Real Time Touch



new TOP 200 Companies filing patents this week

new Companies with the Most Patent Filings (2010+)




Real Time Touch

Jsr Corporation patents


Recent patent applications related to Jsr Corporation. Jsr Corporation is listed as an Agent/Assignee. Note: Jsr Corporation may have other listings under different names/spellings. We're not affiliated with Jsr Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "J" | Jsr Corporation-related inventors


Method for producing three-dimensional object

A method for producing a three-dimensional (3D) object having excellent moldability and mechanical characteristics is provided. The method includes a molding step of irradiating a composition filled in the cavity of a mold with electromagnetic waves having a wavelength of from 0.01 m to 100 m, and molding the composition... Jsr Corporation

Production process for solder electrode and use thereof

The present invention relates to a production process for a solder electrode, including: a step (1) of forming a coating film of a photosensitive resin composition on a substrate having an electrode pad; a step (2) of forming resist having an opening in a region corresponding to the electrode pad... Jsr Corporation

Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method

Provided is a treatment composition for chemical mechanical polishing, for treating an object to be treated including a wiring layer containing a metal, the treatment composition for chemical mechanical polishing containing: (A) a nitrogen-containing compound; (B) at least one kind of compound selected from the group consisting of a surfactant... Jsr Corporation

Immunoglobulin-binding protein and affinity carrier using same

Provided is an affinity chromatography carrier that maintains high immunoglobulin-binding capacity and high alkali resistance. An immunoglobulin-binding protein including at least one modified immunoglobulin-binding domain, the modified immunoglobulin-binding domain being a polypeptide consisting of an amino acid sequence of an immunoglobulin-binding domain selected from the group consisting of the B... Jsr Corporation

Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method

A treatment composition for chemical mechanical polishing includes: (A) a water-soluble amine; (B) a water-soluble polymer having an aromatic hydrocarbon group-containing repeating unit; and an aqueous medium. The treatment composition for chemical mechanical polishing preferably further includes (C) an organic acid having an aromatic hydrocarbon group and has a pH... Jsr Corporation

Liquid crystal element and producing the same

A liquid crystal element includes a pair of substrates disposed to face each other, a liquid crystal layer disposed between the pair of substrates, and a liquid crystal alignment layer provided on each of the liquid crystal layer sides of the pair of substrates. The liquid crystal layer includes a... Jsr Corporation

Treatment agent for inhibiting substrate pattern collapse and treatment substrate

A treatment agent for inhibiting substrate pattern collapse contains a polymer and a polar solvent. A treatment method of a substrate includes: applying the treatment agent onto a substrate having a pattern formed thereon; and drying the treatment agent applied onto the substrate. The polymer is preferably a hydrophilic polymer.... Jsr Corporation

Modified conjugated diene polymer, producing modified conjugated diene polymer, polymer composition, crosslinked polymer, and tire

A modified conjugated diene-based polymer is produced by reacting a conjugated diene-based polymer having an alkali metal or an alkali-earth metal at a terminal of the polymer with a compound represented by formula (1). R1 and R2 independently represent a hydrocarbyl group having 20 or fewer carbon atoms. R3 represents... Jsr Corporation

Copolymer, polymer composition, and crosslinked polymer

A copolymer having a structural unit derived from a conjugated diene compound and a structural unit derived from an α-olefin having 3 to 8 carbon atoms, wherein the copolymer has a melting point within a temperature range of 0 to 10° C. and has a fusion enthalpy of 5 J/g... Jsr Corporation

Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production patterned substrate

A resist underlayer film-forming composition includes a solvent, and a compound comprising an aromatic ring. The solvent includes a first solvent having a normal boiling point of less than 156° C., and a second solvent having a normal boiling point of no less than 156° C. and less than 300°... Jsr Corporation

Optical filter and ambient light sensor including optical filter

An optical filter including a base member having a layer containing near-infrared absorbing fine particles and a dielectric multilayer film, the optical filter satisfying a requirement that, in a wavelength range of 400 nm to 650 nm, an average of transmittance of any of light incident from a direction perpendicular... Jsr Corporation

Pattern-forming method

... Jsr Corporation

Polymer, resin composition and resin molded product

The polymer includes a first structural unit represented by formula (1), a second structural unit represented by formula (2), and a third structural unit represented by formula (3). R1, R2, R10 and R11 each independently represent a halogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a... Jsr Corporation

