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Intermolecular, Inc. patents


      
Recent patent applications related to Intermolecular, Inc.. Intermolecular, Inc. is listed as an Agent/Assignee. Note: Intermolecular, Inc. may have other listings under different names/spellings. We're not affiliated with Intermolecular, Inc., we're just tracking patents.

ARCHIVE: New 2014 2013 2012 2011 2010 2009 | Company Directory "I" | Intermolecular, Inc.-related inventors



Intermolecular

Systems for discretized processing of regions of a substrate

Intermolecular

Silicon texturing formulations

Intermolecular

Resistive-switching memory elements having improved switching characteristics

Search recent Press Releases: Intermolecular, Inc.-related press releases
Count Application # Date Intermolecular, Inc. patents (updated weekly) - BOOKMARK this page
12014023174408/21/14Methods for forming resistive switching memory elements
22014023095508/21/14Systems for discretized processing of regions of a substrate
32014023170408/21/14Silicon texturing formulations
42014022505608/14/14Resistive-switching memory elements having improved switching characteristics
52014022787108/14/14Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region
62014022788008/14/14Combinatorial plasma enhanced deposition and etchtechniques
72014019126207/10/14Material with tunable index of refraction
82014019136507/10/14Device design for partially oriented rutile dielectrics
92014018267007/03/14Light trapping and antireflective coatings
102014018369607/03/14Methods to improve leakage for zro2 based high k mim capacitor
112014018503407/03/14Method to extend single wavelength ellipsometer to obtain spectra of refractive index
122014018659807/03/14Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
132014018699507/03/14Method of fabricating cigs solar cells with high band gap by sequential processing
142014018704107/03/14High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures
152014018705107/03/14Poly removal for replacement gate with an apm mixture
162014018705207/03/14Selective etching of hafnium oxide using diluted hydrofluoric acid
172014018266507/03/14Optical absorbers
182014018303607/03/14In situ sputtering target measurement
192014018316107/03/14Methods and systems for site-isolated combinatorial substrate processing using a mask
202014018343207/03/14Moox-based resistance switching materials
212014018343907/03/14Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
222014018366407/03/14Fullerene-based capacitor electrode
232014018366607/03/14Flourine-stabilized interface
242014018369507/03/14Methods for reproducible flash layer deposition
252014018369707/03/14High work function, manufacturable top electrode
262014018373707/03/14Diffusion barriers
272014018535707/03/14Barrier design for steering elements
282014018661707/03/14Low-emissivity coatings
292014018701507/03/14Methods to improve leakage for zro2 based high k mim capacitor
302014018701607/03/14High work function, manufacturable top electrode
312014018701807/03/14Methods for reproducible flash layer deposition
322014018826407/03/14Workflow manager and bar coding system for processing of samples/substrates in hpc (high productivity combinatorial) r&d environment
332014017535906/26/14Diffusion barrier layer for resistive random access memory cells
342014017561806/26/14Transition metal aluminate and high k dielectric semiconductor stack
352014017704206/26/14Novel silver barrier materials for low-emissivity applications
362014017865706/26/14Antireflection coatings
372014017908206/26/14Selective etching of hafnium oxide using non-aqueous solutions
382014017910706/26/14Etching silicon nitride using dilute hydrofluoric acid
392014017911206/26/14High productivity combinatorial techniques for titanium nitride etching
402014017448106/26/14Processing and cleaning substrates
412014017454006/26/14Ald process window combinatorial screening tool
422014017465606/26/14Method to improve the operational robustness and safety of combinatorial processing systems
432014017490706/26/14High deposition rate chamber with co-sputtering capabilities
442014017491006/26/14Sputter gun shield
452014017491106/26/14Methods and systems for reducing particles during physical vapor deposition
462014017491806/26/14Sputter gun
472014017492106/26/14Multi-piece target and magnetron to prevent sputtering of target backing materials
482014017542206/26/14Deposition of rutile films with very high dielectric constant
492014017556706/26/14Method of depositing films with narrow-band conductive properties
502014017560306/26/14Method of forming an asymmetric mimcap or a schottky device as a selector element for a cross-bar memory array
512014017560406/26/14Two step deposition of molybdenum dioxide electrode for high quality dielectric stacks
522014017737806/26/14High dilution ratio by successively preparing and diluting chemicals
532014017857806/26/14Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
542014017858306/26/14Combinatorial methods and systems for developing thermochromic materials and devices
552014017903006/26/14Dissolution rate monitor
562014017903306/26/14Methods for forming templated materials
572014017909506/26/14Methods and systems for controlling gate dielectric interfaces of mosfets
582014017910006/26/14Method to control depth profiles of dopants using a remote plasma source
592014017911306/26/14Surface treatment methods and systems for substrate processing
