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Hermes Microvision Inc
Hermes Microvision Inc taiwan
  

Hermes Microvision Inc patents

Recent patent applications related to Hermes Microvision Inc. Hermes Microvision Inc is listed as an Agent/Assignee. Note: Hermes Microvision Inc may have other listings under different names/spellings. We're not affiliated with Hermes Microvision Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "H" | Hermes Microvision Inc-related inventors




Date Hermes Microvision Inc patents (updated weekly) - BOOKMARK this page
06/22/17 new patent  Test device for defect inspection
06/01/17Apparatus of plural charged-particle beams
05/04/17Charged particle source
05/04/17Charged particle source
05/04/17Charged particle source
05/04/17Apparatus of plural charged-particle beams
05/04/17Apparatus of plural charged-particle beams
02/23/17Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
02/23/17Method and system for inspecting an euv mask
01/26/17Apparatus of plural charged-particle beams
01/26/17Apparatus of plural charged-particle beams
11/24/16System and calibrating charge-regulating module
11/17/16Apparatus of plural charged-particle beams
10/27/16Ebeam inspection method
09/29/16Apparatus of plural charged-particle beams
09/15/16Apparatus of plural charged-particle beams
09/08/16Laser sde effect compensation by adaptive tuning
08/25/16Local alignment point calibration method in die inspection
06/16/16Swing objective lens
06/09/16Charged particle source
06/09/16Method and compound system for inspecting and reviewing defects
02/04/16Energy filter for charged particle beam apparatus
12/24/15Charged particle beam apparatus
11/12/15Method and system for inspecting an euv mask
10/22/15Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
09/03/15Energy-discrimination detection device
06/04/15Charged particle beam apparatus
05/28/15Charged particle beam apparatus
04/16/15Method and system for inspecting an euv mask
04/02/15Metal seal for ultra high vacuum system
03/26/15Charged particle beam apparatus
03/05/15System and controlling charge-up in an electron beam apparatus
03/05/15System and controlling charge-up in an electron beam apparatus
02/19/15Electrostatic chuck
09/25/14Energy filter for charged particle beam apparatus
01/30/14Structure for discharging extreme ultraviolet mask
12/19/13High efficiency scintillator detector for charged particle detection
10/03/13Metal seal for ultra high vacuum system
09/26/13Multi-axis magnetic lens for focusing a plurality of charged particle beams
08/08/13Method and system for measuring critical dimension and monitoring fabrication uniformity
07/25/13Method and system for measuring critical dimension and monitoring fabrication uniformity
07/18/13Method and system for measuring critical dimension and monitoring fabrication uniformity
06/20/13Multi-axis magnetic lens for focusing a plurality of charged particle beams
12/20/12Monochromator for charged particle beam apparatus
12/13/12Method and machine for examining wafers
11/08/12Charged particle system for reticle / wafer defects inspection and review
09/13/12Method for inspecting euv reticle and apparatus thereof
08/23/12Method and system for measuring critical dimension and monitoring fabrication uniformity
06/14/12Particle detection system
06/14/12Apparatus of plural charged particle beams with multi-axis magnetic lens
06/14/12Apparatus of plural charged particle beams with multi-axis magnetic lens
04/26/12Filament for electron source
04/26/12Method for forming memory cell transistor
03/29/12Structure and determining a defect in integrated circuit manufacturing process
03/22/12Method for inspecting overlay shift defect during semiconductor manufacturing and apparatus thereof
03/01/12Charged particle apparatus
02/09/12Method for inspecting euv reticle and apparatus thereof
12/01/11Movable detector for charged particle beam inspection or review
10/27/11Dynamic focus adjustment with optical height detection apparatus in electron beam system
10/27/11Particle detection system
09/08/11Charged particle beam detection unit with multi type detection subunits
06/16/11Multi-axis magnetic lens
05/05/11Z-stage configuration and application thereof
03/03/11Method for forming memory cell transistor
03/03/11Wafer grounding and biasing method, apparatus, and application
Patent Packs
03/03/11Substrate inspection method
02/17/11Charged particle beam inspection method
12/23/10Method for characterizing identified defects during charged particle beam inspection and application thereof
12/16/10Method and identifying plug-to-plug short from a charged particle microscopic image
10/28/10Method for venting gas into closed space and gas supply assembly thereof
09/30/10Method and system for determining a defect during charged particle beam inspection of a sample
08/19/10Method and machine for examining wafers
07/01/10Apparatus for detecting a sample
06/24/10Method and system for heating substrate in vacuum environment and identifying defects on substrate
04/29/10Patterning device holding apparatus and application thereof
04/01/10Structure and determining a defect in integrated circuit manufacturing process
12/03/09Electron beam apparatus
03/26/09Method and system for the visual classification of defects
04/30/09System and method to determine focus parameters during an electron beam inspection







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