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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Optical element

Carl Zeiss Smt

Optical element

Lithography apparatus with segmented mirror

Carl Zeiss Smt

Lithography apparatus with segmented mirror

Method and cooling system for cooling an optical element for euv applications

Carl Zeiss Smt

Method and cooling system for cooling an optical element for euv applications

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015010959104/23/15 new patent  Optical imaging device with thermal attenuation
22015010332604/16/15Optical element
32015010332704/16/15Lithography apparatus with segmented mirror
42015010342604/16/15Method and cooling system for cooling an optical element for euv applications
52015009806804/09/15Device for controlling temperature of an optical element
62015009807104/09/15Optical arrangement for three-dimensionally patterning a material layer
72015009807204/09/15Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
82015009814004/09/15Optical element unit
92015009217404/02/15Illumination optical unit
102015008527103/26/15Projection exposure controlling a projection exposure apparatus
112015008527203/26/15Optical system of a microlithographic projection exposure apparatus
122015007067103/12/15Illumination system of a microlithographic projection exposure apparatus
132015007067703/12/15Projection exposure projection lithography
142015007078903/12/15Replacement an optical element
152015006254903/05/15Assembly for a projection exposure euv projection lithography
162015006255103/05/15Optical system, in particular of a microlithographic projection exposure apparatus
172015006259603/05/15Optical imaging arrangement with multiple metrology support units
182015006268203/05/15Correction of optical elements by correction light irradiated in a flat manner
192015006272503/05/15Catadioptric projection objective comprising deflection mirrors and projection exposure method
202015005510802/26/15Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
212015005510902/26/15Projection objective for a microlithographic projection exposure apparatus
222015005511002/26/15Illumination optical unit for projection lithography
232015005511102/26/15Reflective optical element and euv lithography appliance
242015005511202/26/15Lithography producing a mirror arrangement
252015005521202/26/15Catadioptric projection objective
262015005521402/26/15Catadioptric projection objective
272015004931902/19/15Microlithography projection optical system, tool and production
282015004932002/19/15Projection exposure method, system and objective
292015004932102/19/15Facet mirror
302015004297402/12/15Illumination optical unit and optical system for euv projection lithography
312015004297502/12/15Projection exposure tool for microlithography and microlithographic imaging
322015004306002/12/15Optical elements comprising magnetostrictive material
332015003611502/05/15Illumination optical unit for euv projection lithography
342015002947701/29/15Optical system for a microlithographic projection exposure apparatus
352015002947901/29/15Projection exposure method and projection exposure microlithography
362015002948001/29/15Optical system of a microlithographic projection exposure apparatus
372015002279201/22/15Microlithographic apparatus and changing an optical wavefront in such an apparatus
382015002279801/22/15Illumination system for microlithography
392015002279901/22/15Microlithographic imaging optical system including multiple mirrors
402015001342701/15/15Method for calibrating a position-measuring system and position-measuring system
412015001586201/15/15Illumination optical unit for projection lithography
422015001586401/15/15Projection exposure microlithography for the production of semiconductor components
432015001586501/15/15Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
442015001587501/15/15Measuring device for measuring an illumination property
452015001758901/15/15Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
462015000821501/08/15Method and device for connecting an optical element to a frame
472015000833101/08/15Charged particle inspection method and charged particle system
482015000949201/08/15Measuring system for measuring an imaging quality of an euv lens
492015000955701/08/15Gravitation compensation for optical elements in projection exposure apparatuses
502015000956501/08/15Optical imaging with reduced immersion liquid evaporation effects
512015000292501/01/15Illumination system for euv lithography
522014037608612/25/14Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
532014037769212/25/14Mask for microlithography and scanning projection exposure method utilizing the mask
542014036880112/18/14Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
552014036880312/18/14Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
562014036893312/18/14Positioning unit and adjustment of an optical element
572014033391211/13/14Microlithographic projection exposure apparatus
582014031349810/23/14Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
592014030730810/16/14Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
602014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
612014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
622014026838109/18/14Optical module for a microlithography objective holding and supporting devices
632014025403609/11/14Optical module for an objective
642014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
652014022498508/14/14Focusing a charged particle imaging system
662014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
672014021725708/07/14Support structure and related assemblies and methods
682014021870908/07/14Field facet mirror for an illumination optics of a projection exposure euv microlithography
692014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
702014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
712014021118707/31/14Optical module for guiding a radiation beam
722014021118807/31/14Microlithographic projection exposure apparatus
732014019954307/17/14Reflective optical element and optical system for euv lithography