602014017912306/26/14Site-isolated rapid thermal processing methods and apparatus
612014016647206/19/14Method and apparatus for temperature control to improve low emissivity coatings
622014016875906/19/14Methods and apparatuses for patterned low emissivity panels
632014017030806/19/14Antireflective coatings with gradation and methods for forming the same
642014017033806/19/14Pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
652014017041306/19/14Silver based conductive layer for flexible electronics
662014017042106/19/14Low-e panel with improved barrier layer and method for forming the same
672014017042206/19/14Low emissivity coating with optimal base layer material and layer stack
682014017043406/19/14Two layer ag process for low emissivity coatings
692014016605006/19/14Chuck for mounting a semiconductor wafer for liquid immersion processing
702014016610706/19/14Back-contact electron reflectors enhancing thin film solar cell efficiency
712014016613406/19/14Pump with reduced number of moving parts
722014016661606/19/14Combinatorial processing using a remote plasma source
732014016684006/19/14Substrate carrier
742014016695806/19/14Controlling reram forming voltage with doping
752014016722106/19/14Methods to improve leakage of high k materials
762014016722306/19/14Semiconductor cooling device
772014016906206/19/14Methods of manufacturing embedded bipolar switching resistive memory
782014017004906/19/14Low refractive index material by sputtering deposition method
792014017033506/19/14Methods and apparatus for combinatorial pecvd or peald
802014017077506/19/14Hpc workflow for rapid screening of materials and stacks for stt-ram
812014017080206/19/14Absorber layer for a thin film photovoltaic device with a double-graded band gap
822014017080306/19/14Cigs absorber formed by co-sputtered indium
832014017080606/19/14Tcos for high-efficiency crystalline si heterojunction solar cells
842014017083306/19/14Methods to improve leakage of high k materials
852014017085706/19/14Customizing etch selectivity with sequential multi-stage etches with complementary etchants
862014016238406/12/14Pvd-ald-cvd hybrid hpc for work function material screening
872014015819006/12/14Absorbers for high efficiency thin-film pv
882014015912006/12/14Conformal doping
892014016198906/12/14Anti-glare using a two-step texturing process
902014016199006/12/14Anti-glare glass/substrate via novel specific combinations of dry and wet processes
912014016239706/12/14High-efficiency thin-film photovoltaics with controlled homogeneity and defects
922014015162606/05/14Selector device using low leakage dielectric mimcap diode
932014015485906/05/14Methods and vehicles for high productivity combinatorial testing of materials for resistive random access memory cells
942014015024506/05/14Pneumatic clamping mechanism for cells with adjustable height
952014014759405/29/14Magnesium fluoride and magnesium oxyfluoride based anti-reflection coatings via chemical solution deposition processes
962014014447105/29/14Contamination control, rinsing, and purging methods to extend the life of components within combinatorial processing systems
972014014451205/29/14Methods and systems for dispensing different liquids for high productivity combinatorial processing
982014014477105/29/14Cooling efficiency method for fluid cooled sputter guns
992014014735005/29/14Cleaner for reactor component cleaning
1002014014758705/29/14Combinatorial spin deposition
1012014014759305/29/14Liquid cooled sputter apertured shields
1022014014153405/22/14Dielectric doping using high productivity combinatorial methods
1032014013860205/22/14Controlled localized defect paths for resistive memories
1042014014153405/22/14Dielectric doping using high productivity combinatorial methods
1052014013860205/22/14Controlled localized defect paths for resistive memories
1062014013484905/15/14Combinatorial site isolated plasma assisted deposition
1072014013092205/15/14Control methods and hardware configurations for ozone delivery systems
1082014013326505/15/14Contactless magnetically driven agitation systems
1092014013484905/15/14Combinatorial site isolated plasma assisted deposition
1102014013092205/15/14Control methods and hardware configurations for ozone delivery systems
1112014013326505/15/14Contactless magnetically driven agitation systems
1122014012403805/08/14Reactor cell isolation using differential pressure in a combinatorial reactor
1132014012435905/08/14New magnet design which improves erosion profile for pvd systems
1142014012472505/08/14Resistive random access memory cells having doped current limiting layers
1152014012478805/08/14Chemical vapor deposition system
1162014012481705/08/14Contact layers
1172014012742205/08/14Method and apparatus for high-k gate performance improvement and combinatorial processing
1182014012788705/08/14Chemical vapor deposition system
1192014012797405/08/14Combinatorial tool for mechanically-assisted surface polishing and cleaning
1202014012403805/08/14Reactor cell isolation using differential pressure in a combinatorial reactor
1212014012435905/08/14New magnet design which improves erosion profile for pvd systems
1222014012472505/08/14Resistive random access memory cells having doped current limiting layers
1232014012478805/08/14Chemical vapor deposition system
1242014012481705/08/14Contact layers
1252014012742205/08/14Method and apparatus for high-k gate performance improvement and combinatorial processing
1262014012788705/08/14Chemical vapor deposition system
