Real Time Touch



new TOP 200 Companies filing patents this week

new Companies with the Most Patent Filings (2010+)




Real Time Touch

Similar
Filing Names

Institute Of Microelectronics Chinese Academy Of Sciences
Institute Of Microelectronics Chinese Academy Of Sciences A Chinese Corporation
Institute Of Microelectronics Chinese Academy Of Sciences A Chines Corporation
Institute Of Microelectronics Chinese Academy Of Sciences imecas
  

Institute Of Microelectronics Chinese Academy Of Sciences patents

Recent patent applications related to Institute Of Microelectronics Chinese Academy Of Sciences. Institute Of Microelectronics Chinese Academy Of Sciences is listed as an Agent/Assignee. Note: Institute Of Microelectronics Chinese Academy Of Sciences may have other listings under different names/spellings. We're not affiliated with Institute Of Microelectronics Chinese Academy Of Sciences, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "I" | Institute Of Microelectronics Chinese Academy Of Sciences-related inventors




Date Institute Of Microelectronics Chinese Academy Of Sciences patents (updated weekly) - BOOKMARK this page
08/17/17 new patent  Three-dimensional memory device and manufacturing method thereof
06/29/17Etching method
06/08/17Low-damage etching iii-nitride
06/08/17Semiconductor devices having high-quality epitaxial layer and methods of manufacturing the same
06/08/17Nanometer semiconductor devices having high-quality epitaxial layer and methods of manufacturing the same
06/01/17Three-dimensional semiconductor device and manufacturing method therefor
05/25/17Semiconductor devices and methods for manufacturing the same
05/11/17Cmos devices having charged punch-through stopper layer to reduce punch-through and methods of manufacturing the same
05/11/17Semiconductor devices having charged punch-through stopper layer to reduce punch-through and methods of manufacturing the same
05/04/17Semiconductor device and manufacturing the same
04/13/17Method for preparing titanium-aluminum alloy thin film
03/30/17Method for controlling magnetic multi-domain state
02/23/17Method for manufacturing a finfet device
02/16/173 - d semiconductor device and manufacturing the same
01/19/17Method for cleaning lanthanum gallium silicate wafer
12/29/16Method for manufacturing semiconductor device
11/10/16Vertical channel-type 3d semiconductor memory device and manufacturing the same
10/06/16Flexible-substrate-based three-dimensional packaging structure and method
10/06/16Semiconductor device and manufacturing the same
09/22/16Method for manufacturing finfet
09/15/16Low interface state device and manufacturing the same
09/15/16Method for manufacturing semiconductor device
09/15/16Methods for forming metal silicide
09/15/16Semiconductor arrangement and manufacturing the same
09/08/16Improved sram storage unit based on dice structure
08/18/16Method for adjusting effective work function of metal gate
08/18/16Semiconductor devices and methods for manufacturing the same
07/28/16Semiconductor devices and methods for manufacturing the same
07/21/16Apparatus and epitaxially growing sources and drains of a finfet device
07/14/16Mosfet structure and manufacturing method thereof
06/30/16Finfet and manufacturing the same
06/23/16Mosfet structure and manufacturing same
06/16/16Mosfet structure and manufacturing method thereof
06/16/16Semiconductor structure and manufacturing the same
06/09/16Method for manufacturing semiconductor device
06/09/16Mosfet structure and manufacturing same
06/09/16Finfet and manufacturing same
06/02/16Asymmetric ultrathin soi mos transistor structure and manufacturing same
05/26/16Methods for manufacturing semiconductor devices
05/26/16Asymmetrical finfet structure and manufacturing same
05/12/16Fin-fet structure and manufacturing same
05/05/16Gas recognition method based on compressive sensing theory
05/05/16Method for manufacturing no2 gas sensor for detection at room temperature
04/14/16Memory devices, methods of manufacturing the same, and methods of accessing the same
03/24/16Cmos device and manufacturing the same
03/24/16Semiconductor devices and methods for manufacturing the same
