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Intermolecular, Inc. patents


      
Recent patent applications related to Intermolecular, Inc.. Intermolecular, Inc. is listed as an Agent/Assignee. Note: Intermolecular, Inc. may have other listings under different names/spellings. We're not affiliated with Intermolecular, Inc., we're just tracking patents.

ARCHIVE: New 2014 2013 2012 2011 2010 2009 | Company Directory "I" | Intermolecular, Inc.-related inventors



Search recent Press Releases: Intermolecular, Inc.-related press releases
Count Application # Date Intermolecular, Inc. patents (updated weekly) - BOOKMARK this page
12014026166009/18/14 new patent  Tcos for heterojunction solar cells
22014026415509/18/14 new patent  High-selectivity wet patterning of source-drain electrodes over taos for a bce device structure
32014026423909/18/14 new patent  Using multi-layer mimcaps in the tunneling regime as selector element for a cross-bar memory array
42014026830109/18/14 new patent  Low-emissivity panels including magnetic layers
52014026831609/18/14 new patent  Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy
62014026831709/18/14 new patent  High solar gain low-e panel and method for forming the same
72014026834809/18/14 new patent  Anti-reflective coatings with porosity gradient and methods for forming the same
82014026834909/18/14 new patent  Optical coatings with plate-shaped particles and methods for forming the same
92014026899309/18/14 new patent  Nonvolatile resistive memory element with an oxygen-gettering layer
102014027212709/18/14 new patent  Anti-glare coatings with sacrificial surface roughening agents and methods for forming the same
112014027229009/18/14 new patent  Polymer anti-glare coatings and methods for forming the same
122014027233509/18/14 new patent  Low-e glazing performance by seed structure optimization
132014027235309/18/14 new patent  Color shift of high lsg low emissivity coating after heat treatment
142014027235409/18/14 new patent  Method to generate high lsg low-emissivity coating with same color after heat treatment
152014027238409/18/14 new patent  Anti-reflection coatings with aqueous particle dispersions and methods for forming the same
162014027238709/18/14 new patent  Anti-glare coatings with aqueous particle dispersions and methods for forming the same
172014027239009/18/14 new patent  Low-e panel with improved barrier layer process window and method for forming the same
182014027239509/18/14 new patent  Low-emissivity glass including spacer layers compatible with heat treatment
192014027245409/18/14 new patent  Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
202014027245509/18/14 new patent  Titanium nickel niobium alloy barrier for low-emissivity coatings
212014027333309/18/14 new patent  Methods for fabricating znose alloys
222014027346709/18/14 new patent  Polycrystalline-silicon etch with low-peroxide apm
232014027349709/18/14 new patent  Wet processing systems and methods with replenishment
242014026202809/18/14 new patent  Non-contact wet-process cell confining liquid to a region of a solid surface by differential pressure
252014026274909/18/14 new patent  Methods of plasma surface treatment in a pvd chamber
262014026422409/18/14 new patent  Performance enhancement of forming-free reram devices using 3d nanoparticles
272014026424109/18/14 new patent  Znte on tin or pt electrodes as a resistive switching element for reram applications
282014026425209/18/14 new patent  Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
292014026428109/18/14 new patent  Channel-last methods for making fets
302014026432009/18/14 new patent  Compositional graded igzo thin film transistor
312014026432109/18/14 new patent  Method of fabricating igzo by sputtering in oxidizing gas
322014026449209/18/14 new patent  Counter-doped low-power finfet
332014026450709/18/14 new patent  Fluorine passivation in cmos image sensors
342014026463409/18/14 new patent  Finfet for rf and analog integrated circuits
352014026470809/18/14 new patent  Optical absorbers
362014026474709/18/14 new patent  Deposition of anisotropic dielectric layers orientationally matched to the physically separated substrate
372014026482509/18/14 new patent  Ultra-low resistivity contacts
382014026487109/18/14 new patent  Method to increase interconnect reliability
392014026837709/18/14 new patent  Ultrathin coating for one way mirror applications
