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Intermolecular, Inc. patents


      
Recent patent applications related to Intermolecular, Inc.. Intermolecular, Inc. is listed as an Agent/Assignee. Note: Intermolecular, Inc. may have other listings under different names/spellings. We're not affiliated with Intermolecular, Inc., we're just tracking patents.

ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009 | Company Directory "I" | Intermolecular, Inc.-related inventors



Mixed-metal barrier films optimized by high-productivity combinatorial pvd

Intermolecular

Mixed-metal barrier films optimized by high-productivity combinatorial pvd

Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties

Intermolecular

Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties

Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties

Intermolecular

Molecular self-assembly in substrate processing

Search recent Press Releases: Intermolecular, Inc.-related press releases
Count Application # Date Intermolecular, Inc. patents (updated weekly) - BOOKMARK this page
12015003114801/29/15 new patent  Shadow mask for patterned deposition on substrates
22015002177201/22/15Mixed-metal barrier films optimized by high-productivity combinatorial pvd
32015002418201/22/15Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties
42015002177401/22/15Molecular self-assembly in substrate processing
52015002567001/22/15Substrate processing including correction for deposition location
62015001617801/15/15All around electrode for novel 3d rram applications
72015001745601/15/15Reducing voids caused by trapped acid on a dielectric surface
82015001778001/15/15Nonvolatile resistive memory element with an integrated oxygen isolation structure
92015001781501/15/15Combinatorial non-contact wet processing
102015000838601/08/15Morphology control of ultra-thin meox layer
112015001070501/08/15Methods for forming templated materials
122015000155501/01/15Methods for coating a substrate with an amphiphilic compound
132015000167601/01/15Method of forming an asymmetric mimcap or a schottky device as a selector element for a cross-bar memory array
142014037424012/25/14Multifunctional electrode
152014037793112/25/14Metal aluminum nitride embedded resistors for resistive random memory access cells
162014037064612/18/14Absorber layer for a thin film photovoltaic device with a double-graded band gap
172014032250710/30/14Systems, methods, and production coatings of low-emissivity glass
182014032288410/30/14Nonvolatile resistive memory element with a silicon-based switching layer
192014031533110/23/14Screening of surface passivation processes for germanium channels
202014030852810/16/14Systems, methods, and production coatings of low-emissivity glass
212014030267110/09/14Selective etching of copper and copper-barrier materials by an aqueous base solution with fluoride addition
222014026166009/18/14Tcos for heterojunction solar cells
232014026415509/18/14High-selectivity wet patterning of source-drain electrodes over taos for a bce device structure
242014026423909/18/14Using multi-layer mimcaps in the tunneling regime as selector element for a cross-bar memory array
252014026830109/18/14Low-emissivity panels including magnetic layers
262014026831609/18/14Systems, methods, and production coatings of low-emissivity glass including a ternary alloy
272014026831709/18/14High solar gain low-e panel and forming the same
282014026834809/18/14Anti-reflective coatings with porosity gradient and methods for forming the same
292014026834909/18/14Optical coatings with plate-shaped particles and methods for forming the same
302014026899309/18/14Nonvolatile resistive memory element with an oxygen-gettering layer
312014027212709/18/14Anti-glare coatings with sacrificial surface roughening agents and methods for forming the same
322014027229009/18/14Polymer anti-glare coatings and methods for forming the same
332014027233509/18/14Low-e glazing performance by seed structure optimization
342014027235309/18/14Color shift of high lsg low emissivity coating after heat treatment
352014027235409/18/14Method to generate high lsg low-emissivity coating with same color after heat treatment
362014027238409/18/14Anti-reflection coatings with aqueous particle dispersions and methods for forming the same
372014027238709/18/14Anti-glare coatings with aqueous particle dispersions and methods for forming the same
382014027239009/18/14Low-e panel with improved barrier layer process window and forming the same
392014027239509/18/14Low-emissivity glass including spacer layers compatible with heat treatment
402014027245409/18/14Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
412014027245509/18/14Titanium nickel niobium alloy barrier for low-emissivity coatings
422014027333309/18/14Methods for fabricating znose alloys
432014027346709/18/14Polycrystalline-silicon etch with low-peroxide apm
442014027349709/18/14Wet processing systems and methods with replenishment
452014026202809/18/14Non-contact wet-process cell confining liquid to a region of a solid surface by differential pressure
462014026274909/18/14Methods of plasma surface treatment in a pvd chamber
472014026422409/18/14Performance enhancement of forming-free reram devices using 3d nanoparticles
482014026424109/18/14Znte on tin or pt electrodes as a resistive switching element for reram applications
492014026425209/18/14Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
