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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Reflective optical element and euv lithography appliance

Carl Zeiss Smt

Reflective optical element and euv lithography appliance

Catadioptric projection objective

Carl Zeiss Smt

Catadioptric projection objective

Projection objective for a microlithographic projection exposure apparatus

Carl Zeiss Smt

Projection objective for a microlithographic projection exposure apparatus

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015005510802/26/15 new patent  Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
22015005510902/26/15 new patent  Projection objective for a microlithographic projection exposure apparatus
32015005511002/26/15 new patent  Illumination optical unit for projection lithography
42015005511102/26/15 new patent  Reflective optical element and euv lithography appliance
52015005511202/26/15 new patent  Lithography producing a mirror arrangement
62015005521202/26/15 new patent  Catadioptric projection objective
72015005521402/26/15 new patent  Catadioptric projection objective
82015004931902/19/15Microlithography projection optical system, tool and production
92015004932002/19/15Projection exposure method, system and objective
102015004932102/19/15Facet mirror
112015004297402/12/15Illumination optical unit and optical system for euv projection lithography
122015004297502/12/15Projection exposure tool for microlithography and microlithographic imaging
132015004306002/12/15Optical elements comprising magnetostrictive material
142015003611502/05/15Illumination optical unit for euv projection lithography
152015002947701/29/15Optical system for a microlithographic projection exposure apparatus
162015002947901/29/15Projection exposure method and projection exposure microlithography
172015002948001/29/15Optical system of a microlithographic projection exposure apparatus
182015002279201/22/15Microlithographic apparatus and changing an optical wavefront in such an apparatus
192015002279801/22/15Illumination system for microlithography
202015002279901/22/15Microlithographic imaging optical system including multiple mirrors
212015001342701/15/15Method for calibrating a position-measuring system and position-measuring system
222015001586201/15/15Illumination optical unit for projection lithography
232015001586401/15/15Projection exposure microlithography for the production of semiconductor components
242015001586501/15/15Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
252015001587501/15/15Measuring device for measuring an illumination property
262015001758901/15/15Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
272015000821501/08/15Method and device for connecting an optical element to a frame
282015000833101/08/15Charged particle inspection method and charged particle system
292015000949201/08/15Measuring system for measuring an imaging quality of an euv lens
302015000955701/08/15Gravitation compensation for optical elements in projection exposure apparatuses
312015000956501/08/15Optical imaging with reduced immersion liquid evaporation effects
322015000292501/01/15Illumination system for euv lithography
332014037608612/25/14Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
342014037769212/25/14Mask for microlithography and scanning projection exposure method utilizing the mask
352014036880112/18/14Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
362014036880312/18/14Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
372014036893312/18/14Positioning unit and adjustment of an optical element
382014033391211/13/14Microlithographic projection exposure apparatus
392014031349810/23/14Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
402014030730810/16/14Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
412014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
422014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
432014026838109/18/14Optical module for a microlithography objective holding and supporting devices
442014025403609/11/14Optical module for an objective
452014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
462014022498508/14/14Focusing a charged particle imaging system
472014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
482014021725708/07/14Support structure and related assemblies and methods
492014021870908/07/14Field facet mirror for an illumination optics of a projection exposure euv microlithography
502014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
512014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
522014021118707/31/14Optical module for guiding a radiation beam
532014021118807/31/14Microlithographic projection exposure apparatus
542014019954307/17/14Reflective optical element and optical system for euv lithography
552014019021207/10/14Mirror elements for euv lithography and production methods therefor
562014019234407/10/14Method and determining the absorption in a blank
572014019359107/10/14Method for producing a reflective optical element for euv-lithography
582014018502707/03/14Illumination optics and projection exposure apparatus
592014017692106/26/14Optical assembly with suppression of degradation
602014017693006/26/14Microlithographic illumination system
612014016045606/12/14Optical aperture device
622014013294105/15/14Imaging optical system and projection exposure system including the same
632014011871205/01/14Measuring system
642014011871405/01/14Projection optics for microlithography
652014010235504/17/14Producing polarization-modulating optical element for microlithography system
662014010458804/17/14Projection objective for microlithography
672014009835204/10/14Device for controlling temperature of an optical element
682014009835504/10/14Catoptric objectives and systems using catoptric objectives
692014007848103/20/14Method for correcting the surface form of a mirror
702014007848203/20/14Lithographic projection objective
712014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
722014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
732014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
742014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
752014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
762014006479103/06/14Optical element unit
