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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Euv light source

Carl Zeiss Smt

Euv light source

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015013852005/21/15 new patent  Holding device for an optical element in an objective
22015013701205/21/15 new patent  Euv light source
32015013852105/21/15 new patent  Lens module comprising at least one exchangeable optical element
42015012407505/07/15Optical imaging device and imaging microscopy
52015012423305/07/15Illumination system for an euv projection lithographic projection exposure apparatus
62015012596805/07/15Optical system and use
72015011670304/30/15Reflective optical element
82015010959104/23/15Optical imaging device with thermal attenuation
92015010332604/16/15Optical element
102015010332704/16/15Lithography apparatus with segmented mirror
112015010342604/16/15Method and cooling system for cooling an optical element for euv applications
122015009806804/09/15Device for controlling temperature of an optical element
132015009807104/09/15Optical arrangement for three-dimensionally patterning a material layer
142015009807204/09/15Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
152015009814004/09/15Optical element unit
162015009217404/02/15Illumination optical unit
172015008527103/26/15Projection exposure controlling a projection exposure apparatus
182015008527203/26/15Optical system of a microlithographic projection exposure apparatus
192015007067103/12/15Illumination system of a microlithographic projection exposure apparatus
202015007067703/12/15Projection exposure projection lithography
212015007078903/12/15Replacement an optical element
222015006254903/05/15Assembly for a projection exposure euv projection lithography
232015006255103/05/15Optical system, in particular of a microlithographic projection exposure apparatus
242015006259603/05/15Optical imaging arrangement with multiple metrology support units
252015006268203/05/15Correction of optical elements by correction light irradiated in a flat manner
262015006272503/05/15Catadioptric projection objective comprising deflection mirrors and projection exposure method
272015005510802/26/15Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
282015005510902/26/15Projection objective for a microlithographic projection exposure apparatus
292015005511002/26/15Illumination optical unit for projection lithography
302015005511102/26/15Reflective optical element and euv lithography appliance
312015005511202/26/15Lithography producing a mirror arrangement
322015005521202/26/15Catadioptric projection objective
332015005521402/26/15Catadioptric projection objective
342015004931902/19/15Microlithography projection optical system, tool and production
352015004932002/19/15Projection exposure method, system and objective
362015004932102/19/15Facet mirror
372015004297402/12/15Illumination optical unit and optical system for euv projection lithography
382015004297502/12/15Projection exposure tool for microlithography and microlithographic imaging
392015004306002/12/15Optical elements comprising magnetostrictive material
402015003611502/05/15Illumination optical unit for euv projection lithography
412015002947701/29/15Optical system for a microlithographic projection exposure apparatus
422015002947901/29/15Projection exposure method and projection exposure microlithography
432015002948001/29/15Optical system of a microlithographic projection exposure apparatus
442015002279201/22/15Microlithographic apparatus and changing an optical wavefront in such an apparatus
452015002279801/22/15Illumination system for microlithography
462015002279901/22/15Microlithographic imaging optical system including multiple mirrors
472015001342701/15/15Method for calibrating a position-measuring system and position-measuring system
482015001586201/15/15Illumination optical unit for projection lithography
492015001586401/15/15Projection exposure microlithography for the production of semiconductor components
502015001586501/15/15Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
512015001587501/15/15Measuring device for measuring an illumination property
522015001758901/15/15Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
532015000821501/08/15Method and device for connecting an optical element to a frame
542015000833101/08/15Charged particle inspection method and charged particle system
552015000949201/08/15Measuring system for measuring an imaging quality of an euv lens
562015000955701/08/15Gravitation compensation for optical elements in projection exposure apparatuses
572015000956501/08/15Optical imaging with reduced immersion liquid evaporation effects
582015000292501/01/15Illumination system for euv lithography
592014037608612/25/14Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
602014037769212/25/14Mask for microlithography and scanning projection exposure method utilizing the mask
612014036880112/18/14Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
622014036880312/18/14Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
632014036893312/18/14Positioning unit and adjustment of an optical element
642014033391211/13/14Microlithographic projection exposure apparatus
652014031349810/23/14Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
662014030730810/16/14Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
672014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
682014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
692014026838109/18/14Optical module for a microlithography objective holding and supporting devices
702014025403609/11/14Optical module for an objective
712014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
722014022498508/14/14Focusing a charged particle imaging system
732014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
742014021725708/07/14Support structure and related assemblies and methods
752014021870908/07/14Field facet mirror for an illumination optics of a projection exposure euv microlithography
762014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
