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Plansee Se
Plansee Se_20100121

Plansee Se patents

Recent patent applications related to Plansee Se. Plansee Se is listed as an Agent/Assignee. Note: Plansee Se may have other listings under different names/spellings. We're not affiliated with Plansee Se, we're just tracking patents.

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Metal oxide thin film, depositing metal oxide thin film and device comprising metal oxide thin film

A metal oxide thin film formed of β-MoO3 includes at least one doping element of the group Re, Mn, and Ru. Further, there is described a method of producing such a metal oxide thin film via sputtering and a thin film device with a metal oxide thin film of β-MoO3... Plansee Se

Metallization for a thin-film component, process for the production thereof and sputtering target

A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and... Plansee Se

Target and process for producing a target

A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.... Plansee Se

Process for producing a component

A method of producing a component from refractory metal or a refractory metal alloy having a refractory metal content >50 at %. The process includes the steps of providing a powder formed of particles and solidifying the powder under the action of a laser beam or electron beam. The powder... Plansee Se

Crucible for growing crystals

Crucible for growing single crystals, formed from W, Mo, Re, an alloy or a base alloy of these metals, and a process for producing a crucible (2), wherein at least part of an outwardly facing outer face (4) of the crucible (2) has, at least in certain regions, a profile... Plansee Se

Process for producing a layer

A process for producing a layer or a body built up of layers. A process gas which has a pressure of >10 bar is accelerated in a convergent-divergent nozzle and a coating material which is formed by particles and is composed of Mo, W, an Mo-based alloy or a W-based... Plansee Se

W-ni sputtering target

A sputtering target contains 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% intermetallic phases. A process for producing a W—Ni sputtering target and a process of using the... Plansee Se

Coating material

A coating material has Cr-rich regions having a Cr content >95% by mass which form Cr-containing particles. At least some of these particles are present in the form of aggregates or agglomerates, at least some have pores and have in the Cr-rich regions a mean nanohardness HIT 0.005/5/1/5 of ≦4... Plansee Se

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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Plansee Se in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Plansee Se with additional patents listed. Browse our Agent directory for other possible listings. Page by