772014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
782014003624602/06/14Imaging optical system and projection exposure system for microlithography
792014002252401/23/14Device and the optical measurement of an optical system by using an immersion fluid
802014002252501/23/14Deflection mirror and projection exposure microlithography comprising such a deflection mirror
812014002383501/23/14Optical device
822014001610801/16/14Optical imaging device with image defect determination
832013034282112/26/13Imaging optical system
842013033442612/19/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
852013033555212/19/13Method for mask inspection, and mask inspection installation
862013028647110/31/13Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
872013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
882013024872809/26/13Beam regulating an euv illumination beam
892013025026109/26/13Optical system and use
902013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
912013025026509/26/13Projection exposure euv microlithography and microlithographic exposure
922013025214609/26/13Projection exposure tool for microlithography and microlithographic imaging
932013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
942013024227909/19/13Catadioptric projection objective
952013024228209/19/13Position manipulator for an optical component
962013022277808/29/13Illumination microlithography projection system including polarization-modulating optical element
972013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
982013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
992013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1002013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
1012013018816007/25/13Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1022013018816207/25/13Method for operating a projection exposure tool and control apparatus
1032013018816307/25/13Mirror and related euv systems and methods
1042013018824607/25/13Imaging optical system for microlithography
1052013018223407/18/13Projection exposure system and projection exposure method
1062013018226407/18/13Projection exposure tool for microlithography and microlithographic exposure
1072013018234407/18/13Systems for aligning an optical element and same
1082013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1092013017654507/11/13Projection exposure apparatus
1102013017654607/11/13Illumination optical unit with a movable filter element
1112013017005607/04/13Substrate for mirrors for euv lithography
1122013015550906/20/13Lens module comprising at least one exchangeable optical element
1132013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1142013014810506/13/13Method and qualifying optics of a projection exposure tool for microlithography
1152013014820006/13/13Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1162013014170706/06/13Euv exposure apparatus
1172013013576005/30/13Positioning unit and alignment device for an optical element
1182013012825105/23/13Imaging optical system
1192013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1202013013203705/23/13Microlithographic projection exposure apparatus
1212013012072305/16/13Exposure apparatus and measuring device for a projection lens
1222013012072605/16/13Method of structuring a photosensitive material
1232013012072805/16/13Catadioptric projection objective with mirror group
1242013012073005/16/13Facet mirror device
1252013012082005/16/13Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1262013012086305/16/13Substrates for mirrors for euv lithography and their production
1272013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1282013011405705/09/13Optical imaging device with thermal attenuation
1292013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1302013010569805/02/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1312013010723905/02/13Optical arrangement for euv lithography and configuring such an optical arrangement
1322013009913204/25/13Optical system for euv lithography with a charged-particle source
1332013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1342013010042804/25/13Mask for euv lithography, euv lithography optimising the imaging of a mask
1352013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1362013010054704/25/13Optical element module with minimized parasitic loads
1372013009401004/18/13Lithographic systems and processes of making and using same
1382013008869504/11/13Device for controlling temperature of an optical element
1392013008869804/11/13Methods and devices for driving micromirrors
1402013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1412013008330804/04/13Substrate holder
1422013007707403/28/13Microlithographic projection exposure apparatus
1432013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1442013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1452013007022103/21/13Microlithographic projection exposure apparatus
1462013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1472013007022703/21/13Imaging optical system
1482013006371003/14/13Catoptric objectives and systems using catoptric objectives
1492013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1502013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1512013005067202/28/13Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
1522013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1532013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1542013004430402/21/13Optical projection system
1552013003884802/14/13Optical devices having kinematic components
1562013003884902/14/13Optical component comprising radiation protective layer
1572013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1582013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
1592013002768101/31/13Euv collector
1602013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1612013002159201/24/13Arrangement for and characterising the polarisation properties of an optical system
1622013001633101/17/13Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
1632013001035201/10/13Projection objective having mirror elements with reflective coatings
1642012032738412/27/12Mirror elements for euv lithography and production methods therefor
1652012032738512/27/12Optical system for semiconductor lithography
