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Fei Company
Fei Company_20131212

Fei Company patents

Recent patent applications related to Fei Company. Fei Company is listed as an Agent/Assignee. Note: Fei Company may have other listings under different names/spellings. We're not affiliated with Fei Company, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "F" | Fei Company-related inventors

Probe landing detection

Probe landing is detected by detecting a change in a vibration of the probe in a plane substantially parallel to the work piece surface as the probe is lowered toward the work piece. The vibration may be observed, for example, by acquiring multiple electron microscope images of the probe as... Fei Company

Charged-particle microscope with exchangeable pole piece extending element

A charged-particle microscope having a vacuum chamber comprises a specimen holder, a particle-optical column, a detector and an exchangeable column extending element. The specimen holder is for holding a specimen. The particle-optical column is for producing and directing a beam of charged particles along an axis so as to irradiate... Fei Company

Magnet used with a plasma cleaner

A plasma generator is located outside the vacuum chamber and generates neutral reactive particles and charged particles. A magnet positioned outside the plasma generator deflects the charged particles, preventing some or all of them from entering the vacuum chamber, thereby preventing secondary plasma sources from forming in the vacuum chamber,... Fei Company

Electron microscope with multipe types of integrated x-ray detectors arranged in an array

An electron microscope including a vacuum chamber for containing a specimen to be analyzed, an optics column, including an electron source and a final probe forming lens, for focusing electrons emitted from the electron source, a specimen stage positioned in the vacuum chamber under the probe forming lens for holding... Fei Company

Method of imaging a specimen using ptychography

A method of imaging a specimen using ptychography includes directing a charged-particle beam from a source through an illuminator so as to traverse the specimen and land upon a detector, detecting a flux of radiation emanating from the specimen with the detector, calculating at least one property of a charged-particle... Fei Company

Methods and semiconductor sample workflow

Apparatus and methods are described for the automated transfer and storage of transmission electron microscope (TEM) and scanning/transmission electron microscope (STEM) lamella samples throughout a semiconductor manufacturing facility using existing automation infrastructure such as a Front Opening Unified Pod (FOUP). Also provided are wafer facsimiles corresponding to outer dimensions of... Fei Company

Charged-particle microscope with in situ deposition functionality

Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.... Fei Company

Attachment of nano-objects to beam-deposited structures

Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle... Fei Company

System for orienting a sample using a diffraction pattern

A method and apparatus are provided for aligning a sample in a charged particle beam system. The charged particle beam is directed toward the sample to obtain a sample diffraction pattern. The sample diffraction pattern is compared with reference diffraction patterns having known misalignments to determine which reference pattern most... Fei Company

Three-dimensional imaging in charged-particle microscopy

(h) Selecting subsequent energy values in the series {Ei} so as to maintain a substantially constant depth increment Δd between consecutive members of the series {di}, within the bounds of selected minimum and maximum landing energies Emin and Emax, respectively.... Fei Company

Automated tem sample preparation

Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment... Fei Company

High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella

A method for TEM sample preparation and analysis that can be used in a FIB-SEM system without re-welds, unloads, user handling of the lamella, or a motorized flip stage. The method allows a dual beam FIB-SEM system with a typical tilt stage to be used to extract a sample to... Fei Company

Studying dynamic specimen behavior in a charged-particle microscope

Irradiating said specimen with said train of pulses, and using said detector to perform positionally resolved (temporally discriminated) detection of the attendant emergent radiation.... Fei Company

Correction of beam hardening artifacts in microtomography for samples imaged in containers

Provided are improved referenceless multi-material beam hardening correction methods, with an emphasis on maintaining data quality for real-world imaging of geologic materials with a view towards automation. A referenceless post reconstruction (RPC) correction technique is provided that applies the corrections in integrated attenuation space. A container-only pre-correction technique also is... Fei Company

Charged-particle microscope with astigmatism compensation and energy-selection

A beam selector, comprising a slit that is rotationally oriented so as to match a direction of the slit to said line focus direction, thereby producing an output beam comprising an energy-discriminated portion of said intermediate beam.... Fei Company

Holder assembly for cooperating with a nanoreactor and an electron microscope

Presented is a holder assembly for cooperating with a nanoreactor and an electron microscope. The holder assembly has a distal end for holding the nanoreactor. The volume has a fluid inlet and outlet. The holder assembly has fluid supply and outlet tubes which in working are connected to the fluid... Fei Company

Charged particle beam-induced etching

A micromachining process includes exposing the work piece surface to a precursor gas including a compound having an acid halide functional group; and irradiating the work piece surface with a beam in the presence of the precursor gas, the precursor gas reacting in the presence of the particle beam to... Fei Company

Preparation of cryogenic sample for charged-particle microscopy

Pumping cryogenic fluid through said conduits so as to concurrently flush from said mouthpieces, thereby suddenly immersing the sample in cryogenic fluid from two opposite sides.... Fei Company

Method and device for testing samples by means of an electron or ion beam microscope

The disclosed subject matter relates to testing a sample by means of a particle beam microscope in which the sample is scanned in a point-wise manner by a focused beam of charged particles thereby generating imaging signals. The particle beam dose applied per scanning point is changed during scanning.... Fei Company

