Real Time Touch



new TOP 200 Companies filing patents this week

new Companies with the Most Patent Filings (2010+)




Real Time Touch

Nuflare Technology Inc patents


Recent patent applications related to Nuflare Technology Inc. Nuflare Technology Inc is listed as an Agent/Assignee. Note: Nuflare Technology Inc may have other listings under different names/spellings. We're not affiliated with Nuflare Technology Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "N" | Nuflare Technology Inc-related inventors


 new patent  Multibeam-focus adjusting method, multibeam-focus measuring method, and charged-particle-beam lithography apparatus

A multibeam-focus adjusting method in a charged-particle-beam lithography apparatus that draws a pattern by irradiating a sample with multibeams having a plurality of beam lines through a plurality of lines of opening portions provided on an aperture member, the method adjusting a focus of the multibeams and including: acquiring a... Nuflare Technology Inc

Reference-image confirmation method, mask inspection method, and mask inspection device

To include generating a reference image based on a comparison between design data of a mask having patterns and an optical image of the mask in a first region of the mask designated in advance, and confirming whether the generated reference image has effectiveness, the generating and the confirming being... Nuflare Technology Inc

Film growth apparatus, film growth method and maintenance film growth apparatus

A film growth apparatus according to one aspect of the present disclosure includes: a reactor configured to perform film growth processing on a substrate; an exhaust configured to discharge an exhaust gas from the reactor to the outside; a first valve including a valving element, the first valve provided in... Nuflare Technology Inc

Electron beam apparatus and positional displacement correcting electron beam

According to one aspect of the present invention, an electron beam apparatus includes charge amount distribution operation processing circuitry that operates a charge amount distribution of an irradiation region in a case that a substrate is irradiated with an electron beam using a combined function combining a first exponential function... Nuflare Technology Inc

Charged particle beam apparatus and positional displacement correcting charged particle beam

According to one aspect of the present invention, a charged particle beam apparatus includes fogging charged particle amount distribution operation processing circuitry that operates a fogging charged particle amount distribution by performing convolution integration of a distribution function in which a design distribution center of fogging charged particles is shifted... Nuflare Technology Inc

Substrate processing apparatus, transfer method, and susceptor

An apparatus of an embodiment includes: a processing-chamber; a susceptor capable of supporting a substrate, the susceptor including a first member having an opening in a central portion, and a second member covering the opening; a support configured to support and rotate the susceptor in the processing-chamber; and a lift... Nuflare Technology Inc

Film forming apparatus and film forming method

According to one embodiment, a film forming apparatus includes a process chamber, a placement portion, a susceptor, a cover, a gas source, a heater, and a support portion. The placement portion is provided inside the process chamber. The susceptor is held in an end portion of the placement portion and... Nuflare Technology Inc

Inspection method and inspection apparatus

An inspection method and apparatus comprising, a step of reflecting linearly-polarized light having a predetermined wavelength using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by... Nuflare Technology Inc

Charged particle beam writing apparatus, adjusting beam incident angle to target object surface, and charged particle beam writing method

A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical... Nuflare Technology Inc

Blanking aperture array apparatus, charged particle beam lithography apparatus, and electrode testing method

In one embodiment, a BAA apparatus 204 includes apertures 3, each of which being provided to blank charged particle beams 20. The apparatus 204 further includes first electrodes 6a, second electrodes 6b, first via plugs 5a, second via plugs 5c, drivers 2 and comparison circuitries 7 that are provided for... Nuflare Technology Inc

Vapor phase growth apparatus and vapor phase growth method

A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a holder provided in the reaction chamber, the holder holding a substrate, a heater heating the substrate, a first reflector facing the holder, the heater being interposed between the first reflector and the holder, a second reflector... Nuflare Technology Inc

Conductive contact point pin and charged particle beam apparatus

A conductive contact point pin includes a pin body, and a plurality of convex portions formed in a tip portion of the pin body, wherein the conductive contact point pin breaks, by pressing a substrate where a film to be broken is formed on a conductive film from above the... Nuflare Technology Inc

