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Nanometrics Incorporated patents

Recent patent applications related to Nanometrics Incorporated. Nanometrics Incorporated is listed as an Agent/Assignee. Note: Nanometrics Incorporated may have other listings under different names/spellings. We're not affiliated with Nanometrics Incorporated, we're just tracking patents.

ARCHIVE: New 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "N" | Nanometrics Incorporated-related inventors




Date Nanometrics Incorporated patents (updated weekly) - BOOKMARK this page
02/02/173d target for monitoring multiple patterning process
01/26/17Optical critical dimension target design
01/19/17Interferometric characterization of surface topography
11/24/16Optical metrology using differential fitting
10/06/16Optical metrology system for spectral imaging of a sample
04/28/16Optical metrology system for spectral imaging of a sample
04/07/16Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device
02/04/16Optical metrology with purged reference chip
02/04/16Protected lens cover plate for an optical metrology device
10/29/15Simultaneous measurement of multiple overlay errors using diffraction based overlay
06/18/15Via characterization for bcd and depth metrology
06/18/15Focusing system with filter for open or closed loop control
06/04/15Optical metrology with multiple angles of incidence and/or azumith angles
05/28/15Optical metrology system for spectral imaging of a sample
04/10/14Ellipsometer focusing system
10/24/13Dark field diffraction based overlay
10/03/13Plasma lamp ignition source
09/19/13Dual angles of incidence and azimuth angles optical metrology
08/15/13Image based overlay measurement with finite gratings
11/01/12Apparatus and electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
10/25/12Thin films and surface topography measurement using reduced library
10/11/12Ellipsometer focusing system
09/06/12Parallel acquisition of spectra for diffraction based overlay
07/12/12Mueller matrix spectroscopy using chiroptic
02/16/12In-plane optical metrology
11/03/11Local stress measurement
09/29/11Diffraction based overlay linearity testing
06/16/11Silicon filter for photoluminescence metrology
04/28/11Optical metrology on textured samples
04/07/11Scatterometry measurement of asymmetric structures
10/28/10Simulating two-dimensional periodic patterns using compressed fourier space
06/24/10Apparatus and electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
06/03/10Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
12/03/09Imaging diffraction based overlay
11/05/09Modeling conductive patterns using an effective model
09/17/09Sealing ring assembly and mounting method
07/30/09Line profile asymmetry measurement
06/11/09Support pin with dome shaped upper surface
05/07/09Determining overlay error using an in-chip overlay target







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