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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors




Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12016018754306/30/16  new patent  Optical element and optical system for euv lithography, and treating such an optical element
22016018763206/30/16  new patent  Collector
32016018778406/30/16  new patent  Illumination optical unit and illumination system for euv projection lithography
42016018778506/30/16  new patent  Illumination system
52016018778606/30/16  new patent  Illumination optical unit for euv projection lithography
62016018778906/30/16  new patent  Illumination system for illuminating a mask in a microlithographic exposure apparatus
72016017901306/23/16 Optical imaging arrangement with simplified manufacture
82016017901806/23/16 Microlithographic projection exposure apparatus and correcting optical wavefront deformations in such an apparatus
92016016981606/16/16 Method and system for euv mask blank buried defect analysis
102016017020106/16/16 Optical component
112016017030706/16/16 Projection objective for microlithography
122016017030806/16/16 Facet mirror for a projection exposure apparatus
132016016170006/09/16 Optical element unit
142016016184506/09/16 Method of operating a microlithographic projection apparatus
152016016185206/09/16 Mirror for a microlithographic projection exposure processing a mirror
162016016185806/09/16 Illumination system for microlithography
172016015422806/02/16 Catadioptric projection objective comprising deflection mirrors and projection exposure method
182016015431606/02/16 Illumination optical unit for euv projection lithography
192016015431706/02/16 Mirror, in particular for a microlithographic projection exposure apparatus
202016015431806/02/16 Micromirror array
212016014513705/26/16 Method for loading a blank composed of fused silica with hydrogen, lens element and projection lens
222016014715805/26/16 Imaging optical unit for euv projection lithography
232016014715905/26/16 Optical imaging device
242016013890705/19/16 Method and device for determining a reference point of an orientation marking on a substrate of a photolithographic mask in an automated manner
252016013198005/12/16 Microlithographic projection exposure apparatus
262016012372405/05/16 Mask inspection system for inspecting lithography masks
272016012414205/05/16 Optical hollow waveguide assembly
282016012431505/05/16 Support for a component of an optical device
292016011664804/28/16 Optical element comprising a multilayer coating, and optical arrangement comprising same
302016011685104/28/16 Projection exposure tool for microlithography and microlithographic imaging
312016010967904/21/16 Optical element unit and supporting an optical element
322016010980704/21/16 Optical component
332016010981404/21/16 Lithographic apparatus, positioning system for use in a lithographic apparatus and method
342016011126904/21/16 Mass spectrometer, use thereof, and the mass spectrometric examination of a gas mixture
352016010427504/14/16 Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position
362016009130003/31/16 Method for characterizing a structure on a mask and device for carrying out said method
372016009179803/31/16 Optical assembly
382016008506103/24/16 Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit
392016007744103/17/16 Euv imaging apparatus
402016007744203/17/16 Optical component
412016007744403/17/16 Method for operating an illumination system of a microlithographic projection exposure apparatus
422016007744603/17/16 Illumination system for a microlithographic projection exposure apparatus
432016007017603/10/16 Illumination system of a microlithographic projection exposure apparatus
442016006224403/03/16 System for producing structures in a substrate
452016006224503/03/16 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
462016005466102/25/16 Arrangement for actuating an element in a microlithographic projection exposure apparatus
472016005466202/25/16 Projection exposure apparatus with a highly flexible manipulator
482016004808302/18/16 Reflecting coating with optimized thickness
492016004808802/18/16 Device for controlling temperature of an optical element
502016004136002/11/16 Positioning unit and adjustment of an optical element
512016004147302/11/16 Lens comprising a plurality of optical element disposed in a housing
522016004147502/11/16 Replacement an optical element
532016004148002/11/16 Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus
542016003387302/04/16 Projection exposure apparatus with at least one manipulator
552016002555401/28/16 Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and euv lithography apparatus
562016002595201/28/16 Optical module
572016002609101/28/16 Radiation collector, radiation source and lithographic apparatus
582016002609301/28/16 Model-based control of an optical imaging device
592016002609401/28/16 Method and device for the correction of imaging defects
602016001866401/21/16 Polarizer assembly for spatially separation polarization states of a light beam
612016001152001/14/16 Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
622016001152101/14/16 Microlithographic apparatus
