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Carl Zeiss Smt Gmbh patents


      
Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors



Reflective optical element for the euv wavelength range, method for producing and for correcting such an element,…

Carl Zeiss Smt

Reflective optical element for the euv wavelength range, method for producing and for correcting such an element,…

Lens comprising a plurality of optical element disposed in a housing

Carl Zeiss Smt

Lens comprising a plurality of optical element disposed in a housing

Search recent Press Releases: Carl Zeiss Smt Gmbh-related press releases
Count Application # Date Carl Zeiss Smt Gmbh patents (updated weekly) - BOOKMARK this page
12014031349810/23/14 new patent  Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
22014030730810/16/14Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
32014029325310/02/14Lens comprising a plurality of optical element disposed in a housing
42014028578309/25/14Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
52014026838109/18/14Optical module for a microlithography objective holding and supporting devices
62014025403609/11/14Optical module for an objective
72014024743709/04/14Illumination system of a microlithographic projection exposure apparatus
82014022498508/14/14Focusing a charged particle imaging system
92014022614108/14/14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
102014021725708/07/14Support structure and related assemblies and methods
112014021870908/07/14Field facet mirror for an illumination optics of a projection exposure apparatus for euv microlithography
122014021117807/31/14Method for producing a capping layer composed of silicon oxide on an euv mirror, euv mirror, and euv lithography apparatus
132014021117907/31/14Euv mirror comprising an oxynitride capping layer having a stable composition, euv lithography apparatus, and operating method
142014021118707/31/14Optical module for guiding a radiation beam
152014021118807/31/14Microlithographic projection exposure apparatus
162014019954307/17/14Reflective optical element and optical system for euv lithography
172014019021207/10/14Mirror elements for euv lithography and production methods therefor
182014019234407/10/14Method and apparatus for determining the absorption in a blank
192014019359107/10/14Method for producing a reflective optical element for euv-lithography
202014018502707/03/14Illumination optics and projection exposure apparatus
212014017692106/26/14Optical assembly with suppression of degradation
222014017693006/26/14Microlithographic illumination system
232014016045606/12/14Optical aperture device
242014013294105/15/14Imaging optical system and projection exposure system including the same
252014013294105/15/14Imaging optical system and projection exposure system including the same
262014011871205/01/14Measuring system
272014011871405/01/14Projection optics for microlithography
282014011871205/01/14Measuring system
292014011871405/01/14Projection optics for microlithography
302014010235504/17/14Producing polarization-modulating optical element for microlithography system
312014010458804/17/14Projection objective for microlithography
322014010235504/17/14Producing polarization-modulating optical element for microlithography system
332014010458804/17/14Projection objective for microlithography
342014009835204/10/14Device for controlling temperature of an optical element
352014009835504/10/14Catoptric objectives and systems using catoptric objectives
362014009835204/10/14Device for controlling temperature of an optical element
372014009835504/10/14Catoptric objectives and systems using catoptric objectives
382014009835204/10/14Device for controlling temperature of an optical element
392014009835504/10/14Catoptric objectives and systems using catoptric objectives
402014007848103/20/14Method for correcting the surface form of a mirror
412014007848203/20/14Lithographic projection objective
422014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
432014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
442014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
452014007848103/20/14Method for correcting the surface form of a mirror
462014007848203/20/14Lithographic projection objective
472014007848403/20/14Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
482014007851303/20/14Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
492014007856703/20/14Correction of optical elements by correction light irradiated in a flat manner
502014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
512014007141403/13/14Microlithography projection system with an accessible diaphragm or aperture stop
522014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
532014006479103/06/14Optical element unit
542014006362803/06/14Device for the low-deformation replaceable mounting of an optical element
552014006479103/06/14Optical element unit
562014004359602/13/14Arrangement for actuating an element in a microlithographic projection exposure apparatus
572014003624602/06/14Imaging optical system and projection exposure system for microlithography
582014002252401/23/14Device and method for the optical measurement of an optical system by using an immersion fluid
592014002252501/23/14Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
