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Rohm And Haas Electronic Materials Llc patents (2016 archive)


Recent patent applications related to Rohm And Haas Electronic Materials Llc. Rohm And Haas Electronic Materials Llc is listed as an Agent/Assignee. Note: Rohm And Haas Electronic Materials Llc may have other listings under different names/spellings. We're not affiliated with Rohm And Haas Electronic Materials Llc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "R" | Rohm And Haas Electronic Materials Llc-related inventors


Composite polishing layer chemical mechanical polishing pad

A chemical mechanical polishing pad is provided containing: a polishing layer having a polishing surface; wherein the polishing layer comprises a first continuous non-fugitive polymeric phase and a second continuous non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has a plurality of interconnected periodic recesses; wherein the plurality of interconnected periodic recesses are occupied with the second continuous non-fugitive polymeric phase; wherein the first continuous non-fugitive polymeric phase has an open cell porosity of ≦6 vol %; wherein the second continuous non-fugitive polymeric phase contains an open cell porosity of ≧10 vol %; and, wherein the polishing surface is adapted for polishing a substrate.. . ... Rohm And Haas Electronic Materials Llc

Coating compositions for use with an overcoated photoresist

Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. ... Rohm And Haas Electronic Materials Llc

Wet-strippable silicon-containing antireflectant

Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.. ... Rohm And Haas Electronic Materials Llc

Compositions and methods for pattern treatment

Pattern treatment compositions comprise a block copolymer and an organic solvent. The block copolymer comprises a first block and a second block. ... Rohm And Haas Electronic Materials Llc

Compositions and methods for pattern treatment

Pattern treatment compositions comprise a block copolymer and an organic solvent. The block copolymer comprises a first block and a second block. ... Rohm And Haas Electronic Materials Llc

Pattern treatment methods

Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.. ... Rohm And Haas Electronic Materials Llc

Pattern treatment methods

Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and an aromatic group, provided that the second monomer is not styrene; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.. ... Rohm And Haas Electronic Materials Llc

Imaging on substrates with alkaline strippable uv blocking compositions and aqueous soluble uv transparent films

Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable uv photosensitive material followed by applying an aqueous soluble uv transparent film to coat the uv photosensitive material. An aqueous alkaline strippable uv blocking composition is selectively applied to the surface of the uv transparent film to function as a mask. ... Rohm And Haas Electronic Materials Llc

Acid generator compounds and photoresists comprising same

Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.. ... Rohm And Haas Electronic Materials Llc

Rohm And Haas Electronic Materials Llc

. . ... Rohm And Haas Electronic Materials Llc

Rohm And Haas Electronic Materials Korea Ltd.

. . ... Rohm And Haas Electronic Materials Llc

Stable catalysts for electroless metallization

Aqueous catalysts of nanoparticles of precious metals and stabilizers of flavonoid derivatives are used to electrolessly plate metal on non-conductive substrates. Such substrates include printed circuit boards.. ... Rohm And Haas Electronic Materials Llc

Overcoat compositions and methods for photolithography

Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.. ... Rohm And Haas Electronic Materials Llc

Photoresist compositions and methods

New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.. ... Rohm And Haas Electronic Materials Llc

11/03/16 / #20160319447

Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens

Reaction products of heterocyclic nitrogen compounds, polyepoxide compounds and polyhalogen compounds may be used as levelers in metal electroplating baths, such as copper electroplating baths, to provide good throwing power. Such reaction products may plate metal with good surface properties and good physical reliability.. ... Rohm And Haas Electronic Materials Llc

10/27/16 / #20160312372

Acid copper electroplating bath and method for electroplating low internal stress and good ductiility copper deposits

Acid copper electroplating baths provide improved low internal stress copper deposits with good ductility. The acid copper electroplating baths include one or more branched polyalkylenimines and one or more accelerators. ... Rohm And Haas Electronic Materials Llc

10/13/16 / #20160298249

Cyanide-free electroplating baths for white bronze based on copper (i) ions

Copper alloy electroplating baths include one or more sources of copper (i) ions and one or more sources of tin ions to electroplate copper/tin alloys of mirror bright white bronze. The copper alloys may also include one or more sources of silver ions to electroplate ternary alloys of bright white bronze containing copper/tin/silver. ... Rohm And Haas Electronic Materials Llc

10/13/16 / #20160297985

Toughened arylcyclobutene polymers

Arylcyclobutene polymers having improved toughness are provided. Compositions and methods for coating arylcyclobutene polymers having improved toughness are also provided.. ... Rohm And Haas Electronic Materials Llc

10/06/16 / #20160289493

Polyarylene polymers

Compositions of arylene oligomers and certain curing agents are useful to provide arylene polymer coatings having improved mechanical properties when cured in an oxygen-containing atmosphere. Methods of curing such compositions are also provided.. ... Rohm And Haas Electronic Materials Llc

09/15/16 / #20160265113

Method and apparatus

Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.. ... Rohm And Haas Electronic Materials Llc