632016000416401/07/16 Illumination system for an euv lithography device and facet mirror therefor
642016000416501/07/16 Imaging optical system and projection exposure system for microlithography
652016000416701/07/16 Microlithographic projection exposure apparatus illumination optics
662016000416801/07/16 Measuring an optical symmetry property on a projection exposure apparatus
672016000417001/07/16 Lithographic apparatus and device manufacturing method
682016000417401/07/16 Microlithographic apparatus and varying a light irradiance distribution
692015037017212/24/15 Projection lens with wavefront manipulator
702015037017612/24/15 Actuators and microlithography projection exposure systems and methods using the same
712015036234012/17/15 Position sensor, sensor arrangement and lithography apparatus comprising position sensor
722015036243812/17/15 Magnifying imaging optical unit and euv mask inspection system with such an imaging optical unit
732015036266012/17/15 Optical waveguide for guiding illumination light
742015035505212/10/15 Test object for measuring the point spread function of an optical system
752015035555212/10/15 Optical assembly for increasing the etendue
762015035555512/10/15 Illumination optical unit for projection lithography
772015034659812/03/15 Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unit
782015034660412/03/15 Illumination optical unit for projection lithography
792015034660812/03/15 Method for ascertaining distortion properties of an optical system in a measurement system for microlithography
802015034661212/03/15 Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
812015034082911/26/15 Beam reverser module and optical power amplifier having such a beam reverser module
822015032338711/12/15 Polarization measuring device, lithography apparatus, measuring arrangement, and polarization measurement
832015032387311/12/15 Optical projection system
842015032387411/12/15 Euv light source for generating a used output beam for a projection exposure apparatus
852015031685111/05/15 Reflective optical element for euv lithography and manufacturing a reflective optical element
862015031685311/05/15 Support elements for an optical element
872015031685411/05/15 Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
882015031685511/05/15 Projection exposure semiconductor lithography including an actuator system
892015030930510/29/15 Arrangement for the actuation of at least one element in an optical system
902015030080710/22/15 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
912015030145510/22/15 Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
922015029335210/15/15 Method for improving the imaging properties of a projection objective, and such a projection objective
932015029345710/15/15 Imaging optical unit and projection exposure projection lithography, having such imaging optical unit
942015028615010/08/15 Illumination system of a microlithographic projection exposure apparatus
952015027723010/01/15 Optical membrane element having a longitudinally adjustable connecting element
962015027723510/01/15 Optical system of a microlithographic projection exposure apparatus
972015025367709/10/15 Optical system of a microlithographic projection exposure apparatus
982015024179208/27/15 Illumination system and lithographic apparatus
992015023428908/20/15 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1002015023429108/20/15 Illumination system of a microlithographic projection exposure apparatus
1012015023582908/20/15 Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor
1022015022694808/13/15 Catadioptric projection objective with parallel, offset optical axes
1032015022705208/13/15 Projection exposure method, system and objective
1042015022705308/13/15 Multi facet mirror of a microlithographic projection exposure apparatus
1052015022705508/13/15 Optical apparatus with adjustable action of force on an optical module
1062015021987408/06/15 Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
1072015021999908/06/15 Imaging optics, microlithography projection exposure apparatus having same and related methods
1082015021243107/30/15 Projection exposure system for microlithography with a measurement device
1092015020508407/23/15 Catadioptric projection objective with intermediate images
1102015019843707/16/15 Projection exposure microlithography comprising an optical distance measurement system
1112015019843807/16/15 Diffractive optical element and measuring method
1122015019889107/16/15 Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
1132015019889207/16/15 Arrangement for actuating at least one optical element in an optical system
1142015019889407/16/15 Monitor system for determining orientations of mirror elements and euv lithography system
1152015019286007/09/15 Illumination optical unit for euv projection lithography
1162015019423007/09/15 Euv collector
1172015018546907/02/15 Method for regulating the tilting of a mirror element
1182015018562107/02/15 Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
1192015018562207/02/15 Illumination system of a microlithographic projection exposure apparatus
1202015017762306/25/15 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