Vapor-phase growth method

A substrate W is placed on a support part 7 provided in a reaction chamber 2. While the substrate W is rotated together with the support part 7 around a rotation shaft A passing through a center of the substrate W at a rotating speed of 1300 rpm or more... Nuflare Technology Inc

Vapor phase growth apparatus

A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a ring-shaped holder provided in the reaction chamber, the ring-shaped holder configured to hold a substrate, the ring-shaped holder including an outer portion, and an inner portion on which a ring-shaped protrusion is provided and surrounded by... Nuflare Technology Inc

Generating drawing data and charged particle beam drawing method

In one embodiment, a generating method of drawing data includes generating a pixel map that includes dose amount information on each of pixels obtained by dividing a drawing area on an object into a mesh, extracting, from the pixel map, an island-shaped pixel map which is a group of multiple... Nuflare Technology Inc

Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus includes an area density calculation unit to calculate a pattern area density weighted using a dose modulation value, which has previously been input from an outside and in which an amount of correction of a dimension variation due to a proximity effect has been... Nuflare Technology Inc

Template substrate for use in adjusting focus offset for defect detection

Disclosed is a template substrate for use in adjusting a focus offset to detect a defect using an optical image obtained by irradiating a substrate with light emitted from a light source. The template substrate includes a first pattern constructed with a repetitive pattern that is not resolved by the... Nuflare Technology Inc

Multi charged particle beam writing apparatus and adjusting the same

In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a plurality of openings are formed and that forms multiple beams by allowing the charged particle beam to pass through the plurality of openings, a blanking... Nuflare Technology Inc

Aperture for inspecting multi beam, beam inspection multi beam, and multi charged particle beam writing apparatus

In one embodiment, an aperture for inspecting a multi-beam allows passage of one beam among multi-beams applied in a multi-beam writing apparatus. The aperture includes a scattering layer that is provided with a through-hole through which the one beam passes, and by which the other beams are scattered, and an... Nuflare Technology Inc

Method for measuring resolution of charged particle beam and charged particle beam drawing apparatus

In one embodiment, a method for measuring a resolution of a charged particle beam includes changing a focus position of the charged particle beam in a height direction, and scanning a dot mark formed on a substrate with the charged particle beam for each focus position, detecting a reflected charged... Nuflare Technology Inc

Charged particle beam inspection apparatus and charged particle beam inspection method

A charged particle beam inspection apparatus includes a first deflector to deflect N×N′ multiple beams collectively to N×N′ small regions having a size p/M in the first direction and arrayed at the pitch p in the first direction, perform tracking deflection, and re-deflect the multiple beams collectively to next N×N′... Nuflare Technology Inc

Charged particle beam drawing method and charged particle beam drawing apparatus

In one embodiment, a charged particle beam drawing method includes calculating a resist film reduction amount caused by etching from data representing a relation between a resist area rate and a resist film reduction amount and from an area rate of a pattern to be drawn, calculating a remaining resist-film... Nuflare Technology Inc

Pattern inspection apparatus

A pattern inspection apparatus includes a first half-wave plate to receive an ultraviolet light linearly polarized in a first electric field oscillation direction, and output a linearly polarized light polarized in a second electric field oscillation direction obtained by rotating by an integer multiple of 90°, a mirror to reflect... Nuflare Technology Inc

Electron beam inspection apparatus and electron beam inspection method

An electron beam inspection apparatus includes a stage to mount a substrate to be inspected thereon and to be continuously movable, an electron beam column, while the stage continuously moves, to scan the substrate by irradiating the substrate with multi-beams composed of a plurality of first electron beams in a... Nuflare Technology Inc