09/15/16 / #20160263721

Chemical mechanical plishing pad with window

A chemical mechanical polishing pad is provided having a polishing layer; an endpoint detection window; subpad; and, a stack adhesive; wherein the subpad includes plurality of apertures in optical communication with the endpoint detection window; and, wherein the polishing surface of the polishing layer is adapted for polishing of a substrate.. . ... Rohm And Haas Electronic Materials Llc

08/25/16 / #20160248020

Compositions containing fluorene substituted triazine derived compounds, and electronic devices containing the same

The invention provides a composition comprising at least one fluorene substituted triazine derived compound of formula 1, as described herein, and electronic devices containing the same. Such devices have improved efficiency and better driving voltage.. ... Rohm And Haas Electronic Materials Llc

08/04/16 / #20160223911

Coating compositions for photolithography

In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. ... Rohm And Haas Electronic Materials Llc

07/28/16 / #20160215090

Aromatic resins for underlayers

Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.. . ... Rohm And Haas Electronic Materials Llc

07/21/16 / #20160208400

Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens

Reaction products of guanidine compounds or salts thereof, polyepoxide compounds and polyhalogen compounds may be used as levelers in metal electroplating baths, such as copper electroplating baths, to provide good throwing power. Such reaction products may plate with good surface properties of the metal deposits and good physical reliability.. ... Rohm And Haas Electronic Materials Llc

07/14/16 / #20160201209

Reaction products of guanidine compounds or salts thereof, polyepoxides and polyhalogens

Reaction products of guanidine compounds or salts thereof, polyepoxide compounds and polyhalogen compounds may be used as levelers in metal electroplating baths, such as copper electroplating baths, to provide good throwing power. Such reaction products may plate with good surface properties of the metal deposits and good physical reliability.. ... Rohm And Haas Electronic Materials Llc

06/16/16 / #20160168419

Silylated polyarylenes

Polyarylenes comprising as polymerized units a first monomer having two cyclopentadienone moieties and a second monomer having two or more alkyne moieties, wherein at least one alkyne moiety is directly bonded to a silicon atom are provided. Such polyarylenes are useful as dielectric materials in the manufacture of electronic devices.. ... Rohm And Haas Electronic Materials Llc

06/16/16 / #20160168117

Aryl acetate onium materials

Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.. ... Rohm And Haas Electronic Materials Llc

06/16/16 / #20160168064

Purification method

A method of separating a secondary alcohol compound from a primary alcohol compound using selective acylation is provided.. . ... Rohm And Haas Electronic Materials Llc

05/26/16 / #20160145756

Environmentally friendly gold electroplating compositions and methods

Gold electroplating compositions are substantially free of many environmental toxins to provide an environmentally friendly pure gold electroplating composition. The substantially pure gold electroplating compositions may electroplate gold over a broad current density range to deposit bright to matte gold layers on various types of electronic components and decorative articles.. ... Rohm And Haas Electronic Materials Llc

05/26/16 / #20160145745

Formaldehyde-free electroless metal plating compositions and methods

Formaldehyde-free electroless metal plating solutions include glyoxylic acid or salts thereof in combination with tertiary amines which stabilize the glyoxylic acid and salts. The electroless metal plating solutions are environmentally friendly, stable and deposit bright metal deposits on substrates.. ... Rohm And Haas Electronic Materials Llc

05/19/16 / #20160143152

Reaction products of heterocyclic nitrogen compounds polyepoxides and polyhalogens

Reaction products of heterocyclic nitrogen compounds, polyepoxide compounds and polyhalogen compounds may be used as levelers in metal electroplating baths, such as copper electroplating baths, to provide good throwing power. Such reaction products may plate metal with good surface properties and good physical reliability.. ... Rohm And Haas Electronic Materials Llc

05/19/16 / #20160141171

Photoresist pattern trimming methods

Provided are methods of trimming photoresist patterns. The methods involve coating a photoresist trimming composition over a photoresist pattern, wherein the trimming composition includes a matrix polymer, a thermal acid generator and a solvent, the trimming composition being free of cross-linking agents. ... Rohm And Haas Electronic Materials Llc

05/19/16 / #20160137874

Photoresist overcoat compositions and methods of forming electronic devices

Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.. ... Rohm And Haas Electronic Materials Llc

05/19/16 / #20160137860

Hot melt compositions with improved etch resistance

Hot melt compositions include non-aromatic cyclic (alkyl)acrylates and low acid number waxes. Upon application of actinic radiation, the hot melt compositions cure to form resists. ... Rohm And Haas Electronic Materials Llc

05/12/16 / #a topcoat composition comprises: a matrix polymer; a surface active polymer comprising: a first unit comprising a group of the following general formula (i):

Rohm And Haas Electronic Materials Llc

. . ... Rohm And Haas Electronic Materials Llc

05/12/16 / #20160133864

Display device manufacture

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.. . ... Rohm And Haas Electronic Materials Llc

05/05/16 / #20160124309

Pattern formation methods

Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an organic solvent developer. The methods have particular applicability in the semiconductor manufacturing industry.. ... Rohm And Haas Electronic Materials Llc

