new TOP 200 Companies filing patents this week

new Companies with the Most Patent Filings (2010+)





Similar
Filing Names

Molecular Imprints Inc
Molecular Imprints Inc_20100121
  

Molecular Imprints Inc patents

Recent patent applications related to Molecular Imprints Inc. Molecular Imprints Inc is listed as an Agent/Assignee. Note: Molecular Imprints Inc may have other listings under different names/spellings. We're not affiliated with Molecular Imprints Inc, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "M" | Molecular Imprints Inc-related inventors




Date Molecular Imprints Inc patents (updated weekly) - BOOKMARK this page
02/18/16Nano imprinting with reusable polymer template with metallic or oxide coating
07/02/15Methods for uniform imprint pattern transfer of sub-20 nm features
06/18/15Optically absorptive material for alignment marks
06/18/15Safe separation for nano imprinting
05/21/15High throughput imprint based on contact line motion tracking control
04/02/15Chucking system with recessed support feature
01/15/15Imprint apparatus, imprint method, and article manufacturing method
01/15/15Imprint apparatus, imprint method, and article manufacturing method
10/30/14Patterning of non-convex shaped nanostructures
10/23/14Imprint apparatus and article manufacturing method
10/23/14Nano imprinting with reusable polymer template with metallic or oxide coating
07/31/14Fabrication of high-throughput nano-imprint lithography templates
05/01/14Strain and kinetics control during separation phase of imprint process
04/10/14Nanoimprint lithography processes for forming nanoparticles
02/06/14Method for adhering materials together
01/23/14Large area patterning of nano-sized shapes
01/09/14Imprint lithography template
09/19/13Extrusion reduction in imprint lithography
08/22/13Large area imprint lithography
06/20/13Fabrication of seamless large area master templates for imprint lithography using step and repeat tools
11/15/12Reduced residual formation in etched multi-layer stacks
10/25/12Optically absorptive material for alignment marks
08/23/12High aspect ratio patterning of silicon
08/09/12Photocatalytic reactions in nano-imprint lithography processes
07/26/12Critical dimension control during template formation
07/26/12Controlling thickness of residual layer
05/10/12Template pillar formation
05/10/12Patterning of non-convex shaped nanostructures
05/10/12Nanoimprint lithography formation of functional nanoparticles using dual release layers
03/29/12High contrast alignment marks through multiple stage imprinting
03/22/12Vapor delivery system for use in imprint lithography
03/08/12Methods of cleaning hard drive disk substrates for nanoimprint lithography
01/12/12Contaminate detection and substrate cleaning
01/12/12Enhanced densification of silicon oxide layers
12/29/11Release agent partition control in imprint lithography
11/17/11Nanostructured solar cell
11/17/11Backside contact solar cell
10/27/11Safe deparation for nano imprinting
10/20/11Low-k dielectric functional imprinting materials
09/15/11Step and repeat imprint lithography process
09/08/11Reducing adhesion between a conformable region and a mold
09/01/11Imprinting of partial fields at the edge of the wafer
08/11/11Templates having high contrast alignment marks
08/11/11Process gas confinement for nano-imprinting
08/04/11Ultra-compliant nanoimprint lithography template
08/04/11Nanoimprint lithography processes for forming nanoparticles
07/28/11Solar cell fabrication by nanoimprint lithography
07/28/11Micro-conformal templates for nanoimprint lithography
07/28/11Roll-to-roll imprint lithography and purging system
07/28/11Methods and systems of material removal and pattern transfer
07/28/11Systems and methods for substrate formation
07/14/11Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
07/07/11Adhesion layers in nanoimprint lithograhy
06/16/11Capillary imprinting technique
06/16/11Imprint lithography template
06/16/11Composition for an etching mask comprising a silicon-containing material
04/14/11Large area linear array nanoimprinting
03/10/11Positive tone bi-layer method
03/03/11Functional nanoparticles
03/03/11Method and system to control movement of a body for nano-scale manufacturing
02/10/11Adjacent field alignment
02/10/11Desirable wetting and release between an imprint lithography mold and a polymerizable composition
02/03/11Alignment a substrate in a nano-imprint process
01/20/11Chucking system for nano-manufacturing
01/06/11Chucking system with recessed support feature
Patent Packs
12/23/10Dual zone template chuck
12/23/10Self-aligned cross-point memory fabrication
12/16/10Chucking system for nano-manufacturing
11/18/10Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
