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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors




Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12016003387302/04/16 Projection exposure apparatus with at least one manipulator
22016002555401/28/16 Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and euv lithography apparatus
32016002595201/28/16 Optical module
42016002609101/28/16 Radiation collector, radiation source and lithographic apparatus
52016002609301/28/16 Model-based control of an optical imaging device
62016002609401/28/16 Method and device for the correction of imaging defects
72016001866401/21/16 Polarizer assembly for spatially separation polarization states of a light beam
82016001152001/14/16 Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
92016001152101/14/16 Microlithographic apparatus
102016000416401/07/16 Illumination system for an euv lithography device and facet mirror therefor
112016000416501/07/16 Imaging optical system and projection exposure system for microlithography
122016000416701/07/16 Microlithographic projection exposure apparatus illumination optics
132016000416801/07/16 Measuring an optical symmetry property on a projection exposure apparatus
142016000417001/07/16 Lithographic apparatus and device manufacturing method
152016000417401/07/16 Microlithographic apparatus and varying a light irradiance distribution
162015037017212/24/15 Projection lens with wavefront manipulator
172015037017612/24/15 Actuators and microlithography projection exposure systems and methods using the same
182015036234012/17/15 Position sensor, sensor arrangement and lithography apparatus comprising position sensor
192015036243812/17/15 Magnifying imaging optical unit and euv mask inspection system with such an imaging optical unit
202015036266012/17/15 Optical waveguide for guiding illumination light
212015035505212/10/15 Test object for measuring the point spread function of an optical system
222015035555212/10/15 Optical assembly for increasing the etendue
232015035555512/10/15 Illumination optical unit for projection lithography
242015034659812/03/15 Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unit
252015034660412/03/15 Illumination optical unit for projection lithography
262015034660812/03/15 Method for ascertaining distortion properties of an optical system in a measurement system for microlithography
272015034661212/03/15 Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
282015034082911/26/15 Beam reverser module and optical power amplifier having such a beam reverser module
292015032338711/12/15 Polarization measuring device, lithography apparatus, measuring arrangement, and polarization measurement
302015032387311/12/15 Optical projection system
312015032387411/12/15 Euv light source for generating a used output beam for a projection exposure apparatus
322015031685111/05/15 Reflective optical element for euv lithography and manufacturing a reflective optical element
332015031685311/05/15 Support elements for an optical element
342015031685411/05/15 Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
352015031685511/05/15 Projection exposure semiconductor lithography including an actuator system
362015030930510/29/15 Arrangement for the actuation of at least one element in an optical system
372015030080710/22/15 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
382015030145510/22/15 Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
392015029335210/15/15 Method for improving the imaging properties of a projection objective, and such a projection objective
402015029345710/15/15 Imaging optical unit and projection exposure projection lithography, having such imaging optical unit
412015028615010/08/15 Illumination system of a microlithographic projection exposure apparatus
422015027723010/01/15 Optical membrane element having a longitudinally adjustable connecting element
432015027723510/01/15 Optical system of a microlithographic projection exposure apparatus
442015025367709/10/15 Optical system of a microlithographic projection exposure apparatus
452015024179208/27/15 Illumination system and lithographic apparatus
462015023428908/20/15 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
472015023429108/20/15 Illumination system of a microlithographic projection exposure apparatus
482015023582908/20/15 Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor
492015022694808/13/15 Catadioptric projection objective with parallel, offset optical axes
502015022705208/13/15 Projection exposure method, system and objective
512015022705308/13/15 Multi facet mirror of a microlithographic projection exposure apparatus
522015022705508/13/15 Optical apparatus with adjustable action of force on an optical module
532015021987408/06/15 Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
542015021999908/06/15 Imaging optics, microlithography projection exposure apparatus having same and related methods
552015021243107/30/15 Projection exposure system for microlithography with a measurement device
562015020508407/23/15 Catadioptric projection objective with intermediate images
572015019843707/16/15 Projection exposure microlithography comprising an optical distance measurement system
