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L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude
L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude_20131212
  

L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude patents

Recent patent applications related to L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude. L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude is listed as an Agent/Assignee. Note: L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude may have other listings under different names/spellings. We're not affiliated with L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "L" | L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude-related inventors




Date L air Liquide Soci xe9 t xe9 Anonyme Pour L etude Et L exploitation Des Proc xe9 d xe9 s Georges Claude patents (updated weekly) - BOOKMARK this page
11/09/17Short inorganic trisilylamine-based polysilazanes for thin film deposition
10/26/17Nasal high flow therapy device and method
10/26/17Equipment for injecting a gas into a cesspool
09/14/17On-site medical gas production plant and associated operating method
09/07/17Recycling system and process of a methanol-to-propylene and steam cracker plant
09/07/17Tap for pressurized fluid
07/20/17Molybdenum- and tungsten-containing precursors for thin film deposition
06/29/17Vapor deposition of silicon-containing films using penta-substituted disilanes
06/22/17Iodine-containing compounds for etching semiconductor structures
06/08/17Pressure sensor and pressurized fluid apparatus comprising such a sensor
05/04/17Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing
04/27/17Valve unit for gas container with a pressure-indicating or autonomy-indication device near the top
02/23/17Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films
02/16/17Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films
02/16/17Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films
02/02/17Nasal cannula assembly with inhalation valves communicating with a deformable reservoir
02/02/17Nasal cannula assembly with flow control passage communicating with a deformable reservoir
11/24/16Pressurized fluid cylinder comprising an electronic data-display device
10/27/16Process for forming gate insulators for tft structures
10/20/16Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films
10/20/16Niobium-containing film forming compositions and vapor deposition of niobium-containing films
10/20/16Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films
10/20/16Niobium-containing film forming compositions and vapor deposition of niobium-containing films
09/15/16Synthesis methods for halosilanes
05/19/16Titanium-containing film forming compositions for vapor deposition of titanium-containing films
04/28/16Group 8-containing film forming compositions, their synthesis, and use in film deposition
04/28/16Cobalt-containing film forming compositions, their synthesis, and use in film deposition
04/21/16Amino(bromo)silane precursors for ald/cvd silicon-containing film applications and methods of using the same
04/21/16Vapor deposition of silicon-containing films using penta-substituted disilanes
03/24/16Tantalum- or vanadium-containing film forming compositions and vapor deposition of tantalum- or vanadium-containing films
03/03/16Equipment for injecting a gas into a cesspool
02/18/16Internally coated vessel for housing a metal halide
12/31/15Si-containing film forming precursors and methods of using the same
12/17/15Device and supplying fluid
12/03/15Process and plant for producing olefins from oxygenates
12/03/15Station for filling tanks wtih compressed gas
10/29/15Gas supply device
09/17/15Protective cap for gas cylinder with electronic display screen positioned towards the top
09/17/15Protective cap with pivoting attachment system for gas cylinder
08/20/15Method for controlling a homogeneous batch of pressurised fluid cylinders
06/25/15Silicon- and zirconium-containing compositions for vapor deposition of zirconium-containing films
05/28/15Valve for pressurized fluid and tank furnished with such a valve
04/23/15Chalcogenide-containing film forming compositions and vapor deposition of chalcogenide-containing films
03/12/15Titanium bis diazadienyl precursor for vapor deposition of titanium oxide films
02/26/15Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursors
01/15/15Method for filling a tank with gas
08/28/14Cylinder valve for pressurized gas cylinder and a gas cylinder comprising such a valve
07/31/14Apparatus and integrated process for separating a mixture of carbon dioxide and at least one other gas and for separating air by cryogenic distillation
07/31/14Filler coupling and corresponding receptacle and filling method
05/22/14Microwave plasma generating devices and plasma torches
12/12/13Apparatus for tracking compliance with a treatment for obstructive sleep apnea
08/15/13Method for operating an on-site medical gas production plant and associated plant
01/24/13Heteroleptic pyrrolecarbaldimine precursors
12/13/12Method for packaging an no/n2 gaseous mixture
12/01/11Method for arc welding with a dual gas flow, with a central flow containing argon and hydrogen, and with a sheath flow including argon and either carbon dioxide or oxygen
12/12/13Apparatus for tracking compliance with a treatment for obstructive sleep apnea







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