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D2s Inc patents

Recent patent applications related to D2s Inc. D2s Inc is listed as an Agent/Assignee. Note: D2s Inc may have other listings under different names/spellings. We're not affiliated with D2s Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "D" | D2s Inc-related inventors




Date D2s Inc patents (updated weekly) - BOOKMARK this page
11/09/17Method and system for forming a pattern on a reticle using charged particle beam lithography
07/27/17Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
05/04/17Method and system for forming patterns using shaped beam lithography including temperature effects
01/26/17Method and system for forming patterns with charged particle beam lithography
11/17/16Method and system for forming patterns using charged particle beam lithography
10/13/16Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
09/08/16Method and system for forming a pattern on a reticle using charged particle beam lithography
09/08/16Method and system for dimensional uniformity using charged particle beam lithography
07/07/16Method and system for design of enhanced edge slope patterns for charged particle beam lithography
06/16/16Lithography mask functional optimization and spatial frequency analysis
04/14/16Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
11/26/15Method and system for design of enhanced edge slope patterns for charged particle beam lithography
11/19/15Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
09/17/15Method and system for forming patterns with charged particle beam lithography
09/10/15Method and system for forming a pattern on a surface using multi-beam charged particle lithography
04/16/15Method and system for forming non-manhattan patterns using variable shaped beam lithography
04/16/15Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
03/19/15Method for forming circular patterns on a surface
01/15/15Method and system for design of a reticle to be manufactured using variable shaped beam lithography
12/04/14Method and system for forming high accuracy patterns using charged particle beam lithography
09/18/14Method and system for forming a diagonal pattern using charged particle beam lithography
09/18/14Method and system for forming a diagonal pattern using charged particle beam lithography
08/28/14Integrated circuit designed and manufactured using diagonal minimum-width patterns
08/14/14Method and system for forming patterns with charged particle beam lithography
08/07/14Method and system for forming high accuracy patterns using charged particle beam lithography
06/12/14Method and system for forming a pattern on a reticle using charged particle beam lithography
06/12/14Method and system for forming a pattern on a reticle using charged particle beam lithography
05/15/14Method for forming circular patterns on a surface
05/08/14Method and system for improving critical dimension uniformity using shaped beam lithography
05/08/14Method and system for dimensional uniformity using charged particle beam lithography
05/08/14Method and system for dimensional uniformity using charged particle beam lithography
01/09/14Method and system for stencil design for particle beam writing
12/19/13Method and system for design of a reticle to be manufactured using variable shaped beam lithography
11/28/13Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
11/21/13Method and system for forming non-manhattan patterns using variable shaped beam lithography
11/21/13Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
11/21/13Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
11/21/13Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
10/24/13Method and system for critical dimension uniformity using charged particle beam lithography
10/24/13Method and system for forming patterns using charged particle beam lithography
10/24/13Method and system for forming patterns using charged particle beam lithography
10/24/13Method and system for forming patterns using charged particle beam lithography
09/26/13Method and system for design of enhanced accuracy patterns for charged particle beam lithography
08/08/13Method and system for forming high precision patterns using charged particle beam lithography
05/16/13Method for forming circular patterns on a surface
05/16/13Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
04/25/13Method for design and manufacture of patterns with variable shaped beam lithography
03/21/13Method and system for optimization of an image on a substrate to be manufactured using optical lithography
02/07/13Method and system for design of a reticle to be manufactured using variable shaped beam lithography
01/24/13Method and system for manufacturing a surface using shaped charged particle beam lithography
01/03/13Method and system for stencil design for particle beam writing
12/27/12Method and system for forming patterns with charged particle beam lithography
11/08/12Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
11/01/12Method and system for forming non-manhattan patterns using variable shaped beam lithography
08/30/12Method and system for forming patterns using charged particle beam lithography with overlapping shots
08/30/12Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
08/30/12Method and system for design of enhanced accuracy patterns for charged particle beam lithography
08/30/12Method and system for design of enhanced edge slope patterns for charged particle beam lithography
08/30/12Method and system for design of a surface to be manufactured using charged particle beam lithography
05/24/12Method for matching of patterns
04/19/12Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns
04/19/12Method and system for forming high accuracy patterns using charged particle beam lithography
04/05/12Method and system for design of a reticle to be manufactured using variable shaped beam lithography
03/15/12Method for design and manufacture of diagonal patterns with variable shaped beam lithography
02/16/12Method, device, and system for forming circular patterns on a surface
Patent Packs
02/09/12Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
02/02/12Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
11/17/11Method for integrated circuit design and manufacture using diagonal minimum-width patterns
10/27/11Method and system for stencil design for particle beam writing
10/13/11Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
08/04/11Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
08/04/11Method and system for design of a reticle to be manufactured using variable shaped beam lithography
06/30/11Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
06/30/11Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
06/30/11Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
05/05/11Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
04/21/11Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
04/21/11Method and system for manufacturing a surface using charged particle beam lithography
03/03/11Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
03/03/11Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur
Patent Packs
02/24/11Method and system for manufacturing a surface using character projection lithography with variable magnification
09/09/10Method and system for stencil design for particle beam writing
07/22/10Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
03/11/10Stencil, stencil design cell projection particle beam lithography
03/04/10Method and system for manufacturing a reticle using character projection particle beam lithography
03/04/10Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
03/04/10Method for fracturing circular patterns and for manufacturing a semiconductor device
03/04/10Method for design and manufacture of a reticle using variable shaped beam lithography
03/04/10Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
03/04/10Method and system for forming circular patterns on a surface
03/04/10Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
03/04/10Method and system for manufacturing a reticle using character projection lithography
03/04/10Method and system for design of a reticle to be manufactured using variable shaped beam lithography
03/04/10Method for optical proximity correction of a reticle to be manufactured using character projection lithography
03/04/10Method and system for design of a reticle to be manufactured using character projection lithography
12/31/09Stencil design and improving character density for cell projection charged particle beam lithography







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