402014026900409/18/14 new patent  Method for improving data retention of reram chips operating at low operating temperatures
412014027211209/18/14 new patent  Combinatorial methods and systems for developing electrochromic materials and devices
422014027330009/18/14 new patent  Method for forming reram chips operating at low operating temperatures
432014027330909/18/14 new patent  Controlling radical lifetimes in a remote plasma chamber
442014027331109/18/14 new patent  Optical absorbers
452014027331409/18/14 new patent  High productivity combinatorial workflow to screen and design chalcogenide materials as non volatile memory current selector
462014027334009/18/14 new patent  High productivity combinatorial screening for stable metal oxide tfts
472014027334109/18/14 new patent  Methods for forming back-channel-etch devices with copper-based electrodes
482014027340409/18/14 new patent  Advanced targeted microwave degas system
492014027342709/18/14 new patent  Electrode for low-leakage devices
502014027349309/18/14 new patent  Hydrogen plasma cleaning of germanium oxide surfaces
512014027352509/18/14 new patent  Atomic layer deposition of reduced-leakage post-transition metal oxide films
522014025611109/11/14Nonvolatile memory elements
532014025256509/11/14Nucleation interface for high-k layer on germanium
542014024664009/04/14Doped electrodes used to inhibit oxygen loss in reram device
552014024764909/04/14Bipolar resistive-switching memory with a single diode per memory cell
562014023174408/21/14Methods for forming resistive switching memory elements
572014023095508/21/14Systems for discretized processing of regions of a substrate
582014023170408/21/14Silicon texturing formulations
592014022505608/14/14Resistive-switching memory elements having improved switching characteristics
602014022787108/14/14Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region
612014022788008/14/14Combinatorial plasma enhanced deposition and etchtechniques
622014019126207/10/14Material with tunable index of refraction
632014019136507/10/14Device design for partially oriented rutile dielectrics
642014018267007/03/14Light trapping and antireflective coatings
652014018369607/03/14Methods to improve leakage for zro2 based high k mim capacitor
662014018503407/03/14Method to extend single wavelength ellipsometer to obtain spectra of refractive index
672014018659807/03/14Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
682014018699507/03/14Method of fabricating cigs solar cells with high band gap by sequential processing
692014018704107/03/14High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures
702014018705107/03/14Poly removal for replacement gate with an apm mixture
712014018705207/03/14Selective etching of hafnium oxide using diluted hydrofluoric acid
722014018266507/03/14Optical absorbers
732014018303607/03/14In situ sputtering target measurement
742014018316107/03/14Methods and systems for site-isolated combinatorial substrate processing using a mask
752014018343207/03/14Moox-based resistance switching materials
762014018343907/03/14Current selector for non-volatile memory in a cross bar array based on defect and band engineering metal-dielectric-metal stacks
772014018366407/03/14Fullerene-based capacitor electrode
782014018366607/03/14Flourine-stabilized interface
792014018369507/03/14Methods for reproducible flash layer deposition
802014018369707/03/14High work function, manufacturable top electrode
812014018373707/03/14Diffusion barriers
822014018535707/03/14Barrier design for steering elements
832014018661707/03/14Low-emissivity coatings
842014018701507/03/14Methods to improve leakage for zro2 based high k mim capacitor
852014018701607/03/14High work function, manufacturable top electrode
862014018701807/03/14Methods for reproducible flash layer deposition
872014018826407/03/14Workflow manager and bar coding system for processing of samples/substrates in hpc (high productivity combinatorial) r&d environment
882014017535906/26/14Diffusion barrier layer for resistive random access memory cells
892014017561806/26/14Transition metal aluminate and high k dielectric semiconductor stack
902014017704206/26/14Novel silver barrier materials for low-emissivity applications
912014017865706/26/14Antireflection coatings
922014017908206/26/14Selective etching of hafnium oxide using non-aqueous solutions
932014017910706/26/14Etching silicon nitride using dilute hydrofluoric acid
