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Hemlock Semiconductor Corporation patents


Recent patent applications related to Hemlock Semiconductor Corporation. Hemlock Semiconductor Corporation is listed as an Agent/Assignee. Note: Hemlock Semiconductor Corporation may have other listings under different names/spellings. We're not affiliated with Hemlock Semiconductor Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "H" | Hemlock Semiconductor Corporation-related inventors


Method of determining a concentration of a material not dissolved by silicon etchants contaminating a product

A method of determining a concentration of plastic or other material not dissolved by silicon etchants contaminating a silicon product comprising: obtaining a sample of the silicon product contaminated with the plastic or other material not dissolved by silicon etchants; placing the sample of the silicon product into a ultrasonic... Hemlock Semiconductor Corporation

Low impurity detection characterizing metals within a surface and sub-surface of polycrystalline silicon

A method of quantifying metal impurities on a silicon product, includes obtaining a sample of the silicon product; etching or chemically treating a surface of silicon product to retrieve a predetermined amount of silicon product mass; and testing and measuring the etched portion for the presence of metal impurities using... Hemlock Semiconductor Corporation

Surface conditioning of conveyor materials or contact surfaces

A method of reducing contamination in a silicon product includes: moving silicon pieces along a conveyance system, wherein the conveyance system comprises a liner having a polished surface finish with a surface roughness of less than or equal to 12 microinches; and moving the silicon pieces across the conveyance system,... Hemlock Semiconductor Corporation

Dichlorosilane compensating control strategy for improved polycrystalline silicon growth

A method of improving polycrystalline silicon growth in a reactor, including: introducing a chlorosilane feed composition comprising trichlorosilane and dichlorosilane into a deposition chamber, wherein the deposition chamber contains a substrate; blending the chlorosilane feed composition with hydrogen gas to form a feed composition; adjusting a baseline flow of chlorosilane... Hemlock Semiconductor Corporation








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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Hemlock Semiconductor Corporation in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Hemlock Semiconductor Corporation with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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