Electron beam drawing apparatus and electron beam drawing method

In one embodiment, an electron beam drawing apparatus includes an electron gun including a cathode and an anode, a current control circuit controlling a total emission current, a first detector detecting a first emission current from an outer peripheral portion of the cathode, a second detector detecting a second emission... Nuflare Technology Inc

Blanking aperture array, manufacturing blanking aperture array, and multi-charged particle beam writing apparatus

In one embodiment, a blanking aperture array is for a multi-charged particle beam writing apparatus. The blanking aperture array includes a substrate and a plurality of blankers. Each of the plurality of blankers includes a blanking electrode and a ground electrode that are formed on a first surface of the... Nuflare Technology Inc

Focusing apparatus, focusing method, and pattern inspection method

A focusing apparatus includes a first reticle, arranged at the front side of a conjugate position of a TDI sensor; a second reticle, arranged at the back side of the conjugate position; an equalizing circuit to perform gray scale value equalization by using a gray scale value output by the... Nuflare Technology Inc

Multi charged particle beam writing apparatus and multi charged particle beam writing method

In one embodiment, a multi charged particle beam writing apparatus includes a blanking plate including a plurality of blankers, bitmap generation processing circuitry generating bitmap data for each writing pass of multi-pass writing, the bitmap data specifying irradiation time periods for a plurality of irradiation positions, a plurality of dose... Nuflare Technology Inc

Heat transfer plate and writing apparatus

A heat transfer plate according to the present embodiment includes a first heat transfer unit transferring heat generated in a member mounted on the first heat transfer unit, the heat being generated due to shaping or controlling of a beam generated by a light source in a decompressed atmosphere, a... Nuflare Technology Inc

Multi charged-particle beam writing apparatus and adjustment the same

In one embodiment, a multi charged-particle beam writing apparatus includes a plurality of blankers switching between ON and OFF state of a corresponding beam among multiple beams, a main deflector deflecting beams having been subjected to blanking deflection to a writing position of the beams in accordance with movement of... Nuflare Technology Inc

Pattern inspection apparatus and pattern inspection method

A pattern inspection apparatus includes a design pattern image generation circuit to generate a first design pattern image by developing an image of the first design pattern, and a second design pattern image by developing an image of the second design pattern for assisting the first design pattern, a comparison... Nuflare Technology Inc

Inspection method

An inspection method according to one aspect of the present disclosure, includes: acquiring a plurality of first acquisition images of a first die having a predetermined pattern; acquiring a plurality of second acquisition images of a second die having the predetermined pattern; acquiring a plurality of third acquisition images of... Nuflare Technology Inc

Inspection method and inspection apparatus

An inspection method according to the embodiments includes applying light of a light source to an inspection target; receiving light from the inspection target to obtain a first image of the inspection target by a sensor; based on an image of a first pattern comprising repetitive patterns unresolvable with a... Nuflare Technology Inc

Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus

A multi charged particle beams exposure method includes assigning, with respect to plural times of shots of multi-beams using a charged particle beam, each shot to one of plural groups, depending on a total current value of beams becoming in an ON condition in a shot concerned in the multi-beams,... Nuflare Technology Inc

Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus

A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the... Nuflare Technology Inc

11/02/17 / #20170315069

Pattern inspection apparatus

A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a first stage to be able to move up to a first stroke by which an entire surface of an inspection region of the... Nuflare Technology Inc

11/02/17 / #20170315070

Pattern inspection apparatus

A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate... Nuflare Technology Inc

11/02/17 / #20170316557

Pattern inspection method and pattern inspection apparatus

A pattern inspection method includes calculating a first coefficient of a filter function by using data of optical images of plural small regions selected and data of developed images of the plural small regions based on design data; calculating a second coefficient of a filter function by using data of... Nuflare Technology Inc

11/02/17 / #20170316914

Stage mechanism

According to one aspect of the present invention, a stage mechanism includes a movable stage disposed in a vacuum atmosphere and mounting a heat source, a first heat pipe connected to the heat source, a movable mechanism configured to move according to the movement of the first heat pipe caused... Nuflare Technology Inc