942014017911206/26/14High productivity combinatorial techniques for titanium nitride etching
952014017448106/26/14Processing and cleaning substrates
962014017454006/26/14Ald process window combinatorial screening tool
972014017465606/26/14Method to improve the operational robustness and safety of combinatorial processing systems
982014017490706/26/14High deposition rate chamber with co-sputtering capabilities
992014017491006/26/14Sputter gun shield
1002014017491106/26/14Methods and systems for reducing particles during physical vapor deposition
1012014017491806/26/14Sputter gun
1022014017492106/26/14Multi-piece target and magnetron to prevent sputtering of target backing materials
1032014017542206/26/14Deposition of rutile films with very high dielectric constant
1042014017556706/26/14Method of depositing films with narrow-band conductive properties
1052014017560306/26/14Method of forming an asymmetric mimcap or a schottky device as a selector element for a cross-bar memory array
1062014017560406/26/14Two step deposition of molybdenum dioxide electrode for high quality dielectric stacks
1072014017737806/26/14High dilution ratio by successively preparing and diluting chemicals
1082014017857806/26/14Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
1092014017858306/26/14Combinatorial methods and systems for developing thermochromic materials and devices
1102014017903006/26/14Dissolution rate monitor
1112014017903306/26/14Methods for forming templated materials
1122014017909506/26/14Methods and systems for controlling gate dielectric interfaces of mosfets
1132014017910006/26/14Method to control depth profiles of dopants using a remote plasma source
1142014017911306/26/14Surface treatment methods and systems for substrate processing
1152014017912306/26/14Site-isolated rapid thermal processing methods and apparatus
1162014016647206/19/14Method and apparatus for temperature control to improve low emissivity coatings
1172014016875906/19/14Methods and apparatuses for patterned low emissivity panels
1182014017030806/19/14Antireflective coatings with gradation and methods for forming the same
1192014017033806/19/14Pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
1202014017041306/19/14Silver based conductive layer for flexible electronics
1212014017042106/19/14Low-e panel with improved barrier layer and method for forming the same
1222014017042206/19/14Low emissivity coating with optimal base layer material and layer stack
1232014017043406/19/14Two layer ag process for low emissivity coatings
1242014016605006/19/14Chuck for mounting a semiconductor wafer for liquid immersion processing
1252014016610706/19/14Back-contact electron reflectors enhancing thin film solar cell efficiency
1262014016613406/19/14Pump with reduced number of moving parts
1272014016661606/19/14Combinatorial processing using a remote plasma source
1282014016684006/19/14Substrate carrier
1292014016695806/19/14Controlling reram forming voltage with doping
1302014016722106/19/14Methods to improve leakage of high k materials
1312014016722306/19/14Semiconductor cooling device
1322014016906206/19/14Methods of manufacturing embedded bipolar switching resistive memory
1332014017004906/19/14Low refractive index material by sputtering deposition method
1342014017033506/19/14Methods and apparatus for combinatorial pecvd or peald
1352014017077506/19/14Hpc workflow for rapid screening of materials and stacks for stt-ram
1362014017080206/19/14Absorber layer for a thin film photovoltaic device with a double-graded band gap
1372014017080306/19/14Cigs absorber formed by co-sputtered indium
1382014017080606/19/14Tcos for high-efficiency crystalline si heterojunction solar cells
1392014017083306/19/14Methods to improve leakage of high k materials
1402014017085706/19/14Customizing etch selectivity with sequential multi-stage etches with complementary etchants
1412014016238406/12/14Pvd-ald-cvd hybrid hpc for work function material screening
1422014015819006/12/14Absorbers for high efficiency thin-film pv
1432014015912006/12/14Conformal doping
1442014016198906/12/14Anti-glare using a two-step texturing process
1452014016199006/12/14Anti-glare glass/substrate via novel specific combinations of dry and wet processes
1462014016239706/12/14High-efficiency thin-film photovoltaics with controlled homogeneity and defects
1472014015162606/05/14Selector device using low leakage dielectric mimcap diode
1482014015485906/05/14Methods and vehicles for high productivity combinatorial testing of materials for resistive random access memory cells
