical system of a microlithographic projection exposure apparatus
732015002279201/22/15 Microlithographic apparatus and changing an optical wavefront in such an apparatus
742015002279801/22/15 Illumination system for microlithography
752015002279901/22/15 Microlithographic imaging optical system including multiple mirrors
762015001342701/15/15 Method for calibrating a position-measuring system and position-measuring system
772015001586201/15/15 Illumination optical unit for projection lithography
782015001586401/15/15 Projection exposure microlithography for the production of semiconductor components
792015001586501/15/15 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
802015001587501/15/15 Measuring device for measuring an illumination property
812015001758901/15/15 Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
822015000821501/08/15 Method and device for connecting an optical element to a frame
832015000833101/08/15 Charged particle inspection method and charged particle system
842015000949201/08/15 Measuring system for measuring an imaging quality of an euv lens
852015000955701/08/15 Gravitation compensation for optical elements in projection exposure apparatuses
862015000956501/08/15 Optical imaging with reduced immersion liquid evaporation effects
872015000292501/01/15 Illumination system for euv lithography
882014037608612/25/14 Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
892014037769212/25/14 Mask for microlithography and scanning projection exposure method utilizing the mask
902014036880112/18/14 Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
912014036880312/18/14 Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
922014036893312/18/14 Positioning unit and adjustment of an optical element
932014033391211/13/14 Microlithographic projection exposure apparatus
942014031349810/23/14 Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
952014030730810/16/14 Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
962014029325310/02/14 Lens comprising a plurality of optical element disposed in a housing
972014028578309/25/14 Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
982014026838109/18/14 Optical module for a microlithography objective holding and supporting devices
992014025403609/11/14 Optical module for an objective
1002014024743709/04/14 Illumination system of a microlithographic projection exposure apparatus
1012014022498508/14/14 Focusing a charged particle imaging system
1022014022614108/14/14 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1032014021725708/07/14 Support structure and related assemblies and methods
1042014021870908/07/14 Field facet mirror for an illumination optics of a projection exposure euv microlithography
1052014021117807/31/14 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
1062014021117907/31/14 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
1072014021118707/31/14 Optical module for guiding a radiation beam
1082014021118807/31/14 Microlithographic projection exposure apparatus
1092014019954307/17/14 Reflective optical element and optical system for euv lithography
1102014019021207/10/14 Mirror elements for euv lithography and production methods therefor
1112014019234407/10/14 Method and determining the absorption in a blank
1122014019359107/10/14 Method for producing a reflective optical element for euv-lithography
1132014018502707/03/14 Illumination optics and projection exposure apparatus
1142014017692106/26/14 Optical assembly with suppression of degradation
1152014017693006/26/14 Microlithographic illumination system
1162014016045606/12/14 Optical aperture device
1172014013294105/15/14 Imaging optical system and projection exposure system including the same
1182014011871205/01/14 Measuring system
1192014011871405/01/14 Projection optics for microlithography
1202014010235504/17/14 Producing polarization-modulating optical element for microlithography system
1212014010458804/17/14 Projection objective for microlithography
1222014009835204/10/14 Device for controlling temperature of an optical element
1232014009835504/10/14 Catoptric objectives and systems using catoptric objectives
1242014007848103/20/14 Method for correcting the surface form of a mirror
1252014007848203/20/14 Lithographic projection objective
1262014007848403/20/14 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
1272014007851303/20/14 Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
1282014007856703/20/14 Correction of optical elements by correction light irradiated in a flat manner
1292014007141403/13/14 Microlithography projection system with an accessible diaphragm or aperture stop
1302014006362803/06/14 Device for the low-deformation replaceable mounting of an optical element
1312014006479103/06/14 Optical element unit
1322014004359602/13/14 Arrangement for actuating an element in a microlithographic projection exposure apparatus
1332014003624602/06/14 Imaging optical system and projection exposure system for microlithography
1342014002252401/23/14 Device and the optical measurement of an optical system by using an immersion fluid
1352014002252501/23/14 Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1362014002383501/23/14 Optical device
1372014001610801/16/14 Optical imaging device with image defect determination
1382013034282112/26/13 Imaging optical system
1392013033442612/19/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1402013033555212/19/13 Method for mask inspection, and mask inspection installation
1412013028647110/31/13 Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1422013025830310/03/13 Method for operating an illumination system of a microlithographic projection exposure apparatus
1432013024872809/26/13 Beam regulating an euv illumination beam
1442013025026109/26/13 Optical system and use
1452013025026409/26/13 Illumination system for illuminating a mask in a microlithographic exposure apparatus
1462013025026509/26/13 Projection exposure euv microlithography and microlithographic exposure
1472013025214609/26/13 Projection exposure tool for microlithography and microlithographic imaging
1482013024227809/19/13 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
1492013024227909/19/13 Catadioptric projection objective
1502013024228209/19/13 Position manipulator for an optical component
1512013022277808/29/13 Illumination microlithography projection system including polarization-modulating optical element
1522013022278008/29/13 Euv microlithography projection exposure apparatus with a heat light source
1532013020146408/08/13 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
1542013019455908/01/13 Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1552013018643007/25/13 Method for removing a contamination layer from an optical surface and arrangement therefor
1562013018816007/25/13 Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1572013018816207/25/13 Method for operating a projection exposure tool and control apparatus
1582013018816307/25/13 Mirror and related euv systems and methods
1592013018824607/25/13 Imaging optical system for microlithography
1602013018223407/18/13 Projection exposure system and projection exposure method
1612013018226407/18/13 Projection exposure tool for microlithography and microlithographic exposure