1212015017762606/25/15 Blocking element for protecting optical elements in projection exposure apparatuses
1222015016867406/18/15 Mirror arrangement for an euv projection exposure apparatus, operating the same, and euv projection exposure apparatus
1232015016884406/18/15 Mirror arrangement for a lithography producing the same
1242015016884606/18/15 Optical element unit for exposure processes
1252015016884906/18/15 Method of operating a microlithographic apparatus
1262015016885306/18/15 Lithography apparatus with restricted movement relative to floor and related method
1272015017316306/18/15 Euv light source for generating a usable output beam for a projection exposure apparatus
1282015016056106/11/15 Mirror
1292015016056206/11/15 System correction from long timescales
1302015016056506/11/15 Projection exposure methods and systems
1312015016056606/11/15 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1322015015365006/04/15 Method for operating a microlithographic projection exposure apparatus
1332015015365206/04/15 Method for adjusting an illumination setting
1342015015365406/04/15 Illumination system of a microlithographic projection exposure apparatus
1352015014618305/28/15 Illumination system of a microlithographic projection exposure apparatus
1362015014618405/28/15 Illumination system of a microlithographic projection exposure apparatus
1372015013852005/21/15 Holding device for an optical element in an objective
1382015013701205/21/15 Euv light source
1392015013852105/21/15 Lens module comprising at least one exchangeable optical element
1402015012407505/07/15 Optical imaging device and imaging microscopy
1412015012423305/07/15 Illumination system for an euv projection lithographic projection exposure apparatus
1422015012596805/07/15 Optical system and use
1432015011670304/30/15 Reflective optical element
1442015010959104/23/15 Optical imaging device with thermal attenuation
1452015010332604/16/15 Optical element
1462015010332704/16/15 Lithography apparatus with segmented mirror
1472015010342604/16/15 Method and cooling system for cooling an optical element for euv applications
1482015009806804/09/15 Device for controlling temperature of an optical element
1492015009807104/09/15 Optical arrangement for three-dimensionally patterning a material layer
1502015009807204/09/15 Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
1512015009814004/09/15 Optical element unit
1522015009217404/02/15 Illumination optical unit
1532015008527103/26/15 Projection exposure controlling a projection exposure apparatus
1542015008527203/26/15 Optical system of a microlithographic projection exposure apparatus
1552015007067103/12/15 Illumination system of a microlithographic projection exposure apparatus
1562015007067703/12/15 Projection exposure projection lithography
1572015007078903/12/15 Replacement an optical element
1582015006254903/05/15 Assembly for a projection exposure euv projection lithography
1592015006255103/05/15 Optical system, in particular of a microlithographic projection exposure apparatus
1602015006259603/05/15 Optical imaging arrangement with multiple metrology support units
1612015006268203/05/15 Correction of optical elements by correction light irradiated in a flat manner
1622015006272503/05/15 Catadioptric projection objective comprising deflection mirrors and projection exposure method
1632015005510802/26/15 Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
1642015005510902/26/15 Projection objective for a microlithographic projection exposure apparatus
1652015005511002/26/15 Illumination optical unit for projection lithography
1662015005511102/26/15 Reflective optical element and euv lithography appliance
1672015005511202/26/15 Lithography producing a mirror arrangement
1682015005521202/26/15 Catadioptric projection objective
1692015005521402/26/15 Catadioptric projection objective
1702015004931902/19/15 Microlithography projection optical system, tool and production
1712015004932002/19/15 Projection exposure method, system and objective
1722015004932102/19/15 Facet mirror
1732015004297402/12/15 Illumination optical unit and optical system for euv projection lithography
1742015004297502/12/15 Projection exposure tool for microlithography and microlithographic imaging
1752015004306002/12/15 Optical elements comprising magnetostrictive material
1762015003611502/05/15 Illumination optical unit for euv projection lithography
1772015002947701/29/15 Optical system for a microlithographic projection exposure apparatus
1782015002947901/29/15 Projection exposure method and projection exposure microlithography
1792015002948001/29/15 Optical system of a microlithographic projection exposure apparatus
1802015002279201/22/15 Microlithographic apparatus and changing an optical wavefront in such an apparatus
1812015002279801/22/15 Illumination system for microlithography
1822015002279901/22/15 Microlithographic imaging optical system including multiple mirrors
1832015001342701/15/15 Method for calibrating a position-measuring system and position-measuring system
1842015001586201/15/15 Illumination optical unit for projection lithography
1852015001586401/15/15 Projection exposure microlithography for the production of semiconductor components