10/26/17 / #20170309440

Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method

A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through... Nuflare Technology Inc

10/26/17 / #20170309450

Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus includes a storage unit to store writing data of a region to be written in a target object, a first dividing unit to read the writing data and divide the region to be written into at least one first data processing region that overlaps... Nuflare Technology Inc

10/19/17 / #20170298512

Shower head, vapor phase growth apparatus and vapor phase growth method

A shower head according to an embodiment includes: a mixing chamber to which process gas is supplied; a plurality of cooling portions provided below the mixing chamber with a gap therebetween, the cooling portion having a cooling hole provided in a horizontal direction, the process gas being introduced from the... Nuflare Technology Inc

10/19/17 / #20170301506

Multi charged particle beam exposure method, and multi charged particle beam blanking apparatus

A multi charged particle beam exposure method includes transmitting ON/OFF control signals each being an ON/OFF control signal for a corresponding beam of multi-beams of charged particle beams in a batch to a blanking apparatus in which there are mounted a substrate where a plurality of passage holes are formed... Nuflare Technology Inc

10/05/17 / #20170283985

Vapor phase growth apparatus and vapor phase growth method

A vapor phase growth apparatus includes: a reaction chamber; a support provided in the reaction chamber, the support on which a substrate can be placed; a first gas supply passage supplying first gas including ammonia; a second gas supply passage supplying second gas including metal-organic gas; a purge gas supply... Nuflare Technology Inc

09/28/17 / #20170275755

Vapor phase growth apparatus and vapor phase growth method

A vapor phase growth method using a vapor phase growth apparatus including a reaction chamber, a shower plate disposed in the upper portion of the reaction chamber so as to supply a gas into the reaction chamber, and a support portion provided below the shower plate inside the reaction chamber... Nuflare Technology Inc

09/28/17 / #20170278672

Charged particle beam writing method, and charged particle beam writing apparatus

A charged particle beam writing method includes acquiring a pair of a reference dose and a backscatter coefficient for proximity effect correction using a first settling time, acquiring a first relation between a temperature rise amount and a critical dimension variation amount using a second settling time shorter than the... Nuflare Technology Inc

09/21/17 / #20170270656

Method for inspecting blanking plate

In one embodiment, a method for inspecting a blanking plate includes generating a plurality of beams by causing a charged particle beam to pass through a shaping aperture array having a plurality of holes, performing blanking deflection on the plurality of beams by using a plurality of blankers provided in... Nuflare Technology Inc

09/21/17 / #20170271118

Multi charged particle beam blanking apparatus, multi charged particle beam blanking method, and multi charged particle beam writing apparatus

A multi charged particle beam blanking apparatus includes a substrate, where a plurality of passage holes are formed, to let multi-beams of charged particle beams individually pass through a passage hole concerned; a plurality of reference electrodes, each arranged close to a corresponding passage hole, to be applied with a... Nuflare Technology Inc

08/24/17 / #20170243714

Diagnosis method, charged particle beam lithography apparatus, and recording medium

Disclosed is a method of diagnosing a conversion process for converting a format of image data including unit data corresponding to charged particle beams into a format suitable for an aperture array, the aperture array having a plurality of controllers provided to match a plurality of the charged particle beams... Nuflare Technology Inc

08/24/17 / #20170243715

Inspection apparatus and inspection method

According to one embodiment, an inspection apparatus includes an irradiation device irradiating an inspection target substrate with multiple beams, a detector detecting each of a plurality of charged particle beams formed by charged particles emitted from the inspection target substrate as an electrical signal, and a comparison processing circuitry performing... Nuflare Technology Inc

08/24/17 / #20170243716

Inspection apparatus and inspection method

An inspection apparatus according to an embodiment includes an irradiation part configured to irradiate an inspection target substrate with multiple beams including energy beams, a detector, on which a plurality of charged particle beams of charged particles released from the inspection target substrate are imaged, configured to detect each of... Nuflare Technology Inc

