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Nissan Chemical Industries Ltd
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Nissan Chemical Industries Ltd patents

Recent patent applications related to Nissan Chemical Industries Ltd. Nissan Chemical Industries Ltd is listed as an Agent/Assignee. Note: Nissan Chemical Industries Ltd may have other listings under different names/spellings. We're not affiliated with Nissan Chemical Industries Ltd, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "N" | Nissan Chemical Industries Ltd-related inventors




Date Nissan Chemical Industries Ltd patents (updated weekly) - BOOKMARK this page
07/20/17 new patent  Composition for forming a resist upper-layer film and producing a semiconductor device using the composition
07/13/17Method for producing multibranched aliphatic ester
07/13/17Liquid crystal display element
07/13/17Layered body of temporary adhesive
07/13/17Fluorine-atom-containing polymer and use thereof
07/06/17Fungicidal or bactericidal composition, and controlling diseases
07/06/17Parasite- and hygienic pest-controlling agent
07/06/17Silane-treated forsterite fine particles and production method therefor, and organic solvent dispersion of silane-treated forsterite fine particles and production method therefor
06/29/17Liquid crystal display element, liquid crystal alignment film, and liquid crystal alignment treatment agent
06/29/17Charge-transporting varnish
06/29/17Hole transport compositions and related devices and methods (i)
06/29/17Charge-transporting varnish
06/22/17Culture medium composition and culturing cell or tissue using thereof
06/15/17Resin composition for flattened film or microlens
06/15/17Photoreactive liquid crystal composition, display element, optical element, manufacturing display element, and manufacturing optical element
06/15/17Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group
06/08/17Method for producing silane compound having sulfonyl bond
06/08/17Metal oxide semiconductor layer forming composition, and producing metal oxide semiconductor layer using same
06/01/17Resist underlayer film-forming composition
06/01/17Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure
06/01/17Charge-transporting varnish, charge-transporting thin film and manufacturing same, and organic electroluminescent element and manufacturing same
05/25/17Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore
05/18/17Insecticidal, miticidal, nematicidal, molluscicidal, microbicidal, or bactericidal composition and controlling pest
05/11/17Production basic zinc cyanurate powder and production rust-preventive pigment composition
05/11/17Fluorene derivative and use thereof
04/20/17Compound having polymerizable group and crosslinkable group and producing the same
04/20/17Structure having antifouling properties and having concave-convex shaped surface, and producing the same
04/20/17Additive and resist underlayer film-forming composition containing the same
04/13/17Charge-transporting varnish
04/13/17Fused-ring quinone-substituted polynorbornene, electrode active material and secondary battery
04/06/17Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added
03/16/17Metal-organic framework stimulus responsive polymer composite capable of controlling release of guest
03/16/17Metal-organic framework stimulus responsive polymer composite capable of controlling release of guest
03/16/17Ion-conductive fused-ring quinone polymer, electrode active material and secondary battery
03/16/17Charge storage material, electrode active material and secondary battery
03/09/17Isoxazoline-substituted benzamide compound and pesticide
02/16/17Thickened composition containing lipid peptide-type compound
02/16/17Tricyclic compound and jak inhibitor
02/16/17Active-ester-group-containing composition for producing fibers, and cell culture scaffold material using fibers produced from active-ester-group-containing composition
02/16/17Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure
02/16/17Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure
02/16/17Resist underlayer film-forming composition and forming resist pattern using the same
02/09/17Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
01/26/17Crystalline forms of pitavastatin calcium
01/26/17Polymerizable composition containing reactive fluorine-containing silicone compound
01/12/17Alkynyl pyridine-substituted amide compound and pesticide
01/12/17Method for producing gel
01/12/17Culture medium composition
01/12/17Material for undifferentiated state-maintaining culture
01/12/17Resist overlayer film forming composition and producing semiconductor device including the same
01/12/17Aniline derivative and use thereof
01/05/17Silica particles, manufacturing the same, and silica sol
01/05/17Method for producing culture medium composition