1862015001586501/15/15 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
1872015001587501/15/15 Measuring device for measuring an illumination property
1882015001758901/15/15 Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
1892015000821501/08/15 Method and device for connecting an optical element to a frame
1902015000833101/08/15 Charged particle inspection method and charged particle system
1912015000949201/08/15 Measuring system for measuring an imaging quality of an euv lens
1922015000955701/08/15 Gravitation compensation for optical elements in projection exposure apparatuses
1932015000956501/08/15 Optical imaging with reduced immersion liquid evaporation effects
1942015000292501/01/15 Illumination system for euv lithography
1952014037608612/25/14 Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
1962014037769212/25/14 Mask for microlithography and scanning projection exposure method utilizing the mask
1972014036880112/18/14 Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
1982014036880312/18/14 Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
1992014036893312/18/14 Positioning unit and adjustment of an optical element
2002014033391211/13/14 Microlithographic projection exposure apparatus
2012014031349810/23/14 Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
2022014030730810/16/14 Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
2032014029325310/02/14 Lens comprising a plurality of optical element disposed in a housing
2042014028578309/25/14 Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
2052014026838109/18/14 Optical module for a microlithography objective holding and supporting devices
2062014025403609/11/14 Optical module for an objective
2072014024743709/04/14 Illumination system of a microlithographic projection exposure apparatus
2082014022498508/14/14 Focusing a charged particle imaging system
2092014022614108/14/14 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
2102014021725708/07/14 Support structure and related assemblies and methods
2112014021870908/07/14 Field facet mirror for an illumination optics of a projection exposure euv microlithography
2122014021117807/31/14 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
2132014021117907/31/14 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
2142014021118707/31/14 Optical module for guiding a radiation beam
2152014021118807/31/14 Microlithographic projection exposure apparatus
2162014019954307/17/14 Reflective optical element and optical system for euv lithography
2172014019021207/10/14 Mirror elements for euv lithography and production methods therefor
2182014019234407/10/14 Method and determining the absorption in a blank
2192014019359107/10/14 Method for producing a reflective optical element for euv-lithography
2202014018502707/03/14 Illumination optics and projection exposure apparatus
2212014017692106/26/14 Optical assembly with suppression of degradation
2222014017693006/26/14 Microlithographic illumination system
2232014016045606/12/14 Optical aperture device
2242014013294105/15/14 Imaging optical system and projection exposure system including the same
2252014011871205/01/14 Measuring system
2262014011871405/01/14 Projection optics for microlithography
2272014010235504/17/14 Producing polarization-modulating optical element for microlithography system
2282014010458804/17/14 Projection objective for microlithography
2292014009835204/10/14 Device for controlling temperature of an optical element
2302014009835504/10/14 Catoptric objectives and systems using catoptric objectives
2312014007848103/20/14 Method for correcting the surface form of a mirror
2322014007848203/20/14 Lithographic projection objective
2332014007848403/20/14 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
2342014007851303/20/14 Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
2352014007856703/20/14 Correction of optical elements by correction light irradiated in a flat manner
2362014007141403/13/14 Microlithography projection system with an accessible diaphragm or aperture stop
2372014006362803/06/14 Device for the low-deformation replaceable mounting of an optical element
2382014006479103/06/14 Optical element unit
2392014004359602/13/14 Arrangement for actuating an element in a microlithographic projection exposure apparatus
2402014003624602/06/14 Imaging optical system and projection exposure system for microlithography
2412014002252401/23/14 Device and the optical measurement of an optical system by using an immersion fluid
2422014002252501/23/14 Deflection mirror and projection exposure microlithography comprising such a deflection mirror
2432014002383501/23/14 Optical device
2442014001610801/16/14 Optical imaging device with image defect determination
2452013034282112/26/13 Imaging optical system
2462013033442612/19/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
2472013033555212/19/13 Method for mask inspection, and mask inspection installation
2482013028647110/31/13 Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
2492013025830310/03/13 Method for operating an illumination system of a microlithographic projection exposure apparatus



ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009



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