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Mks Instruments Inc patents


Recent patent applications related to Mks Instruments Inc. Mks Instruments Inc is listed as an Agent/Assignee. Note: Mks Instruments Inc may have other listings under different names/spellings. We're not affiliated with Mks Instruments Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "M" | Mks Instruments Inc-related inventors


Systems and methods for generating a conductive liquid comprising deionized water with ammonia gas dissolved therein

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture comprising the ammonia gas and the transfer gas. ... Mks Instruments Inc

Supervisory control of radio frequency (rf) impedance tuning operation

A radio frequency (rf) control system including a rf generator having a power amplifier that outputs a rf signal and a controller. A matching network receives the rf signal and generates at least one rf output signal. ... Mks Instruments Inc

Gas measurement system

Presented herein are systems and methods for quantifying trace and/or ultra-trace levels of a species—for example, h2s or h2o—in a natural gas line. The systems and methods employ a tunable laser, such as a tunable diode laser, vertical-cavity surface-emitting laser (vcsel), external cavity diode laser or a vertical external-cavity surface-emitting laser (vecsel) or a tunable quantum cascade laser (qcl). ... Mks Instruments Inc

Cold cathode ionization vacuum gauge

A cold cathode ionization vacuum gauge includes an extended anode electrode and a cathode electrode surrounding the anode electrode along its length and forming a discharge space between the anode electrode and the cathode electrode. The vacuum gauge further includes an electrically conductive guard ring electrode interposed between the cathode electrode and the anode electrode about a base of the anode electrode to collect leakage electrical current, and a discharge starter device disposed over and electrically connected with the guard ring electrode, the starter device having a plurality of tips directed toward the anode and forming a gap between the tips and the anode.. ... Mks Instruments Inc

Micromachined bulk acoustic wave resonator pressure sensor

A pressure sensor includes a piezoelectric substrate having a generally planar structure and an anchor location fixing the piezoelectric substrate at the periphery of the planar structure of the piezoelectric substrate. The planar structure of the piezoelectric substrate has a first region having a first characteristic thickness adjacent to the anchor location, and a second region have a second characteristic thickness at a middle region of the substrate. ... Mks Instruments Inc

Compact microwave plasma applicator utilizing conjoining electric fields

A plasma applicator includes a plasma discharge tube and a microwave cavity at least partially surrounding a portion of the plasma discharge tube. Microwave energy is coupled to the microwave cavity via a coupling iris. ... Mks Instruments Inc

Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network

An evc including coarse and fine tuning networks. The coarse tuning network includes a circuit: receiving a rf input signal from a rf generator; outputting a rf output signal to a reference terminal or load; and receiving a dc bias voltage. ... Mks Instruments Inc

Trans-impedance amplifier with increased dynamic range

A wide dynamic range trans-impedance amplifier includes a first trans-impedance amplifier configured to receive a first input current and produce a first voltage as a function of the first input current, and a second trans-impedance amplifier configured to receive a second input current and produce a second voltage as a function of the second input current. A current steering element causes a first portion of current from a current source to flow to the first trans-impedance amplifier until the first current portion reaches the first threshold current, and causes a second portion of current from the current source to flow to the second trans-impedance amplifier, until the second current portion reaches the second threshold current. ... Mks Instruments Inc

Predictive diagnostics systems and methods using vacuum pressure control valves

Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. ... Mks Instruments Inc

Toroidal plasma channel with varying cross-section areas along the channel

An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. ... Mks Instruments Inc

Actively cooled vacuum isolation valve

A cooled isolation valve includes a valve body, a stationary element coupled to the valve body, and a movable closure element movable with respect to the stationary element between a closed position in which the movable closure element and the stationary element are brought together and an open position. One of the movable closure element and the stationary element includes a sealing element. ... Mks Instruments Inc

Toroidal plasma abatement apparatus and method

An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. ... Mks Instruments Inc

Method and apparatus for deposition cleaning in a pumping line

A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. ... Mks Instruments Inc

System for and method of monitoring flow through mass flow controllers in real time

A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.. . ... Mks Instruments Inc

07/13/17 / #20170198396

Method and apparatus for valve deposition cleaning and prevention by plasma discharge