742014019021207/10/14Mirror elements for euv lithography and production methods therefor
752014019234407/10/14Method and determining the absorption in a blank
762014019359107/10/14Method for producing a reflective optical element for euv-lithography
772014018502707/03/14Illumination optics and projection exposure apparatus
782014017692106/26/14Optical assembly with suppression of degradation
792014017693006/26/14Microlithographic illumination system
802014016045606/12/14Optical aperture device
812014013294105/15/14Imaging optical system and projection exposure system including the same
822014011871205/01/14Measuring system
832014011871405/01/14Projection optics for microlithography
842014010235504/17/14Producing polarization-modulating optical element for microlithography system
852014010458804/17/14Projection objective for microlithography
862014009835204/10/14Device for controlling temperature of an optical element
872014009835504/10/14Catoptric objectives and systems using catoptric objectives
882014007848103/20/14Method for correcting the surface form of a mirror
892014007848203/20/14Lithographic projection objective
902014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
912014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
922014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
932014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
942014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
952014006479103/06/14Optical element unit
962014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
972014003624602/06/14Imaging optical system and projection exposure system for microlithography
982014002252401/23/14Device and the optical measurement of an optical system by using an immersion fluid
992014002252501/23/14Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1002014002383501/23/14Optical device
1012014001610801/16/14Optical imaging device with image defect determination
1022013034282112/26/13Imaging optical system
1032013033442612/19/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1042013033555212/19/13Method for mask inspection, and mask inspection installation
1052013028647110/31/13Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1062013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
1072013024872809/26/13Beam regulating an euv illumination beam
1082013025026109/26/13Optical system and use
1092013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
1102013025026509/26/13Projection exposure euv microlithography and microlithographic exposure
1112013025214609/26/13Projection exposure tool for microlithography and microlithographic imaging
1122013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
1132013024227909/19/13Catadioptric projection objective
1142013024228209/19/13Position manipulator for an optical component
1152013022277808/29/13Illumination microlithography projection system including polarization-modulating optical element
1162013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
1172013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
1182013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1192013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
1202013018816007/25/13Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1212013018816207/25/13Method for operating a projection exposure tool and control apparatus
1222013018816307/25/13Mirror and related euv systems and methods
1232013018824607/25/13Imaging optical system for microlithography
1242013018223407/18/13Projection exposure system and projection exposure method
1252013018226407/18/13Projection exposure tool for microlithography and microlithographic exposure
1262013018234407/18/13Systems for aligning an optical element and same
1272013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1282013017654507/11/13Projection exposure apparatus
1292013017654607/11/13Illumination optical unit with a movable filter element
1302013017005607/04/13Substrate for mirrors for euv lithography
1312013015550906/20/13Lens module comprising at least one exchangeable optical element
1322013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1332013014810506/13/13Method and qualifying optics of a projection exposure tool for microlithography
1342013014820006/13/13Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1352013014170706/06/13Euv exposure apparatus
1362013013576005/30/13Positioning unit and alignment device for an optical element
1372013012825105/23/13Imaging optical system
1382013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1392013013203705/23/13Microlithographic projection exposure apparatus
1402013012072305/16/13Exposure apparatus and measuring device for a projection lens
1412013012072605/16/13Method of structuring a photosensitive material
1422013012072805/16/13Catadioptric projection objective with mirror group
1432013012073005/16/13Facet mirror device
1442013012082005/16/13Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1452013012086305/16/13Substrates for mirrors for euv lithography and their production
1462013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1472013011405705/09/13Optical imaging device with thermal attenuation
1482013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1492013010569805/02/13Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1502013010723905/02/13Optical arrangement for euv lithography and configuring such an optical arrangement
1512013009913204/25/13Optical system for euv lithography with a charged-particle source
1522013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1532013010042804/25/13Mask for euv lithography, euv lithography optimising the imaging of a mask
1542013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1552013010054704/25/13Optical element module with minimized parasitic loads
1562013009401004/18/13Lithographic systems and processes of making and using same
1572013008869504/11/13Device for controlling temperature of an optical element
1582013008869804/11/13Methods and devices for driving micromirrors
1592013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1602013008330804/04/13Substrate holder
1612013007707403/28/13Microlithographic projection exposure apparatus
