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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors



Lens comprising a plurality of optical element disposed in a housing

Carl Zeiss Smt

Lens comprising a plurality of optical element disposed in a housing

Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method

Carl Zeiss Smt

Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12014030730810/16/14 new patent  Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
22014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
32014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
42014026838109/18/14Optical module for a microlithography objective holding and supporting devices
52014025403609/11/14Optical module for an objective
62014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
72014022498508/14/14Focusing a charged particle imaging system
82014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
92014021725708/07/14Support structure and related assemblies and methods
102014021870908/07/14Field facet mirror for an illumination optics of a projection exposure apparatus for euv microlithography
112014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
122014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
132014021118707/31/14Optical module for guiding a radiation beam
142014021118807/31/14Microlithographic projection exposure apparatus
152014019954307/17/14Reflective optical element and optical system for euv lithography
162014019021207/10/14Mirror elements for euv lithography and production methods therefor
172014019234407/10/14Method and apparatus for determining the absorption in a blank
182014019359107/10/14Method for producing a reflective optical element for euv-lithography
192014018502707/03/14Illumination optics and projection exposure apparatus
202014017692106/26/14Optical assembly with suppression of degradation
212014017693006/26/14Microlithographic illumination system
222014016045606/12/14Optical aperture device
232014013294105/15/14Imaging optical system and projection exposure system including the same
242014013294105/15/14Imaging optical system and projection exposure system including the same
252014011871205/01/14Measuring system
262014011871405/01/14Projection optics for microlithography
272014011871205/01/14Measuring system
282014011871405/01/14Projection optics for microlithography
292014010235504/17/14Producing polarization-modulating optical element for microlithography system
302014010458804/17/14Projection objective for microlithography
312014010235504/17/14Producing polarization-modulating optical element for microlithography system
322014010458804/17/14Projection objective for microlithography
332014009835204/10/14Device for controlling temperature of an optical element
342014009835504/10/14Catoptric objectives and systems using catoptric objectives
352014009835204/10/14Device for controlling temperature of an optical element
362014009835504/10/14Catoptric objectives and systems using catoptric objectives
372014009835204/10/14Device for controlling temperature of an optical element
382014009835504/10/14Catoptric objectives and systems using catoptric objectives
392014007848103/20/14Method for correcting the surface form of a mirror
402014007848203/20/14Lithographic projection objective
412014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
422014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
432014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
442014007848103/20/14Method for correcting the surface form of a mirror
452014007848203/20/14Lithographic projection objective
462014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
472014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
482014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
492014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
502014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
512014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
522014006479103/06/14Optical element unit
532014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
542014006479103/06/14Optical element unit
552014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
562014003624602/06/14Imaging optical system and projection exposure system for microlithography
572014002252401/23/14Device and method for the optical measurement of an optical system by using an immersion fluid
582014002252501/23/14Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
592014002383501/23/14Optical device
602014001610801/16/14Optical imaging device with image defect determination
612013034282112/26/13Imaging optical system
622013033442612/19/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
632013033555212/19/13Method for mask inspection, and mask inspection installation
642013028647110/31/13Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
652013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
662013024872809/26/13Beam regulating apparatus for an euv illumination beam
672013025026109/26/13Optical system and method of use
682013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
692013025026509/26/13Projection exposure apparatus for euv microlithography and method for microlithographic exposure
702013025214609/26/13Projection exposure tool for microlithography and method for microlithographic imaging
712013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
722013024227909/19/13Catadioptric projection objective
732013024228209/19/13Position manipulator for an optical component
742013022277808/29/13Illumination apparatus for microlithography projection system including polarization-modulating optical element
752013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
762013022277808/29/13Illumination apparatus for microlithography projection system including polarization-modulating optical element
772013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
782013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
792013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
802013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