1272014012797405/08/14Combinatorial tool for mechanically-assisted surface polishing and cleaning
1282014011076404/24/14Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
1292014011340304/24/14High efficiency cztse by a two-step approach
1302014011081304/24/14Absorbers for high efficiency thin-film pv
1312014011076404/24/14Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
1322014011340304/24/14High efficiency cztse by a two-step approach
1332014011081304/24/14Absorbers for high efficiency thin-film pv
1342014010328204/17/14Diffusion barrier layer for resistive random access memory cells
1352014010328404/17/14Reram cells including taxsiyn embedded resistors
1362014010248804/17/14Method and system for improving performance and preventing corrosion in multi-module cleaning chamber
1372014010656104/17/14Graphene barrier layers for interconnects and methods for forming the same
1382014010903004/17/14Method of determining electromigration (em) lifetimes and lifetime criteria
1392014010328204/17/14Diffusion barrier layer for resistive random access memory cells
1402014010328404/17/14Reram cells including taxsiyn embedded resistors
1412014010248804/17/14Method and system for improving performance and preventing corrosion in multi-module cleaning chamber
1422014010656104/17/14Graphene barrier layers for interconnects and methods for forming the same
1432014010903004/17/14Method of determining electromigration (em) lifetimes and lifetime criteria
1442014009978504/10/14Sacrificial low work function cap layer
1452014009978504/10/14Sacrificial low work function cap layer
1462014009978504/10/14Sacrificial low work function cap layer
1472014009059604/03/14Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
1482014009066804/03/14In-situ cleaning assembly
1492014009246204/03/14Electrochromic device with improved transparent conductor and method for forming the same
1502014009403704/03/14Method and apparatus for preventing native oxide regrowth
1512014009059604/03/14Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
1522014009066804/03/14In-situ cleaning assembly
1532014009246204/03/14Electrochromic device with improved transparent conductor and method for forming the same
1542014009403704/03/14Method and apparatus for preventing native oxide regrowth
1552014008423603/27/14Ald processing techniques for forming non-volatile resistive switching memories
1562014008494803/27/14Test vehicles for evaluating resistance of thin layers
1572014008749003/27/14Method and apparatus for improving particle performance
1582014008423603/27/14Ald processing techniques for forming non-volatile resistive switching memories
1592014008494803/27/14Test vehicles for evaluating resistance of thin layers
1602014008749003/27/14Method and apparatus for improving particle performance
1612014007714703/20/14Methods for selective etching of a multi-layer substrate
1622014007733603/20/14Leakage reduction in dram mim capacitors
1632014007733703/20/14High temperature ald process for metal oxide for dram applications
1642014007880803/20/14Embedded nonvolatile memory elements having resistive switching characteristics
1652014008023303/20/14Combinatorial optimization of interlayer parameters
1662014008025003/20/14Method of fabricating high efficiency cigs solar cells
1672014008028203/20/14Leakage reduction in dram mim capacitors
1682014008028403/20/14High temperature ald process of metal oxide for dram applications
1692014008032203/20/14Emissivity profile control for thermal uniformity
1702014007714703/20/14Methods for selective etching of a multi-layer substrate
1712014007733603/20/14Leakage reduction in dram mim capacitors
1722014007733703/20/14High temperature ald process for metal oxide for dram applications
1732014007880803/20/14Embedded nonvolatile memory elements having resistive switching characteristics
1742014008023303/20/14Combinatorial optimization of interlayer parameters
1752014008025003/20/14Method of fabricating high efficiency cigs solar cells
1762014008028203/20/14Leakage reduction in dram mim capacitors
1772014008028403/20/14High temperature ald process of metal oxide for dram applications
1782014008032203/20/14Emissivity profile control for thermal uniformity
1792014007310703/13/14Atomic layer deposition of metal oxide materials for memory applications
1802014007021303/13/14Methods for discretized processing and process sequence integration of regions of a substrate
1812014007143503/13/14High throughput quantum efficiency combinatorial characterization tool and method for combinatorial solar test substrates
1822014007310703/13/14Atomic layer deposition of metal oxide materials for memory applications
1832014007021303/13/14Methods for discretized processing and process sequence integration of regions of a substrate
1842014007143503/13/14High throughput quantum efficiency combinatorial characterization tool and method for combinatorial solar test substrates
1852014006578803/06/14Combinatorial approach for screening of ald film stacks
1862014006579903/06/14Methods and systems for low resistance contact formation
1872014006581903/06/14Methods and systems for low resistance contact formation
1882014006578803/06/14Combinatorial approach for screening of ald film stacks
1892014006579903/06/14Methods and systems for low resistance contact formation
1902014006581903/06/14Methods and systems for low resistance contact formation
1912014005737102/27/14High productivity combinatorial workflow for post gate etch clean development