1662012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1672012032034812/20/12Reflective mask for euv lithography
1682012032035312/20/12Projection exposure apparatus and optical system
1692012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1702012031428112/13/12Reflective optical element and production of such an optical element
1712012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1722012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1732012030018411/29/12Surface correction on coated mirrors
1742012030018511/29/12Catoptric illumination system for microlithography tool
1752012030019511/29/12Method and setting an illumination optical unit
1762012029377911/22/12Reflective optical element and euv lithography appliance
1772012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1782012029378511/22/12Optical element having a plurality of reflective facet elements
1792012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
1802012028741411/15/12Facet mirror for use in microlithography
1812012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
1822012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
1832012027491711/01/12Imaging optics
1842012027491811/01/12Catadioptric projection objective
1852012027491911/01/12Catadioptric projection objective
1862012024998510/04/12Measurement of an imaging optical system by superposition of patterns
1872012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
1882012025014410/04/12Reflective optical element and operating an euv lithography apparatus
1892012024126809/27/12Arrangement for the vibration isolation of a pay load
1902012024296809/27/12Method for adjusting an illumination system of a projection exposure projection lithography
1912012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
1922012023627209/20/12Combination stop for catoptric projection arrangement
1932012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
1942012023628209/20/12Imaging optical system
1952012023631609/20/12Method and determining a shape of an optical test surface
1962012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
1972012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
1982012022415309/06/12Optical arrangement, in particular in a projection exposure euv lithography
1992012022416009/06/12Reflective optical imaging system
2002012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure microlithography, and projection exposure apparatus
2012012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2022012021864308/30/12Lens blank and lens elements as well as their production
2032012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2042012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2052012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure microlithography comprising such a projection objective
2062012020670408/16/12Illumination optical unit for projection lithography
2072012020811508/16/12Imaging optics
2082012020091308/09/12Reflective optical element and producing it
2092012019479308/02/12Optical use in photolithography
2102012019479508/02/12Optical element
2112012018852307/26/12Optical arrangement in a projection exposure euv lithography
2122012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
2132012018852507/26/12Catoptric objectives and systems using catoptric objectives
2142012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
2152012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
2162012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
2172012018260607/19/12Micromirror arrangement having a coating and the production thereof
2182012017659107/12/12Method and device for the correction of imaging defects
2192012017667007/12/12Imaging microoptics for measuring the position of an aerial image
2202012016262506/28/12Catadioptric projection objective with intermediate images
2212012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
2222012016262706/28/12Illumination optical unit for microlithography
2232012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals
2242012015477206/21/12Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
2252012014734406/14/12Actuators and microlithography projection exposure systems and methods using the same
2262012014734706/14/12Imaging optical system and illumination optical system
2272012013840106/07/12Damping device
2282012014024106/07/12Optical system, in particular in a microlithographic projection exposure apparatus
2292012014032806/07/12Optical element with low surface figure deformation
2302012014035106/07/12Magnifying imaging optical unit and metrology system including same
2312012014045406/07/12Magnifying imaging optical unit and metrology system including same
2322012013401505/31/12Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objective
2332012013401605/31/12Method of manufacturing a projection objective and projection objective
2342012012744005/24/12Optical assembly for projection lithography
2352012012748105/24/12Method and determining a deviation of an actual shape from a desired shape of an optical surface
2362012012037805/17/12Component of an euv or uv lithography producing it
2372012011342905/10/12Device and the optical measurement of an optical system by using an immersion fluid
2382012010425205/03/12Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
2392012010586505/03/12Microlithographic projection exposure apparatus and related method
2402012010595805/03/12Lens module comprising at least one exchangeable optical element
2412012009909304/26/12Polarization actuator
2422012009263704/19/12Microlithographic projection exposure apparatus
2432012009266904/19/12Measurement method and measurement system for measuring birefringence
2442012008692504/12/12Method for avoiding contamination and euv-lithography-system
2452012008168504/05/12Microlithographic projection exposure apparatus illumination optics
2462012008168604/05/12Microlithographic projection exposure apparatus illumination optics
2472012008282304/05/12Method for bonding bodies and composite body
2482012007560203/29/12Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
2492012007560803/29/12Projection objective and projection exposure apparatus with negative back focus of the entry pupil



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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