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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Blocking element for protecting optical elements in projection exposure apparatuses

Carl Zeiss Smt

Blocking element for protecting optical elements in projection exposure apparatuses

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015017762306/25/15 new patent  Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
22015017762606/25/15 new patent  Blocking element for protecting optical elements in projection exposure apparatuses
32015016867406/18/15Mirror arrangement for an euv projection exposure apparatus, operating the same, and euv projection exposure apparatus
42015016884406/18/15Mirror arrangement for a lithography producing the same
52015016884606/18/15Optical element unit for exposure processes
62015016884906/18/15Method of operating a microlithographic apparatus
72015016885306/18/15Lithography apparatus with restricted movement relative to floor and related method
82015017316306/18/15Euv light source for generating a usable output beam for a projection exposure apparatus
92015016056106/11/15Mirror
102015016056206/11/15System correction from long timescales
112015016056506/11/15Projection exposure methods and systems
122015016056606/11/15Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
132015015365006/04/15Method for operating a microlithographic projection exposure apparatus
142015015365206/04/15Method for adjusting an illumination setting
152015015365406/04/15Illumination system of a microlithographic projection exposure apparatus
162015014618305/28/15Illumination system of a microlithographic projection exposure apparatus
172015014618405/28/15Illumination system of a microlithographic projection exposure apparatus
182015013852005/21/15Holding device for an optical element in an objective
192015013701205/21/15Euv light source
202015013852105/21/15Lens module comprising at least one exchangeable optical element
212015012407505/07/15Optical imaging device and imaging microscopy
222015012423305/07/15Illumination system for an euv projection lithographic projection exposure apparatus
232015012596805/07/15Optical system and use
242015011670304/30/15Reflective optical element
252015010959104/23/15Optical imaging device with thermal attenuation
262015010332604/16/15Optical element
272015010332704/16/15Lithography apparatus with segmented mirror
282015010342604/16/15Method and cooling system for cooling an optical element for euv applications
292015009806804/09/15Device for controlling temperature of an optical element
302015009807104/09/15Optical arrangement for three-dimensionally patterning a material layer
312015009807204/09/15Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
322015009814004/09/15Optical element unit
332015009217404/02/15Illumination optical unit
342015008527103/26/15Projection exposure controlling a projection exposure apparatus
352015008527203/26/15Optical system of a microlithographic projection exposure apparatus
362015007067103/12/15Illumination system of a microlithographic projection exposure apparatus
372015007067703/12/15Projection exposure projection lithography
382015007078903/12/15Replacement an optical element
392015006254903/05/15Assembly for a projection exposure euv projection lithography
402015006255103/05/15Optical system, in particular of a microlithographic projection exposure apparatus
412015006259603/05/15Optical imaging arrangement with multiple metrology support units
422015006268203/05/15Correction of optical elements by correction light irradiated in a flat manner
432015006272503/05/15Catadioptric projection objective comprising deflection mirrors and projection exposure method
442015005510802/26/15Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
452015005510902/26/15Projection objective for a microlithographic projection exposure apparatus
462015005511002/26/15Illumination optical unit for projection lithography
472015005511102/26/15Reflective optical element and euv lithography appliance
482015005511202/26/15Lithography producing a mirror arrangement
492015005521202/26/15Catadioptric projection objective
502015005521402/26/15Catadioptric projection objective
512015004931902/19/15Microlithography projection optical system, tool and production
522015004932002/19/15Projection exposure method, system and objective
532015004932102/19/15Facet mirror
542015004297402/12/15Illumination optical unit and optical system for euv projection lithography
552015004297502/12/15Projection exposure tool for microlithography and microlithographic imaging
562015004306002/12/15Optical elements comprising magnetostrictive material
572015003611502/05/15Illumination optical unit for euv projection lithography
582015002947701/29/15Optical system for a microlithographic projection exposure apparatus
592015002947901/29/15Projection exposure method and projection exposure microlithography
602015002948001/29/15Optical system of a microlithographic projection exposure apparatus
612015002279201/22/15Microlithographic apparatus and changing an optical wavefront in such an apparatus
622015002279801/22/15Illumination system for microlithography
632015002279901/22/15Microlithographic imaging optical system including multiple mirrors
642015001342701/15/15Method for calibrating a position-measuring system and position-measuring system
652015001586201/15/15Illumination optical unit for projection lithography
662015001586401/15/15Projection exposure microlithography for the production of semiconductor components
672015001586501/15/15Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
682015001587501/15/15Measuring device for measuring an illumination property
692015001758901/15/15Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
702015000821501/08/15Method and device for connecting an optical element to a frame
712015000833101/08/15Charged particle inspection method and charged particle system
722015000949201/08/15Measuring system for measuring an imaging quality of an euv lens
732015000955701/08/15Gravitation compensation for optical elements in projection exposure apparatuses
742015000956501/08/15Optical imaging with reduced immersion liquid evaporation effects