1622013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1632013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1642013007022103/21/13Microlithographic projection exposure apparatus
1652013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1662013007022703/21/13Imaging optical system
1672013006371003/14/13Catoptric objectives and systems using catoptric objectives
1682013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1692013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1702013005067202/28/13Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
1712013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1722013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1732013004430402/21/13Optical projection system
1742013003884802/14/13Optical devices having kinematic components
1752013003884902/14/13Optical component comprising radiation protective layer
1762013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1772013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
1782013002768101/31/13Euv collector
1792013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1802013002159201/24/13Arrangement for and characterising the polarisation properties of an optical system
1812013001633101/17/13Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
1822013001035201/10/13Projection objective having mirror elements with reflective coatings
1832012032738412/27/12Mirror elements for euv lithography and production methods therefor
1842012032738512/27/12Optical system for semiconductor lithography
1852012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1862012032034812/20/12Reflective mask for euv lithography
1872012032035312/20/12Projection exposure apparatus and optical system
1882012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1892012031428112/13/12Reflective optical element and production of such an optical element
1902012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1912012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1922012030018411/29/12Surface correction on coated mirrors
1932012030018511/29/12Catoptric illumination system for microlithography tool
1942012030019511/29/12Method and setting an illumination optical unit
1952012029377911/22/12Reflective optical element and euv lithography appliance
1962012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1972012029378511/22/12Optical element having a plurality of reflective facet elements
1982012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
1992012028741411/15/12Facet mirror for use in microlithography
2002012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
2012012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
2022012027491711/01/12Imaging optics
2032012027491811/01/12Catadioptric projection objective
2042012027491911/01/12Catadioptric projection objective
2052012024998510/04/12Measurement of an imaging optical system by superposition of patterns
2062012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
2072012025014410/04/12Reflective optical element and operating an euv lithography apparatus
2082012024126809/27/12Arrangement for the vibration isolation of a pay load
2092012024296809/27/12Method for adjusting an illumination system of a projection exposure projection lithography
2102012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
2112012023627209/20/12Combination stop for catoptric projection arrangement
2122012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
2132012023628209/20/12Imaging optical system
2142012023631609/20/12Method and determining a shape of an optical test surface
2152012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
2162012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
2172012022415309/06/12Optical arrangement, in particular in a projection exposure euv lithography
2182012022416009/06/12Reflective optical imaging system
2192012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure microlithography, and projection exposure apparatus
2202012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2212012021864308/30/12Lens blank and lens elements as well as their production
2222012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2232012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2242012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure microlithography comprising such a projection objective
2252012020670408/16/12Illumination optical unit for projection lithography
2262012020811508/16/12Imaging optics
2272012020091308/09/12Reflective optical element and producing it
2282012019479308/02/12Optical use in photolithography
2292012019479508/02/12Optical element
2302012018852307/26/12Optical arrangement in a projection exposure euv lithography
2312012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
2322012018852507/26/12Catoptric objectives and systems using catoptric objectives
2332012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
2342012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
2352012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
2362012018260607/19/12Micromirror arrangement having a coating and the production thereof
2372012017659107/12/12Method and device for the correction of imaging defects
2382012017667007/12/12Imaging microoptics for measuring the position of an aerial image
2392012016262506/28/12Catadioptric projection objective with intermediate images
2402012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
2412012016262706/28/12Illumination optical unit for microlithography
2422012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals
2432012015477206/21/12Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
2442012014734406/14/12Actuators and microlithography projection exposure systems and methods using the same
2452012014734706/14/12Imaging optical system and illumination optical system
2462012013840106/07/12Damping device
2472012014024106/07/12Optical system, in particular in a microlithographic projection exposure apparatus
2482012014032806/07/12Optical element with low surface figure deformation
2492012014035106/07/12Magnifying imaging optical unit and metrology system including same



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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