Polymer, resin composition and resin molded product

A polymer includes a first structural unit represented by formula (1-1), (1-2) or (1-3) and a second structural unit represented by formula (2) or (3). In the formulae (1-1) to (1-3), (2) and (3), R1, R10 and R11 each represent a halogen atom, a monovalent hydrocarbon group having 1 to... Jsr Corporation

Pattern-forming method and composition

A pattern-forming method includes forming a base pattern including a first polymer on a front face side. A composition is applied on at least a lateral face of the base pattern. The composition includes at least one polymer that is capable of interacting with the first polymer. The composition is... Jsr Corporation

Solid-state imaging device

the second optical layer includes a compound (B) having at least one absorption maximum at the wavelength of from 755 to 1050 nm, an absorption maximum wavelength on a longest wavelength side of the compound (B) is larger than an absorption maximum wavelength on the longest wavelength side of the... Jsr Corporation

Resist pattern-forming method

A resist pattern-forming method includes applying a photoresist composition directly or indirectly on a front face of a substrate to form a photoresist film. A topcoat layer is laminated directly or indirectly on a front face of the photoresist film. The photoresist film is subjected to liquid immersion lithography in... Jsr Corporation

Semiconductor treatment composition and treatment method

A semiconductor treatment composition includes potassium and sodium, and has a potassium content MK (ppm) and a sodium content MNa (ppm) that satisfy MK/MNa=5×103 to 1×105.... Jsr Corporation

Semiconductor treatment composition and treatment method

A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL.... Jsr Corporation

Resist pattern-forming method

A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes... Jsr Corporation

Solid-state imaging device and infrared-absorbing composition

Provided is a solid-state imaging device that includes: first pixels provided with a color filter layer having a transmission band in a visible light wavelength region on a light-receiving surface of a first light-receiving element; second pixels provided with an infrared pass filter layer having a transmission band in an... Jsr Corporation

Solid-state imaging device, infrared-absorbing composition, and flattened-film-forming curable composition

Provided is a solid-state imaging device that includes: a first pixel provided with a color filter layer having a transmission band in a visible light wavelength region on a light-receiving surface of a first light-receiving element; a second pixel provided with an infrared pass filter layer having a transmission band... Jsr Corporation

Method for manufacturing structure having recessed pattern, resin composition, forming electroconductive film, electronic circuit, and electronic device

(ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.... Jsr Corporation

Radiation-sensitive composition and pattern-forming method

A radiation-sensitive composition includes an organic acid, particles including a metal oxide as a principal component, and an acid generating agent that is capable of generating an acid upon irradiation with a radioactive ray. A pKa, which is a logarithmic value of a reciprocal of an acid dissociation constant Ka,... Jsr Corporation

Solid phase carrier, ligand-bound solid phase carrier, detecting or separating target substance, and producing solid phase carrier

provided that R5 is not an organic group having a zwitterionic structure.... Jsr Corporation

Binder composition for storage device electrode, slurry for storage device electrode, storage device electrode, and storage device

An electrical storage device electrode binder composition exhibits an excellent binding capability, and makes it possible to produce an electrical storage device electrode that exhibits excellent charge-discharge durability characteristics. The electrical storage device electrode binder composition includes a polymer (A) and a liquid medium (B), wherein the polymer (A) is... Jsr Corporation

Photoresist composition, production photoresist composition, and resist pattern-forming method

A photoresist composition includes a radiation-sensitive acid generator, particles, and a first solvent. The radiation-sensitive acid generator is capable of generating an acid upon irradiation with a radioactive ray, an action of the acid allowing a solubility of a film made from the photoresist composition in a developer solution to... Jsr Corporation

Pattern-forming method

A pattern-forming method enables a resist pattern having a favorable shape with a desired size to be conveniently formed while generation of defects is inhibited, and by using such a superior resist pattern as a mask, a pattern having a favorable shape and arrangement can be formed. The pattern-forming method... Jsr Corporation

Cleaning composition for semiconductor substrate and cleaning method

A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which... Jsr Corporation

Radiation-sensitive composition and pattern-forming method

A radiation-sensitive composition includes particles including a metal oxide as a principal component, a radiation-sensitive acid generator, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom,... Jsr Corporation

Radiation-sensitive composition and pattern-forming method

A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an... Jsr Corporation

08/24/17 / #20170243980

Thin film transistor and mos field effect transistor that include hydrophilic/hydrophobic material, and methods for manufacturing the same

The thin film transistor includes a first insulating layer provided on a substrate; a source electrode and a drain electrode that are provided on the first insulating layer; a semiconductor layer provided so as to cover the first insulating layer, the source electrode, and the drain electrode; a second insulating... Jsr Corporation

