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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors



Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12014036893312/18/14 new patent  Positioning unit and apparatus for adjustment of an optical element
22014033391211/13/14Microlithographic projection exposure apparatus
32014031349810/23/14Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
42014030730810/16/14Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
52014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
62014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
72014026838109/18/14Optical module for a microlithography objective holding and supporting devices
82014025403609/11/14Optical module for an objective
92014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
102014022498508/14/14Focusing a charged particle imaging system
112014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
122014021725708/07/14Support structure and related assemblies and methods
132014021870908/07/14Field facet mirror for an illumination optics of a projection exposure apparatus for euv microlithography
142014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
152014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
162014021118707/31/14Optical module for guiding a radiation beam
172014021118807/31/14Microlithographic projection exposure apparatus
182014019954307/17/14Reflective optical element and optical system for euv lithography
192014019021207/10/14Mirror elements for euv lithography and production methods therefor
202014019234407/10/14Determining the absorption in a blank
212014019359107/10/14Method for producing a reflective optical element for euv-lithography
222014018502707/03/14Illumination optics and projection exposure apparatus
232014017692106/26/14Optical assembly with suppression of degradation
242014017693006/26/14Microlithographic illumination system
252014016045606/12/14Optical aperture device
262014013294105/15/14Imaging optical system and projection exposure system including the same
272014011871205/01/14Measuring system
282014011871405/01/14Projection optics for microlithography
292014010235504/17/14Producing polarization-modulating optical element for microlithography system
302014010458804/17/14Projection objective for microlithography
312014009835204/10/14Device for controlling temperature of an optical element
322014009835504/10/14Catoptric objectives and systems using catoptric objectives
332014007848103/20/14Method for correcting the surface form of a mirror
342014007848203/20/14Lithographic projection objective
352014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
362014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
372014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
382014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
392014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
402014006479103/06/14Optical element unit
412014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
422014003624602/06/14Imaging optical system and projection exposure system for microlithography
432014002252401/23/14Device and method for the optical measurement of an optical system by using an immersion fluid
442014002252501/23/14Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
452014002383501/23/14Optical device
462014001610801/16/14Optical imaging device with image defect determination
472013034282112/26/13Imaging optical system
482013033442612/19/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
492013033555212/19/13Method for mask inspection, and mask inspection installation
502013028647110/31/13Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
512013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
522013024872809/26/13Beam regulating apparatus for an euv illumination beam
532013025026109/26/13Optical system and method of use
542013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
552013025026509/26/13Projection exposure apparatus for euv microlithography and method for microlithographic exposure
562013025214609/26/13Projection exposure tool for microlithography and method for microlithographic imaging
572013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
582013024227909/19/13Catadioptric projection objective
592013024228209/19/13Position manipulator for an optical component
602013022277808/29/13Illumination apparatus for microlithography projection system including polarization-modulating optical element
612013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
622013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
632013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
642013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
652013018816007/25/13Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
662013018816207/25/13Method for operating a projection exposure tool and control apparatus
672013018816307/25/13Mirror and related euv systems and methods
682013018824607/25/13Imaging optical system for microlithography
692013018223407/18/13Projection exposure system and projection exposure method
702013018226407/18/13Projection exposure tool for microlithography and method for microlithographic exposure
712013018234407/18/13Systems for aligning an optical element and method for same
722013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
732013017654507/11/13Projection exposure apparatus
742013017654607/11/13Illumination optical unit with a movable filter element
752013017005607/04/13Substrate for mirrors for euv lithography
762013015550906/20/13Lens module comprising at least one exchangeable optical element
772013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
782013014810506/13/13Qualifying optics of a projection exposure tool for microlithography
792013014820006/13/13Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination
802013014170706/06/13Euv exposure apparatus
812013013576005/30/13Positioning unit and alignment device for an optical element
822013012825105/23/13Imaging optical system
832013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
842013013203705/23/13Microlithographic projection exposure apparatus
