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Hitachi High technologies Corporation
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Hitachi High technologies Corporation patents


Recent patent applications related to Hitachi High technologies Corporation. Hitachi High technologies Corporation is listed as an Agent/Assignee. Note: Hitachi High technologies Corporation may have other listings under different names/spellings. We're not affiliated with Hitachi High technologies Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "H" | Hitachi High technologies Corporation-related inventors


Sample handling system

A sample processing system is configured for analyzing, preprocessing, or carrying out other operations for a biological sample such as blood or urea. With the sample processing system, it is possible to store samples to be stored in a thermally insulated state or specimens required for accuracy control in the... Hitachi High technologies Corporation

Inspection device

Proposed is an inspection device that is provided with: an illuminating optical unit that irradiates a discretionary region of a sample with light; a control unit that gives instructions to the illuminating optical unit; and at least one detection unit that detects light transmitted from the sample. The illuminating optical... Hitachi High technologies Corporation

Defect detection device and defect observation device

Provided is a defect detection device including an illumination unit including a condenser lens and a plurality of light beam synthesis units, and a detection unit detecting scattered light generated on a sample by the illumination unit. The condenser lens condenses a plurality of light beams, emitted onto the sample... Hitachi High technologies Corporation

Operation plasma processing apparatus

A vacuum processing apparatus includes a processing chamber inside a vacuum vessel, a plasma forming chamber above, a dielectric plate member having multiple through-holes for introducing particles of plasma to the processing chamber between the processing chamber and the plasma forming chamber above a sample stage upper surface in the... Hitachi High technologies Corporation

Sensitivity measuring device and inspection device

This sensitivity measuring device is provided with: a stage for placing a sample container; a temperature adjustment device that is provided with an upper heating body and a lower heating body, which are disposed above and below the sample container; and an image pickup device for picking up an image... Hitachi High technologies Corporation

Cell dispersion device, and automatic subculture system using same

The purpose of the present invention is to provide a means for dispersing cell aggregates without damaging the cells, such that a sufficient multiplication rate can be obtained in a subculture. According to the present invention, provided is a cell-suspension processing device which disperses cell aggregates included in a cell... Hitachi High technologies Corporation

Terahertz wave measuring device

Provided is a terahertz wave measuring device that can provide means for improving sensitivity, removing unnecessary light, and phase difference detection. The terahertz wave measuring device comprises a pulsed laser light generation unit 1 that generates pump light 3, a seed light generation unit 2 that generates seed light, a... Hitachi High technologies Corporation

Automatic analysis device and automatic analysis method

The automatic analysis device 100 is provided with: a specimen dispensing mechanism 101 that dispenses subject blood plasma and/or normal blood plasma to be added to correct the coagulation time of the subject blood plasma, into a plurality of specimen containers 103; reaction containers 104 that contain the subject blood... Hitachi High technologies Corporation

Charged particle beam device and evacuation same

In this charged particle beam device, when a sample chamber is to be placed in a high-vacuum state, a charged particle gun chamber and the sample chamber are evacuated via a main intake of a turbo molecular pump, and when the sample chamber is to be placed in a low-vacuum... Hitachi High technologies Corporation

Plasma processing apparatus and plasma processing method

A plasma processing apparatus according to the present invention includes a processing chamber, a first radio frequency power source, and a second radio frequency power source. The first radio frequency power source supplies radio frequency power to generate the plasma. The second radio frequency power source applies a first radio... Hitachi High technologies Corporation

Plasma processing method

A plasma processing method for plasma-etching a sample in a metallic processing chamber includes etching the sample with a plasma; plasma-cleaning the processing chamber with a fluorine-containing gas after etching the sample; and plasma-processing the processing chamber with a gas containing sulfur and oxygen after plasma cleaning the processing chamber.... Hitachi High technologies Corporation

Plasma processing method

The present invention provides a plasma processing method for subjecting a sample on which a metal element-containing film is disposed to plasma etching in a processing chamber. The method comprises: subjecting an inside of the processing chamber to plasma cleaning using a boron element-containing gas; removing the boron element using... Hitachi High technologies Corporation

Automatic analyzer

An automatic analyzer which realizes stable reagent heating and high dispensing accuracy includes a thermostat bath for controlling a reagent or a reaction solution in reaction cells arranged on a circumference of a reaction disk to have a constant temperature; a first reagent dispensing mechanism dispenses a reagent into the... Hitachi High technologies Corporation

