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Semes Co Ltd
Semes Co Ltd_20100107

Semes Co Ltd patents


Recent patent applications related to Semes Co Ltd. Semes Co Ltd is listed as an Agent/Assignee. Note: Semes Co Ltd may have other listings under different names/spellings. We're not affiliated with Semes Co Ltd, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "S" | Semes Co Ltd-related inventors


Apparatus and treating substrate

A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches... Semes Co Ltd

Apparatus and treating substrate

Disclosed are an apparatus and a method for liquid-treating a substrate. The method for liquid-treating a substrate includes a first treatment liquid supplying operation of supplying a first treatment liquid to a treatment location of the substrate, and a wetting operation of, after the first treatment liquid supplying operation, supplying... Semes Co Ltd

Substrate treating apparatus

Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a spin head, a support shaft connected to a lower portion of the spin head to support the spin head, a pin located on an upper surface of the spin head to support the substrate and having a space... Semes Co Ltd

Substrate treating apparatus and substrate treating method

A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus comprises: a process chamber; a support member positioned in an inner space of the process chamber to support the substrate; an exhaust line provided to communicate with the interior of the process chamber; an exhaust... Semes Co Ltd

Apparatus and treating substrate

Provided is a substrate treating apparatus. The substrate treating apparatus comprises: a support unit provided to support the substrate and rotate the substrate; a treatment liquid nozzle for supplying the treatment liquid onto the substrate supported by the support unit; a pre-wet liquid nozzle for supplying a pre-wet liquid onto... Semes Co Ltd

Substrate treating unit, baking apparatus including the same, and substrate treating method using baking apparatus

Disclosed is a heating unit that heats a substrate. The heating unit includes a housing providing a treatment space in the interior thereof, a heating plate supporting a substrate in the treatment space, a heating member provided in the heating plate and configured to heat-treat the substrate supported by the... Semes Co Ltd

Apparatus and treating substrate

A substrate treating apparatus comprises: an alignment unit for aligning a substrate placed in a support unit in position; and a teaching unit for setting a transfer position for transferring the substrate onto the support unit of the transfer unit, wherein the teaching unit correcting a transfer position of the... Semes Co Ltd

Plasma antenna and generating plasma having the same

Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first... Semes Co Ltd

Method and treating substrate

Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface modification step for supplying an... Semes Co Ltd

Apparatus and treating a substrate

Provided is a method for treating a substrate which removes particle within a concave portion on a substrate having a thin film on which a pattern having the concave portion on its upper surface is formed. The substrate treating method according the present invention comprises a penetration step for penetrating... Semes Co Ltd

Stocker for receiving cassettes and teaching a stocker robot disposed therein

Disclosed is a stocker for receiving a cassette. The stocker includes a shelf for receiving a cassette, a stocker robot, a teaching jig, and a teaching unit. The stocker robot includes a robot arm configured to load the cassette in the shelf and to unload the cassette from the shelf.... Semes Co Ltd

Support unit, treating a substrate

An embodiment includes a support unit, substrate treating apparatus and substrate treating method. The substrate treating apparatus comprises: a process chamber having a treatment space inside thereof; a support unit for supporting a substrate inside of the process chamber; and a gas supply unit for supplying the treatment gas into... Semes Co Ltd

Apparatus and treating substrate

Disclosed is a method for liquid-treating a substrate. In a method for treating a substrate, the substrate may be treated by supplying a treatment liquid onto the rotating substrate by using a first nozzle and a second nozzle, the first nozzle supplies the treatment liquid to an area including a... Semes Co Ltd

Transfer unit, and treating substrate

Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers... Semes Co Ltd

Substrate treating apparatus and substrate treating method

Disclosed are a liquid treating apparatus and a liquid treating method. The liquid treating apparatus includes a chamber that provides a space for processing a substrate, a support unit that is provided in the chamber to support the substrate, an ejection unit that has a nozzle for supplying a cleaning... Semes Co Ltd

Unit for supplying fluid, treating substrate with the unit

Provided is an apparatus and method for supplying a fluid. The substrate treating apparatus comprises a treating unit for treating a substrate and a fluid supply unit for supplying fluid to the treating unit, wherein the fluid supply unit comprises a supply tank in which the fluid is stored, a... Semes Co Ltd

