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Mapper Lithography Ip B v patents

Recent patent applications related to Mapper Lithography Ip B v. Mapper Lithography Ip B v is listed as an Agent/Assignee. Note: Mapper Lithography Ip B v may have other listings under different names/spellings. We're not affiliated with Mapper Lithography Ip B v, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "M" | Mapper Lithography Ip B v-related inventors




Date Mapper Lithography Ip B v patents (updated weekly) - BOOKMARK this page
06/29/17Control lithography apparatus
12/22/16Method and arrangement for handling and processing substrates
10/27/16Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun
09/15/16Individual beam pattern placement verification in multiple beam lithography
05/19/16Load lock transferring substrates in a lithography system
05/05/16Target processing unit
03/10/16Beam grid layout
03/03/16Cabinet for electronic equipment
01/07/16Apparatus for transferring a substrate in a lithography system
11/19/15Arrangement for transporting radicals
11/12/15Enclosure for a target processing machine
10/29/15Network architecture and protocol for cluster of lithography machines
09/24/15Interferometer module
08/27/15Multi-axis differential interferometer
08/27/15Enhanced stitching by overlap dose and feature reduction
08/27/15Proximity effect correction in a charged particle lithography system
07/23/15Electrical charge regulation for a semiconductor substrate during charged particle beam processing
07/09/15Method for forming an optical fiber array
07/02/15Cathode arrangement, electron gun, and lithography system comprising such electron gun
07/02/15Cathode arrangement, electron gun, and lithography system comprising such electron gun
06/25/15Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method.
06/25/15Charged particle lithography system with sensor assembly
06/11/15Charged particle beam lithography system and target positioning device
06/04/15Method for determining a beamlet position and determining a distance between two beamlets in a multi-beamlet exposure apparatus
05/28/15Vacuum chamber with base plate
05/21/15Modulation device and power supply arrangement
05/21/15Multi-electrode electron optics
05/21/15Multi-electrode cooling arrangement
05/21/15Multi-electrode stack arrangement
05/07/15Charged particle lithography system and beam generator
04/23/15Lithography processing a target, such as a wafer
04/23/15Charged particle lithography system with alignment sensor and beam measurement sensor
04/02/15Target processing unit
03/12/15Charged particle optical device
03/05/15Method and predicting a growth rate of deposited contaminants
02/26/15Drying use in a lithography system
01/29/15Arrangement and transporting radicals
01/15/15Support module for lithography system
01/01/15Device for spot size measurement at wafer level using a knife edge and a manufacturing such a device
07/17/14Vibration isolation module and substrate processing system
03/06/14Charged particle lithography system with intermediate chamber
02/20/14Capacitive sensing system
05/30/13Method and system for realizing a vacuum in a vacuum chamber
05/16/13Method for splitting a pattern for use in a multi-beamlet lithography apparatus
05/02/13Network architecture and protocol for cluster of lithography machines
02/21/13Arrangement of optical fibers, and a forming such arrangement
02/21/13System for magnetic shielding
02/21/13Apparatus for transferring a substrate in a lithography system
02/14/13Network architecture for lithography machine cluster
02/07/13Method of processing a substrate in a lithography system
01/10/13Current measurement system
01/03/13Active shield for capacitive measurement system
11/22/12Charged particle beam modulator
11/22/12Charged particle lithography system with aperture array cooling
11/22/12Charged particle lithography system with intermediate chamber
11/22/12Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
11/15/12Data path for lithography apparatus
11/15/12Method of generating a two-level pattern for lithographic processing and pattern generator using the same
11/15/12Dual pass scanning
11/15/12Pattern data conversion for lithography system
11/15/12Data path for lithography apparatus
11/01/12Modulation device and charged particle multi-beamlet lithography system using the same
09/06/12Direct write lithography system
07/12/12Lithography system and processing substrates in such a lithography system
06/14/12Lithography system and refracting
Patent Packs
06/14/12Projection lens arrangement
06/14/12Lithography system, modulation device and manufacturing a fiber fixation substrate
04/19/12Beamlet blanker arrangement
04/19/12Projection lens arrangement
03/15/12Projection lens arrangement
02/23/12Substrate support structure, clamp preparation unit, and lithography system
11/03/11Charged particle multi-beamlet lithography system, modulation device , and manufacturing thereof
10/27/11Charged particle multi-beamlet lithography system with modulation device
10/27/11Modulation device and charged particle multi-beamlet lithography system using the same
10/27/11Exposure method
10/20/11Lithography system, sensor, converter element and manufacture
10/20/11Capacitive sensing system with differential pairs
09/08/11Electrostatic lens structure
08/11/11Integrated sensor system
08/11/11Capacitive sensing system
Patent Packs
04/07/11Imaging system
03/31/11Method of and system for exposing a target
03/03/11Lithography machine and substrate handling arrangement
02/24/11Charged particle lithography apparatus and generating vacuum in a vacuum chamber
11/04/10Charged particle optical system comprising an electrostatic deflector
10/28/10Method and arrangement for realizing a vacuum in a vacuum chamber
10/28/10Gravity-assisted drain valve for restricting intake of mildew spores
10/28/10Charged particle lithography apparatus and generating vacuum in a vacuum chamber
10/21/10Method of clamping a substrate and clamp preparation unit
09/23/10Substrate support structure, clamp preparation unit, and lithography system
09/23/10Preparation unit for lithography machine







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