Specimen conveyance device and specimen processing system

A connection unit connects one end of each of two processing systems and includes a processing unit for carrying out necessary processing on a specimen in a specimen container held by a specimen holding rack. The first and second processing systems each have an opening and closing part that can... Hitachi High technologies Corporation

Charged particle beam device and sample observation method

A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a... Hitachi High technologies Corporation

Etching method and etching apparatus

A method for etching a titanium nitride film includes a first process of supplying reactive species, which include hydrogen and fluorine, to a base material including a titanium nitride film on at least a part of a surface, and a second process of vacuum-heating the base material to remove the... Hitachi High technologies Corporation

Light amount detection device, immune analyzing apparatus and charged particle beam apparatus that each use the light amount detection device

A signal detected by a photomultiplier tube is pre-amplified and converted into a digital signal. A time average value of signal components, each of which has a voltage lower than a predetermined base threshold value, is calculated as a base voltage. A signal that has been subjected to base correction... Hitachi High technologies Corporation

Defect inspecting method and defect inspecting apparatus

A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted... Hitachi High technologies Corporation

Charged particle beam device and sample observation method in charged particle beam device

The charged particle beam device comprises: an electron gun for generating an electron beam; an imaging lens system for imaging the electron beam that has passed through a sample; a splitting portion where the electron beam that has passed through the imaging lens system is split into a first image... Hitachi High technologies Corporation

Plasma processing apparatus

The features of the present invention are that a plasma processing apparatus includes: a process chamber in which a sample is plasma-processed; a dielectric window which airtightly seals an upper part of the process chamber; an inductive antenna which is disposed at an upper part of the dielectric window and... Hitachi High technologies Corporation

Plasma processing method and plasma processing apparatus

The present invention provides a plasma processing method and a plasma processing apparatus. The plasma processing method enables consistent processing by realizing a high selectivity and a high etching rate when etching a laminated film using a boron-containing amorphous carbon film, realizes high throughput including prior and post processes by... Hitachi High technologies Corporation

Plasma processing apparatus and plasma processing method

A plasma processing apparatus including a processing chamber, a radio frequency power source, a monitoring unit, and a calculation unit is provided. In the processing chamber, etching target film is etched by using plasma. The radio frequency power source supplies radio frequency electric power. The monitoring unit monitors light emission... Hitachi High technologies Corporation

Electrophoresis device and electrophoresis method

Provided is an electrophoresis device that, by electrophoresis, feeds a sample into capillaries and optically detects the sample, the electrophoresis device being provided with capillaries, a capillary head provided at the distal end of the capillaries, a phoretic medium-filled container used for electrophoresis and filled with a phoretic medium, a... Hitachi High technologies Corporation

Inspection device

In medical analysis devices and automatic specimen examination systems, the specimen conveyance mechanism is constituted by a plurality of belt lines. During installation or maintenance of the specimen conveyance mechanism, it is necessary to confirm the existence of steps at the joints of these belt lines and the parallelism of... Hitachi High technologies Corporation

Cytologic diagnosis support apparatus, cytologic diagnosis support method, remote diagnosis support system, service providing system, and image processing method

The present invention realizes determination of tissues and cells from an image by calculating feature values of a deformed degree of the cells even in a case where the tissues or the cells have various shapes. An image diagnosis support apparatus according to the present invention executes processing of inputting... Hitachi High technologies Corporation

Optical measurement device and optical measurement method

In multiplex CARS, a fingerprint region is a region where signals are densely concentrated. Information about the intensities and spatial distribution of these signals is important in cell analysis. However, there has been a problem in that the signal intensities are low. Accordingly, mechanisms 702 and 703 for adjusting the... Hitachi High technologies Corporation

Plasma processing method and plasma processing device

A plasma processing apparatus performs plasma generation and control of energy of ion bombardment on the substrate independently, generates plasma by continuous discharge or pulse discharge, and switches at least two bias powers having different frequencies, and alternately and repeatedly applies the at least two bias powers having different frequencies... Hitachi High technologies Corporation

Plasma processing device and plasma processing method using same

The plasma processing apparatus includes a mechanism (125, 126, 131, 132) for generating inductively coupled plasma, a perforated plate 116 for partitioning the vacuum processing chamber into upper and lower areas 106-1 and 106-2 and shielding ions, and a switch 133 for changing over between the upper and lower areas... Hitachi High technologies Corporation