502014026428109/18/14Channel-last methods for making fets
512014026432009/18/14Compositional graded igzo thin film transistor
522014026432109/18/14Method of fabricating igzo by sputtering in oxidizing gas
532014026449209/18/14Counter-doped low-power finfet
542014026450709/18/14Fluorine passivation in cmos image sensors
552014026463409/18/14Finfet for rf and analog integrated circuits
562014026470809/18/14Optical absorbers
572014026474709/18/14Deposition of anisotropic dielectric layers orientationally matched to the physically separated substrate
582014026482509/18/14Ultra-low resistivity contacts
592014026487109/18/14Method to increase interconnect reliability
602014026837709/18/14Ultrathin coating for one way mirror applications
612014026900409/18/14Method for improving data retention of reram chips operating at low operating temperatures
622014027211209/18/14Combinatorial methods and systems for developing electrochromic materials and devices
632014027330009/18/14Method for forming reram chips operating at low operating temperatures
642014027330909/18/14Controlling radical lifetimes in a remote plasma chamber
652014027331109/18/14Optical absorbers
662014027331409/18/14High productivity combinatorial workflow to screen and design chalcogenide materials as non volatile memory current selector
672014027334009/18/14High productivity combinatorial screening for stable metal oxide tfts
682014027334109/18/14Methods for forming back-channel-etch devices with copper-based electrodes
692014027340409/18/14Advanced targeted microwave degas system
702014027342709/18/14Electrode for low-leakage devices
712014027349309/18/14Hydrogen plasma cleaning of germanium oxide surfaces
722014027352509/18/14Atomic layer deposition of reduced-leakage post-transition metal oxide films
732014025611109/11/14Nonvolatile memory elements
742014025256509/11/14Nucleation interface for high-k layer on germanium
752014024664009/04/14Doped electrodes used to inhibit oxygen loss in reram device
762014024764909/04/14Bipolar resistive-switching memory with a single diode per memory cell
772014023174408/21/14Methods for forming resistive switching memory elements
782014023095508/21/14Systems for discretized processing of regions of a substrate
792014023170408/21/14Silicon texturing formulations
802014022505608/14/14Resistive-switching memory elements having improved switching characteristics
812014022787108/14/14Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region
822014022788008/14/14Combinatorial plasma enhanced deposition and etchtechniques
832014019126207/10/14Material with tunable index of refraction
842014019136507/10/14Device design for partially oriented rutile dielectrics
852014018267007/03/14Light trapping and antireflective coatings
862014018369607/03/14Methods to improve leakage for zro2 based high k mim capacitor
872014018503407/03/14Method to extend single wavelength ellipsometer to obtain spectra of refractive index
882014018659807/03/14Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
892014018699507/03/14Method of fabricating cigs solar cells with high band gap by sequential processing
902014018704107/03/14High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures
912014018705107/03/14Poly removal for replacement gate with an apm mixture
922014018705207/03/14Selective etching of hafnium oxide using diluted hydrofluoric acid
932014018266507/03/14Optical absorbers
942014018303607/03/14In situ sputtering target measurement
952014018316107/03/14Methods and systems for site-isolated combinatorial substrate processing using a mask
962014018343207/03/14Moox-based resistance switching materials
972014018343907/03/14Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
982014018366407/03/14Fullerene-based capacitor electrode
992014018366607/03/14Flourine-stabilized interface
1002014018369507/03/14Methods for reproducible flash layer deposition
1012014018369707/03/14High work function, manufacturable top electrode
1022014018373707/03/14Diffusion barriers
1032014018535707/03/14Barrier design for steering elements
1042014018661707/03/14Low-emissivity coatings
1052014018701507/03/14Methods to improve leakage for zro2 based high k mim capacitor
1062014018701607/03/14High work function, manufacturable top electrode
1072014018701807/03/14Methods for reproducible flash layer deposition
1082014018826407/03/14Workflow manager and bar coding system for processing of samples/substrates in hpc (high productivity combinatorial) r&d environment
1092014017535906/26/14Diffusion barrier layer for resistive random access memory cells
1102014017561806/26/14Transition metal aluminate and high k dielectric semiconductor stack
1112014017704206/26/14Novel silver barrier materials for low-emissivity applications
1122014017865706/26/14Antireflection coatings
1132014017908206/26/14Selective etching of hafnium oxide using non-aqueous solutions
1142014017910706/26/14Etching silicon nitride using dilute hydrofluoric acid
1152014017911206/26/14High productivity combinatorial techniques for titanium nitride etching
1162014017448106/26/14Processing and cleaning substrates
1172014017454006/26/14Ald process window combinatorial screening tool
1182014017465606/26/14Method to improve the operational robustness and safety of combinatorial processing systems
1192014017490706/26/14High deposition rate chamber with co-sputtering capabilities
1202014017491006/26/14Sputter gun shield