03/24/16Semiconductor device and manufacturing the same
03/17/16Random sampler adapted to one-dimension slow-varying signal
03/10/16Method for manufacturing semiconductor device
01/21/16Semiconductor device and manufacturing the same
12/31/15Method for manufacturing mosfet
12/17/15Semiconductor arrangements and methods of manufacturing the same
12/10/15Semiconductor arrangements and methods for manufacturing the same
12/10/15Semiconductor device and manufacturing the same
12/03/15Ti-igbt and formation method thereof
11/26/15Semiconductor device and manufacturing the same
11/26/15Semiconductor arrangements and methods of manufacturing the same
11/26/15Semiconductor device and manufacturing the same
11/26/15Semiconductor device and manufacturing method thereof
11/19/15Semiconductor structure and manufacturing same
11/12/15Method for manufacturing compound semiconductor sensitive film based on displacement reaction-thermal oxidation method
11/12/15Planarization process
11/12/15Method for manufacturing semiconductor device
11/12/15Manufacturing n-type mosfet
11/12/15Finfet and manufacturing the same
Patent Packs
11/12/15Semiconductor devices and methods for manufacturing the same
11/12/15Method for collecting signal with sampling frequency lower than nyquist frequency
11/05/15Semiconductor device and manufacturing the same
11/05/15Method and arrangement for reducing contact resistance of two-dimensional crystal material
11/05/15Finfet and manufacturing the same
11/05/15Semiconductor device and manufacturing the same
11/05/15Semiconductor device and manufacturing the same
10/29/15Semiconductor device and manufacturing the same
10/29/15Finfet device and manufacturing the same
10/29/15Semiconductor structure and manufacturing the same
10/29/15Itc-igbt and manufacturing method therefor
10/22/15Semiconductor device and manufacturing the same
10/22/15Method for manufacturing fin structure
10/15/15Method for manufacturing fin structure
10/15/15Method for manufacturing p-type mosfet
Patent Packs
10/15/15Method of manufacturing mosfet
10/15/15Finfet and manufacturing the same
10/08/15Method of depositing tungsten layer with improved adhesion and filling behavior
10/08/15Semiconductor structure and manufacturing the same
10/08/15Semiconductor devices and methods for manufacturing the same
10/01/15Methods for manufacturing semiconductor devices
10/01/15Method of manufacturing fin field effect transistor
10/01/15Semiconductor structure and manufacturing the same
09/24/15Method for manufacturing fin structure of finfet
09/24/15Semiconductor structure and manufacturing the same
09/17/15Planarization process
09/17/15Method for manufacturing semiconductor device
09/10/15Method for manufacturing a semiconductor structure
09/10/15Planarization process
09/10/15Semiconductor device and manufacturing the same
09/10/15Method for manufacturing mosfet
09/10/15Quasi-nanowire transistor and manufacturing the same
09/10/15Semiconductor devices and methods for manufacturing the same
08/27/15Semiconductor structure and manufacturing the same
08/27/15Semiconductor structure and manufacturing the same
08/27/15Method for manufacturing a semiconductor structure
08/27/15Low-noise voltage-controlled oscillator
08/20/15Method for manufacturing semiconductor device
08/20/15Method of manufacturing semiconductor device
08/13/15Method of manufacturing stacked nanowire mos transistor
08/06/15Semiconductor structure and manufacturing the same
08/06/15Finfet and manufacturing the same
07/30/15Method for manufacturing semiconductor device
07/16/15Fin arrangement and manufacturing the same
07/16/15Method for manufacturing semiconductor devices
Social Network Patent Pack
07/16/15Finfet and manufacturing the same
07/09/15Method for manufacturing semiconductor device
07/02/15Method for manufacturing semiconductor device
07/02/15Semiconductor structure and manufacturing the same
06/25/15Method for determining pn junction depth
06/25/15Vertical channel-type 3d semiconductor memory device and manufacturing the same
06/18/15Semiconductor structure and manufacturing the same
06/18/15Flash devices and methods of manufacturing the same
06/18/15Semiconductor device manufacturing method