01/05/17Aniline derivative and use thereof
01/05/17Aniline derivative and use thereof
12/22/16Retardation material-forming resin composition, orientation material, and retardation material
12/22/16Polymerizable composition containing reactive silsesquioxane compound
12/22/16Polymerizable compositions, cured products obtained therewith, and use of these materials
12/22/16Cured film formation composition, orientation material and retardation material
12/15/16Method for producing optically active azetidinone compound
12/15/16Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer
12/15/16Polymer-containing coating liquid applied to resist pattern
12/01/16Film forming composition containing fluorine-containing surfactant
11/24/16Substituted triazinone compound and t-type calcium channel inhibitor
11/24/16Highly soluble modified epoxy resin composition
Patent Packs
11/17/16Production forsterite fine particles
11/10/16Stick-shaped base material containing lipid peptide compound
11/10/16Aqueous dispersion for solidifying serum and blood
11/10/16Resist underlayer film-forming composition containing novolac polymer having secondary amino group
11/03/16Oxime-substituted amide compound and pest control agent
11/03/16Oxime-substituted amide compound and pest control agent
11/03/16Composition for forming protective film for transparent conductive film
11/03/16Method for producing purified active silicic acid solution and silica sol
11/03/16Resist underlayer film forming composition for lithography containing polyether structure-containing resin
10/27/16Composition for forming passivation film, including resin having carbon-carbon multiple bond
10/27/16Composition for film formation
10/27/16Electro-optic element
10/27/16Composition for anode buffer layer of organic thin film solar cell and organic thin film solar cell
10/20/16Fibers, composition for producing fibers, and biomaterial containing fibers
10/13/16Aniline derivatives and uses thereof
Patent Packs
10/06/162-pyridone compound
10/06/16Cured film formation composition, orientation material, and retardation material
10/06/16Organic electroluminescent element
09/22/16Thermosetting resin composition
09/22/16Hydrogel forming composition and hydrogel formed thereof
09/22/16Mask blank and transfer mask
09/15/16Fluorine-containing highly branched polymer and resin composition containing the same
09/15/16Liquid crystal aligning agent containing polyimide precursor having thermally-leaving group and/or polyimide
09/15/16Photosensitive fiber and manufacturing same
09/15/16Novel diamine, polyamic acid, and polyimide
09/01/16Imprint material containing silsesquioxane compound and modified silicone compound
09/01/16Metal-containing resist underlayer film-forming composition containing polyacid
09/01/16Method for producing optical waveguide
08/25/16Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display device
08/25/16Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display device
08/25/16Charge-transporting varnish
08/25/16Arylsulfonic acid compound, use thereof, and producing arylsulfonic acid compound
08/18/16T-type calcium channel inhibitor
08/18/16Resist underlayer film formation composition and forming resist pattern using the same
08/04/16Forming underlayer film of self-assembled film including aliphatic polycyclic structure
08/04/16Polymer and composition including same, and adhesive composition
07/28/16Method for forming resist pattern, and composition for forming resist pattern
07/28/16Pattern forming method using resist underlayer film
07/14/16Agent for dispersing electrically conductive carbon material, and dispersion of electrically conductive carbon material
07/14/16Fiber-forming composition and bio-compatible material using said fiber
07/07/16Polyester resin composition containing amino-triazine derivative
06/30/16Method for producing optically active 5-hydroxy-3-ketoester
06/30/16Positive photosensitive resin composition and polyhydroxyamide resin
06/30/16Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound
06/23/16Coating liquid to be applied to resist pattern and forming reverse pattern
Social Network Patent Pack
06/16/16Method for producing heterocyclic compound
06/09/16Carbon material dispersed film formation composition
06/02/16Carbon-containing solid acid having sulfonate group
06/02/16Thermosetting resin composition containing polymer having specific terminal structure
05/26/16Colloidal silica particles, process for producing the same, and organic solvent-dispersed silica sol, polymerizable compound-dispersed silica sol, and dicarboxylic anhydride-dispersed silica sol each obtained from the same
05/26/16Resist underlayer film-forming composition contaning pyrrole novolac resin
05/26/16Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
