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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors




Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12015024179208/27/15  new patent  Illumination system and lithographic apparatus
22015023428908/20/15 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
32015023429108/20/15 Illumination system of a microlithographic projection exposure apparatus
42015023582908/20/15 Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor
52015022694808/13/15 Catadioptric projection objective with parallel, offset optical axes
62015022705208/13/15 Projection exposure method, system and objective
72015022705308/13/15 Multi facet mirror of a microlithographic projection exposure apparatus
82015022705508/13/15 Optical apparatus with adjustable action of force on an optical module
92015021987408/06/15 Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
102015021999908/06/15 Imaging optics, microlithography projection exposure apparatus having same and related methods
112015021243107/30/15 Projection exposure system for microlithography with a measurement device
122015020508407/23/15 Catadioptric projection objective with intermediate images
132015019843707/16/15 Projection exposure microlithography comprising an optical distance measurement system
142015019843807/16/15 Diffractive optical element and measuring method
152015019889107/16/15 Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
162015019889207/16/15 Arrangement for actuating at least one optical element in an optical system
172015019889407/16/15 Monitor system for determining orientations of mirror elements and euv lithography system
182015019286007/09/15 Illumination optical unit for euv projection lithography
192015019423007/09/15 Euv collector
202015018546907/02/15 Method for regulating the tilting of a mirror element
212015018562107/02/15 Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
222015018562207/02/15 Illumination system of a microlithographic projection exposure apparatus
232015017762306/25/15 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
242015017762606/25/15 Blocking element for protecting optical elements in projection exposure apparatuses
252015016867406/18/15 Mirror arrangement for an euv projection exposure apparatus, operating the same, and euv projection exposure apparatus
262015016884406/18/15 Mirror arrangement for a lithography producing the same
272015016884606/18/15 Optical element unit for exposure processes
282015016884906/18/15 Method of operating a microlithographic apparatus
292015016885306/18/15 Lithography apparatus with restricted movement relative to floor and related method
302015017316306/18/15 Euv light source for generating a usable output beam for a projection exposure apparatus
312015016056106/11/15 Mirror
322015016056206/11/15 System correction from long timescales
332015016056506/11/15 Projection exposure methods and systems
342015016056606/11/15 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
352015015365006/04/15 Method for operating a microlithographic projection exposure apparatus
362015015365206/04/15 Method for adjusting an illumination setting
372015015365406/04/15 Illumination system of a microlithographic projection exposure apparatus
382015014618305/28/15 Illumination system of a microlithographic projection exposure apparatus
392015014618405/28/15 Illumination system of a microlithographic projection exposure apparatus
402015013852005/21/15 Holding device for an optical element in an objective
412015013701205/21/15 Euv light source
422015013852105/21/15 Lens module comprising at least one exchangeable optical element
432015012407505/07/15 Optical imaging device and imaging microscopy
442015012423305/07/15 Illumination system for an euv projection lithographic projection exposure apparatus
452015012596805/07/15 Optical system and use
462015011670304/30/15 Reflective optical element
472015010959104/23/15 Optical imaging device with thermal attenuation
482015010332604/16/15 Optical element
492015010332704/16/15 Lithography apparatus with segmented mirror
502015010342604/16/15 Method and cooling system for cooling an optical element for euv applications
512015009806804/09/15 Device for controlling temperature of an optical element
522015009807104/09/15 Optical arrangement for three-dimensionally patterning a material layer
532015009807204/09/15 Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system
542015009814004/09/15 Optical element unit
552015009217404/02/15 Illumination optical unit
562015008527103/26/15 Projection exposure controlling a projection exposure apparatus
572015008527203/26/15 Optical system of a microlithographic projection exposure apparatus
582015007067103/12/15 Illumination system of a microlithographic projection exposure apparatus
592015007067703/12/15 Projection exposure projection lithography
602015007078903/12/15 Replacement an optical element
612015006254903/05/15 Assembly for a projection exposure euv projection lithography
622015006255103/05/15 Optical system, in particular of a microlithographic projection exposure apparatus
632015006259603/05/15 Optical imaging arrangement with multiple metrology support units
642015006268203/05/15 Correction of optical elements by correction light irradiated in a flat manner