05/28/15Semiconductor structure and manufacturing the same
Patent Packs
04/30/15Semiconductor structure and manufacturing the same
04/23/15Active chip package substrate and preparing the same
04/16/15Dual-metal gate cmos devices and manufacturing the same
03/26/15Semiconductor structure and manufacturing the same
03/19/15Semiconductor structure and manufacturing the same
03/19/15Semiconductor structure and manufacturing the same
02/26/15Semiconductor devices and methods for manufacturing the same
02/26/15Semiconductor devices and methods of manufacturing the same
02/19/15Semiconductor device and manufacturing method thereof
02/12/15P type mosfet and manufacturing the same
01/08/15N-type mosfet and manufacturing the same
01/08/15Method for manufacturing p-type mosfet
12/25/14Cantilever beam structure where stress is matched and manufacturing the same
12/11/14Semiconductor memory device and accessing the same
10/09/14Method for manufacturing semiconductor device
09/11/14Method for manufacturing semiconductor device
08/28/14Field effect transistor and manufacturing the same
08/21/14Finfet and manufacturing the same
08/21/14Semiconductor structure and manufacturing the same
08/14/14Method for manufacturing small-size fin-shaped structure
08/07/14Semiconductor structure and manufacturing the same
08/07/14Semiconductor device and manufacturing the same
07/10/14Semiconductor structure and manufacturing the same
06/26/14Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof
06/05/14Method for manufacturing n-type mosfet
05/15/14Semiconductor devices and methods for manufacturing the same
05/08/14Semiconductor structure and manufacturing the same
04/24/14Semiconductor devices and methods for manufacturing the same
02/27/14Method of manufacturing semiconductor device
01/09/14Method of manufacturing semiconductor device
Patent Packs
01/02/14Transistor and forming the same
12/19/13Semiconductor structure and manufacutring the same
11/28/13Semiconductor device and a manufacturing the same
10/31/13Semiconductor structure and manufacturing the same
10/31/13Semiconductor structure and manufacturing the same
10/31/13Soi analogic front circuit for medical device
09/05/13Trench isolation structure and forming the same
08/15/13Semiconductor memory device and accessing the same
06/27/13Semiconductor device and manufacturing the same
06/20/13Semiconductor structure and manufacturing the same
05/30/13Semiconductor field-effect transistor structure and manufacturing the same
05/30/13Semiconductor structure and manufacturing the same
05/16/13Resistive random access memory cell and memory
05/09/13Semiconductor device and forming the same
04/18/13Mosfet and manufacturing the same
04/18/13Mosfet and manufacturing the same
03/21/13Sram cell and manufacturing the same
03/14/13Method for cleaning wafer after chemical mechanical planarization
02/28/13Semiconductor device structure and manufacturing the same
02/21/13Projection-type photolithography system using composite photon sieve
Social Network Patent Pack
02/21/13Double-sided maskless exposure system and method
01/03/13Method for manufacturing multigate device
12/20/12Semiconductor structure and manufacturing the same
12/20/12Nand structure and manufacturing the same
12/20/12Semiconductor device and manufacturing the same
12/20/12Semiconductor structure and manufacturing the same
12/13/12Semiconductor structure and manufacturing the same
12/13/12Semiconductor structure and manufacturing the same
12/06/12Metal oxide resistive switching memory and manufacturing same
12/06/12Method for manufacturing fin field-effect transistor
11/29/12Method for manufacturing a semiconductor structure
11/15/12Device performance prediction structure optimization method
11/08/12Flash memory device and manufacturing method thereof
10/18/12Semiconductor device and manufacturing the same
10/18/12Method for forming semiconductor structure
10/04/12Method for manufacturing semiconductor structure
09/27/12Chemical-mechanical polishing tool and preheating the same
09/20/12Semiconductor structure with a stressed layer in the channel and forming the same
09/20/12Semiconductor structure and manufacturing the same