Nucleic acid analyzer

The purpose of the invention is to provide a nucleic acid analyzer that sets and executes temperature regulation, said temperature regulation matching the characteristics of analyzing items and the configuration of the analyzer, by a simple operation while preventing deterioration in analytical performance caused by partial overheating of a liquid... Hitachi High technologies Corporation

Automated analysis device

Provided is an automatic analyzer capable of replacing an insertion mechanism while suppressing occurrence of dispensing abnormality and analysis result abnormality accompanying deterioration of the insertion mechanism. Included are an insertion mechanism that is inserted into a closed container through a lid of the container; a storage unit that stores... Hitachi High technologies Corporation

Sample transport apparatus

Proposed is a sample transport apparatus including at least one transport line stage including first and second transport lines each configured to transport sample holders each capable of holding at least one sample along a side wall of a housing along a long-side direction, a drive mechanism configured to transport... Hitachi High technologies Corporation

Sample dispensing apparatus and automatic analyzer including the same

The invention provides a small-sized automatic analyzer being compact, enabling a large number of analysis items to be carried out, and having a high processing speed. The automatic analyzer is particularly suitably applied to a medical analyzer used for qualitative/quantitative analysis of living body samples, such as urine and blood.... Hitachi High technologies Corporation

Plasma processing apparatus and plasma processing method

Disclosed herein is a plasma processing apparatus including: a processing chamber in which a sample is to be processed using plasma; a radio-frequency power source that supplies radio-frequency power for producing the plasma; and a sample stage on which the sample is to be mounted, the plasma processing apparatus further... Hitachi High technologies Corporation

Plasma processing releasing sample

The invention provides a plasma processing apparatus which includes a processing chamber, a radio frequency power source to supply a radio frequency power for plasma generation, a sample stage equipped with an electrostatic chuck electrode of a sample, a DC power source to apply a DC voltage to the electrode,... Hitachi High technologies Corporation

Operation control materials and automated analyzer

Operation methods for control material conventionally differ in each inspection laboratory, and automatic operation according to laboratory operation standards has been difficult. Further, since operation for control material is complex and devices are operated on the basis of judgments by inspectors in accordance with results of measurement for control materials,... Hitachi High technologies Corporation

02/01/18 / #20180030506

Method for constructing nucleic acid molecule

The present invention provides a method for constructing a single-stranded nucleic acid molecule for nucleic acid sequencing by means of a nanopore sequencer, said method including: a step in which at least one hairpin primer including a single-stranded region on the 3′ side and a pair of primers are used... Hitachi High technologies Corporation

02/01/18 / #20180031469

Terahertz wave generating device and spectroscopic device using same

A terahertz wave generating device according to the present invention comprises a fixed-wavelength pump optical laser that generates a single wavelength pump beam, a variable-wavelength laser that emits a seed beam and is capable of making the wavelength of the seed beam variable, a delay element that delays pulses of... Hitachi High technologies Corporation

02/01/18 / #20180031589

Automatic analyser

An automatic analyser which is capable of detecting a dispensing abnormality with a high degree of accuracy without causing the decrease in the determination performance or the increase in the calculation amount caused by the configuration balance of the reference database is implemented. A dispensing nozzle of a sample dispensing... Hitachi High technologies Corporation

01/25/18 / #20180024061

Multicolor detection device

A multicolor detection device includes: a condensing lens array 17 in which a plurality of condensing lenses 18, each of which turns light emitted from each of a plurality of light emitting points 1 individually into parallel light beams, are arranged, the light emitting points being arranged in a light... Hitachi High technologies Corporation

01/25/18 / #20180024154

Automated analysis device, and lid opening/closing mechanism

Provided is an automated analysis device equipped with a lid opening/closing mechanism with which it is possible to selectively open or close lids of a plurality of reagent containers, as well as to close all of the lids of the plurality of reagent containers, regardless of their current open/closed state.... Hitachi High technologies Corporation

01/25/18 / #20180025482

Method for measuring overlay and measuring apparatus, scanning electron microscope, and gui

A method for measuring overlay at a semiconductor device on which circuit patterns are formed by a plurality of exposure processes is characterized in including an image capturing step for capturing images of a plurality of areas of the semiconductor device, a reference image setting step for setting a reference... Hitachi High technologies Corporation