602014002383501/23/14Optical device
612014001610801/16/14Optical imaging device with image defect determination
622013034282112/26/13Imaging optical system
632013033442612/19/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
642013033555212/19/13Method for mask inspection, and mask inspection installation
652013028647110/31/13Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
662013025830310/03/13Method for operating an illumination system of a microlithographic projection exposure apparatus
672013024872809/26/13Beam regulating apparatus for an euv illumination beam
682013025026109/26/13Optical system and method of use
692013025026409/26/13Illumination system for illuminating a mask in a microlithographic exposure apparatus
702013025026509/26/13Projection exposure apparatus for euv microlithography and method for microlithographic exposure
712013025214609/26/13Projection exposure tool for microlithography and method for microlithographic imaging
722013024227809/19/13Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
732013024227909/19/13Catadioptric projection objective
742013024228209/19/13Position manipulator for an optical component
752013022277808/29/13Illumination apparatus for microlithography projection system including polarization-modulating optical element
762013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
772013022277808/29/13Illumination apparatus for microlithography projection system including polarization-modulating optical element
782013022278008/29/13Euv microlithography projection exposure apparatus with a heat light source
792013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
802013020146408/08/13Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
812013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
822013019455908/01/13Method for setting an illumination geometry for an illumination optical unit for euv projection lithography
832013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
842013018816007/25/13Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
852013018816207/25/13Method for operating a projection exposure tool and control apparatus
862013018816307/25/13Mirror and related euv systems and methods
872013018824607/25/13Imaging optical system for microlithography
882013018643007/25/13Method for removing a contamination layer from an optical surface and arrangement therefor
892013018816007/25/13Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
902013018816207/25/13Method for operating a projection exposure tool and control apparatus
912013018816307/25/13Mirror and related euv systems and methods
922013018824607/25/13Imaging optical system for microlithography
932013018223407/18/13Projection exposure system and projection exposure method
942013018226407/18/13Projection exposure tool for microlithography and method for microlithographic exposure
952013018234407/18/13Systems for aligning an optical element and method for same
962013018223407/18/13Projection exposure system and projection exposure method
972013018226407/18/13Projection exposure tool for microlithography and method for microlithographic exposure
982013018234407/18/13Systems for aligning an optical element and method for same
992013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1002013017654507/11/13Projection exposure apparatus
1012013017654607/11/13Illumination optical unit with a movable filter element
1022013017654407/11/13Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
1032013017654507/11/13Projection exposure apparatus
1042013017654607/11/13Illumination optical unit with a movable filter element
1052013017005607/04/13Substrate for mirrors for euv lithography
1062013017005607/04/13Substrate for mirrors for euv lithography
1072013015550906/20/13Lens module comprising at least one exchangeable optical element
1082013015550906/20/13Lens module comprising at least one exchangeable optical element
1092013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1102013014810506/13/13Method and apparatus for qualifying optics of a projection exposure tool for microlithography
1112013014820006/13/13Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination
1122013014809206/13/13Illumination system for a microlithographic projection exposure apparatus
1132013014810506/13/13Method and apparatus for qualifying optics of a projection exposure tool for microlithography
1142013014820006/13/13Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination
1152013014170706/06/13Euv exposure apparatus
1162013014170706/06/13Euv exposure apparatus
1172013013576005/30/13Positioning unit and alignment device for an optical element
1182013013576005/30/13Positioning unit and alignment device for an optical element
1192013012825105/23/13Imaging optical system
1202013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1212013013203705/23/13Microlithographic projection exposure apparatus
1222013012825105/23/13Imaging optical system
1232013012825205/23/13Multi facet mirror of a microlithographic projection exposure apparatus
1242013013203705/23/13Microlithographic projection exposure apparatus
1252013012072305/16/13Exposure apparatus and measuring device for a projection lens
1262013012072605/16/13Method of structuring a photosensitive material