852013012072305/16/13Exposure apparatus and measuring device for a projection lens
862013012072605/16/13Method of structuring a photosensitive material
872013012072805/16/13Catadioptric projection objective with mirror group
882013012073005/16/13Facet mirror device
892013012082005/16/13Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
902013012086305/16/13Substrates for mirrors for euv lithography and their production
912013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
922013011405705/09/13Optical imaging device with thermal attenuation
932013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
942013010569805/02/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
952013010723905/02/13Optical arrangement for euv lithography and method for configuring such an optical arrangement
962013009913204/25/13Optical system for euv lithography with a charged-particle source
972013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
982013010042804/25/13Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask
992013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1002013010054704/25/13Optical element module with minimized parasitic loads
1012013009401004/18/13Lithographic systems and processes of making and using same
1022013008869504/11/13Device for controlling temperature of an optical element
1032013008869804/11/13Methods and devices for driving micromirrors
1042013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1052013008330804/04/13Substrate holder
1062013007707403/28/13Microlithographic projection exposure apparatus
1072013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1082013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1092013007022103/21/13Microlithographic projection exposure apparatus
1102013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1112013007022703/21/13Imaging optical system
1122013006371003/14/13Catoptric objectives and systems using catoptric objectives
1132013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1142013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1152013005067202/28/13Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
1162013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1172013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1182013004430402/21/13Optical projection system
1192013003884802/14/13Optical devices having kinematic components
1202013003884902/14/13Optical component comprising radiation protective layer
1212013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1222013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
1232013002768101/31/13Euv collector
1242013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1252013002159201/24/13Arrangement for and method of characterising the polarisation properties of an optical system
1262013001633101/17/13Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
1272013001035201/10/13Projection objective having mirror elements with reflective coatings
1282012032738412/27/12Mirror elements for euv lithography and production methods therefor
1292012032738512/27/12Optical system for semiconductor lithography
1302012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1312012032034812/20/12Reflective mask for euv lithography
1322012032035312/20/12Projection exposure apparatus and optical system
1332012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1342012031428112/13/12Reflective optical element and method for production of such an optical element
1352012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1362012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1372012030018411/29/12Surface correction on coated mirrors
1382012030018511/29/12Catoptric illumination system for microlithography tool
1392012030019511/29/12Setting an illumination optical unit
1402012029377911/22/12Reflective optical element and euv lithography appliance
1412012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1422012029378511/22/12Optical element having a plurality of reflective facet elements
1432012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
1442012028741411/15/12Facet mirror for use in microlithography
1452012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
1462012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
1472012027491711/01/12Imaging optics
1482012027491811/01/12Catadioptric projection objective
1492012027491911/01/12Catadioptric projection objective
1502012024998510/04/12Measurement of an imaging optical system by superposition of patterns
1512012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
1522012025014410/04/12Reflective optical element and method for operating an euv lithography apparatus
1532012024126809/27/12Arrangement for the vibration isolation of a pay load
1542012024296809/27/12Method for adjusting an illumination system of a projection exposure apparatus for projection lithography
1552012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
1562012023627209/20/12Combination stop for catoptric projection arrangement
1572012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
1582012023628209/20/12Imaging optical system
1592012023631609/20/12Determining a shape of an optical test surface
1602012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
1612012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
1622012022415309/06/12Optical arrangement, in particular in a projection exposure apparatus for euv lithography
1632012022416009/06/12Reflective optical imaging system
1642012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
1652012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
1662012021864308/30/12Lens blank and lens elements as well as method for their production
1672012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
1682012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
1692012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
1702012020670408/16/12Illumination optical unit for projection lithography
1712012020811508/16/12Imaging optics
1722012020091308/09/12Reflective optical element and method of producing it
1732012019479308/02/12Optical apparatus for use in photolithography
1742012019479508/02/12Optical element
1752012018852307/26/12Optical arrangement in a projection exposure apparatus for euv lithography