582015019843807/16/15 Diffractive optical element and measuring method
592015019889107/16/15 Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
602015019889207/16/15 Arrangement for actuating at least one optical element in an optical system
612015019889407/16/15 Monitor system for determining orientations of mirror elements and euv lithography system
622015019286007/09/15 Illumination optical unit for euv projection lithography
632015019423007/09/15 Euv collector
642015018546907/02/15 Method for regulating the tilting of a mirror element
652015018562107/02/15 Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
662015018562207/02/15 Illumination system of a microlithographic projection exposure apparatus
672015017762306/25/15 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
682015017762606/25/15 Blocking element for protecting optical elements in projection exposure apparatuses
692015016867406/18/15 Mirror arrangement for an euv projection exposure apparatus, operating the same, and euv projection exposure apparatus
702015016884406/18/15 Mirror arrangement for a lithography producing the same
712015016884606/18/15 Optical element unit for exposure processes
722015016884906/18/15 Method of operating a microlithographic apparatus
732015016885306/18/15 Lithography apparatus with restricted movement relative to floor and related method
742015017316306/18/15 Euv light source for generating a usable output beam for a projection exposure apparatus
752015016056106/11/15 Mirror
762015016056206/11/15 System correction from long timescales
772015016056506/11/15 Projection exposure methods and systems
782015016056606/11/15 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
792015015365006/04/15 Method for operating a microlithographic projection exposure apparatus
802015015365206/04/15 Method for adjusting an illumination setting
812015015365406/04/15 Illumination system of a microlithographic projection exposure apparatus
822015014618305/28/15 Illumination system of a microlithographic projection exposure apparatus
832015014618405/28/15 Illumination system of a microlithographic projection exposure apparatus
842015013852005/21/15 Holding device for an optical element in an objective
852015013701205/21/15 Euv light source
862015013852105/21/15 Lens module comprising at least one exchangeable optical element
872015012407505/07/15 Optical imaging device and imaging microscopy
882015012423305/07/15 Illumination system for an euv projection lithographic projection exposure apparatus
892015012596805/07/15 Optical system and use
902015011670304/30/15 Reflective optical element
912015010959104/23/15 Optical imaging device with thermal attenuation
922015010332604/16/15 Optical element
932015010332704/16/15 Lithography apparatus with segmented mirror
942015010342604/16/15 Method and cooling system for cooling an optical element for euv applications
952015009806804/09/15 Device for controlling temperature of an optical element
962015009807104/09/15 Optical arrangement for three-dimensionally patterning a material layer
972015009807204/09/15 Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
982015009814004/09/15 Optical element unit
992015009217404/02/15 Illumination optical unit
1002015008527103/26/15 Projection exposure controlling a projection exposure apparatus
1012015008527203/26/15 Optical system of a microlithographic projection exposure apparatus
1022015007067103/12/15 Illumination system of a microlithographic projection exposure apparatus
1032015007067703/12/15 Projection exposure projection lithography
1042015007078903/12/15 Replacement an optical element
1052015006254903/05/15 Assembly for a projection exposure euv projection lithography
1062015006255103/05/15 Optical system, in particular of a microlithographic projection exposure apparatus
1072015006259603/05/15 Optical imaging arrangement with multiple metrology support units
1082015006268203/05/15 Correction of optical elements by correction light irradiated in a flat manner
1092015006272503/05/15 Catadioptric projection objective comprising deflection mirrors and projection exposure method
1102015005510802/26/15 Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
1112015005510902/26/15 Projection objective for a microlithographic projection exposure apparatus
1122015005511002/26/15 Illumination optical unit for projection lithography
1132015005511102/26/15 Reflective optical element and euv lithography appliance
1142015005511202/26/15 Lithography producing a mirror arrangement
1152015005521202/26/15 Catadioptric projection objective
1162015005521402/26/15 Catadioptric projection objective
1172015004931902/19/15 Microlithography projection optical system, tool and production
1182015004932002/19/15 Projection exposure method, system and objective
1192015004932102/19/15 Facet mirror
1202015004297402/12/15 Illumination optical unit and optical system for euv projection lithography
1212015004297502/12/15 Projection exposure tool for microlithography and microlithographic imaging
1222015004306002/12/15 Optical elements comprising magnetostrictive material
1232015003611502/05/15 Illumination optical unit for euv projection lithography