1272013012072805/16/13Catadioptric projection objective with mirror group
1282013012073005/16/13Facet mirror device
1292013012082005/16/13Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1302013012086305/16/13Substrates for mirrors for euv lithography and their production
1312013012072305/16/13Exposure apparatus and measuring device for a projection lens
1322013012072605/16/13Method of structuring a photosensitive material
1332013012072805/16/13Catadioptric projection objective with mirror group
1342013012073005/16/13Facet mirror device
1352013012082005/16/13Beam control apparatus for an illumination beam and metrology system comprising an optical system containing such a beam control apparatus
1362013012086305/16/13Substrates for mirrors for euv lithography and their production
1372013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1382013011405705/09/13Optical imaging device with thermal attenuation
1392013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1402013011405605/09/13Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
1412013011405705/09/13Optical imaging device with thermal attenuation
1422013011406005/09/13Illumination system of a microlithographic projection exposure apparatus
1432013010569805/02/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
1442013010723905/02/13Optical arrangement for euv lithography and method for configuring such an optical arrangement
1452013010569805/02/13Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
1462013010723905/02/13Optical arrangement for euv lithography and method for configuring such an optical arrangement
1472013009913204/25/13Optical system for euv lithography with a charged-particle source
1482013010042604/25/13Method for producing facet mirrors and projection exposure apparatus
1492013010042804/25/13Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask
1502013010042904/25/13Optical system and multi facet mirror of a microlithographic projection exposure apparatus
1512013010054704/25/13Optical element module with minimized parasitic loads
1522013009401004/18/13Lithographic systems and processes of making and using same
1532013008869504/11/13Device for controlling temperature of an optical element
1542013008869804/11/13Methods and devices for driving micromirrors
1552013008870104/11/13Imaging optical system and projection exposure installation for microlithography including same
1562013008330804/04/13Substrate holder
1572013007707403/28/13Microlithographic projection exposure apparatus
1582013007707603/28/13Microlithography illumination optical system and microlithography projection exposure apparatus including same
1592013007707703/28/13Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
1602013007022103/21/13Microlithographic projection exposure apparatus
1612013007022403/21/13Projection lens system of a microlithographic projection exposure installation
1622013007022703/21/13Imaging optical system
1632013006371003/14/13Catoptric objectives and systems using catoptric objectives
1642013005784403/07/13Illumination system of a microlithographic projection exposure apparatus
1652013005067102/28/13Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods
1662013005067202/28/13Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
1672013005067302/28/13Optical system of a microlithographic projection exposure apparatus
1682013004430302/21/13Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
1692013004430402/21/13Optical projection system
1702013003884802/14/13Optical devices having kinematic components
1712013003884902/14/13Optical component comprising radiation protective layer
1722013003885002/14/13Illumination system and projection objective of a mask inspection apparatus
1732013003892902/14/13Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
1742013002768101/31/13Euv collector
1752013002159101/24/13Illumination system of a microlithographic projection exposure apparatus
1762013002159201/24/13Arrangement for and method of characterising the polarisation properties of an optical system
1772013001633101/17/13Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
1782013001035201/10/13Projection objective having mirror elements with reflective coatings
1792012032738412/27/12Mirror elements for euv lithography and production methods therefor
1802012032738512/27/12Optical system for semiconductor lithography
1812012033060912/27/12Method of measuring a deviation of an optical surface from a target shape
1822012032034812/20/12Reflective mask for euv lithography
1832012032035312/20/12Projection exposure apparatus and optical system
1842012032035812/20/12Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
1852012031428112/13/12Reflective optical element and method for production of such an optical element
1862012031491012/13/12Method and device for determining the position of a first structure relative to a second structure or a part thereof
1872012030018311/29/12Optical arrangement in a microlithographic projection exposure apparatus
1882012030018411/29/12Surface correction on coated mirrors
1892012030018511/29/12Catoptric illumination system for microlithography tool
1902012030019511/29/12Method and apparatus for setting an illumination optical unit
1912012029377911/22/12Reflective optical element and euv lithography appliance