08/24/17 / #20170243718

Charged particle beam drawing apparatus and charged particle beam drawing method

In one embodiment, A charged particle beam drawing apparatus includes an irradiation amount resetting processing circuitry changing the irradiation amount in the shot data to the irradiation amount lower limit value when the irradiation amount defined in the shot data is less than the irradiation amount lower limit value, a... Nuflare Technology Inc

08/17/17 / #20170233867

Vapor phase growth apparatus and vapor phase growth method

A vapor phase growth apparatus according to as embodiment includes n reaction chambers, a main gas supply path supplying a process gas to the n reaction chambers, a main mass flow controller controlling a flow rate of the process gas, a branch portion branching the main gas supply path, n... Nuflare Technology Inc

08/10/17 / #20170229280

Multi charged particle beam writing apparatus and multi charged particle beam writing method

In one embodiment, a multi charged particle beam writing apparatus includes processing circuitry that is programmed to perform the function of a data region determination part determining a data region based on boundaries of pixels obtained by dividing a writing area of a substrate into mesh-shaped regions, an irradiation range... Nuflare Technology Inc

08/10/17 / #20170229282

Method for evaluating shaping aperture array

In one embodiment, a method for evaluating a shaping aperture array includes forming a plurality of evaluation patterns on a substrate, the evaluation patterns each including a first line portion along a first direction and a second line portion along a second direction perpendicular to the first direction by performing... Nuflare Technology Inc

07/20/17 / #20170206433

Pattern inspection apparatus

According to one aspect of the present invention, a pattern inspection apparatus includes a first diaphragm that is positioned on an optical path of a reflection illumination optical system and has a first reference pattern of a line-and-space pattern formed thereon; a semi-transmission reflection plate configured to reflect a portion... Nuflare Technology Inc

07/20/17 / #20170207056

Multi charged particle beam writing method and multi charged particle beam writing apparatus

In one embodiment, a multi charged particle beam writing method includes performing blanking deflection on each of multiple beams using a plurality of individual blankers, and collectively performing blanking deflection on the multiple beams using a common blanker. The beams controlled in the beam ON state by the individual blankers... Nuflare Technology Inc

07/20/17 / #20170207064

Multi charged particle beam exposing method, and multi charged particle beam exposing apparatus

A multi charged particle beam exposing method includes setting, in multiple exposures by a plurality of shots of each beam of multi-beams where the plurality of shots continuously irradiate a same irradiation position, a plurality of clock periods including at least one different clock period where the plurality of clock... Nuflare Technology Inc

07/13/17 / #20170200582

Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus according to an embodiment starts a wiring operation when the sum of the amount of shot data stored in a buffer memory of a transfer control calculator, the amount of shot data being transferred by a transfer unit, and the amount of shot data... Nuflare Technology Inc

07/06/17 / #20170193650

Drawing data generating method

A drawing data generating method according to an embodiment is a method for generating drawing data input to a drawing apparatus that draws a plurality of figure patterns on an object using a charged particle beam. The method includes generating the drawing data in accordance with a data format that... Nuflare Technology Inc

06/22/17 / #20170178314

Pattern inspection apparatus and pattern inspection method

A pattern inspection apparatus includes a stage to mount thereon a substrate with patterns formed thereon and be able to move two-dimensionally, plural detectors of a two-dimensional scale, whose height positions are mutually different and arranged at positions on the stage different from the substrate position, to perform measurement, the... Nuflare Technology Inc

06/22/17 / #20170178862

Multiple charged particle beam apparatus

A multiple charged particle beam apparatus includes: a first aperture array substrate to form multiple beams; a first grating lens that constitutes a concave lens by using the first aperture array substrate as a grating; a second aperture array substrate that allows the multiple beams to pass through; and a... Nuflare Technology Inc