812013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
822013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
832013018816007/25/13Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
842013018816207/25/13Method for operating a projection exposure tool and control apparatus
852013018816307/25/13Mirror and related euv systems and methods
862013018824607/25/13Imaging optical system for microlithography
872013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
882013018816007/25/13Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
892013018816207/25/13Method for operating a projection exposure tool and control apparatus
902013018816307/25/13Mirror and related euv systems and methods
912013018824607/25/13Imaging optical system for microlithography
922013018223407/18/13Projection exposure system and projection exposure method
932013018226407/18/13Projection exposure tool for microlithography and method for microlithographic exposure
942013018234407/18/13Systems for aligning an optical element and method for same
952013018223407/18/13Projection exposure system and projection exposure method
962013018226407/18/13Projection exposure tool for microlithography and method for microlithographic exposure
972013018234407/18/13Systems for aligning an optical element and method for same
982013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
992013017654507/11/13Projection exposure apparatus
1002013017654607/11/13Illumination optical unit with a movable filter element
1012013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1022013017654507/11/13Projection exposure apparatus
1032013017654607/11/13Illumination optical unit with a movable filter element
1042013017005607/04/13Substrate for mirrors for euv lithography
1052013017005607/04/13Substrate for mirrors for euv lithography
1062013015550906/20/13Lens module comprising at least one exchangeable optical element
1072013015550906/20/13Lens module comprising at least one exchangeable optical element
1082013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1092013014810506/13/13Method and apparatus for qualifying optics of a projection exposure tool for microlithography
1102013014820006/13/13Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination
1112013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1122013014810506/13/13Method and apparatus for qualifying optics of a projection exposure tool for microlithography
1132013014820006/13/13Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination
1142013014170706/06/13Euv exposure apparatus
1152013014170706/06/13Euv exposure apparatus
1162013013576005/30/13Positioning unit and alignment device for an optical element
1172013013576005/30/13Positioning unit and alignment device for an optical element
1182013012825105/23/13Imaging optical system
1192013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1202013013203705/23/13Microlithographic projection exposure apparatus
1212013012825105/23/13Imaging optical system
1222013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1232013013203705/23/13Microlithographic projection exposure apparatus
1242013012072305/16/13Exposure apparatus and measuring device for a projection lens
1252013012072605/16/13Method of structuring a photosensitive material
1262013012072805/16/13Catadioptric projection objective with mirror group
1272013012073005/16/13Facet mirror device
1282013012082005/16/13Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1292013012086305/16/13Substrates for mirrors for euv lithography and their production
1302013012072305/16/13Exposure apparatus and measuring device for a projection lens
1312013012072605/16/13Method of structuring a photosensitive material
1322013012072805/16/13Catadioptric projection objective with mirror group
1332013012073005/16/13Facet mirror device
1342013012082005/16/13Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1352013012086305/16/13Substrates for mirrors for euv lithography and their production
1362013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1372013011405705/09/13Optical imaging device with thermal attenuation
1382013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1392013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1402013011405705/09/13Optical imaging device with thermal attenuation
1412013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1422013010569805/02/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
1432013010723905/02/13Optical arrangement for euv lithography and method for configuring such an optical arrangement
1442013010569805/02/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
1452013010723905/02/13Optical arrangement for euv lithography and method for configuring such an optical arrangement
1462013009913204/25/13Optical system for euv lithography with a charged-particle source
1472013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1482013010042804/25/13Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask
1492013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1502013010054704/25/13Optical element module with minimized parasitic loads
1512013009401004/18/13Lithographic systems and processes of making and using same
1522013008869504/11/13Device for controlling temperature of an optical element
1532013008869804/11/13Methods and devices for driving micromirrors
1542013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1552013008330804/04/13Substrate holder
1562013007707403/28/13Microlithographic projection exposure apparatus
1572013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1582013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1592013007022103/21/13Microlithographic projection exposure apparatus
1602013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1612013007022703/21/13Imaging optical system
1622013006371003/14/13Catoptric objectives and systems using catoptric objectives
1632013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1642013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1652013005067202/28/13Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