1922012029378411/22/12Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
1932012029378511/22/12Optical element having a plurality of reflective facet elements
1942012029378611/22/12Illumination system of a microlithographic projection exposure apparatus
1952012028741411/15/12Facet mirror for use in microlithography
1962012028119611/08/12Projection objective of a microlithographic projection exposure apparatus
1972012028119811/08/12Filter device for the compensation of an asymmetric pupil illumination
1982012027491711/01/12Imaging optics
1992012027491811/01/12Catadioptric projection objective
2002012027491911/01/12Catadioptric projection objective
2012012024998510/04/12Measurement of an imaging optical system by superposition of patterns
2022012024998810/04/12Optical beam deflecting element, illumination system including same, and related method
2032012025014410/04/12Reflective optical element and method for operating an euv lithography apparatus
2042012024126809/27/12Arrangement for the vibration isolation of a pay load
2052012024296809/27/12Method for adjusting an illumination system of a projection exposure apparatus for projection lithography
2062012024299609/27/12Optical scattering disk, use thereof, and wavefront measuring apparatus
2072012023627209/20/12Combination stop for catoptric projection arrangement
2082012023627709/20/12Catadioptric projection objective comprising deflection mirrors and projection exposure method
2092012023628209/20/12Imaging optical system
2102012023631609/20/12Method and apparatus for determining a shape of an optical test surface
2112012022978409/13/12Mirror for use in a microlithography projection exposure apparatus
2122012022981409/13/12Method of measuring a shape of an optical surface and interferometric measuring device
2132012022415309/06/12Optical arrangement, in particular in a projection exposure apparatus for euv lithography
2142012022416009/06/12Reflective optical imaging system
2152012022418609/06/12Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
2162012021853608/30/12Catadioptric projection objective including a reflective optical component and a measuring device
2172012021864308/30/12Lens blank and lens elements as well as method for their production
2182012021272008/23/12Device for guiding electromagnetic radiation into a projection exposure apparatus
2192012021272108/23/12Substrates and mirrors for euv microlithography, and methods for producing them
2202012021281008/23/12Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
2212012020670408/16/12Illumination optical unit for projection lithography
2222012020811508/16/12Imaging optics
2232012020091308/09/12Reflective optical element and method of producing it
2242012019479308/02/12Optical apparatus for use in photolithography
2252012019479508/02/12Optical element
2262012018852307/26/12Optical arrangement in a projection exposure apparatus for euv lithography
2272012018852407/26/12Projection exposure apparatus with optimized adjustment possibility
2282012018852507/26/12Catoptric objectives and systems using catoptric objectives
2292012018852707/26/12Illumination system of a microlithographic projection exposure apparatus
2302012018863607/26/12Method for correcting a lithography projection objective, and such a projection objective
2312012018253307/19/12Optical arrangement and microlithographic projection exposure apparatus including same
2322012018260607/19/12Micromirror arrangement having a coating and method for the production thereof
2332012017659107/12/12Method and device for the correction of imaging defects
2342012017667007/12/12Imaging microoptics for measuring the position of an aerial image
2352012016262506/28/12Catadioptric projection objective with intermediate images
2362012016262606/28/12Shutter device for a lithography apparatus and lithography apparatus
2372012016262706/28/12Illumination optical unit for microlithography
2382012016406106/28/12Production of radiation-resistant fluoride crystals, in particular calcium fluoride crystals
2392012015477206/21/12Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
2402012014734406/14/12Actuators and microlithography projection exposure systems and methods using the same
2412012014734706/14/12Imaging optical system and illumination optical system
2422012013840106/07/12Damping device
2432012014024106/07/12Optical system, in particular in a microlithographic projection exposure apparatus
2442012014032806/07/12Optical element with low surface figure deformation
2452012014035106/07/12Magnifying imaging optical unit and metrology system including same
2462012014045406/07/12Magnifying imaging optical unit and metrology system including same
2472012013401505/31/12Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objective
2482012013401605/31/12Method of manufacturing a projection objective and projection objective
2492012012744005/24/12Optical assembly for projection lithography


ARCHIVE: New 2014 2013 2012 2011 2010 2009



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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Carl Zeiss Smt Gmbh in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Carl Zeiss Smt Gmbh with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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