A valve assembly is provided that comprises a vacuum valve including a body and an electrically grounded surface on at least a surface of the body and an electrode extending substantially parallel to the electrically grounded surface and adjacent to the vacuum valve. The vacuum valve assembly also includes a barrier dielectric, a least a portion of which is located between the electrode and the electrically grounded surface. ... Mks Instruments Inc

06/22/17 / #20170178879

Sputtering system and method including an arc detection

A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (dc) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. ... Mks Instruments Inc

06/22/17 / #20170173846

Method and apparatus for processing dielectric materials using microwave energy

Methods and systems are provided for heating a dielectric preform material. An exemplary method includes inserting the preform material into a microwave cavity along a longitudinal axis of the microwave cavity and supplying the microwave cavity with microwave power having a frequency that corresponds to an axial wavelength along the longitudinal axis of the microwave cavity. ... Mks Instruments Inc

03/16/17 / #20170074742

Pressure sensor with real time health monitoring and compensation

A pressure sensor may measure gas or liquid pressure. A chamber may have an inlet that receives the gas or liquid. ... Mks Instruments Inc

03/02/17 / #20170064802

Direct three phase parallel resonant inverter for reactive gas generator applications

A power system for a reactive gas generator can include a direct three phase inverter. A resonant tank can further be included to receive a square wave output of the direct three phase inverter and provide a sine wave output. ... Mks Instruments Inc

03/02/17 / #20170062187

Plasma rf bias cancellation system

An rf supply system in which a bias rf generator operates at a first frequency to provide a bias rf output signal and a source rf generator operates at a second frequency to provide a source rf output signal. The rf output power signals are applied to a load, such as a plasma chamber. ... Mks Instruments Inc

03/02/17 / #20170062186

Feedback control by rf waveform tailoring for ion energy distribution

A system for controlling rf power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. ... Mks Instruments Inc

03/02/17 / #20170060143

Method and apparatus for pressure-based flow measurement in non-critical flow conditions

Methods, systems, and apparatus for pressure-based flow measurement are provided. A processor receives, from the pressure-based mass flow controller (mfc), an upstream pressure value pu. ... Mks Instruments Inc

02/23/17 / #20170054418

Supervisory control of radio frequency (rf) impedance tuning operation

A radio frequency (rf) control system including a rf generator having a power amplifier that outputs a rf signal and a controller. A matching network receives the rf signal and generates at least one rf output signal. ... Mks Instruments Inc

02/09/17 / #20170036906

Stress relief mems structure and package

Stress relief structures and methods that can be applied to mems sensors requiring a hermetic seal and that can be simply manufactured are disclosed. The system includes a sensor having a first surface and a second surface, the second surface being disposed away from the first surface, the second surface also being disposed away from a package surface and located between the first surface and the package surface, a number of support members, each support member extending from the second surface to the package surface, the support members being disposed on and operatively connected to only a portion of the second surface. ... Mks Instruments Inc

01/19/17 / #20170018926

Unified rf power delivery single input, multiple output control for continuous and pulse mode operation

A radio frequency (rf) control system including a rf generator having a power amplifier that outputs a rf signal and a controller. A matching network receives the rf signal and generates a plurality of rf output signals. ... Mks Instruments Inc

01/12/17 / #20170013678

Trimmable heater

A trimmable heater mat has a plurality of heater mat segments that together comprise a length of the heater mat. Each of the heater mat segments has a segment heater element connected to a power bus for generating heat. ... Mks Instruments Inc

01/12/17 / #20170010172

Ionization pressure gauge with bias voltage and emission current control and measurement

Devices and corresponding methods are provided to operate a hot cathode ionization pressure gauge (hcig). A transistor circuit can be configured to pass the electron emission current with low input impedance and to control cathode bias voltage. ... Mks Instruments Inc

01/12/17 / #20170010171

Devices and methods for feedthrough leakage current detection and decontamination in ionization gauges

Devices and corresponding methods can be provided to test an ionization gauge, such as a hot cathode ionization gauge, for leakage currents and to respond to the leakage currents to improve pressure measurement accuracy. Responding to the leakage current can include applying a correction to a pressure measurement signal generated by the gauge based on the leakage current. ... Mks Instruments Inc








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