01/25/18 / #20180025885

Composite charged particle beam device

This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is... Hitachi High technologies Corporation

01/25/18 / #20180025894

Plasma processing apparatus and analysis analyzing plasma processing data

According to the present invention, a plasma processing apparatus includes an analysis unit that obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger... Hitachi High technologies Corporation

01/25/18 / #20180025896

Ion guide and mass spectrometer using same

A first rod electrode set has a first center axis, into which ions and air current are introduced. A second rod electrode set has a second center axis at a distance from the first center axis, from which the ions are discharged. A power supply applies voltages to the first... Hitachi High technologies Corporation

01/18/18 / #20180017492

Multicolor fluorescence analysis device

A multicolor fluorescence analysis device 1 according to the present invention is provided with: an irradiation unit 41 for irradiating excitation light having a plurality of excitation wavelength bands onto a sample s; a first fiberoptic plate 424 for guiding light including fluorescence emitted from the sample s as a... Hitachi High technologies Corporation

01/18/18 / #20180017502

Examination device

The present invention provides an inspection device that is capable of detecting foreign matter with high accuracy, the inspection device including: a light source; an electro-optic element on which light from the light source is incident and which changes a phase of the light into at least two states; and... Hitachi High technologies Corporation

01/18/18 / #20180017588

Automatic analysis device

Provided is an automatic analysis device that enables a reagent to be reliably loaded in and loaded out within a stipulated amount of time, even during analysis and without stopping the analysis, and that enables a reagent to be exchanged without causing a long wait for the operator. Provided is... Hitachi High technologies Corporation

01/18/18 / #20180019096

Charged particle beam device, and manufacturing component for charged particle beam device

The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using... Hitachi High technologies Corporation

01/18/18 / #20180019097

Sample observation method and sample observation device

An inspection method uses a charged particle microscope to observe a sample and view a defect site or a circuit pattern. A plurality of images is detected by a plurality of detectors and a mixed image is generated by automatically adjusting and mixing weighting factors required when the plurality of... Hitachi High technologies Corporation

01/11/18 / #20180010084

Test device

The invention provides a technology for promptly determining bacterial identification or an antimicrobial susceptibility testing. In the invention, first, a state where the bacteria are divided is monitored by performing microscopic observation with respect to the shape or the number of bacteria in each of wells of a culture plate... Hitachi High technologies Corporation

01/11/18 / #20180011021

Multicolor fluorescence analysis device

A multicolor fluorescence analysis device 11 is for detecting fluorescence emitted, as a result of excitation light irradiation, from a plurality of types of fluorophores included in a sample s, and is provided with an irradiation optical unit 520 for irradiating light emitted from a light source 510 onto a... Hitachi High technologies Corporation

01/11/18 / #20180011121

Automated analyzer and liquid reservoir

Provided are an automated analyzer for analyzing a substance contained in an unknown sample and a liquid reservoir, the analyzer and the reservoir being capable of saving users' operation without remarkably increasing the number of components. A flow path outlet of an overflow portion of the liquid reservoirs projects closer... Hitachi High technologies Corporation

01/11/18 / #20180012349

Pattern measurement apparatus and flaw inspection apparatus

The purpose of the present invention is to provide a pattern measurement apparatus that appropriately assesses patterns formed by patterning methods for forming patterns that do not exist on photomasks. In order to achieve this purpose, the present invention provides a pattern measurement apparatus comprising a processor that measures the... Hitachi High technologies Corporation

01/11/18 / #20180012375

Automatic analyser

A two-dimensional code is attached to a location of a reagent storage unit which is visually recognizable from the outside, and a coordinate position of the two-dimensional code in a coordinate system of the two-dimensional code and coordinate information of an installation position of a reagent bottle are held. After... Hitachi High technologies Corporation

01/11/18 / #20180012725

Charged particle beam device

Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for... Hitachi High technologies Corporation

01/04/18 / #20180003728

Liquid surface inspection device, automated analysis device, and processing device

Provided are a liquid surface inspection device, an automated analysis device, and a liquid surface inspection method with which instances of contamination can be minimized and the accuracy of the manner in which the surface conditions, such as bubbles or the like, of a liquid substance are detected can be... Hitachi High technologies Corporation