652015006272503/05/15 Catadioptric projection objective comprising deflection mirrors and projection exposure method
662015005510802/26/15 Mirror for the euv wavelength range, producing such a mirror, and projection exposure apparatus comprising such a mirror
672015005510902/26/15 Projection objective for a microlithographic projection exposure apparatus
682015005511002/26/15 Illumination optical unit for projection lithography
692015005511102/26/15 Reflective optical element and euv lithography appliance
702015005511202/26/15 Lithography producing a mirror arrangement
712015005521202/26/15 Catadioptric projection objective
722015005521402/26/15 Catadioptric projection objective
732015004931902/19/15 Microlithography projection optical system, tool and production
742015004932002/19/15 Projection exposure method, system and objective
752015004932102/19/15 Facet mirror
762015004297402/12/15 Illumination optical unit and optical system for euv projection lithography
772015004297502/12/15 Projection exposure tool for microlithography and microlithographic imaging
782015004306002/12/15 Optical elements comprising magnetostrictive material
792015003611502/05/15 Illumination optical unit for euv projection lithography
802015002947701/29/15 Optical system for a microlithographic projection exposure apparatus
812015002947901/29/15 Projection exposure method and projection exposure microlithography
822015002948001/29/15 Optical system of a microlithographic projection exposure apparatus
832015002279201/22/15 Microlithographic apparatus and changing an optical wavefront in such an apparatus
842015002279801/22/15 Illumination system for microlithography
852015002279901/22/15 Microlithographic imaging optical system including multiple mirrors
862015001342701/15/15 Method for calibrating a position-measuring system and position-measuring system
872015001586201/15/15 Illumination optical unit for projection lithography
882015001586401/15/15 Projection exposure microlithography for the production of semiconductor components
892015001586501/15/15 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
902015001587501/15/15 Measuring device for measuring an illumination property
912015001758901/15/15 Apparatus and compensating a defect of a channel of a microlithographic projection exposure system
922015000821501/08/15 Method and device for connecting an optical element to a frame
932015000833101/08/15 Charged particle inspection method and charged particle system
942015000949201/08/15 Measuring system for measuring an imaging quality of an euv lens
952015000955701/08/15 Gravitation compensation for optical elements in projection exposure apparatuses
962015000956501/08/15 Optical imaging with reduced immersion liquid evaporation effects
972015000292501/01/15 Illumination system for euv lithography
982014037608612/25/14 Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
992014037769212/25/14 Mask for microlithography and scanning projection exposure method utilizing the mask
1002014036880112/18/14 Imaging optical unit and projection exposure projection lithography comprising such an imaging optical unit
1012014036880312/18/14 Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit
1022014036893312/18/14 Positioning unit and adjustment of an optical element
1032014033391211/13/14 Microlithographic projection exposure apparatus
1042014031349810/23/14 Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
1052014030730810/16/14 Reflective optical element for the euv wavelength range, producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure microlithography comprising such a projection lens
1062014029325310/02/14 Lens comprising a plurality of optical element disposed in a housing
1072014028578309/25/14 Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
1082014026838109/18/14 Optical module for a microlithography objective holding and supporting devices
1092014025403609/11/14 Optical module for an objective
1102014024743709/04/14 Illumination system of a microlithographic projection exposure apparatus
1112014022498508/14/14 Focusing a charged particle imaging system
1122014022614108/14/14 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1132014021725708/07/14 Support structure and related assemblies and methods
1142014021870908/07/14 Field facet mirror for an illumination optics of a projection exposure euv microlithography
1152014021117807/31/14 Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
1162014021117907/31/14 Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
1172014021118707/31/14 Optical module for guiding a radiation beam
1182014021118807/31/14 Microlithographic projection exposure apparatus
1192014019954307/17/14 Reflective optical element and optical system for euv lithography
1202014019021207/10/14 Mirror elements for euv lithography and production methods therefor
1212014019234407/10/14 Method and determining the absorption in a blank
1222014019359107/10/14 Method for producing a reflective optical element for euv-lithography
1232014018502707/03/14 Illumination optics and projection exposure apparatus
1242014017692106/26/14 Optical assembly with suppression of degradation
1252014017693006/26/14 Microlithographic illumination system