08/17/17 / #20170233561

Crosslinked rubber, member for tires, vibration-proofing member, member for belts, and rubber composition

A cross-linked rubber exhibits high strength and excellent abrasion resistance as compared with a known cross-linked rubber. The cross-linked rubber is obtained by cross-linking a rubber composition that includes a hydrogenated conjugated diene-based polymer, an olefin-based rubber, and a cross-linking agent, the hydrogenated conjugated diene-based polymer being a hydrogenated product... Jsr Corporation

08/17/17 / #20170235225

Coloring composition, colored cured film, and solid-state imaging element

and wherein, in the Formula (X), Ra and Rb each independently represent a monovalent organic group, and p and q each independently represent an integer from 0 to 5.... Jsr Corporation

08/03/17 / #20170218229

Germanium smoothing and chemical mechanical planarization processes

Method for chemical mechanical planarization is provided, which includes: forming a dielectric layer containing at least one opening, the dielectric layer is located on a substrate; epitaxially growing a germanium material within the at least one opening of the dielectric layer, the germanium material extending above a topmost surface of... Jsr Corporation

07/27/17 / #20170211225

Sizing agent, composition, and formed article

A composition improves mechanical strength (e.g., impact resistance and flexural strength), and achieves improved mass productivity by reducing a situation in which a strand fuzzes during extrusion. The composition includes a conjugated diene-based polymer (A), fibers (B), and a thermoplastic resin (C), the composition including the conjugated diene-based polymer (A)... Jsr Corporation

07/20/17 / #20170204216

Block copolymer

A block copolymer includes a polystyrene block including a styrene unit, and a polyalkyl (meth)acrylate block including an alkyl (meth)acrylate unit. The block copolymer includes an organic group that is bound to at least one end of a main chain of the block copolymer and that comprises a hetero atom.... Jsr Corporation

07/13/17 / #20170199453

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid... Jsr Corporation

06/29/17 / #20170184960

Pattern-forming method

A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound... Jsr Corporation

06/29/17 / #20170184961

Pattern-forming method

R1X)n  (1)... Jsr Corporation

06/22/17 / #20170176878

Cleaning immersion liquid, immersion liquid cleaning composition, and substrate

A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the... Jsr Corporation

06/08/17 / #20170160637
06/01/17 / #20170153543

Photosensitive resin composition, forming resist pattern, and producing metallic pattern

The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass of a structural unit represented by the Formula (1) below; a compound (B) having at least one ethylenically unsaturated double bond per molecule; and a... Jsr Corporation

06/01/17 / #20170154782

Composition for film formation, film, production patterned substrate, and compound

A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon... Jsr Corporation

05/25/17 / #20170145051

Carrier for affinity chromatography

The affinity chromatography carrier includes a solid support including a copolymer including (M-1) more than 20 parts by mass and 99.5 parts by mass or less of a structural unit derived from an epoxy group-containing monovinyl monomer with respect to and (M-2) 0.5 to 80 parts by mass of a... Jsr Corporation

05/25/17 / #20170146528

Solid support, ligand-bound solid support, detection or separation target substance, solid support production method, and ligand-bound solid support production method

To provide a solid-phase carrier to which impurities are hard to nonspecifically adsorb. A solid-phase carrier, formed by binding a chain polymer, wherein the chain polymer comprises a random polymer structure containing a first structural unit having a reactive functional group, and a second structural unit having no reactive functional... Jsr Corporation

05/25/17 / #20170149064

Binder composition for power storage devices

The present invention provides an electrical storage device binder composition that can produce an electrode that achieves improved charge-discharge characteristics. The composition includes a polymer (A) and a liquid medium (B), and further includes particles having a particle size of 10 to 50 micrometers in a number of 1,000 to... Jsr Corporation

05/18/17 / #20170138936

Method for capturing target substance, solid-phase carrier for capturing target substance, and producing solid-phase carrier

A method for capturing a target substance, including: a step for preparing a solid-phase carrier for capturing a target substance, the carrier having a base material, at least a portion of the surface thereof being formed of or coated with a saccharide, and having a linker of 5-100 atoms having... Jsr Corporation

05/11/17 / #20170131632

Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method

An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4... Jsr Corporation

05/11/17 / #20170131633

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating... Jsr Corporation

05/11/17 / #20170131634

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating... Jsr Corporation

05/04/17 / #20170127533

Production process for solder electrode, production process for laminate, laminate and electronic part