772014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
782014021118707/31/14Optical module for guiding a radiation beam
792014021118807/31/14Microlithographic projection exposure apparatus
802014019954307/17/14Reflective optical element and optical system for euv lithography
812014019021207/10/14Mirror elements for euv lithography and production methods therefor
822014019234407/10/14Method and determining the absorption in a blank
832014019359107/10/14Method for producing a reflective optical element for euv-lithography
842014018502707/03/14Illumination optics and projection exposure apparatus
852014017692106/26/14Optical assembly with suppression of degradation
862014017693006/26/14Microlithographic illumination system
872014016045606/12/14Optical aperture device
882014013294105/15/14Imaging optical system and projection exposure system including the same
892014011871205/01/14Measuring system
902014011871405/01/14Projection optics for microlithography
912014010235504/17/14Producing polarization-modulating optical element for microlithography system
922014010458804/17/14Projection objective for microlithography
932014009835204/10/14Device for controlling temperature of an optical element
942014009835504/10/14Catoptric objectives and systems using catoptric objectives
952014007848103/20/14Method for correcting the surface form of a mirror
962014007848203/20/14Lithographic projection objective
972014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
982014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
992014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
1002014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
1012014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
1022014006479103/06/14Optical element unit
1032014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
1042014003624602/06/14Imaging optical system and projection exposure system for microlithography
1052014002252401/23/14Device and the optical measurement of an optical system by using an immersion fluid
1062014002252501/23/14Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1072014002383501/23/14Optical device
1082014001610801/16/14Optical imaging device with image defect determination
1092013034282112/26/13Imaging optical system
1102013033442612/19/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1112013033555212/19/13Method for mask inspection, and mask inspection installation
1122013028647110/31/13Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1132013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
1142013024872809/26/13Beam regulating an euv illumination beam
1152013025026109/26/13Optical system and use
1162013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
1172013025026509/26/13Projection exposure euv microlithography and microlithographic exposure
1182013025214609/26/13Projection exposure tool for microlithography and microlithographic imaging
1192013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
1202013024227909/19/13Catadioptric projection objective
1212013024228209/19/13Position manipulator for an optical component
1222013022277808/29/13Illumination microlithography projection system including polarization-modulating optical element
1232013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
1242013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
1252013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1262013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
1272013018816007/25/13Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1282013018816207/25/13Method for operating a projection exposure tool and control apparatus
1292013018816307/25/13Mirror and related euv systems and methods
1302013018824607/25/13Imaging optical system for microlithography
1312013018223407/18/13Projection exposure system and projection exposure method
1322013018226407/18/13Projection exposure tool for microlithography and microlithographic exposure
1332013018234407/18/13Systems for aligning an optical element and same
1342013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1352013017654507/11/13Projection exposure apparatus
1362013017654607/11/13Illumination optical unit with a movable filter element
1372013017005607/04/13Substrate for mirrors for euv lithography
1382013015550906/20/13Lens module comprising at least one exchangeable optical element
1392013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1402013014810506/13/13Method and qualifying optics of a projection exposure tool for microlithography
1412013014820006/13/13Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1422013014170706/06/13Euv exposure apparatus
1432013013576005/30/13Positioning unit and alignment device for an optical element
1442013012825105/23/13Imaging optical system
1452013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1462013013203705/23/13Microlithographic projection exposure apparatus
1472013012072305/16/13Exposure apparatus and measuring device for a projection lens
1482013012072605/16/13Method of structuring a photosensitive material
1492013012072805/16/13Catadioptric projection objective with mirror group
1502013012073005/16/13Facet mirror device
1512013012082005/16/13Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1522013012086305/16/13Substrates for mirrors for euv lithography and their production
1532013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1542013011405705/09/13Optical imaging device with thermal attenuation
1552013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1562013010569805/02/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1572013010723905/02/13Optical arrangement for euv lithography and configuring such an optical arrangement
1582013009913204/25/13Optical system for euv lithography with a charged-particle source
1592013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1602013010042804/25/13Mask for euv lithography, euv lithography optimising the imaging of a mask
1612013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1622013010054704/25/13Optical element module with minimized parasitic loads