06/15/17 / #20170169993

Multi charged particle beam apparatus, and shape adjustment multi charged particle beam image

A multi charged particle beam apparatus includes a forming aperture array substrate, where there are formed a plurality of first openings and a plurality of second openings on the periphery of the whole plurality of first openings, each being larger than each of the plurality of first openings, to form... Nuflare Technology Inc

06/15/17 / #20170169994

Data processing method, charged particle beam writing method, and charged particle beam writing apparatus

In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality... Nuflare Technology Inc

06/01/17 / #20170154755

Evaluation method, correction method, recording medium and electron beam lithography system

An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into... Nuflare Technology Inc

Patent Packs
05/25/17 / #20170146910

Method of aperture alignment and multi charged particle beam writing apparatus

In one embodiment, a method of aperture alignment for a multi charged particle beam writing apparatus includes irradiating a shaping aperture member with a charged particle beam while changing an incident direction, detecting a current for each of the incident directions of the charged particle beam, producing a current distribution... Nuflare Technology Inc

05/18/17 / #20170139327

Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus

A parameter acquiring method for dose correction of a charged particle beam includes writing evaluation patterns on a substrate coated with resist; writing, while varying writing condition, a peripheral pattern on a periphery of any different one of the evaluation patterns, after an ignorable time as to influence of resist... Nuflare Technology Inc

05/11/17 / #20170130335

Shower head, vapor phase growth apparatus, and vapor phase growth method

A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas... Nuflare Technology Inc

05/11/17 / #20170132772

Inspection method and inspection apparatus

An inspection apparatus includes a tone correction unit, a dimensional error acquisition unit, and a map generating unit. The correction unit acquires a transmissivity distribution for transmission of light from a light source through an incident surface of an inspection target based on the optical image data to correct a... Nuflare Technology Inc

05/04/17 / #20170122890

Pattern inspection method and pattern inspection apparatus

A pattern inspection method includes: scanning an inspection substrate, to be inspected, to detect a secondary electron group emitted from the inspection substrate due to irradiation with the multiple beams; correcting individually distortion of a first region image obtained from a detection signal of secondary electrons corresponding to a corresponding... Nuflare Technology Inc

05/04/17 / #20170125208

Pattern inspection apparatus and pattern inspection method

A pattern inspection apparatus includes a data processing circuitry to input detection data based on a secondary electron from a substrate for each irradiation unit region, where n1×m1 irradiation unit regions in irradiation unit regions configure one of n2×m2 image reference regions configuring an inspection measurement image, to calculate, for... Nuflare Technology Inc

04/27/17 / #20170115167

Temperature measuring mask and temperature measuring method

A temperature measuring mask includes: a substrate 10; a temperature sensor 11 being provided to the substrate 10, and being capable of sensing a temperature inside a charged particle beam lithography device 4; a circuit board 12 being provided to the substrate 10, and including a measuring circuit 121A that... Nuflare Technology Inc

04/20/17 / #20170110288

Supporting case and multi charged particle beam drawing apparatus

In one embodiment, a supporting case includes a lower case member and an upper case member. The mounting substrate is pinched between a lower cylindrical supporting portion and a upper cylindrical supporting portion. Peripheral regions of the mounting substrate that are on a peripheral side with respect to a part... Nuflare Technology Inc

04/13/17 / #20170103869

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

A multi charged particle beam writing method includes calculating an offset dose to irradiate all the small regions by multiplying one beam dose equivalent to a maximum irradiation time of multi-beams of each pass in multiple writing by a maximum number of defective beams being always ON to irradiate one... Nuflare Technology Inc

04/06/17 / #20170098524

Multi charged particle beam writing method and multi charged particle beam writing apparatus

A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of... Nuflare Technology Inc

03/16/17 / #20170076912

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

A multi charged particle beam writing method includes assigning, for each unit irradiation region per beam of multi-beams, each divided shot obtained by dividing a shot of a maximum irradiation time and continuously irradiate the same unit irradiation region, to at least one of a plurality of beams that can... Nuflare Technology Inc