Novel x-ray imaging technique

Mathematically deconvolving said composite image.... Fei Company

Waveform mapping and gated laser voltage imaging

Systems, methods, and computer readable media to improve integrated circuit (IC) debug operations are described. In general, techniques are disclosed for acquiring/recording waveforms across an under-test IC during a single sweep of a laser scanning microscope (LSM). More particularly, techniques disclosed herein permit the acquisition of an integrated circuit's response... Fei Company

Systems and methods for imaging device interfaces

Systems and methods for controlling an imaging device are disclosed. In one aspect, a method determines a set of control parameters for the imaging device, and acquires an image based on the set of control parameters. The method determines a plurality of image quality measurements of the first image. A... Fei Company

Method of material deposition

A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.... Fei Company

Method for detecting particulate radiation

When detecting particulate radiation, such as electrons, with a pixelated detector, a cloud of electron/hole pairs is formed in the detector. Using the signal caused by this cloud of electron/hole pairs a position of the impact is estimated. When the size of the cloud is comparable to the pixel size,... Fei Company

Method for optimizing charged particle beams formed by shaped apertures

The present invention provides a method for optimizing a shaped working beam having a sharp edge for making sufficiently precise cuts and a high beam current for faster processing. An ion beam is directed along an optical column through a reference aperture to form a reference beam that has a... Fei Company

Charged particle microscope with vibration detection / correction

Invoking said controller to use said signal to produce a vibration profile for the microscope.... Fei Company

Post column filter with enhanced energy range

The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled... Fei Company

Standing wave interferometric microscope

The detector arrangement comprises exactly two interferometric detection branches.... Fei Company

In-situ packaging decapsulation feature for electrical fault localization

An IR camera is used to image an IC to identify hot spots. The objective of the IR camera is removed and laser optics are inserted into the optical axis of the system. A laser is then used to ablate the encapsulation in a defined area around the optical axis.... Fei Company

Investigation of high-temperature specimens in a charged particle microscope

Selectively suppress a second category of photons, comprising thermal radiation from the heated specimen.... Fei Company

Nanofabrication using a new class of electron beam induced surface processing techniques

Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the... Fei Company

Novel data processing in a tomographic imaging apparatus

(iv) Repeating steps (i)-(iii) until said calculated images satisfy an acceptance criterion.... Fei Company

Positional error correction in a tomographic imaging apparatus

A method for investigating a specimen using a tomographic imaging apparatus, comprising acquiring a set of input images of the specimen taken at a corresponding set of source positions that are intended to lie on an ideal locus but are instead caused by positioning errors to lie on a distorted... Fei Company

Cad-assisted tem prep recipe creation

An improved process workflow and apparatus for S/TEM sample preparation and analysis is provided. Preferred embodiments provide improved methods for an automated recipe TEM sample creation, especially for small geometry TEM lamellae, employing CAD data to automatically align various stages of sample preparation. The process automatically verifies and aligns the... Fei Company

Optimized wavelength photon emission microscope for vlsi devices

A method for emission testing of a semiconductor device (DUT), by mounting the DUT onto an test bench of an emission tester, the emission tester having an optical detector; electrically connecting the DUT to an electrical tester; applying electrical test signals to the DUT while keeping test parameters constant; inserting... Fei Company

02/23/17 / #20170052264

Novel acquisition and processing of data in a tomographic imaging apparatus

A method of investigating a specimen using a tomographic imaging apparatus using a stage for producing relative motion of a source with respect to a specimen, so as to allow the source and a detector to image the specimen along a series of different viewing axes and a processing apparatus... Fei Company

02/02/17 / #20170032928

Micro-chamber for inspecting sample material

A micro-chamber for inspecting a sample material immersed in a liquid and a method for filling such a chamber are described. The sample chamber includes an inspection volume for holding the sample material, the inspection volume defined by first and second rigid layers, with a hermetic seal between the layers.... Fei Company

01/26/17 / #20170024908

Method of ptychographic imaging

A method and apparatus for ptychographic imaging is described. Typically a high number of pixels (after binning) is needed to obtain a high quality reconstruction of an object. By using calculation planes with more nodes (for example 512×512 nodes) than the number of pixels of the detector, a high quality... Fei Company

01/26/17 / #20170025246

Fiducial formation for tem/stem tomography tilt-series acquisition and alignment

Provided are methods to improve tomography by creating fiducial holes using charged particle beams, and using the fiducial holes to improve the sample positioning, acquisition, alignment, reconstruction, and visualization of tomography data sets. Some versions create fiducial holes with an ion beam during the process of milling the sample. Other... Fei Company

01/05/17 / #20170002455

Adaptive beam current for high throughput patterning

A method for planning a beam path for material deposition is provided in which a structure pattern having features of varying size is analyzed to determine the size of each feature. A beam path throughout the structure pattern is determined and the beam current required for each point in the... Fei Company

01/05/17 / #20170002467

Adaptive control for charged particle beam processing

An improved process control for a charged beam system is provided that allows the capability of accurately producing complex two and three dimensional structures from a computer generated model in a material deposition process. The process control actively monitors the material deposition process and makes corrective adjustments as necessary to... Fei Company

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Fei Company in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Fei Company with additional patents listed. Browse our Agent directory for other possible listings. Page by