1762012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
1772012018852507/26/12Catoptric objectives and systems using catoptric objectives
1782012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
1792012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
1802012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
1812012018260607/19/12Micromirror arrangement having a coating and method for the production thereof
1822012017659107/12/12Method and device for the correction of imaging defects
1832012017667007/12/12Imaging microoptics for measuring the position of an aerial image
1842012016262506/28/12Catadioptric projection objective with intermediate images
1852012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
1862012016262706/28/12Illumination optical unit for microlithography
1872012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals
1882012015477206/21/12Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
1892012014734406/14/12Actuators and microlithography projection exposure systems and methods using the same
1902012014734706/14/12Imaging optical system and illumination optical system
1912012013840106/07/12Damping device
1922012014024106/07/12Optical system, in particular in a microlithographic projection exposure apparatus
1932012014032806/07/12Optical element with low surface figure deformation
1942012014035106/07/12Magnifying imaging optical unit and metrology system including same
1952012014045406/07/12Magnifying imaging optical unit and metrology system including same
1962012013401505/31/12Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objective
1972012013401605/31/12Method of manufacturing a projection objective and projection objective
1982012012744005/24/12Optical assembly for projection lithography
1992012012748105/24/12Determining a deviation of an actual shape from a desired shape of an optical surface
2002012012037805/17/12Component of an euv or uv lithography apparatus and method for producing it
2012012011342905/10/12Device and method for the optical measurement of an optical system by using an immersion fluid
2022012010425205/03/12Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
2032012010586505/03/12Microlithographic projection exposure apparatus and related method
2042012010595805/03/12Lens module comprising at least one exchangeable optical element
2052012009909304/26/12Polarization actuator
2062012009263704/19/12Microlithographic projection exposure apparatus
2072012009266904/19/12Measurement method and measurement system for measuring birefringence
2082012008692504/12/12Method for avoiding contamination and euv-lithography-system
2092012008168504/05/12Microlithographic projection exposure apparatus illumination optics
2102012008168604/05/12Microlithographic projection exposure apparatus illumination optics
2112012008282304/05/12Method for bonding bodies and composite body
2122012007560203/29/12Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
2132012007560803/29/12Projection objective and projection exposure apparatus with negative back focus of the entry pupil
2142012007561103/29/12Diaphragm changing device
2152012006783303/22/12Support elements for an optical element
2162012006931003/22/12Semiconductor microlithography projection exposure apparatus
2172012006931203/22/12Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
2182012006931303/22/12Euv microlithography illumination optical system and euv attenuator for same
2192012006931403/22/12Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
2202012006931503/22/12Imaging optics and projection exposure installation for microlithography with an imaging optics
2212012006931803/22/12Projection exposure method and projection exposure system therefor
2222012006286503/15/12Optical imaging with reduced immersion liquid evaporation effects
2232012005070303/01/12Euv collector
2242012004447302/23/12Optical element for uv or euv lithography
2252012004447402/23/12Optical module for guiding a radiation beam
2262012003329602/09/12Projection objective for a microlithographic projection exposure apparatus
2272012002647602/02/12Device for controlling temperature of an optical element
2282012002647902/02/12Optical imaging device and method for reducing dynamic fluctuations in pressure difference
2292012001979601/26/12Illumination system for microlithography
2302012001979701/26/12Reflective optical element for euv lithography
2312012001979801/26/12Positioning unit and alignment device for an optical element
2322012001979901/26/12Optical assembly
2332012001980001/26/12Lithography projection objective, and a method for correcting image defects of the same
2342012001387801/19/12Projection exposure system, beam delivery system and method of generating a beam of light
2352012001397601/19/12Reflective optical element for euv lithography
2362012001398501/19/12Method for correcting optical proximity effects
2372012000812101/12/12Actuator including magnet for a projection exposure system and projection exposure system including a magnet
2382012000812401/12/12Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
2392012000812501/12/12Imaging optics and projection exposure installation for microlithography with an imaging optics
2402012000218401/05/12Illumination system of a microlithographic projection exposure apparatus
2412012000218501/05/12Microlithographic projection exposure apparatus
2422012000227301/05/12Catadioptric projection objective with pupil correction
2432011031714012/29/11Projection exposure apparatus for semiconductor lithography including an actuator system
2442011031869612/29/11Illumination optical system and optical systems for microlithography
2452011031052412/22/11Wafer chuck for euv lithography
2462011030352912/15/11Processes and device for the deposition of films on substrates
2472011030483712/15/11Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source
2482011030492612/15/11Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
2492011029905312/08/11Optical device having a deformable optical element


ARCHIVE: New 2014 2013 2012 2011 2010 2009



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