Apparatus and treating substrate

Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treating unit that liquid-treats a substrate by supplying a liquid onto a substrate, a weight measuring unit that measures a weight of the remained liquid on the substrate, and a... Semes Co Ltd

Apparatus for processing substrate and cleaning same

Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the... Semes Co Ltd

Nozzle unit and coating apparatus including the same

An embodiment includes a coating apparatus comprising: a support unit for supporting a coating object; and a spray assembly for spraying a fluid which includes a coating material to be coated by the coating object supported on the support unit. The spray assembly comprises: a nozzle unit where the fluid... Semes Co Ltd

Apparatus and treating a substrate

Provided is a substrate treating apparatus comprising: a support unit for supporting the substrate; a discharge unit for discharging an organic solvent to the substrate supported on the support unit; and a solvent supply unit for supplying the organic solvent in a liquid state to the discharge unit at atmospheric... Semes Co Ltd

Apparatus and treating a substrate

An antenna and a substrate treating process utilizing the same are provided. The antenna may extend along an imaginary baseline having predetermined curvature and comprise a section where the distance between the baseline and intersection point between the antenna and a vertical line perpendicular to the baseline changes depending on... Semes Co Ltd

Chemical supply unit and treating a substrate

Provided is a substrate treating apparatus. The substrate treating apparatus comprises: a housing having a treating space therein; a spin head for supporting and rotating a substrate in the treating space; and a chemical supply unit having an injection nozzle for supplying a chemical to the substrate which is supported... Semes Co Ltd

Apparatus for controlling temperature of substrate, treating substrate comprising the same, and controlling the same

An embodiment includes an apparatus for controlling temperature of a substrate, an apparatus for treating a substrate comprising the same, and a method of controlling the same, which may control the temperature of the substrate by each area and not increasing the volume of the apparatus. The substrate temperature control... Semes Co Ltd

Apparatus and treating a substrate

The present invention relates to an apparatus and a method for treating a substrate with liquid. The substrate treating apparatus comprises a substrate supporting unit for supporting the substrate, a liquid supply unit for supplying a liquid to the substrate supported on the substrate supporting unit, and a controller for... Semes Co Ltd

Pump and supplying liquid

A pump is disclosed which includes a pump body, a silencer connected to the pump body, and a condensation preventing device surrounding the silencer. A liquid supplying apparatus is also disclosed which includes the pump for providing a power to supply the liquid to outside, and a storage tank for... Semes Co Ltd

Substrate processing system and substrate processing method

A substrate processing system includes an index module including wafer carriers. First and second heat processing units are disposed adjacent to the index module. Each of the first and second heat processing units includes a plurality of first heat processing plates sequentially stacked. First and second transfer robots are disposed... Semes Co Ltd

Apparatus for treating substrate and cleaning guide plate

The present disclosure relates to an apparatus for treating a substrate. The apparatus for treating a substrate includes a cup having an inner space whose top is open, a supporting unit for supporting a substrate in the inner space, a guide plate provided to surround the supporting unit, a treatment... Semes Co Ltd

Apparatus and treating a substrate

The present disclosure relates to an apparatus and a method for treating a substrate with a liquid. A substrate treating apparatus includes a substrate supporting unit having a supporting plate for supporting a substrate and a bottom liquid supply unit for supplying a liquid to a bottom of the substrate... Semes Co Ltd

Spin head, treating a substrate including the spin head

The present disclosure relates to a spin head, apparatus and method for treating a substrate including the spin head. The spin head includes a supporting plate where a substrate is placed and a chuck pin placed on the supporting plate and supporting a lateral portion of the substrate, wherein the... Semes Co Ltd

Chuck pin, manufacturing a chuck pin, treating a substrate

A chuck pin, method for manufacturing a chuck pin, and an apparatus for treating substrate. The substrate treating apparatus includes a container having a treating space in its inner side, a supporting unit supporting the substrate inside of the treating space, and a liquid supply unit providing a solution to... Semes Co Ltd