1662013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1672013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1682013004430402/21/13Optical projection system
1692013003884802/14/13Optical devices having kinematic components
1702013003884902/14/13Optical component comprising radiation protective layer
1712013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1722013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
1732013002768101/31/13Euv collector
1742013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1752013002159201/24/13Arrangement for and method of characterising the polarisation properties of an optical system
1762013001633101/17/13Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
1772013001035201/10/13Projection objective having mirror elements with reflective coatings
1782012032738412/27/12Mirror elements for euv lithography and production methods therefor
1792012032738512/27/12Optical system for semiconductor lithography
1802012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1812012032034812/20/12Reflective mask for euv lithography
1822012032035312/20/12Projection exposure apparatus and optical system
1832012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1842012031428112/13/12Reflective optical element and method for production of such an optical element
1852012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1862012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1872012030018411/29/12Surface correction on coated mirrors
1882012030018511/29/12Catoptric illumination system for microlithography tool
1892012030019511/29/12Method and apparatus for setting an illumination optical unit
1902012029377911/22/12Reflective optical element and euv lithography appliance
1912012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1922012029378511/22/12Optical element having a plurality of reflective facet elements
1932012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
1942012028741411/15/12Facet mirror for use in microlithography
1952012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
1962012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
1972012027491711/01/12Imaging optics
1982012027491811/01/12Catadioptric projection objective
1992012027491911/01/12Catadioptric projection objective
2002012024998510/04/12Measurement of an imaging optical system by superposition of patterns
2012012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
2022012025014410/04/12Reflective optical element and method for operating an euv lithography apparatus
2032012024126809/27/12Arrangement for the vibration isolation of a pay load
2042012024296809/27/12Method for adjusting an illumination system of a projection exposure apparatus for projection lithography
2052012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
2062012023627209/20/12Combination stop for catoptric projection arrangement
2072012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
2082012023628209/20/12Imaging optical system
2092012023631609/20/12Method and apparatus for determining a shape of an optical test surface
2102012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
2112012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
2122012022415309/06/12Optical arrangement, in particular in a projection exposure apparatus for euv lithography
2132012022416009/06/12Reflective optical imaging system
2142012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
2152012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2162012021864308/30/12Lens blank and lens elements as well as method for their production
2172012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2182012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2192012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
2202012020670408/16/12Illumination optical unit for projection lithography
2212012020811508/16/12Imaging optics
2222012020091308/09/12Reflective optical element and method of producing it
2232012019479308/02/12Optical apparatus for use in photolithography
2242012019479508/02/12Optical element
2252012018852307/26/12Optical arrangement in a projection exposure apparatus for euv lithography
2262012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
2272012018852507/26/12Catoptric objectives and systems using catoptric objectives
2282012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
2292012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
2302012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
2312012018260607/19/12Micromirror arrangement having a coating and method for the production thereof
2322012017659107/12/12Method and device for the correction of imaging defects
2332012017667007/12/12Imaging microoptics for measuring the position of an aerial image
2342012016262506/28/12Catadioptric projection objective with intermediate images
2352012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
2362012016262706/28/12Illumination optical unit for microlithography
2372012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals
2382012015477206/21/12Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
2392012014734406/14/12Actuators and microlithography projection exposure systems and methods using the same
2402012014734706/14/12Imaging optical system and illumination optical system
2412012013840106/07/12Damping device
2422012014024106/07/12Optical system, in particular in a microlithographic projection exposure apparatus
2432012014032806/07/12Optical element with low surface figure deformation
2442012014035106/07/12Magnifying imaging optical unit and metrology system including same
2452012014045406/07/12Magnifying imaging optical unit and metrology system including same
2462012013401505/31/12Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objective
2472012013401605/31/12Method of manufacturing a projection objective and projection objective
2482012012744005/24/12Optical assembly for projection lithography
2492012012748105/24/12Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface


ARCHIVE: New 2014 2013 2012 2011 2010 2009



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