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Silcotek Corp patents


Recent patent applications related to Silcotek Corp. Silcotek Corp is listed as an Agent/Assignee. Note: Silcotek Corp may have other listings under different names/spellings. We're not affiliated with Silcotek Corp, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "S" | Silcotek Corp-related inventors


Static thermal chemical vapor deposition with liquid precursor

Static thermal chemical vapor deposition treatment processes and static thermal chemical vapor deposition treatment systems are disclosed. The process includes providing an enclosed chamber configured to produce a material on a surface of an article within the enclosed chamber in response thermal energy being applied to a gaseous precursor, providing... Silcotek Corp

Treated article, system having treated article, and process incorporating treated article

Treated articles and a process of producing the treated articles, systems having treated articles, and processes incorporating treated articles are disclosed. The treated articles include a metal or metallic substrate, and a surface treatment of the metal or metallic substrate, the surface treatment having fluorine, silicon, and carbon. The systems... Silcotek Corp

Diffusion-rate-limited thermal chemical vapor deposition coating

Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor... Silcotek Corp

Silicon-nitride-containing thermal chemical vapor deposition coating

Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition... Silcotek Corp

Thermal chemical vapor deposition split-functionalization process, product, and coating

Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature... Silcotek Corp

Chemical vapor deposition functionalization

Thermal chemical vapor deposition functionalization processes, thermal chemical vapor deposition functionalizations, and thermal chemical vapor deposition functionalized articles are disclosed. The thermal chemical vapor deposition functionalization process includes modifying a surface by thermally reacting a gas to form a thermal chemical vapor deposition functionalization on the surface. The gas is... Silcotek Corp








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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Silcotek Corp in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Silcotek Corp with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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