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Plansee Se
Plansee Se_20100121

Plansee Se patents


Recent patent applications related to Plansee Se. Plansee Se is listed as an Agent/Assignee. Note: Plansee Se may have other listings under different names/spellings. We're not affiliated with Plansee Se, we're just tracking patents.

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Metal oxide thin film, depositing metal oxide thin film and device comprising metal oxide thin film

A metal oxide thin film formed of β-MoO3 includes at least one doping element of the group Re, Mn, and Ru. Further, there is described a method of producing such a metal oxide thin film via sputtering and a thin film device with a metal oxide thin film of β-MoO3... Plansee Se

Metallization for a thin-film component, process for the production thereof and sputtering target

A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and... Plansee Se

Target and process for producing a target

A target includes a target plate and a stabilizing layer which is joined to the rear side of the target plate. The stabilizing layer was produced by high-kinetic-energy spraying of stabilizing material onto the target plate. A process for producing a target is also provided.... Plansee Se

Process for producing a component

A method of producing a component from refractory metal or a refractory metal alloy having a refractory metal content >50 at %. The process includes the steps of providing a powder formed of particles and solidifying the powder under the action of a laser beam or electron beam. The powder... Plansee Se

Crucible for growing crystals

Crucible for growing single crystals, formed from W, Mo, Re, an alloy or a base alloy of these metals, and a process for producing a crucible (2), wherein at least part of an outwardly facing outer face (4) of the crucible (2) has, at least in certain regions, a profile... Plansee Se

Process for producing a layer

A process for producing a layer or a body built up of layers. A process gas which has a pressure of >10 bar is accelerated in a convergent-divergent nozzle and a coating material which is formed by particles and is composed of Mo, W, an Mo-based alloy or a W-based... Plansee Se

W-ni sputtering target

A sputtering target contains 45 to 75 wt % W and a remainder of Ni and common impurities. The sputtering target contains a Ni(W) phase, a W phase and no or less than 10% intermetallic phases. A process for producing a W—Ni sputtering target and a process of using the... Plansee Se

Coating material

A coating material has Cr-rich regions having a Cr content >95% by mass which form Cr-containing particles. At least some of these particles are present in the form of aggregates or agglomerates, at least some have pores and have in the Cr-rich regions a mean nanohardness HIT 0.005/5/1/5 of ≦4... Plansee Se








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