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Oc Oerlikon Balzers Ag patents

Recent patent applications related to Oc Oerlikon Balzers Ag. Oc Oerlikon Balzers Ag is listed as an Agent/Assignee. Note: Oc Oerlikon Balzers Ag may have other listings under different names/spellings. We're not affiliated with Oc Oerlikon Balzers Ag, we're just tracking patents.

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Date Oc Oerlikon Balzers Ag patents (updated weekly) - BOOKMARK this page
03/27/14Vacuum treatment apparatus
01/23/14Method for manufacturing high performance multilayer ceramic capacitors
10/31/13Vacuum treatment apparatus and a manufacturing
10/31/13Apparatus and depositing a layer onto a substrate
09/26/13In-situ conditioning for vacuum processing of polymer substrates
08/29/13Rf substrate bias with high power impulse magnetron sputtering (hipims)
07/18/13Magnetron sputtering apparatus
07/04/13Double layer antireflection coating for silicon based solar cell modules
05/30/13Vacuum processing device
04/25/13Direct liquid deposition
02/28/13Wafer holder and temperature conditioning arrangement and manufacturing a wafer
11/08/12Method of magnetron sputtering and a determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
08/30/12All solid-state electrochemical double layer supercapacitor
07/26/12Fuel cell/ supercapacitor/ battery power system for vehicular propulsion
02/09/12Reactive sputtering with multiple sputter sources
01/12/12Method of inline manufacturing a solar cell panel
01/05/12Vacuum treatment apparatus
08/25/11Target shaping
08/11/11Magnetron source and manufacturing
08/04/11Target assembly for a magnetron sputtering apparatus, a magnetron sputtering apparatus and a using the magnetron sputtering apparatus
07/21/11Process for the deposition of an anti-reflection film on a substrate
05/19/11Apparatus and processing a substrate
06/24/10Rf sputtering arrangement
05/27/10Rf sputtering arrangement
10/22/09Apparatus for sputtering and a fabricating a metallization structure
10/08/09Processing chamber
07/09/09Method of magnetron sputtering and a determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
07/09/09Reactive sputtering with hipims
06/11/09Procedure and device for the production of a plasma
05/28/09Method for producing a directional layer by cathode sputtering, and device for implementing the method
05/14/09Color wheel fabrication
04/30/09Method for manufacturing workpieces and apparatus
04/30/09Application of hipims to through silicon via metallization in three-dimensional wafer packaging
04/02/09Diffusion barrier layer and manufacturing a diffusion barrier layer
03/05/09Laser module for projection displays







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