01/04/18 / #20180005363

Pattern matching device and computer program for pattern matching

The purpose of the present invention is to provide a pattern matching device and computer program that carry out highly accurate positioning even if edge positions and numbers change. The present invention proposes a computer program and a pattern matching device wherein a plurality of edges included in first pattern... Hitachi High technologies Corporation

12/28/17 / #20170370957

Sampling nozzle, automatic analyzer using the same, and manufacturing sampling nozzle

A CTS nozzle achieves the object of reducing rubber chips produced when the CTS nozzle is inserted into and extracted from a rubber plug of a sample container during dispensing of a sample, thereby inhibiting the wear of the tip of the CTS nozzle. The CTS nozzle has two cut... Hitachi High technologies Corporation

12/28/17 / #20170371981

Recipe creation device for use in semiconductor measurement device or semiconductor inspection device

The purpose of the present invention is to provide a recipe creation device, with the goal of using past recipe data in order to highly efficiently create recipes. As an embodiment with which to achieve this goal, there is provided a recipe creation device comprising an arithmetic processing device that,... Hitachi High technologies Corporation

12/28/17 / #20170372878

Plasma processing apparatus and operational method thereof

A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the... Hitachi High technologies Corporation

12/21/17 / #20170362634

Nucleic acid analysis device

The substrate 100 for use in the analysis of a nucleic acid according to the present invention has multiple analysis areas 12 which are partitioned on a substrate 10, and enables the measurement of the analysis areas 12 while interchanging the analysis areas 12 in turn, said substrate 100 being... Hitachi High technologies Corporation

12/21/17 / #20170363547

Defect detection method and defect detection device and defect observation device provided with same

The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller... Hitachi High technologies Corporation

12/21/17 / #20170367169

Plasma processing apparatus and microwave output device

A plasma processing apparatus includes: a high voltage power supply for supplying a high voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron, wherein based on a result of comparing a signal, which is obtained by adding an output from the detector to... Hitachi High technologies Corporation

12/14/17 / #20170358421

Composite charged particle beam detector, charged particle beam device, and charged particle beam detector

A composite charged particle beam apparatus modulates an irradiation condition of a charged particle beam at high speed and detects a signal in synchronization with a modulation period to extract a signal arising from a particular charged particle beam when a sample is irradiated with a plurality of charged particle... Hitachi High technologies Corporation

12/14/17 / #20170358504

Plasma processing apparatus and plasma processing method

A plasma processing method of processing layer structure previously formed on an upper surface of a wafer disposed in a processing chamber within a vacuum container and having a layer to be processed and an undercoating layer disposed under the layer by plasma in the processing chamber, includes a step... Hitachi High technologies Corporation

Patent Packs
12/07/17 / #20170352517

Ion beam device

In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply... Hitachi High technologies Corporation

11/30/17 / #20170343340

Height measurement device and charged particle beam device

The objective of the present invention is to provide a height measurement device capable of highly accurate measurement in the depth direction of a structure on a sample. To achieve this objective, proposed are a charged particle beam device and a height measurement device that is provided with a calculation... Hitachi High technologies Corporation

11/30/17 / #20170343540

Analysis method and analysis device

Provided is a high-accuracy analysis method utilizing an enzyme-lined immunoassay. The presence of an analyte 3 can be detected or the abundance of the analyte 3 can be analyzed by: bonding an antibody 5 that is capable of specifically bonding to the analyte 3 immobilized on a solid phase 1... Hitachi High technologies Corporation

11/30/17 / #20170345613

Charged particle beam device

The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided... Hitachi High technologies Corporation

11/30/17 / #20170345614

Charged particle beam device and information-processing device

There is provided a charged particle beam apparatus capable of obtaining a high SN ratio with a small electron irradiation amount. The charged particle beam apparatus includes a charged particle detection device. The charged particle detection device detects an analog pulse waveform signal (110) in a detection of emitted electrons... Hitachi High technologies Corporation

11/23/17 / #20170332965

Measurement system, head-mounted device, non-transitory computer readable medium, and service providing method

A head mount apparatus mounted on a head of a user is disclosed, which includes: detection means to detect a variation of a bloodflow rate of the head; and transfer means to transfer a detection value of the detection means to a predetermined transfer destination. An information processing apparatus is... Hitachi High technologies Corporation

11/23/17 / #20170336357

Mass spectrometer

A mass spectrometer device comprising an ion mobility separation device and a mass spectrometer that are coupled together. In order to achieve high efficiency, high throughput, and high sensitivity, the mass spectrometer is provided with: a first flow passageway 24 through which ions from an ion source 1 are introduced... Hitachi High technologies Corporation