1492014015024506/05/14Pneumatic clamping mechanism for cells with adjustable height
1502014014759405/29/14Magnesium fluoride and magnesium oxyfluoride based anti-reflection coatings via chemical solution deposition processes
1512014014447105/29/14Contamination control, rinsing, and purging methods to extend the life of components within combinatorial processing systems
1522014014451205/29/14Methods and systems for dispensing different liquids for high productivity combinatorial processing
1532014014477105/29/14Cooling efficiency method for fluid cooled sputter guns
1542014014735005/29/14Cleaner for reactor component cleaning
1552014014758705/29/14Combinatorial spin deposition
1562014014759305/29/14Liquid cooled sputter apertured shields
1572014014153405/22/14Dielectric doping using high productivity combinatorial methods
1582014013860205/22/14Controlled localized defect paths for resistive memories
1592014014153405/22/14Dielectric doping using high productivity combinatorial methods
1602014013860205/22/14Controlled localized defect paths for resistive memories
1612014013484905/15/14Combinatorial site isolated plasma assisted deposition
1622014013092205/15/14Control methods and hardware configurations for ozone delivery systems
1632014013326505/15/14Contactless magnetically driven agitation systems
1642014013484905/15/14Combinatorial site isolated plasma assisted deposition
1652014013092205/15/14Control methods and hardware configurations for ozone delivery systems
1662014013326505/15/14Contactless magnetically driven agitation systems
1672014012403805/08/14Reactor cell isolation using differential pressure in a combinatorial reactor
1682014012435905/08/14New magnet design which improves erosion profile for pvd systems
1692014012472505/08/14Resistive random access memory cells having doped current limiting layers
1702014012478805/08/14Chemical vapor deposition system
1712014012481705/08/14Contact layers
1722014012742205/08/14Method and apparatus for high-k gate performance improvement and combinatorial processing
1732014012788705/08/14Chemical vapor deposition system
1742014012797405/08/14Combinatorial tool for mechanically-assisted surface polishing and cleaning
1752014012403805/08/14Reactor cell isolation using differential pressure in a combinatorial reactor
1762014012435905/08/14New magnet design which improves erosion profile for pvd systems
1772014012472505/08/14Resistive random access memory cells having doped current limiting layers
1782014012478805/08/14Chemical vapor deposition system
1792014012481705/08/14Contact layers
1802014012742205/08/14Method and apparatus for high-k gate performance improvement and combinatorial processing
1812014012788705/08/14Chemical vapor deposition system
1822014012797405/08/14Combinatorial tool for mechanically-assisted surface polishing and cleaning
1832014011076404/24/14Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
1842014011340304/24/14High efficiency cztse by a two-step approach
1852014011081304/24/14Absorbers for high efficiency thin-film pv
1862014011076404/24/14Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
1872014011340304/24/14High efficiency cztse by a two-step approach
1882014011081304/24/14Absorbers for high efficiency thin-film pv
1892014010328204/17/14Diffusion barrier layer for resistive random access memory cells
1902014010328404/17/14Reram cells including taxsiyn embedded resistors
1912014010248804/17/14Method and system for improving performance and preventing corrosion in multi-module cleaning chamber
1922014010656104/17/14Graphene barrier layers for interconnects and methods for forming the same
1932014010903004/17/14Method of determining electromigration (em) lifetimes and lifetime criteria
1942014010328204/17/14Diffusion barrier layer for resistive random access memory cells
1952014010328404/17/14Reram cells including taxsiyn embedded resistors
1962014010248804/17/14Method and system for improving performance and preventing corrosion in multi-module cleaning chamber
1972014010656104/17/14Graphene barrier layers for interconnects and methods for forming the same
1982014010903004/17/14Method of determining electromigration (em) lifetimes and lifetime criteria
1992014009978504/10/14Sacrificial low work function cap layer
2002014009978504/10/14Sacrificial low work function cap layer
2012014009978504/10/14Sacrificial low work function cap layer