752015000292501/01/15Illumination system for euv lithography
762014037608612/25/14Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
772014037769212/25/14Mask for microlithography and scanning projection exposure method utilizing the mask
782014036880112/18/14Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
792014036880312/18/14Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
802014036893312/18/14Positioning unit and adjustment of an optical element
812014033391211/13/14Microlithographic projection exposure apparatus
822014031349810/23/14Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
832014030730810/16/14Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
842014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
852014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
862014026838109/18/14Optical module for a microlithography objective holding and supporting devices
872014025403609/11/14Optical module for an objective
882014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
892014022498508/14/14Focusing a charged particle imaging system
902014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
912014021725708/07/14Support structure and related assemblies and methods
922014021870908/07/14Field facet mirror for an illumination optics of a projection exposure euv microlithography
932014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
942014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
952014021118707/31/14Optical module for guiding a radiation beam
962014021118807/31/14Microlithographic projection exposure apparatus
972014019954307/17/14Reflective optical element and optical system for euv lithography
982014019021207/10/14Mirror elements for euv lithography and production methods therefor
992014019234407/10/14Method and determining the absorption in a blank
1002014019359107/10/14Method for producing a reflective optical element for euv-lithography
1012014018502707/03/14Illumination optics and projection exposure apparatus
1022014017692106/26/14Optical assembly with suppression of degradation
1032014017693006/26/14Microlithographic illumination system
1042014016045606/12/14Optical aperture device
1052014013294105/15/14Imaging optical system and projection exposure system including the same
1062014011871205/01/14Measuring system
1072014011871405/01/14Projection optics for microlithography
1082014010235504/17/14Producing polarization-modulating optical element for microlithography system
1092014010458804/17/14Projection objective for microlithography
1102014009835204/10/14Device for controlling temperature of an optical element
1112014009835504/10/14Catoptric objectives and systems using catoptric objectives
1122014007848103/20/14Method for correcting the surface form of a mirror
1132014007848203/20/14Lithographic projection objective
1142014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
1152014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
1162014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
1172014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
1182014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
1192014006479103/06/14Optical element unit
1202014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
1212014003624602/06/14Imaging optical system and projection exposure system for microlithography
1222014002252401/23/14Device and the optical measurement of an optical system by using an immersion fluid
1232014002252501/23/14Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1242014002383501/23/14Optical device
1252014001610801/16/14Optical imaging device with image defect determination
1262013034282112/26/13Imaging optical system
1272013033442612/19/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1282013033555212/19/13Method for mask inspection, and mask inspection installation
1292013028647110/31/13Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1302013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
1312013024872809/26/13Beam regulating an euv illumination beam
1322013025026109/26/13Optical system and use
1332013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
1342013025026509/26/13Projection exposure euv microlithography and microlithographic exposure
1352013025214609/26/13Projection exposure tool for microlithography and microlithographic imaging
1362013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
1372013024227909/19/13Catadioptric projection objective
1382013024228209/19/13Position manipulator for an optical component
1392013022277808/29/13Illumination microlithography projection system including polarization-modulating optical element
1402013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
1412013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
1422013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1432013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
1442013018816007/25/13Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1452013018816207/25/13Method for operating a projection exposure tool and control apparatus
1462013018816307/25/13Mirror and related euv systems and methods
1472013018824607/25/13Imaging optical system for microlithography
1482013018223407/18/13Projection exposure system and projection exposure method
1492013018226407/18/13Projection exposure tool for microlithography and microlithographic exposure
1502013018234407/18/13Systems for aligning an optical element and same
1512013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1522013017654507/11/13Projection exposure apparatus
1532013017654607/11/13Illumination optical unit with a movable filter element
1542013017005607/04/13Substrate for mirrors for euv lithography
1552013015550906/20/13Lens module comprising at least one exchangeable optical element
1562013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1572013014810506/13/13Method and qualifying optics of a projection exposure tool for microlithography
1582013014820006/13/13Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1592013014170706/06/13Euv exposure apparatus
1602013013576005/30/13Positioning unit and alignment device for an optical element
1612013012825105/23/13Imaging optical system