11/11/10Residual layer thickness measurement and correction
11/04/10Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks
11/04/10Imprint alignment method, system and template
10/21/10Etch-enhanced technique for lift-off patterning
08/12/10Step and repeat imprint lithography processes
07/22/10Forming a layer on a substrate
07/08/10Conforming template for patterning liquids disposed on substrates
06/10/10Positive tone bi-layer method
06/10/10Capillary imprinting technique
06/10/10Method for expelling gas positioned between a substrate and a mold
05/27/10Method and system for double-sided patterning of substrates
Patent Packs
05/13/10Method to control an atmosphere between a body and a substrate
05/06/10Master template replication
05/06/10Release agent partition control in imprint lithography
05/06/10Nano-imprint lithography template with ordered pore structure
05/06/10Substrate alignment
05/06/10Photocatalytic reactions in nano-imprint lithography processes
05/06/10Separation in an imprint lithography process
05/06/10Alignment for edge field nano-imprinting
05/06/10Double-sided nano-imprint lithography system
05/06/10Dispense system set-up and characterization
05/06/10Facilitating adhesion between substrate and patterned layer
05/06/10Substrate patterning
04/29/10Dispense system
04/29/10Imprint lithography template
04/29/10Strain and kinetics control during separation phase of imprint process
04/29/10Misalignment management
04/29/10Fluid transport and dispensing
04/29/10Optical system for use in stage control
04/29/10Drop deposition control
04/29/10Fabrication of high-throughput nano-imprint lithography templates
04/22/10Double sidewall angle nano-imprint template
04/22/10Drop volume reduction
04/22/10Gas environment for imprint lithography
04/22/10Imprint lithography system and method
04/22/10Reduction of stress during template separation
04/22/10Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
04/22/10Drop deposition materials for imprint lithography
04/22/10Fluid dispense device calibration
04/22/10Fluid dispense system coating
04/22/10Drop pattern generation with edge weighting
Social Network Patent Pack
04/22/10Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
04/22/10Manufacture of drop dispense apparatus
04/15/10Energy sources for curing in an imprint lithography system
04/15/10Complementary alignment marks for imprint lithography
04/08/10Nano-imprint lithography templates
04/08/10In-situ cleaning of an imprint lithography tool
04/01/10Particle mitigation for imprint lithography
03/25/10Imprint lithography system and method
03/25/10Nano-imprint lithography template fabrication and treatment
03/11/10Chucking system comprising an array of fluid chambers
Patent Packs
03/04/10Apparatus for imprint lithography using an electric field
02/18/10Interferometric analysis the manufacture of nano-scale devices
02/18/10Template having a silicon nitride, silicon carbide or silicon oxynitride film
01/21/10Inner cavity system for nano-imprint lithography
11/19/09Imprinting of partial fields at the edge of the wafer
11/05/09Composition to reduce adhesion between a conformable region and a mold
10/15/09Preserving filled features when vacuum wiping
10/08/09Template having alignment marks formed of contrast material
08/27/09Critical dimension control during template formation
08/27/09Formation of conductive templates employing indium tin oxide
08/13/09Template pillar formation
08/13/09Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
08/13/09Extrusion reduction in imprint lithography
08/06/09Controlling template surface composition in nano-imprint lithography
07/02/09Template pattern density doubling
07/02/09Enhanced multi channel alignment
06/18/09Ultra-thin polymeric adhesion layer
06/11/09Spatial phase feature location
06/11/09Alignment using moire patterns
06/11/09Controlling thickness of residual layer
06/04/09Porous template and imprinting stack for nano-imprint lithography
06/04/09Hinged pointer pottery sizing guide
05/28/09Contact angle attenuations on multiple surfaces
05/21/09Method of creating a template employing a lift-off process
05/07/09Drop pattern generation for imprint lithography
02/26/09Reduced residual formation in etched multi-layer stacks
02/05/09Self-aligned cross-point memory fabrication
02/05/09Method and system to control movement of a body for nano-scale manufacturing
01/21/10Inner cavity system for nano-imprint lithography







ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009



###

This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Molecular Imprints Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Molecular Imprints Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

###




';