1242015002947701/29/15 Optical system for a microlithographic projection exposure apparatus
1252015002947901/29/15 Projection exposure method and projection exposure microlithography
1262015002948001/29/15 Optical system of a microlithographic projection exposure apparatus
1272015002279201/22/15 Microlithographic apparatus and changing an optical wavefront in such an apparatus
1282015002279801/22/15 Illumination system for microlithography
1292015002279901/22/15 Microlithographic imaging optical system including multiple mirrors
1302015001342701/15/15 Method for calibrating a position-measuring system and position-measuring system
1312015001586201/15/15 Illumination optical unit for projection lithography
1322015001586401/15/15 Projection exposure microlithography for the production of semiconductor components
1332015001586501/15/15 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
1342015001587501/15/15 Measuring device for measuring an illumination property
1352015001758901/15/15 Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
1362015000821501/08/15 Method and device for connecting an optical element to a frame
1372015000833101/08/15 Charged particle inspection method and charged particle system
1382015000949201/08/15 Measuring system for measuring an imaging quality of an euv lens
1392015000955701/08/15 Gravitation compensation for optical elements in projection exposure apparatuses
1402015000956501/08/15 Optical imaging with reduced immersion liquid evaporation effects
1412015000292501/01/15 Illumination system for euv lithography
1422014037608612/25/14 Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
1432014037769212/25/14 Mask for microlithography and scanning projection exposure method utilizing the mask
1442014036880112/18/14 Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
1452014036880312/18/14 Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
1462014036893312/18/14 Positioning unit and adjustment of an optical element
1472014033391211/13/14 Microlithographic projection exposure apparatus
1482014031349810/23/14 Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
1492014030730810/16/14 Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
1502014029325310/02/14 Lens comprising a plurality of optical element disposed in a housing
1512014028578309/25/14 Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
1522014026838109/18/14 Optical module for a microlithography objective holding and supporting devices
1532014025403609/11/14 Optical module for an objective
1542014024743709/04/14 Illumination system of a microlithographic projection exposure apparatus
1552014022498508/14/14 Focusing a charged particle imaging system
1562014022614108/14/14 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1572014021725708/07/14 Support structure and related assemblies and methods
1582014021870908/07/14 Field facet mirror for an illumination optics of a projection exposure euv microlithography
1592014021117807/31/14 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
1602014021117907/31/14 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
1612014021118707/31/14 Optical module for guiding a radiation beam
1622014021118807/31/14 Microlithographic projection exposure apparatus
1632014019954307/17/14 Reflective optical element and optical system for euv lithography
1642014019021207/10/14 Mirror elements for euv lithography and production methods therefor
1652014019234407/10/14 Method and determining the absorption in a blank
1662014019359107/10/14 Method for producing a reflective optical element for euv-lithography
1672014018502707/03/14 Illumination optics and projection exposure apparatus
1682014017692106/26/14 Optical assembly with suppression of degradation
1692014017693006/26/14 Microlithographic illumination system
1702014016045606/12/14 Optical aperture device
1712014013294105/15/14 Imaging optical system and projection exposure system including the same
1722014011871205/01/14 Measuring system
1732014011871405/01/14 Projection optics for microlithography
1742014010235504/17/14 Producing polarization-modulating optical element for microlithography system
1752014010458804/17/14 Projection objective for microlithography
1762014009835204/10/14 Device for controlling temperature of an optical element
1772014009835504/10/14 Catoptric objectives and systems using catoptric objectives
1782014007848103/20/14 Method for correcting the surface form of a mirror
1792014007848203/20/14 Lithographic projection objective
1802014007848403/20/14 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
1812014007851303/20/14 Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
1822014007856703/20/14 Correction of optical elements by correction light irradiated in a flat manner
1832014007141403/13/14 Microlithography projection system with an accessible diaphragm or aperture stop
1842014006362803/06/14 Device for the low-deformation replaceable mounting of an optical element
1852014006479103/06/14 Optical element unit
1862014004359602/13/14 Arrangement for actuating an element in a microlithographic projection exposure apparatus