1622013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1632013013203705/23/13Microlithographic projection exposure apparatus
1642013012072305/16/13Exposure apparatus and measuring device for a projection lens
1652013012072605/16/13Method of structuring a photosensitive material
1662013012072805/16/13Catadioptric projection objective with mirror group
1672013012073005/16/13Facet mirror device
1682013012082005/16/13Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1692013012086305/16/13Substrates for mirrors for euv lithography and their production
1702013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1712013011405705/09/13Optical imaging device with thermal attenuation
1722013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1732013010569805/02/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1742013010723905/02/13Optical arrangement for euv lithography and configuring such an optical arrangement
1752013009913204/25/13Optical system for euv lithography with a charged-particle source
1762013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1772013010042804/25/13Mask for euv lithography, euv lithography optimising the imaging of a mask
1782013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1792013010054704/25/13Optical element module with minimized parasitic loads
1802013009401004/18/13Lithographic systems and processes of making and using same
1812013008869504/11/13Device for controlling temperature of an optical element
1822013008869804/11/13Methods and devices for driving micromirrors
1832013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1842013008330804/04/13Substrate holder
1852013007707403/28/13Microlithographic projection exposure apparatus
1862013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1872013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1882013007022103/21/13Microlithographic projection exposure apparatus
1892013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1902013007022703/21/13Imaging optical system
1912013006371003/14/13Catoptric objectives and systems using catoptric objectives
1922013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1932013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1942013005067202/28/13Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
1952013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1962013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1972013004430402/21/13Optical projection system
1982013003884802/14/13Optical devices having kinematic components
1992013003884902/14/13Optical component comprising radiation protective layer
2002013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
2012013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
2022013002768101/31/13Euv collector
2032013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
2042013002159201/24/13Arrangement for and characterising the polarisation properties of an optical system
2052013001633101/17/13Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
2062013001035201/10/13Projection objective having mirror elements with reflective coatings
2072012032738412/27/12Mirror elements for euv lithography and production methods therefor
2082012032738512/27/12Optical system for semiconductor lithography
2092012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
2102012032034812/20/12Reflective mask for euv lithography
2112012032035312/20/12Projection exposure apparatus and optical system
2122012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
2132012031428112/13/12Reflective optical element and production of such an optical element
2142012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
2152012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
2162012030018411/29/12Surface correction on coated mirrors
2172012030018511/29/12Catoptric illumination system for microlithography tool
2182012030019511/29/12Method and setting an illumination optical unit
2192012029377911/22/12Reflective optical element and euv lithography appliance
2202012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
2212012029378511/22/12Optical element having a plurality of reflective facet elements
2222012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
2232012028741411/15/12Facet mirror for use in microlithography
2242012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
2252012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
2262012027491711/01/12Imaging optics
2272012027491811/01/12Catadioptric projection objective
2282012027491911/01/12Catadioptric projection objective
2292012024998510/04/12Measurement of an imaging optical system by superposition of patterns
2302012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
2312012025014410/04/12Reflective optical element and operating an euv lithography apparatus
2322012024126809/27/12Arrangement for the vibration isolation of a pay load
2332012024296809/27/12Method for adjusting an illumination system of a projection exposure projection lithography
2342012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
2352012023627209/20/12Combination stop for catoptric projection arrangement
2362012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
2372012023628209/20/12Imaging optical system
2382012023631609/20/12Method and determining a shape of an optical test surface
2392012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
2402012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
2412012022415309/06/12Optical arrangement, in particular in a projection exposure euv lithography
2422012022416009/06/12Reflective optical imaging system
2432012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure microlithography, and projection exposure apparatus
2442012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2452012021864308/30/12Lens blank and lens elements as well as their production
2462012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2472012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2482012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure microlithography comprising such a projection objective
2492012020670408/16/12Illumination optical unit for projection lithography



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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