05/05/16 / #20160124304

Photoacid generators and photoresists comprising same

New methods are provided for synthesis of photoacid generator compounds (“pags”), new photoacid generator compounds and photoresist compositions that comprise such pag compounds. In a particular aspect, sulfonium-containing (s+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.. ... Rohm And Haas Electronic Materials Llc

05/05/16 / #20160122870

Vapor delivery device, methods of manufacture and methods of use thereof

A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. ... Rohm And Haas Electronic Materials Llc

05/05/16 / #20160122602

Ephemeral bonding

Compositions containing an adhesive material and a release additive are suitable for temporarily bonding two surfaces, such as a wafer active side and a substrate. These compositions are useful in the manufacture of electronic devices where a component, such as an active wafer, is temporarily bonded to a substrate, followed by further processing of the active wafer.. ... Rohm And Haas Electronic Materials Llc

05/05/16 / #20160122574

Photoresist overcoat compositions

Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. ... Rohm And Haas Electronic Materials Llc

03/10/16 / #20160070172

Compositions comprising sulfonamide material and processes for photolithography

New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. ... Rohm And Haas Electronic Materials Llc

03/03/16 / #20160066430

Hot melt compositions with improved etch resistance

Hot melt compositions include non-aromatic cyclic (alkyl)acrylates and low acid number waxes. Upon application of actinic radiation, the hot melt compositions cure to form resists. ... Rohm And Haas Electronic Materials Llc

03/03/16 / #20160062232

Multiple-pattern forming methods

Multiple-pattern forming methods are provided. The methods comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition comprising: a matrix polymer comprising an acid labile group; a photoacid generator; and a solvent; (c) patternwise exposing the photoresist layer to activating radiation; (d) baking the exposed photoresist layer; (e) contacting the baked photoresist layer with a first developer to form a first resist pattern; (f) treating the first resist pattern with a coating composition comprising an expedient for switching solubility of a sidewall region of the first resist pattern from soluble to insoluble with respect to a second developer that is different from the first developer; and (g) contacting the treated first resist pattern with the second developer to remove portions of the first resist pattern, leaving the solubility-switched sidewall region to form a multiple-pattern. ... Rohm And Haas Electronic Materials Llc

03/03/16 / #20160060393

Polyarylene materials

Certain polyarylene oligomers having improved solubility are useful in forming dielectric material layers in electronics applications.. . ... Rohm And Haas Electronic Materials Llc

02/18/16 / #20160048077

Hardmask

This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.. . ... Rohm And Haas Electronic Materials Llc

02/11/16 / #20160041467

Photolithographic methods

Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.. ... Rohm And Haas Electronic Materials Llc

02/11/16 / #20160040021

Adhesion promoter

Compositions useful for improving the adhesion of coating compositions, such as dielectric film-forming compositions, include a hydrolyzed poly(alkoxysilane). These compositions are useful in methods of improving the adhesion of coating compositions to a substrate.. ... Rohm And Haas Electronic Materials Llc

02/11/16 / #20160038925

Catalysts for electroless metallization containing five-membered heterocyclic nitrogen compounds

Catalysts include five-membered nitrogen containing heterocyclic compounds as ligands for metal ions which have catalytic activity. The catalysts are used to electrolessly plate metal on metal clad and un-clad substrates.. ... Rohm And Haas Electronic Materials Llc

01/28/16 / #20160027663

Method for chemical mechanical polishing substrates containing ruthenium and copper

A method for chemical mechanical polishing of a substrate comprising ruthenium and copper.. . ... Rohm And Haas Electronic Materials Llc

01/28/16 / #20160027638

Methods of forming patterns

Some embodiments include methods of forming patterns. A first mask is formed over a material. ... Rohm And Haas Electronic Materials Llc

01/21/16 / #20160016872

Resins for underlayers

Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.. . ... Rohm And Haas Electronic Materials Llc

01/14/16 / #20160009924

Coating compositions suitable for use with an overcoated photoresist

In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.. ... Rohm And Haas Electronic Materials Llc

01/07/16 / #20160005641

Gap-fill methods

Provided are gap-fill methods. The methods comprise: (a) providing a semiconductor substrate having a relief image on a surface of the substrate, the relief image comprising a plurality of gaps to be filled, wherein the gaps have a width of 50 nm or less; (b) applying a gap-fill composition over the relief image, wherein the gap-fill composition comprises a first polymer comprising a crosslinkable group, a second polymer comprising a chromophore, wherein the first polymer and the second polymer are different, a crosslinker, an acid catalyst and a solvent, wherein the gap-fill composition is disposed in the gaps; (c) heating the gap-fill composition at a temperature to cause the first polymer to self-crosslink and/or to crosslink with the second polymer to form a crosslinked polymer; (d) forming a photoresist layer over the substrate comprising the crosslinked polymer-filled gaps; (e) patternwise exposing the photoresist layer to activating radiation; and (f) developing the photoresist layer to form a photoresist pattern. ... Rohm And Haas Electronic Materials Llc

01/07/16 / #20160002199

Acid generators and photoresists comprising same

Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.. ... Rohm And Haas Electronic Materials Llc








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