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Fujifilm Electronic Materials U s a Inc patents


Recent patent applications related to Fujifilm Electronic Materials U s a Inc. Fujifilm Electronic Materials U s a Inc is listed as an Agent/Assignee. Note: Fujifilm Electronic Materials U s a Inc may have other listings under different names/spellings. We're not affiliated with Fujifilm Electronic Materials U s a Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "F" | Fujifilm Electronic Materials U s a Inc-related inventors


Stripping compositions for removing photoresists from semiconductor substrates

This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one compound comprising at least three hydroxyl groups; 4) at least one carboxylic acid; 5) at least one Group II metal cation; 6) at... Fujifilm Electronic Materials U s a Inc

Novel polymer and thermosetting composition containing same

This disclosure relates to a polymer that includes a first repeat unit and at least one end-cap group at one end of the polymer. The first repeat unit includes at least one imide moiety and at least one indane-containing moiety. The end-cap group is capable of undergoing a cycloreversion reaction.... Fujifilm Electronic Materials U s a Inc

Dry film structure

This disclosure relates to a dry film structure that includes a carrier substrate, a protective layer, and a polymeric layer between the carrier substrate and the protective layer. The polymeric layer includes at least one protected polybenzoxazole precursor polymer.... Fujifilm Electronic Materials U s a Inc

Process for the production of polyimide and polyamic ester polymers

This disclosure relates to a process of purifying a polymer. The process includes (a) providing an organic solution containing a polyimide or polyamic ester in at least one polar, aprotic polymerization solvent; (b) adding at least one purification solvent to the organic solution to form a diluted organic solution, the... Fujifilm Electronic Materials U s a Inc

Cleaning formulation for removing residues on surfaces

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least... Fujifilm Electronic Materials U s a Inc








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