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Mapper Lithography Ip B v patents


Recent patent applications related to Mapper Lithography Ip B v. Mapper Lithography Ip B v is listed as an Agent/Assignee. Note: Mapper Lithography Ip B v may have other listings under different names/spellings. We're not affiliated with Mapper Lithography Ip B v, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "M" | Mapper Lithography Ip B v-related inventors


Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system

A method of creating electronic devices such as semiconductor chips using a maskless lithographic exposure system such as a charged particle multi-beamlet lithography system (301A-301D). The maskless lithographic exposure system comprises a lithography subsystem (316) including a maskless pattern writer such as a charged particle multi-beamlet lithography machine (1) or... Mapper Lithography Ip B v

Secure chips with serial numbers

An electronic device comprising a semiconductor chip which comprises a plurality of structures formed in the semiconductor chip, wherein the semiconductor chip is a member of a set of semiconductor chips, the set of semiconductor chips comprises a plurality of subsets of semiconductor chips, and the semiconductor chip is a... Mapper Lithography Ip B v

Secure chips with serial numbers

An electronic device comprising a semiconductor chip which comprises a plurality of structures formed in the semiconductor chip, wherein the semiconductor chip is a member of a set of semiconductor chips, the set of semiconductor chips comprises a plurality of subsets of semiconductor chips, and the semiconductor chip is a... Mapper Lithography Ip B v

Apparatus and processing or imaging a sample

The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature, which is at or near the first... Mapper Lithography Ip B v

Method and device for generating a decoded and synchronized output

The invention relates to a invention relates to a method and decoding device for receiving an input bit-stream comprising a sequence of n-bit pattern symbols as well as a unique n-bit comma symbol for synchronization, and for generating therefrom a synchronized output comprising a sequence of m-bit pattern words, with... Mapper Lithography Ip B v

Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame comprising corresponding n-bit symbols

The present invention relates to a method and encoding device for encoding a sequence of m-bit pattern words and outputting as a bit-stream a frame comprising corresponding n-bit symbols as well as a predetermined comma symbol, wherein m<n, wherein occurrences of false commas in the output bitstream are avoided. The... Mapper Lithography Ip B v

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.... Mapper Lithography Ip B v

Substrate processing apparatus

the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.... Mapper Lithography Ip B v

Electrostatic lens structure

An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second... Mapper Lithography Ip B v

Lithography system with differential interferometer module

The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second... Mapper Lithography Ip B v

High voltage shielding and cooling in a charged particle beam generator

The invention relates to a charged particle beam generator. The generator may comprise a high voltage shielding arrangement (201) for shielding components outside the shielding arrangement from high voltages within the shielding arrangement, and a vacuum pump (220) located outside the shielding arrangement for regulating a pressure of a space... Mapper Lithography Ip B v

Vacuum chamber arrangement for charged particle beam generator

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a... Mapper Lithography Ip B v

Control lithography apparatus

A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the... Mapper Lithography Ip B v








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