1262014016045606/12/14 Optical aperture device
1272014013294105/15/14 Imaging optical system and projection exposure system including the same
1282014011871205/01/14 Measuring system
1292014011871405/01/14 Projection optics for microlithography
1302014010235504/17/14 Producing polarization-modulating optical element for microlithography system
1312014010458804/17/14 Projection objective for microlithography
1322014009835204/10/14 Device for controlling temperature of an optical element
1332014009835504/10/14 Catoptric objectives and systems using catoptric objectives
1342014007848103/20/14 Method for correcting the surface form of a mirror
1352014007848203/20/14 Lithographic projection objective
1362014007848403/20/14 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
1372014007851303/20/14 Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
1382014007856703/20/14 Correction of optical elements by correction light irradiated in a flat manner
1392014007141403/13/14 Microlithography projection system with an accessible diaphragm or aperture stop
1402014006362803/06/14 Device for the low-deformation replaceable mounting of an optical element
1412014006479103/06/14 Optical element unit
1422014004359602/13/14 Arrangement for actuating an element in a microlithographic projection exposure apparatus
1432014003624602/06/14 Imaging optical system and projection exposure system for microlithography
1442014002252401/23/14 Device and the optical measurement of an optical system by using an immersion fluid
1452014002252501/23/14 Deflection mirror and projection exposure microlithography comprising such a deflection mirror
1462014002383501/23/14 Optical device
1472014001610801/16/14 Optical imaging device with image defect determination
1482013034282112/26/13 Imaging optical system
1492013033442612/19/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1502013033555212/19/13 Method for mask inspection, and mask inspection installation
1512013028647110/31/13 Mirror, projection objective with such mirror, and projection exposure microlithography with such projection objective
1522013025830310/03/13 Method for operating an illumination system of a microlithographic projection exposure apparatus
1532013024872809/26/13 Beam regulating an euv illumination beam
1542013025026109/26/13 Optical system and use
1552013025026409/26/13 Illumination system for illuminating a mask in a microlithographic exposure apparatus
1562013025026509/26/13 Projection exposure euv microlithography and microlithographic exposure
1572013025214609/26/13 Projection exposure tool for microlithography and microlithographic imaging
1582013024227809/19/13 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
1592013024227909/19/13 Catadioptric projection objective
1602013024228209/19/13 Position manipulator for an optical component
1612013022277808/29/13 Illumination microlithography projection system including polarization-modulating optical element
1622013022278008/29/13 Euv microlithography projection exposure apparatus with a heat light source
1632013020146408/08/13 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
1642013019455908/01/13 Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
1652013018643007/25/13 Method for removing a contamination layer from an optical surface and arrangement therefor
1662013018816007/25/13 Optical system of a microlithographic projection exposure apparatus and reducing image placement errors
1672013018816207/25/13 Method for operating a projection exposure tool and control apparatus
1682013018816307/25/13 Mirror and related euv systems and methods
1692013018824607/25/13 Imaging optical system for microlithography
1702013018223407/18/13 Projection exposure system and projection exposure method
1712013018226407/18/13 Projection exposure tool for microlithography and microlithographic exposure
1722013018234407/18/13 Systems for aligning an optical element and same
1732013017654407/11/13 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1742013017654507/11/13 Projection exposure apparatus
1752013017654607/11/13 Illumination optical unit with a movable filter element
1762013017005607/04/13 Substrate for mirrors for euv lithography
1772013015550906/20/13 Lens module comprising at least one exchangeable optical element
1782013014809206/13/13 Illumination system for a microlithographic projection exposure apparatus
1792013014810506/13/13 Method and qualifying optics of a projection exposure tool for microlithography
1802013014820006/13/13 Optical arrangement, in particular projection exposure euv lithography, as well as reflective optical element with reduced contamination
1812013014170706/06/13 Euv exposure apparatus
1822013013576005/30/13 Positioning unit and alignment device for an optical element
1832013012825105/23/13 Imaging optical system
1842013012825205/23/13 Multi facet mirror of a microlithographic projection exposure apparatus
1852013013203705/23/13 Microlithographic projection exposure apparatus
1862013012072305/16/13 Exposure apparatus and measuring device for a projection lens
1872013012072605/16/13 Method of structuring a photosensitive material
1882013012072805/16/13 Catadioptric projection objective with mirror group
1892013012073005/16/13 Facet mirror device