03/09/17 / #20170068172

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

A method for fabricating a semiconductor device, includes dividing a pattern region of a desired pattern that is to be formed on a semiconductor substrate into a plurality of sub-regions; calculating combination condition including a shape of illumination light for transferring and a mask pattern obtained by correcting a partial... Nuflare Technology Inc

03/09/17 / #20170069111

Method for measuring pattern width deviation, and pattern inspection apparatus

A pattern width deviation measurement method includes measuring width dimensions of a plurality of figure patterns in an optical image from data of gray-scale value profiles of the optical image, using a threshold of a gray-scale value level variably set depending on design dimension information including design width dimension of... Nuflare Technology Inc

03/09/17 / #20170069460

Charged particle beam lithography apparatus and charged particle beam lithography method

A charged particle beam lithography apparatus according to an embodiment includes: a pattern-writing-data data storage processing circuitry configured to store pattern writing data in association with pattern attribute information; a shot dividing processing circuitry configured to divide the pattern writing data into shot data in association with the pattern attribute... Nuflare Technology Inc

03/02/17 / #20170062212

Vapor phase growth apparatus and vapor phase growth method

A vapor phase growth apparatus according to an embodiment includes, n reactors performing a deposition process for a plurality of substrates at the same time, a first main gas supply path distributing a predetermined amount of first process gas including a group-III element to the n reactors at the same... Nuflare Technology Inc

Patent Packs
02/16/17 / #20170047194

Multi charged particle beam writing apparatus and multi charged particle beam writing method

A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for... Nuflare Technology Inc

02/09/17 / #20170039699

Pattern inspection apparatus, pattern imaging apparatus, and pattern imaging method

A pattern inspection apparatus includes a first stage to mount an inspection target object, located at the position displaced from the gravity center of the first stage, first and second two-dimensional scales on the first stage and opposite each other with respect to the gravity center, a second stage under... Nuflare Technology Inc

02/02/17 / #20170032507

Pattern inspection apparatus and pattern inspection method

A pattern inspection apparatus includes a transmitted illumination optical system to illuminate change the shape of a first inspection light, a reflected illumination optical system to illuminate a mask substrate with a second inspection light by using an objective lens and a polarizing element, and let a reflected light from... Nuflare Technology Inc

02/02/17 / #20170032926

Method of cleaning electron source and electron beam writing apparatus

In one embodiment, a method of cleaning an electron source included in an electron gun for an electron beam writing apparatus includes supplying an inert gas to an electron gun chamber, allowing the electron source to emit electrons, ionizing the inert gas with the electrons to produce ions, and removing... Nuflare Technology Inc

01/19/17 / #20170018404

Drawing data creation method and charged particle beam drawing apparatus

In one embodiment, a drawing data creation method includes inputting correction-map-including drawing data having a correction map to a converter, the correction map including dose amount information for each mesh area obtained by dividing a drawing area on a target drawn by a charged particle beam drawing apparatus, the drawing... Nuflare Technology Inc

01/12/17 / #20170009375

Vapor deposition method and vapor deposition apparatus

A vapor deposition method supplies a material gas onto a substrate while heating the substrate by a heater to sequentially form a plurality of films with vapor deposition, grows the film under a constant output control, which keeps an output of the heater at a predetermined output in each of... Nuflare Technology Inc

01/12/17 / #20170011884

Adjustment charged particle beam drawing apparatus and charged particle beam drawing method

According to one embodiment, a method of adjusting a charged particle beam drawing apparatus includes obtaining an offset amount in beam size to be set in the charged particle beam drawing apparatus. The method includes forming a linear evaluation pattern on a substrate by changing number of divisions of a... Nuflare Technology Inc








ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009



###

This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Nuflare Technology Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Nuflare Technology Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

###