05/19/16Resist underlayer film-forming composition containing substituted crosslinkable compound
05/19/16Aniline derivative, charge-transporting varnish and organic electroluminescent device
05/12/16Dispersion and forming hydrogel
Patent Packs
05/12/16Blood filter and manufacturing the same
05/12/16Silica sol and producing silica sol
05/12/16Production optically active alcohol compound
05/12/16Silica-containing resin composition and producing same, and molded article produced from silica-containing resin composition
05/05/16Ion complex material having function of inhibiting adhesion of biological substance and manufacturing the same
04/28/16Cell culture vessel
04/21/16Heterocyclic amide compound
04/21/16Curable composition including siloxane oligomer and inorganic fine particles
04/14/16Tricyclic heterocyclic compounds and jak inhibitors
03/24/16Highly branched lipophilic polymer, and photopolymerizable composition containing the same
03/24/16Triphenylamine derivative and use therefor
03/17/16Thickening composition
03/10/16Imprint material
03/10/16Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
03/10/16Silica sol and silica-containing epoxy resin composition
03/03/16Medium composition and producing red blood cells using same
02/04/16Cured film formation composition, orientation material, and retardation material
01/28/16Crystalline forms of pitavastatin calcium
01/28/16Cured film formation composition, orientation material, and retardation material
01/21/16Film-forming composition
01/14/16Primer for electroless plating
01/07/16Cured-film formation composition, orientation material, and retardation material
01/07/16Charge-transporting varnish
01/07/16Charge-transporting varnish
12/31/15Gelator and organogel
12/31/15Colloidal silica particles, process for producing the same, and organic solvent-dispersed silica sol, polymerizable compound-dispersed silica sol, and dicarboxylic anhydride-dispersed silica sol each obtained from the same
12/31/15Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group
12/24/15Tricyclic pyrrolopyridine compound, and jak inhibitor
12/17/15Thermoplastic resin foam including fluorine-containing highly branched polymer
12/17/15Method for producing substrate having pattern and resin composition for hydrofluoric acid etching
Patent Packs
12/17/15Resist overlayer film forming composition for lithography and producing semiconductor device using the same
12/17/15Resist underlayer film-forming composition
12/10/15Highly soluble tris- (2, 3-epoxypropyl)- isocyanurate and producing same
12/03/15Polyglycolic acid resin composition
11/26/15Curable composition containing fluorine-containing hyperbranched polymer and siloxane oligomer
11/26/15Resist underlayer film-forming composition
11/26/15Non-photosensitive resin composition
11/12/15Imprint material having low mold release property
11/12/15Composition for forming silicon-containing resist underlayer film having cyclic diester group
11/12/15Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound
11/05/15Bottom layer film-forming composition of self-organizing film containing styrene structure
11/05/15Resist underlayer film forming composition containing silicon having ester group
11/05/15Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin
10/22/15Cosmetic additive and cosmetic containing same
10/22/15Biomolecule-compatible, highly branched polymer and biomolecular-recognition surface
10/22/15Curable composition containing silicon-containing highly-branched polymer
10/22/15Film-forming composition
10/15/15Hydrogenation method and hydrogenation apparatus
10/08/15Method for producing epoxy compound
10/01/15Hydrogel forming composition and hydrogel produced therefrom
Social Network Patent Pack
10/01/15Cured-film formation composition, orientation material, and retardation material
09/24/15Method for producing nitrogen-containing heterocyclic n-oxide compound
09/24/15Hydrogel forming composition and hydrogel produced therefrom
09/24/15Light-degradable material, substrate, and patterning the substrate
09/10/15Hydrogel-forming material
09/10/15Hydrogel-forming material, premix, and hydrogel formation method
09/10/15Aromatic polyamide and film-forming composition containing same
09/10/15Method for forming bond between different elements
09/10/15Method for manufacturing orientation material, orientation material, manufacturing retardation material, and retardation material
09/03/15Resist overlayer film forming composition for lithography and manufacturing semiconductor device using the same
09/03/15Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom
08/27/15Structure having antifouling properties and having concave-convex shaped surface, and producing the same
08/27/15Production high-purity nitrogen-containing heterocyclic compound
08/13/15Method for producing purified alkali silicate aqueous solution and silica sol