1622013018234407/18/13 Systems for aligning an optical element and same
1632013017654407/11/13 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1642013017654507/11/13 Projection exposure apparatus
1652013017654607/11/13 Illumination optical unit with a movable filter element
1662013017005607/04/13 Substrate for mirrors for euv lithography
1672013015550906/20/13 Lens module comprising at least one exchangeable optical element
1682013014809206/13/13 Illumination system for a microlithographic projection exposure apparatus
1692013014810506/13/13 Method and qualifying optics of a projection exposure tool for microlithography
1702013014820006/13/13 Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1712013014170706/06/13 Euv exposure apparatus
1722013013576005/30/13 Positioning unit and alignment device for an optical element
1732013012825105/23/13 Imaging optical system
1742013012825205/23/13 Multi facet mirror of a microlithographic projection exposure apparatus
1752013013203705/23/13 Microlithographic projection exposure apparatus
1762013012072305/16/13 Exposure apparatus and measuring device for a projection lens
1772013012072605/16/13 Method of structuring a photosensitive material
1782013012072805/16/13 Catadioptric projection objective with mirror group
1792013012073005/16/13 Facet mirror device
1802013012082005/16/13 Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1812013012086305/16/13 Substrates for mirrors for euv lithography and their production
1822013011405605/09/13 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1832013011405705/09/13 Optical imaging device with thermal attenuation
1842013011406005/09/13 Illumination system of a microlithographic projection exposure apparatus
1852013010569805/02/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1862013010723905/02/13 Optical arrangement for euv lithography and configuring such an optical arrangement
1872013009913204/25/13 Optical system for euv lithography with a charged-particle source
1882013010042604/25/13 Method for producing facet mirrors and projection exposure apparatus
1892013010042804/25/13 Mask for euv lithography, euv lithography optimising the imaging of a mask
1902013010042904/25/13 Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1912013010054704/25/13 Optical element module with minimized parasitic loads
1922013009401004/18/13 Lithographic systems and processes of making and using same
1932013008869504/11/13 Device for controlling temperature of an optical element
1942013008869804/11/13 Methods and devices for driving micromirrors
1952013008870104/11/13 Imaging optical system and projection exposure installation for microlithography including same
1962013008330804/04/13 Substrate holder
1972013007707403/28/13 Microlithographic projection exposure apparatus
1982013007707603/28/13 Microlithography illumination optical system and microlithography projection exposure apparatus including same
1992013007707703/28/13 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
2002013007022103/21/13 Microlithographic projection exposure apparatus
2012013007022403/21/13 Projection lens system of a microlithographic projection exposure installation
2022013007022703/21/13 Imaging optical system
2032013006371003/14/13 Catoptric objectives and systems using catoptric objectives
2042013005784403/07/13 Illumination system of a microlithographic projection exposure apparatus
2052013005067102/28/13 Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
2062013005067202/28/13 Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
2072013005067302/28/13 Optical system of a microlithographic projection exposure apparatus
2082013004430302/21/13 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
2092013004430402/21/13 Optical projection system
2102013003884802/14/13 Optical devices having kinematic components
2112013003884902/14/13 Optical component comprising radiation protective layer
2122013003885002/14/13 Illumination system and projection objective of a mask inspection apparatus
2132013003892902/14/13 Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
2142013002768101/31/13 Euv collector
2152013002159101/24/13 Illumination system of a microlithographic projection exposure apparatus
2162013002159201/24/13 Arrangement for and characterising the polarisation properties of an optical system
2172013001633101/17/13 Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
2182013001035201/10/13 Projection objective having mirror elements with reflective coatings
2192012032738412/27/12 Mirror elements for euv lithography and production methods therefor
2202012032738512/27/12 Optical system for semiconductor lithography
2212012033060912/27/12 Method of measuring a deviation of an optical surface from a target shape
2222012032034812/20/12 Reflective mask for euv lithography
2232012032035312/20/12 Projection exposure apparatus and optical system
2242012032035812/20/12 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
2252012031428112/13/12 Reflective optical element and production of such an optical element
2262012031491012/13/12 Method and device for determining the position of a first structure relative to a second structure or a part thereof
2272012030018311/29/12 Optical arrangement in a microlithographic projection exposure apparatus
2282012030018411/29/12 Surface correction on coated mirrors
2292012030018511/29/12 Catoptric illumination system for microlithography tool
2302012030019511/29/12 Method and setting an illumination optical unit
2312012029377911/22/12 Reflective optical element and euv lithography appliance
2322012029378411/22/12 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
2332012029378511/22/12 Optical element having a plurality of reflective facet elements
2342012029378611/22/12 Illumination system of a microlithographic projection exposure apparatus
2352012028741411/15/12 Facet mirror for use in microlithography
2362012028119611/08/12 Projection objective of a microlithographic projection exposure apparatus
2372012028119811/08/12 Filter device for the compensation of an asymmetric pupil illumination
2382012027491711/01/12 Imaging optics
2392012027491811/01/12 Catadioptric projection objective
2402012027491911/01/12 Catadioptric projection objective
2412012024998510/04/12 Measurement of an imaging optical system by superposition of patterns
2422012024998810/04/12 Optical beam deflecting element, illumination system including same, and related method
2432012025014410/04/12 Reflective optical element and operating an euv lithography apparatus
2442012024126809/27/12 Arrangement for the vibration isolation of a pay load
2452012024296809/27/12 Method for adjusting an illumination system of a projection exposure projection lithography
2462012024299609/27/12 Optical scattering disk, use thereof, and wavefront measuring apparatus
2472012023627209/20/12 Combination stop for catoptric projection arrangement
2482012023627709/20/12 Catadioptric projection objective comprising deflection mirrors and projection exposure method
2492012023628209/20/12 Imaging optical system



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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