1872014003624602/06/14 Imaging optical system and projection exposure system for microlithography
1882014002252401/23/14 Device and the optical measurement of an optical system by using an immersion fluid
1892014002252501/23/14 Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1902014002383501/23/14 Optical device
1912014001610801/16/14 Optical imaging device with image defect determination
1922013034282112/26/13 Imaging optical system
1932013033442612/19/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1942013033555212/19/13 Method for mask inspection, and mask inspection installation
1952013028647110/31/13 Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1962013025830310/03/13 Method for operating an illumination system of a microlithographic projection exposure apparatus
1972013024872809/26/13 Beam regulating an euv illumination beam
1982013025026109/26/13 Optical system and use
1992013025026409/26/13 Illumination system for illuminating a mask in a microlithographic exposure apparatus
2002013025026509/26/13 Projection exposure euv microlithography and microlithographic exposure
2012013025214609/26/13 Projection exposure tool for microlithography and microlithographic imaging
2022013024227809/19/13 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
2032013024227909/19/13 Catadioptric projection objective
2042013024228209/19/13 Position manipulator for an optical component
2052013022277808/29/13 Illumination microlithography projection system including polarization-modulating optical element
2062013022278008/29/13 Euv microlithography projection exposure apparatus with a heat light source
2072013020146408/08/13 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
2082013019455908/01/13 Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
2092013018643007/25/13 Method for removing a contamination layer from an optical surface and arrangement therefor
2102013018816007/25/13 Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
2112013018816207/25/13 Method for operating a projection exposure tool and control apparatus
2122013018816307/25/13 Mirror and related euv systems and methods
2132013018824607/25/13 Imaging optical system for microlithography
2142013018223407/18/13 Projection exposure system and projection exposure method
2152013018226407/18/13 Projection exposure tool for microlithography and microlithographic exposure
2162013018234407/18/13 Systems for aligning an optical element and same
2172013017654407/11/13 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
2182013017654507/11/13 Projection exposure apparatus
2192013017654607/11/13 Illumination optical unit with a movable filter element
2202013017005607/04/13 Substrate for mirrors for euv lithography
2212013015550906/20/13 Lens module comprising at least one exchangeable optical element
2222013014809206/13/13 Illumination system for a microlithographic projection exposure apparatus
2232013014810506/13/13 Method and qualifying optics of a projection exposure tool for microlithography
2242013014820006/13/13 Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
2252013014170706/06/13 Euv exposure apparatus
2262013013576005/30/13 Positioning unit and alignment device for an optical element
2272013012825105/23/13 Imaging optical system
2282013012825205/23/13 Multi facet mirror of a microlithographic projection exposure apparatus
2292013013203705/23/13 Microlithographic projection exposure apparatus
2302013012072305/16/13 Exposure apparatus and measuring device for a projection lens
2312013012072605/16/13 Method of structuring a photosensitive material
2322013012072805/16/13 Catadioptric projection objective with mirror group
2332013012073005/16/13 Facet mirror device
2342013012082005/16/13 Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
2352013012086305/16/13 Substrates for mirrors for euv lithography and their production
2362013011405605/09/13 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
2372013011405705/09/13 Optical imaging device with thermal attenuation
2382013011406005/09/13 Illumination system of a microlithographic projection exposure apparatus
2392013010569805/02/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
2402013010723905/02/13 Optical arrangement for euv lithography and configuring such an optical arrangement
2412013009913204/25/13 Optical system for euv lithography with a charged-particle source
2422013010042604/25/13 Method for producing facet mirrors and projection exposure apparatus
2432013010042804/25/13 Mask for euv lithography, euv lithography optimising the imaging of a mask
2442013010042904/25/13 Optical system and multi facet mirror of a microlithographic projection exposure apparatus
2452013010054704/25/13 Optical element module with minimized parasitic loads
2462013009401004/18/13 Lithographic systems and processes of making and using same
2472013008869504/11/13 Device for controlling temperature of an optical element
2482013008869804/11/13 Methods and devices for driving micromirrors
2492013008870104/11/13 Imaging optical system and projection exposure installation for microlithography including same



ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009



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