2022014009059604/03/14Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
2032014009066804/03/14In-situ cleaning assembly
2042014009246204/03/14Electrochromic device with improved transparent conductor and method for forming the same
2052014009403704/03/14Method and apparatus for preventing native oxide regrowth
2062014009059604/03/14Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
2072014009066804/03/14In-situ cleaning assembly
2082014009246204/03/14Electrochromic device with improved transparent conductor and method for forming the same
2092014009403704/03/14Method and apparatus for preventing native oxide regrowth
2102014008423603/27/14Ald processing techniques for forming non-volatile resistive switching memories
2112014008494803/27/14Test vehicles for evaluating resistance of thin layers
2122014008749003/27/14Method and apparatus for improving particle performance
2132014008423603/27/14Ald processing techniques for forming non-volatile resistive switching memories
2142014008494803/27/14Test vehicles for evaluating resistance of thin layers
2152014008749003/27/14Method and apparatus for improving particle performance
2162014007714703/20/14Methods for selective etching of a multi-layer substrate
2172014007733603/20/14Leakage reduction in dram mim capacitors
2182014007733703/20/14High temperature ald process for metal oxide for dram applications
2192014007880803/20/14Embedded nonvolatile memory elements having resistive switching characteristics
2202014008023303/20/14Combinatorial optimization of interlayer parameters
2212014008025003/20/14Method of fabricating high efficiency cigs solar cells
2222014008028203/20/14Leakage reduction in dram mim capacitors
2232014008028403/20/14High temperature ald process of metal oxide for dram applications
2242014008032203/20/14Emissivity profile control for thermal uniformity
2252014007714703/20/14Methods for selective etching of a multi-layer substrate
2262014007733603/20/14Leakage reduction in dram mim capacitors
2272014007733703/20/14High temperature ald process for metal oxide for dram applications
2282014007880803/20/14Embedded nonvolatile memory elements having resistive switching characteristics
2292014008023303/20/14Combinatorial optimization of interlayer parameters
2302014008025003/20/14Method of fabricating high efficiency cigs solar cells
2312014008028203/20/14Leakage reduction in dram mim capacitors
2322014008028403/20/14High temperature ald process of metal oxide for dram applications
2332014008032203/20/14Emissivity profile control for thermal uniformity
2342014007310703/13/14Atomic layer deposition of metal oxide materials for memory applications
2352014007021303/13/14Methods for discretized processing and process sequence integration of regions of a substrate
2362014007143503/13/14High throughput quantum efficiency combinatorial characterization tool and method for combinatorial solar test substrates
2372014007310703/13/14Atomic layer deposition of metal oxide materials for memory applications
2382014007021303/13/14Methods for discretized processing and process sequence integration of regions of a substrate
2392014007143503/13/14High throughput quantum efficiency combinatorial characterization tool and method for combinatorial solar test substrates
2402014006578803/06/14Combinatorial approach for screening of ald film stacks
2412014006579903/06/14Methods and systems for low resistance contact formation
2422014006581903/06/14Methods and systems for low resistance contact formation
2432014006578803/06/14Combinatorial approach for screening of ald film stacks
2442014006579903/06/14Methods and systems for low resistance contact formation
2452014006581903/06/14Methods and systems for low resistance contact formation
2462014005737102/27/14High productivity combinatorial workflow for post gate etch clean development
2472014005453102/27/14Defect enhancement of a switching layer in a nonvolatile resistive memory element
2482014005515202/27/14Circular transmission line methods compatible with combinatorial processing of semiconductors
2492014005121002/20/14Nonvolatile memory elements


ARCHIVE: New 2014 2013 2012 2011 2010 2009



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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Intermolecular, Inc. in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Intermolecular, Inc. with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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