1632013009401004/18/13Lithographic systems and processes of making and using same
1642013008869504/11/13Device for controlling temperature of an optical element
1652013008869804/11/13Methods and devices for driving micromirrors
1662013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1672013008330804/04/13Substrate holder
1682013007707403/28/13Microlithographic projection exposure apparatus
1692013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1702013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1712013007022103/21/13Microlithographic projection exposure apparatus
1722013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1732013007022703/21/13Imaging optical system
1742013006371003/14/13Catoptric objectives and systems using catoptric objectives
1752013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1762013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1772013005067202/28/13Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
1782013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1792013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1802013004430402/21/13Optical projection system
1812013003884802/14/13Optical devices having kinematic components
1822013003884902/14/13Optical component comprising radiation protective layer
1832013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1842013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
1852013002768101/31/13Euv collector
1862013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1872013002159201/24/13Arrangement for and characterising the polarisation properties of an optical system
1882013001633101/17/13Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
1892013001035201/10/13Projection objective having mirror elements with reflective coatings
1902012032738412/27/12Mirror elements for euv lithography and production methods therefor
1912012032738512/27/12Optical system for semiconductor lithography
1922012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1932012032034812/20/12Reflective mask for euv lithography
1942012032035312/20/12Projection exposure apparatus and optical system
1952012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1962012031428112/13/12Reflective optical element and production of such an optical element
1972012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1982012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1992012030018411/29/12Surface correction on coated mirrors
2002012030018511/29/12Catoptric illumination system for microlithography tool
2012012030019511/29/12Method and setting an illumination optical unit
2022012029377911/22/12Reflective optical element and euv lithography appliance
2032012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
2042012029378511/22/12Optical element having a plurality of reflective facet elements
2052012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
2062012028741411/15/12Facet mirror for use in microlithography
2072012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
2082012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
2092012027491711/01/12Imaging optics
2102012027491811/01/12Catadioptric projection objective
2112012027491911/01/12Catadioptric projection objective
2122012024998510/04/12Measurement of an imaging optical system by superposition of patterns
2132012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
2142012025014410/04/12Reflective optical element and operating an euv lithography apparatus
2152012024126809/27/12Arrangement for the vibration isolation of a pay load
2162012024296809/27/12Method for adjusting an illumination system of a projection exposure projection lithography
2172012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
2182012023627209/20/12Combination stop for catoptric projection arrangement
2192012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
2202012023628209/20/12Imaging optical system
2212012023631609/20/12Method and determining a shape of an optical test surface
2222012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
2232012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
2242012022415309/06/12Optical arrangement, in particular in a projection exposure euv lithography
2252012022416009/06/12Reflective optical imaging system
2262012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure microlithography, and projection exposure apparatus
2272012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2282012021864308/30/12Lens blank and lens elements as well as their production
2292012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2302012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2312012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure microlithography comprising such a projection objective
2322012020670408/16/12Illumination optical unit for projection lithography
2332012020811508/16/12Imaging optics
2342012020091308/09/12Reflective optical element and producing it
2352012019479308/02/12Optical use in photolithography
2362012019479508/02/12Optical element
2372012018852307/26/12Optical arrangement in a projection exposure euv lithography
2382012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
2392012018852507/26/12Catoptric objectives and systems using catoptric objectives
2402012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
2412012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
2422012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
2432012018260607/19/12Micromirror arrangement having a coating and the production thereof
2442012017659107/12/12Method and device for the correction of imaging defects
2452012017667007/12/12Imaging microoptics for measuring the position of an aerial image
2462012016262506/28/12Catadioptric projection objective with intermediate images
2472012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
2482012016262706/28/12Illumination optical unit for microlithography
2492012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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