11/23/17 / #20170336717

Exposure condition evaluation device

The purpose of the present invention is to provide an exposure condition evaluation device that appropriately evaluates a wafer exposure condition or calculates an appropriate exposure condition, on the basis of information obtained from an FEM wafer, without relying on the formation state of the FEM wafer. In order to... Hitachi High technologies Corporation

11/23/17 / #20170338086

Plasma processing apparatus and plasma processing method

When radio-frequency power is time modulated, a high-voltage side Vpp detector detects a first voltage value which is a peak-to-peak voltage value of a radio-frequency voltage applied to a sample stage in a first period of the time modulation having a first amplitude. A low-voltage side Vpp detector detects a... Hitachi High technologies Corporation

11/16/17 / #20170328842

Defect observation method and defect observation device

Provided are a defect observation method and a defect observation device which detect a defect from an image obtained by imaging the defect on a sample with an optical microscope by using positional information of the defect on the sample detected by a different inspection device to correct the positional... Hitachi High technologies Corporation

11/16/17 / #20170328846

Defect inspection device, display device, and defect classification device

A defect inspection device is provided with an illumination optical system that irradiates light or an electron beam onto a sample, a detector that detects a signal obtained from the sample through the irradiation of the light or electron beam, a defect detection unit that detects a defect candidate on... Hitachi High technologies Corporation

11/16/17 / #20170328925

Automatic analysis device

The purpose of the present invention is to provide an automatic analysis device capable of efficiently performing a plurality of analyses, while reducing the footprint and cost of the device. Provided is an automatic analysis device characterized by being provided with containers for containing samples, one rack for placing the... Hitachi High technologies Corporation

11/16/17 / #20170328926

Sample test automation system

A sample test automation system which is capable of reducing the workload of an operator and precisely carrying out necessary processes of each of samples without stagnation. In the sample test automation system, a sample tray 120 on which a plurality of samples 150 can be installed is prepared, an... Hitachi High technologies Corporation

11/16/17 / #20170330722

Composite charged particle beam apparatus and control method thereof

The present invention relates to an automatic sequence for repeatedly performing SEM observation and FIB processing by using a low acceleration voltage for a long time. In order to realize very accurate three-dimensional structure/composition analysis, in the automatic sequence for repeatedly performing sample observation using a scanning electron microscope using... Hitachi High technologies Corporation

11/16/17 / #20170330724

Charged particle beam device

Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen... Hitachi High technologies Corporation

Patent Packs
11/09/17 / #20170322021

Overlay measurement method, device, and display device

To address the problem in which when measuring the overlay of patterns formed on upper and lower layers of a semiconductor pattern by comparing a reference image and measurement image obtained through imaging by an SEM, the contrast of the SEM image of the pattern of the lower layer is... Hitachi High technologies Corporation

11/09/17 / #20170323435

Defect quantification method, defect quantification device, and defect evaluation value display device

To quantify the degree of a defect, and provide information useful for yield management. Disclosed is a defect quantification method wherein: a defect image is classified; a measurement region and a measurement area are set to each of the defect image and a reference image on the basis of defect... Hitachi High technologies Corporation

11/09/17 / #20170323762

Charged particle beam apparatus, electron microscope and sample observation method

An electron microscope includes: a sample holder; a first optical system irradiating and scanning the sample; an electron detection unit detecting secondary electrons discharged from the sample; a first vacuum chamber which holds the sample holder, the first optical system, and the electron detection unit in a vacuum atmosphere; a... Hitachi High technologies Corporation

11/09/17 / #20170323763

Charged particle beam device

The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan... Hitachi High technologies Corporation

11/09/17 / #20170323764

Ion beam device

In this invention, vibrations generated by a freezer from a cooling mechanism for cooling an ion source emitter tip are prevented from being transmitted to the emitter tip as much as possible, while the cooling capability of the cooling mechanism is improved widely. The ion beam device (10) is equipped... Hitachi High technologies Corporation

11/02/17 / #20170316915

Charged particle beam apparatus

Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam optical system that includes an objective lens and emits a charged particle beam emitted from the charged particle source onto the sample, a plurality... Hitachi High technologies Corporation