A production process for a solder electrode, including: a step (I) of forming an opening in a portion of a film provided on a substrate having an electrode pad, the portion corresponding to the electrode pad on the substrate, and thereby forming a resist from the film on the substrate,... Jsr Corporation

04/27/17 / #20170115570

Resin composition, resist pattern-forming method and polymer

A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at... Jsr Corporation

04/20/17 / #20170110332

Indium phosphide smoothing and chemical mechanical planarization processes

A chemical mechanical planarization for indium phosphide material is provided in which at least one opening is formed within a dielectric layer located on a substrate. An indium phosphide material is epitaxially grown within the at least one opening of the dielectric layer which extends above a topmost surface of... Jsr Corporation

04/20/17 / #20170110333

Group iii arsenide material smoothing and chemical mechanical planarization processes

A chemical mechanical planarization for a Group III arsenide material is provided in which at least one opening is formed within a dielectric layer located on a substrate. A Group III arsenide material is epitaxially grown within the at least one opening of the dielectric layer which extends above a... Jsr Corporation

04/20/17 / #20170110334

Germanium smoothing and chemical mechanical planarization processes

Method for chemical mechanical planarization is provided, which includes: forming a dielectric layer containing at least one opening, the dielectric layer is located on a substrate; epitaxially growing a germanium material within the at least one opening of the dielectric layer, the germanium material extending above a topmost surface of... Jsr Corporation

03/30/17 / #20170088740
03/16/17 / #20170073541

Composition for forming liquid immersion upper layer film, and polymer

An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by... Jsr Corporation

03/16/17 / #20170075221

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises:... Jsr Corporation

03/16/17 / #20170075224

Resist pattern-forming method

A resist pattern-forming method comprises applying a chemically amplified resist material on a substrate to form a resist film on the substrate. The resist film is patternwise exposed to a radioactive ray having a wavelength of no greater than 250 nm. The resist film patternwise exposed is floodwise exposed to... Jsr Corporation

Patent Packs
03/02/17 / #20170058237

Lens solution, contact lens, and production method therefor

(B) a repeating unit having a polyoxyalkylene group in a side chain and having the end of the side chain formed from an alkyl group having 5 to 30 carbon atoms, an alkanoyl group having 5 to 30 carbon atoms, or an aryl group.... Jsr Corporation

03/02/17 / #20170059992

Resist pattern-forming method and chemically amplified radiation-sensitive resin composition

A resist pattern-forming method comprises applying a chemically amplified radiation-sensitive resin composition on a substrate to form a resist film. The chemically amplified radiation-sensitive resin composition comprises a first component solubility in a developer solution of which is capable of being altered by an action of an acid, a second... Jsr Corporation

02/16/17 / #20170043320

Solid-phase carrier, production solid-phase carrier, carrier for affinity refining, production filler for affinity chromatography, filler for affinity chromatography, chromatography column, and refining method

There are provided a solid-phase carrier and a carrier for affinity refining that exhibit high dynamic binding capacity when a ligand is immobilized, have excellent antifouling properties, and are unlikely to have non-specific adsorption of impurities. The solid-phase carrier has a functional group capable of fixing a ligand and is... Jsr Corporation

02/09/17 / #20170038679

Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound

The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3−, wherein a hydrogen atom or an electron-donating group bonds to an α... Jsr Corporation

02/09/17 / #20170042038

Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device

A process for producing a substrate having wiring includes steps (i) to (v) described as follows: (i) applying a radiation-sensitive composition on a substrate to form a coating film; (ii) irradiating a prescribed part of the coating film with radiation to allow the coating film to have a radiation-irradiated region... Jsr Corporation

01/12/17 / #20170010270

Method for assaying soluble gpc3 protein

The present invention relates to a method for assaying soluble GPC3 protein in a test sample, comprising using two different antibodies binding to different epitopes present in the N-terminal region of GPC3 protein.... Jsr Corporation

01/05/17 / #20170003417

Optical filter, and solid-state image pickup device and camera module using the optical filter

The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing... Jsr Corporation

01/05/17 / #20170003425

Optical filter, and solid-state image pickup device and camera module using the optical filter

The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing... Jsr Corporation

01/05/17 / #20170003592

Pattern-forming method

SiX4   (1)... Jsr Corporation

01/05/17 / #20170003595

Pattern-forming method, resin, and composition

A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing... Jsr Corporation








ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009



###

This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Jsr Corporation in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Jsr Corporation with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

###