09/06/12Semiconductor device and forming the same
Social Network Patent Pack
09/06/12Through-silicon via and forming the same
08/30/12Semiconductor structure and forming the same
08/30/12Semiconductor device and forming the same
08/23/12Method for forming semiconductor substrate isolation
07/19/12Method of introducing strain into channel and device manufactured by using the method
07/05/12Semiconductor structure and manufacturing the same
07/05/12Transistor and manufacturing the same
06/28/12Method for manufacturing semiconductor device
06/28/12Method for planarizing interlayer dielectric layer
06/21/12Transistor, semiconductor device comprising the transistor and manufacturing the same
06/14/12Method for manufacturing semiconductor wafer
06/07/12Mosfet and manufacturing the same
06/07/12Mosfet and manufacturing the same
06/07/12One time programming memory and storage and manufacture of the same
05/31/12Semiconductor structure and manufacturing the same
05/24/12Method for forming channel material
05/10/12High performance semiconductor device and fabricating the same
05/10/12Semiconductor structure and manufacturing the same
05/10/12Isolation structure, manufacturing the same, and semiconductor device having the structure
05/10/12Stack-type semiconductor device and manufacturing the same
05/03/12Method for fabricating contact electrode and semiconductor device
05/03/12Semiconductor structure and manufacturing the same
05/03/12Cmosfet device with controlled threshold voltage characteristics and fabricating the same
05/03/12Method for forming a semiconductor device with stressed trench isolation
04/26/12Graphene device and manufacturing the same
04/19/12Method for integration of dual metal gates and dual high-k dielectrics in cmos devices
04/05/12Metal interconnection structure and forming metal interlayer via and metal interconnection line
04/05/12Method for manufacturing semiconductor structure
03/15/12Semiconductor device with stress trench isolation and forming the same
03/15/12Transistor and forming the same
Social Network Patent Pack
03/15/12Gate stack structure, semiconductor device and manufacturing the same
03/08/12Hybrid channel semiconductor device and forming the same
03/08/12Semiconductor structure and manufacturing the same
03/01/12Semiconductor structure and fabricating the same
02/23/12Semiconductor device and forming the same
02/23/12Semiconductor device structure and manufacturing the same
02/16/12Semiconductor device and manufacturing the same
02/02/12Semiconductor device structure and fabricating the same
01/26/12Flash memory device and manufacturing the same
01/26/12Semiconductor device and manufacturing the same
01/26/12Method of manufacturing a semiconductor device
01/05/12Semiconductor device and forming the same
12/29/11Fin transistor structure and fabricating the same
12/29/11Semiconductor structure and forming the same
12/08/11Transistor and manufacturing the same
12/08/11Fin transistor structure and fabricating the same
12/08/11Manufacturing gate stack and semiconductor device
12/01/11Semiconductor structure and manufacturing the same
11/24/11Semiconductor device and fabricating the same
11/24/113d integrated circuit and manufacturing the same
10/27/11Semiconductor device and manufacturing the same
10/27/11Memory device and manufacturing the same
10/27/11Semiconductor device and manufacturing the same
10/27/11Field effect transistor device with improved carrier mobility and manufacturing the same
10/20/11Semiconductor device structure and manufacturing the same
10/20/11Semiconductor device and manufacturing the same
10/20/11Method of manufacturing a high-performance semiconductor device
10/20/11Method for manufacturing a metal gate electrode/high k dielectric gate stack
10/13/11Semiconductor structure and manufacturing the same







ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009



###

This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Institute Of Microelectronics Chinese Academy Of Sciences in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Institute Of Microelectronics Chinese Academy Of Sciences with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

###




';