1922014005453102/27/14Defect enhancement of a switching layer in a nonvolatile resistive memory element
1932014005515202/27/14Circular transmission line methods compatible with combinatorial processing of semiconductors
1942014005121002/20/14Nonvolatile memory elements
1952014004801302/20/14Seed layer for zno and doped-zno thin film nucleation and methods of seed layer deposition
1962014005091402/20/14Antireflective coatings with controllable porosity and refractive index properties using a combination of thermal or chemical treatments
1972014004238402/13/14Resistive-switching nonvolatile memory elements
1982014004172202/13/14Method of fabricating high efficiency cigs solar cells
1992014003835202/06/14Non-volatile resistive-switching memories
2002014003838002/06/14Multifunctional electrode
2012014003495702/06/14Index-matched insulators
2022014003784102/06/14Antireflective coatings with controllable porosity and durability properties using controlled exposure to alkaline vapor
2032014003885502/06/14High pressure parallel fixed bed reactor and method
2042014003088701/30/14Sputtering and aligning multiple layers having different boundaries
2052014001468101/16/14Calibration of a chemical dispense system
2062014001489201/16/14Resistive-switching memory element
2072014000793801/09/14Laser annealing for thin film solar cells
2082014000876301/09/14Distributed substrate top contact for moscap measurements
2092014000983401/09/14Novel antireflective coatings with graded refractive index
2102014001136701/09/14Low temperature etching of silicon nitride structures using phosphoric acid solutions
2112014000143001/02/14Surface treatment to improve resistive-switching characteristics
2122014000143101/02/14Reduction of forming voltage in semiconductor devices
2132014000433401/02/14Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties
2142013034223012/26/13High throughput current-voltage combinatorial characterization tool and method for combinatorial solar test substrates
2152013034064812/26/13Electroless deposition of platinum on copper
2162013034080512/26/13Methods of building crystalline silicon solar cells for use in combinatorial screening
2172013034158412/26/13Resistive-switching memory elements having improved switching characteristics
2182013034464612/26/13Absorbers for high-efficiency thin-film pv
2192013033449112/19/13Methods for forming nickel oxide films for use with resistive switching memory devices
2202013033830512/19/13Methods for coating a substrate with an amphiphilic compound
2212013032816812/12/13Manufacturable high-k dram mim capacitor structure
2222013033090312/12/13Manufacturable high-k dram mim capacitor structure
2232013033090212/12/13Enhanced non-noble electrode layers for dram capacitor cell
2242013033129612/12/13Method and system for combinatorial electroplating and characterization
2252013032816812/12/13Manufacturable high-k dram mim capacitor structure
2262013033090312/12/13Manufacturable high-k dram mim capacitor structure
2272013033090212/12/13Enhanced non-noble electrode layers for dram capacitor cell
2282013033129612/12/13Method and system for combinatorial electroplating and characterization
2292013032389012/05/13Aqua regia and hydrogen peroxide hcl combination to remove ni and nipt residues
2302013031984712/05/13Methods and apparatuses for low resistivity ag thin film using collimated sputtering
2312013032049512/05/13Integration of non-noble dram electrode
2322013032386312/05/13Method for generating graphene structures
2332013031356611/28/13Gan epitaxy with migration enhancement and surface energy modification
2342013031365611/28/13Methods of atomic layer deposition of hafnium oxide / erbium oxide bi-layer as advanced gate dielectrics
2352013031365711/28/13Methods of forming fluorinated hafnium oxide gate dielectrics by atomic layer deposition
2362013031497411/28/13Bipolar resistive-switching memory with a single diode per memory cell
2372013031647211/28/13High productivity combinatorial oxide terracing and pvd/ald metal deposition combined with lithography for gate work function extraction
2382013031654611/28/13Methods of atomic layer deposition of hafnium oxide as gate dielectrics
2392013030980411/21/13Method of fabricating high efficiency cigs solar cells
2402013030980511/21/13Method of fabricating high efficiency cigs solar cells
2412013029574811/07/13Method of uniform selenization and sulferization in a tube furnace
2422013028085310/24/13Combinatorial methods for making cigs solar cells
2432013027010310/17/13Method of enabling and controlling ozone concentration and flow
2442013027010410/17/13Combinatorial processing using mosaic sputtering targets
2452013024418609/19/13Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate
2462013024442509/19/13Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region
2472013023663209/12/13Graphene combinatorial processing
2482013022873509/05/13Interfacial oxide used as switching layer in a nonvolatile resistive memory element
2492013023096209/05/13Methods for forming nickel oxide films for use with resistive switching memory devices/us


ARCHIVE: New 2014 2013 2012 2011 2010 2009



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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Intermolecular, Inc. in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Intermolecular, Inc. with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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