1212014017491106/26/14Methods and systems for reducing particles during physical vapor deposition
1222014017491806/26/14Sputter gun
1232014017492106/26/14Multi-piece target and magnetron to prevent sputtering of target backing materials
1242014017542206/26/14Deposition of rutile films with very high dielectric constant
1252014017556706/26/14Method of depositing films with narrow-band conductive properties
1262014017560306/26/14Method of forming an asymmetric mimcap or a schottky device as a selector element for a cross-bar memory array
1272014017560406/26/14Two step deposition of molybdenum dioxide electrode for high quality dielectric stacks
1282014017737806/26/14High dilution ratio by successively preparing and diluting chemicals
1292014017857806/26/14Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
1302014017858306/26/14Combinatorial methods and systems for developing thermochromic materials and devices
1312014017903006/26/14Dissolution rate monitor
1322014017903306/26/14Methods for forming templated materials
1332014017909506/26/14Methods and systems for controlling gate dielectric interfaces of mosfets
1342014017910006/26/14Method to control depth profiles of dopants using a remote plasma source
1352014017911306/26/14Surface treatment methods and systems for substrate processing
1362014017912306/26/14Site-isolated rapid thermal processing methods and apparatus
1372014016647206/19/14Method and temperature control to improve low emissivity coatings
1382014016875906/19/14Methods and apparatuses for patterned low emissivity panels
1392014017030806/19/14Antireflective coatings with gradation and methods for forming the same
1402014017033806/19/14Pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
1412014017041306/19/14Silver based conductive layer for flexible electronics
1422014017042106/19/14Low-e panel with improved barrier layer and forming the same
1432014017042206/19/14Low emissivity coating with optimal base layer material and layer stack
1442014017043406/19/14Two layer ag process for low emissivity coatings
1452014016605006/19/14Chuck for mounting a semiconductor wafer for liquid immersion processing
1462014016610706/19/14Back-contact electron reflectors enhancing thin film solar cell efficiency
1472014016613406/19/14Pump with reduced number of moving parts
1482014016661606/19/14Combinatorial processing using a remote plasma source
1492014016684006/19/14Substrate carrier
1502014016695806/19/14Controlling reram forming voltage with doping
1512014016722106/19/14Methods to improve leakage of high k materials
1522014016722306/19/14Semiconductor cooling device
1532014016906206/19/14Methods of manufacturing embedded bipolar switching resistive memory
1542014017004906/19/14Low refractive index material by sputtering deposition method
1552014017033506/19/14Methods and combinatorial pecvd or peald
1562014017077506/19/14Hpc workflow for rapid screening of materials and stacks for stt-ram
1572014017080206/19/14Absorber layer for a thin film photovoltaic device with a double-graded band gap
1582014017080306/19/14Cigs absorber formed by co-sputtered indium
1592014017080606/19/14Tcos for high-efficiency crystalline si heterojunction solar cells
1602014017083306/19/14Methods to improve leakage of high k materials
1612014017085706/19/14Customizing etch selectivity with sequential multi-stage etches with complementary etchants
1622014016238406/12/14Pvd-ald-cvd hybrid hpc for work function material screening
1632014015819006/12/14Absorbers for high efficiency thin-film pv
1642014015912006/12/14Conformal doping
1652014016198906/12/14Anti-glare using a two-step texturing process
1662014016199006/12/14Anti-glare glass/substrate via novel specific combinations of dry and wet processes
1672014016239706/12/14High-efficiency thin-film photovoltaics with controlled homogeneity and defects
1682014015162606/05/14Selector device using low leakage dielectric mimcap diode
1692014015485906/05/14Methods and vehicles for high productivity combinatorial testing of materials for resistive random access memory cells
1702014015024506/05/14Pneumatic clamping mechanism for cells with adjustable height
1712014014759405/29/14Magnesium fluoride and magnesium oxyfluoride based anti-reflection coatings via chemical solution deposition processes
1722014014447105/29/14Contamination control, rinsing, and purging methods to extend the life of components within combinatorial processing systems
1732014014451205/29/14Methods and systems for dispensing different liquids for high productivity combinatorial processing
1742014014477105/29/14Cooling efficiency fluid cooled sputter guns
1752014014735005/29/14Cleaner for reactor component cleaning
1762014014758705/29/14Combinatorial spin deposition
1772014014759305/29/14Liquid cooled sputter apertured shields
1782014014153405/22/14Dielectric doping using high productivity combinatorial methods
1792014013860205/22/14Controlled localized defect paths for resistive memories
1802014013484905/15/14Combinatorial site isolated plasma assisted deposition
1812014013092205/15/14Control methods and hardware configurations for ozone delivery systems
1822014013326505/15/14Contactless magnetically driven agitation systems
1832014012403805/08/14Reactor cell isolation using differential pressure in a combinatorial reactor
1842014012435905/08/14New magnet design which improves erosion profile for pvd systems
1852014012472505/08/14Resistive random access memory cells having doped current limiting layers
