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Rohm And Haas Electronic Materials Cmp Holdings Inc patents


Recent patent applications related to Rohm And Haas Electronic Materials Cmp Holdings Inc. Rohm And Haas Electronic Materials Cmp Holdings Inc is listed as an Agent/Assignee. Note: Rohm And Haas Electronic Materials Cmp Holdings Inc may have other listings under different names/spellings. We're not affiliated with Rohm And Haas Electronic Materials Cmp Holdings Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "R" | Rohm And Haas Electronic Materials Cmp Holdings Inc-related inventors


High removal rate chemical mechanical polishing pads and methods of making

A chemical mechanical polishing pad for polishing a semiconductor substrate is provided containing a polishing layer that comprises a polyurethane reaction product of a reaction mixture comprising (i) one or more diisocyanate, polyisocyanate or polyisocyanate prepolymer, (ii) from 40 to 85 wt. % based on the total weight of (i)... Rohm And Haas Electronic Materials Cmp Holdings Inc

Debris-removal groove for cmp polishing pad

The invention provides a polishing pad suitable for polishing or planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polishing layer having a polymeric matrix, a thickness and a polishing track representing a working region of the polishing layer for polishing or planarizing. Radial... Rohm And Haas Electronic Materials Cmp Holdings Inc

Polishing layer analyzer and method

A polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.... Rohm And Haas Electronic Materials Cmp Holdings Inc

Chemical mechanical polishing pad, polishing layer analyzer and method

A chemical mechanical polishing pad, polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.... Rohm And Haas Electronic Materials Cmp Holdings Inc

Method of manufacturing chemical mechanical polishing pads

A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processed to form polishing layers of chemical mechanical... Rohm And Haas Electronic Materials Cmp Holdings Inc

Polishing pad and producing same

The purpose of the present invention is to provide: a polishing pad having a high polishing rate and excellent planarizing properties; and a method for producing the polishing pad. A polishing pad which has a polishing layer comprising a polyurethane resin foam, said polishing pad being characterized in that a... Rohm And Haas Electronic Materials Cmp Holdings Inc








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