Substrate treating apparatus

An apparatus for treating a substrate is provided having a treating module, a buffer module, and an index module arranged in sequentially along a first direction. The index module includes a load port where a substrate receiving container places an index module configured to transfer the substrate between the load... Semes Co Ltd

Apparatus and treating a substrate

An apparatus and a method for treating a substrate are disclosed. The apparatus may include a process chamber including an upper chamber and a lower chamber that are coupled to each other to define a treatment space, a supporting unit provided within the treatment space to support a substrate, and... Semes Co Ltd

Dissolved ozone removal unit, treating substrate, removing dissolved ozone, and cleaning substrate

Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved... Semes Co Ltd

System and treating substrate

Provided are a system and a method for treating a substrate. The substrate treating system may include a process chamber including a body with an open top and a dielectric window hermetically sealing the top of the body from an outside, a supporting unit provided in the process chamber to... Semes Co Ltd

04/20/17 / #20170110295

Support unit, substrate treating apparatus including the same, and treating a substrate

The inventive concepts provide a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a treatment space is provided, a support unit supporting a substrate in the process chamber, a gas supply unit supplying a gas into the process chamber, and a plasma source generating plasma... Semes Co Ltd

04/13/17 / #20170103871

Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same

Disclosed are an apparatus for monitoring pulsed high-frequency power and a substrate processing apparatus including the same. The apparatus includes an attenuation module configured to attenuate a pulsed high-frequency power signal; a rectifier module configured to convert the pulsed high-frequency power signal into a direct current signal; and a detection... Semes Co Ltd

03/30/17 / #20170087602

Method and treating substrate

The present disclosure relates to a method for treating a substrate. A method for treating a substrate includes a chamber cleaning step. In the chamber cleaning step a treatment space is cleaned by supplying a cleaning fluid. The cleaning fluid is generated by chemical reaction of a first gas and... Semes Co Ltd

03/30/17 / #20170092520

Method for detecting the center of substrate, transporting a substrate, transporting unit and treating a substrate including the unit

A method for detecting a center of substrate, for transporting a substrate, a substrate transporting unit, and a substrate treating apparatus are provided. The substrate center detecting method includes detecting four edge positions of the substrate, judging whether a notch exists among the four edge positions or not, moving the... Semes Co Ltd

03/30/17 / #20170092522

Transfer unit, treating substrate, and treating substrate

An apparatus for treating a substrate, an apparatus for transferring a substrate and a method for transferring a substrate are provided. The substrate treating apparatus comprises a receiving unit having a plurality of vertically arranged substrate supporting members and a transferring unit having an upper transfer member transferring a substrate... Semes Co Ltd

02/02/17 / #20170028413

Nozzle and substrate treating apparatus including the same

A nozzle for supplying a fluid to a substrate, the nozzle including a body having a liquid discharge line through which the liquid flows and a gas discharge line that surrounds the liquid discharge line and through which a gas flow, wherein the body includes a plurality of liquid discharge... Semes Co Ltd

01/19/17 / #20170018442

Unit for supplying treatment liquid and treating substrate

Disclosed is an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate, and a treatment liquid supply unit that supplies a treatment liquid to the substrate, and the treatment liquid supply unit includes an injection unit that supplies the treatment liquid to the substrate... Semes Co Ltd

01/05/17 / #20170001127

Bubble removing unit and substrate treating apparatus including the same

A bubble removing unit is disclosed including a body having an inner space, through which a liquid flows, in an interior thereof, a liquid introducing pipe through which the liquid is supplied to the body, a liquid discharging pipe through which the liquid, from which bubbles are removed, is discharged... Semes Co Ltd

01/05/17 / #20170001221

Method and treating substrate

A method for treating a substrate with a treatment liquid is disclosed, wherein the substrate is treated while a location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area... Semes Co Ltd

01/05/17 / #20170001223

Method and treating substrate

Disclosed is a method for treating a substrate, the method including a pre-wetting operation of discharging pure water onto an upper surface of the substrate, and a treatment operation of treating the substrate by supplying a treatment liquid onto the upper substrate, after the pre-wetting operation, wherein the method further... Semes Co Ltd








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