08/13/15Method for adhering hydrogels
08/13/15Composite current collector for energy storage device electrode, and electrode
07/30/15Oxime-substituted amide compound and pest control agent
07/30/15Silicon-containing highly branched polymer and curable composition containing the same
07/30/15Triazine ring-containing polymer and film-forming composition containing same
07/30/15Silicon-containing euv resist underlayer film-forming composition containing onium sulfonate
Social Network Patent Pack
07/30/15Resist underlayer film forming composition
07/23/15Dispersion and forming hydrogel
07/09/15Cured-film formation composition, orientation material, and retardation material
07/09/15Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process
07/02/15Resist underlayer film forming composition that contains novolac resin having polynuclear phenol
07/02/15Adhesive composition or underfill composition
06/18/15Cleaning fluid for semiconductor, and cleaning method using the same
06/11/15Crystal form of quinoline compound and process for its production
06/11/15Fluorine-containing highly branched polymer and epoxy resin composition containing the same
06/11/15Resist underlayer film forming composition containing silicon having sulfone structure and amine structure
05/14/15Polymer composition containing organic nonlinear optical compound
05/07/15Polishing liquid composition for wafers
05/07/15Method for producing stereoselective epoxyketone compound
04/30/15Film-forming composition
04/30/15Underlayer film-forming composition for self-assembled films
04/30/15Method for production of 3-hydroxypropan-1-one compound, production of 2-propen-1-one compound and production of isoxazoline compound
04/16/15Isoxazoline-substituted benzamide compound and pesticide
04/09/15Composition for forming resist underlayer film for nanoimprint
04/02/15Film-forming composition and embedding material
03/26/15Resist underlayer film-forming composition
03/19/15Silicon-containing euv resist underlayer film-forming composition including additive
03/12/15Flourine-containing highly branched polymer and polycarbonate resin composition containing the same
03/05/15Triazinone compound and t-type calcium channel inhibitor
02/26/15Charge-transporting varnish
02/19/15Photosensitive resin composition
02/12/15Resist underlayer film forming composition containing phenylindole-containing novolac resin
01/29/15Composition for forming highly adhesive resist underlayer film
01/29/15Metal fine particle association and producing the same
01/22/15Method for imaging mass analysis using physical vapor deposition of platinum nanoparticles
01/22/15Novel sugar-derived gelator
Social Network Patent Pack
01/15/15Film-forming composition and ion implantation method
01/08/15Composition for forming antistatic film and oligomer compound
01/08/15Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring
01/01/15Crystalline polymorphs of isoxazoline compound and production method thereof
12/25/14Composition for forming passivation film, including resin having carbon-carbon multiple bond
12/25/14Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development
12/18/14Carbazole polymer
12/18/14Organic silicon compound and silane coupling agent containing the same
12/18/14Triazine ring-containing polymer and composition for film formation comprising same
12/18/14Carbazole polymer
12/11/14Crystalline forms of pitavastatin calcium
11/27/14Method for catalytic asymmetric synthesis of optically active isoxazoline compound, and optically active isoxazoline compound
11/06/14Method for producing phenylphosphonic acid metal salt composition, and crystal nucleating agent therefrom
10/30/14Semiconductor wafer polishing liquid composition
09/25/14Metal oxide composite sol, coating composition, and optical member
09/25/14Metal fine particle dispersant containing branched polymer compound having ammonium group
09/11/14Method for producing tetrahydropyran compound and intermediate thereof
08/21/14Diarylamine novolac resin
08/21/14Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
08/21/14Flattening film forming composition for hard disk
08/14/14Charge-transporting varnish
08/14/14Polymer and composition including same, and adhesive composition
08/07/14Imprint material
07/24/14Coating liquid for gate insulating film, gate insulating film and organic transistor
07/24/14Crystal form of quinoline compound and process for its production
07/17/14High refractive index cladding material and electro-optical polymer optical waveguide
07/17/14Metal oxide particles containing titanium oxide coated with silicon dioxide-stannic oxide complex oxide
07/17/14Resin composition
07/17/14Tricyclic heterocyclic compounds and jak inhibitors







ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009



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