10/26/17 / #20170306287

Cytometric mechanism, cell culture device comprising same, and cytometric method

A cytometric mechanism includes: a flow path through which a cell suspension is made to flow; a liquid drive unit for sending the cell suspension which is in the flow path; and a computation unit for irradiating, with irradiation light from a light source, a cell suspension flowing through a... Hitachi High technologies Corporation

10/26/17 / #20170307532

Fixed position controller and method

The purpose of the present invention is to control, with a simple structure and high accuracy, irradiation of excitation light to a multi-nanopore substrate without interrupting a measurement. Irradiation of excitation light is performed concurrently to at least one nanopore and at least one reference object on a substrate mounted... Hitachi High technologies Corporation

10/26/17 / #20170309437

Scanning electron microscope

The purpose of the present invention is to be able to acquire high-resolution images in a scanning electron microscope using a combination of a cold cathode (CFE) electron source and a boosting process, even at low accelerating voltage enhancing the current stability of the CFE electron source. A configuration in... Hitachi High technologies Corporation

10/19/17 / #20170299548

Nucleic acid delivery controlling manufacturing same, and nucleic acid sequencing device

The present invention provides: a nucleic acid delivery controlling system in which a novel delay principle is utilized to greatly delay the nanopore passing rate of a nucleic acid strand, thereby enabling the stable analysis of a nucleotide sequence; a method for manufacturing the nucleic acid delivery controlling system; and... Hitachi High technologies Corporation

10/19/17 / #20170301513

Scanning electron microscope

A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit... Hitachi High technologies Corporation

09/28/17 / #20170278671

Charged particle beam device

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged... Hitachi High technologies Corporation

09/28/17 / #20170278730

Plasma processing apparatus and plasma processing method

A plasma processing apparatus including a sample stage arranged in a processing chamber, a temperature regulator arranged in an interior of the sample stage, a film made of a dielectric that configures the upper surface of the sample stage, and including a film-like electrode therein, a protruding portion arranged on... Hitachi High technologies Corporation

09/21/17 / #20170268054

Biomolecule measurement system and biomolecule measurement method

To introduce a biomolecule into a nanopore without the need to check the position of the nanopore in a thin film. In addition, displacement stability is ensured and stable acquisition of blocking signals is realized. An immobilization member 107 having a larger size than a thin film 113 with a... Hitachi High technologies Corporation

09/21/17 / #20170268870

Sample for coordinates calibration and fabricating the same

A sample for coordinates calibration including (1) a substrate having a circular plate-shape, and (2) multiple intentional defects that form a grid pattern with squares as unit grids on a surface of the substrate, the intentional defect providing a center point of the grid pattern coinciding with a center point... Hitachi High technologies Corporation

09/21/17 / #20170269113

Automatic analyzer

A high-throughput automatic analyzer integrates a biochemical analysis section and a blood coagulation analysis section. The analyzer is capable of achieving a reduction in size, system cost, and lifecycle cost. The automatic analyzer includes: a reaction disk; a first reagent dispensing mechanism that dispenses a reagent to reaction cells on... Hitachi High technologies Corporation

09/21/17 / #20170271121

Charged particle beam device

A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused... Hitachi High technologies Corporation

09/14/17 / #20170260573

Spot array substrate, producing same, and nucleic acid polymer analysis

In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of... Hitachi High technologies Corporation

09/14/17 / #20170261441

X-ray inspection

A method including inspecting, using an X-ray transmission image, internal defects in a TSV formed in a semiconductor wafer, and detecting the X-rays, and processing an X-ray transmission image. Therein, the detection of X-rays is configured such that: the detection azimuth of the X-rays, and the detection elevation angle of... Hitachi High technologies Corporation

08/31/17 / #20170249753

Defect observation apparatus

A defect observation apparatus includes a storage unit configured to store defect information about defects detected by an external inspection apparatus; a first imaging unit configured to capture an image of a defect using a first imaging condition and a second imaging condition; a control unit configured to correct positional... Hitachi High technologies Corporation

08/31/17 / #20170250054

Charged particle beam apparatus and vibration damper for charged particle beam apparatus

There is proposed a column supporting structure that includes a viscoelastic sheet, a supporting plate which holds the viscoelastic sheet, and a fixation portion which connects the supporting plate to each lens barrel. The viscoelastic sheet is disposed to extend in a plane perpendicular to one lens barrel or the... Hitachi High technologies Corporation








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