1862014012478805/08/14Chemical vapor deposition system
1872014012481705/08/14Contact layers
1882014012742205/08/14Method and high-k gate performance improvement and combinatorial processing
1892014012788705/08/14Chemical vapor deposition system
1902014012797405/08/14Combinatorial tool for mechanically-assisted surface polishing and cleaning
1912014011076404/24/14Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
1922014011340304/24/14High efficiency cztse by a two-step approach
1932014011081304/24/14Absorbers for high efficiency thin-film pv
1942014010328204/17/14Diffusion barrier layer for resistive random access memory cells
1952014010328404/17/14Reram cells including taxsiyn embedded resistors
1962014010248804/17/14Method and system for improving performance and preventing corrosion in multi-module cleaning chamber
1972014010656104/17/14Graphene barrier layers for interconnects and methods for forming the same
1982014010903004/17/14Method of determining electromigration (em) lifetimes and lifetime criteria
1992014009978504/10/14Sacrificial low work function cap layer
2002014009059604/03/14Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
2012014009066804/03/14In-situ cleaning assembly
2022014009246204/03/14Electrochromic device with improved transparent conductor and forming the same
2032014009403704/03/14Method and preventing native oxide regrowth
2042014008423603/27/14Ald processing techniques for forming non-volatile resistive switching memories
2052014008494803/27/14Test vehicles for evaluating resistance of thin layers
2062014008749003/27/14Method and improving particle performance
2072014007714703/20/14Methods for selective etching of a multi-layer substrate
2082014007733603/20/14Leakage reduction in dram mim capacitors
2092014007733703/20/14High temperature ald process for metal oxide for dram applications
2102014007880803/20/14Embedded nonvolatile memory elements having resistive switching characteristics
2112014008023303/20/14Combinatorial optimization of interlayer parameters
2122014008025003/20/14Method of fabricating high efficiency cigs solar cells
2132014008028203/20/14Leakage reduction in dram mim capacitors
2142014008028403/20/14High temperature ald process of metal oxide for dram applications
2152014008032203/20/14Emissivity profile control for thermal uniformity
2162014007310703/13/14Atomic layer deposition of metal oxide materials for memory applications
2172014007021303/13/14Methods for discretized processing and process sequence integration of regions of a substrate
2182014007143503/13/14High throughput quantum efficiency combinatorial characterization tool and combinatorial solar test substrates
2192014006578803/06/14Combinatorial approach for screening of ald film stacks
2202014006579903/06/14Methods and systems for low resistance contact formation
2212014006581903/06/14Methods and systems for low resistance contact formation
2222014005737102/27/14High productivity combinatorial workflow for post gate etch clean development
2232014005453102/27/14Defect enhancement of a switching layer in a nonvolatile resistive memory element
2242014005515202/27/14Circular transmission line methods compatible with combinatorial processing of semiconductors
2252014005121002/20/14Nonvolatile memory elements
2262014004801302/20/14Seed layer for zno and doped-zno thin film nucleation and methods of seed layer deposition
2272014005091402/20/14Antireflective coatings with controllable porosity and refractive index properties using a combination of thermal or chemical treatments
2282014004238402/13/14Resistive-switching nonvolatile memory elements
2292014004172202/13/14Method of fabricating high efficiency cigs solar cells
2302014003835202/06/14Non-volatile resistive-switching memories
2312014003838002/06/14Multifunctional electrode
2322014003495702/06/14Index-matched insulators
2332014003784102/06/14Antireflective coatings with controllable porosity and durability properties using controlled exposure to alkaline vapor
2342014003885502/06/14High pressure parallel fixed bed reactor and method
2352014003088701/30/14Sputtering and aligning multiple layers having different boundaries
2362014001468101/16/14Calibration of a chemical dispense system
2372014001489201/16/14Resistive-switching memory element
2382014000793801/09/14Laser annealing for thin film solar cells
2392014000876301/09/14Distributed substrate top contact for moscap measurements
2402014000983401/09/14Novel antireflective coatings with graded refractive index
2412014001136701/09/14Low temperature etching of silicon nitride structures using phosphoric acid solutions
2422014000143001/02/14Surface treatment to improve resistive-switching characteristics
2432014000143101/02/14Reduction of forming voltage in semiconductor devices
2442014000433401/02/14Antireflective coatings with self-cleaning, moisture resistance and antimicrobial properties
2452013034223012/26/13High throughput current-voltage combinatorial characterization tool and combinatorial solar test substrates
2462013034064812/26/13Electroless deposition of platinum on copper
2472013034080512/26/13Methods of building crystalline silicon solar cells for use in combinatorial screening
2482013034158412/26/13Resistive-switching memory elements having improved switching characteristics
2492013034464612/26/13Absorbers for high-efficiency thin-film pv


ARCHIVE: New 2015 2014 2013 2012 2011 2010 2009



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