1902013012082005/16/13 Beam control an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1912013012086305/16/13 Substrates for mirrors for euv lithography and their production
1922013011405605/09/13 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1932013011405705/09/13 Optical imaging device with thermal attenuation
1942013011406005/09/13 Illumination system of a microlithographic projection exposure apparatus
1952013010569805/02/13 Apparatus and the locally resolved measurement of a radiation distribution produced using a lithography mask
1962013010723905/02/13 Optical arrangement for euv lithography and configuring such an optical arrangement
1972013009913204/25/13 Optical system for euv lithography with a charged-particle source
1982013010042604/25/13 Method for producing facet mirrors and projection exposure apparatus
1992013010042804/25/13 Mask for euv lithography, euv lithography optimising the imaging of a mask
2002013010042904/25/13 Optical system and multi facet mirror of a microlithographic projection exposure apparatus
2012013010054704/25/13 Optical element module with minimized parasitic loads
2022013009401004/18/13 Lithographic systems and processes of making and using same
2032013008869504/11/13 Device for controlling temperature of an optical element
2042013008869804/11/13 Methods and devices for driving micromirrors
2052013008870104/11/13 Imaging optical system and projection exposure installation for microlithography including same
2062013008330804/04/13 Substrate holder
2072013007707403/28/13 Microlithographic projection exposure apparatus
2082013007707603/28/13 Microlithography illumination optical system and microlithography projection exposure apparatus including same
2092013007707703/28/13 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
2102013007022103/21/13 Microlithographic projection exposure apparatus
2112013007022403/21/13 Projection lens system of a microlithographic projection exposure installation
2122013007022703/21/13 Imaging optical system
2132013006371003/14/13 Catoptric objectives and systems using catoptric objectives
2142013005784403/07/13 Illumination system of a microlithographic projection exposure apparatus
2152013005067102/28/13 Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
2162013005067202/28/13 Apparatus for microlithographic projection exposure and inspecting a surface of a substrate
2172013005067302/28/13 Optical system of a microlithographic projection exposure apparatus
2182013004430302/21/13 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
2192013004430402/21/13 Optical projection system
2202013003884802/14/13 Optical devices having kinematic components
2212013003884902/14/13 Optical component comprising radiation protective layer
2222013003885002/14/13 Illumination system and projection objective of a mask inspection apparatus
2232013003892902/14/13 Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure microlithography comprising such a projection objective
2242013002768101/31/13 Euv collector
2252013002159101/24/13 Illumination system of a microlithographic projection exposure apparatus
2262013002159201/24/13 Arrangement for and characterising the polarisation properties of an optical system
2272013001633101/17/13 Optical system of microlithographic projection exposure apparatus and correcting wavefront deformation in same
2282013001035201/10/13 Projection objective having mirror elements with reflective coatings
2292012032738412/27/12 Mirror elements for euv lithography and production methods therefor
2302012032738512/27/12 Optical system for semiconductor lithography
2312012033060912/27/12 Method of measuring a deviation of an optical surface from a target shape
2322012032034812/20/12 Reflective mask for euv lithography
2332012032035312/20/12 Projection exposure apparatus and optical system
2342012032035812/20/12 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
2352012031428112/13/12 Reflective optical element and production of such an optical element
2362012031491012/13/12 Method and device for determining the position of a first structure relative to a second structure or a part thereof
2372012030018311/29/12 Optical arrangement in a microlithographic projection exposure apparatus
2382012030018411/29/12 Surface correction on coated mirrors
2392012030018511/29/12 Catoptric illumination system for microlithography tool
2402012030019511/29/12 Method and setting an illumination optical unit
2412012029377911/22/12 Reflective optical element and euv lithography appliance
2422012029378411/22/12 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
2432012029378511/22/12 Optical element having a plurality of reflective facet elements
2442012029378611/22/12 Illumination system of a microlithographic projection exposure apparatus
2452012028741411/15/12 Facet mirror for use in microlithography
2462012028119611/08/12 Projection objective of a microlithographic projection exposure apparatus
2472012028119811/08/12 Filter device for the compensation of an asymmetric pupil illumination
2482012027491711/01/12 Imaging optics
2492012027491811/01/12 Catadioptric projection objective



ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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