Real Time Touch



new TOP 200 Companies filing patents this week

new Companies with the Most Patent Filings (2010+)




Real Time Touch

Similar
Filing Names

Sumco Corporation
Sumco Corporation_20100107
Sumco Corporation_20100114
Sumco Corporation_20100121
Sumco Corporation_20100128

Sumco Corporation patents


Recent patent applications related to Sumco Corporation. Sumco Corporation is listed as an Agent/Assignee. Note: Sumco Corporation may have other listings under different names/spellings. We're not affiliated with Sumco Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "S" | Sumco Corporation-related inventors


 new patent  Vitreous silica crucible and evaluation the same

A vitreous silica crucible used to pull up silicon single crystal includes: a cylindrical straight body portion, a corner portion formed at a lower end of the straight body portion, and a bottom portion connected with the straight body portion via the corner portion, wherein the vitreous silica crucible further... Sumco Corporation

Single-wafer processing polishing one side of semiconductor wafer and single-wafer processing polishing one side of semiconductor wafer

An object is to provide a single-wafer processing single-side polishing method and a single-wafer processing single-side polishing apparatus, which increase the flatness of a semiconductor wafer and reduce variations in flatness. The single-wafer processing single-side polishing method includes a polishing step of polishing a semiconductor wafer; and a shifting step... Sumco Corporation

Method of evaluating semiconductor substrate and manufacturing semiconductor substrate

Provided is a method of evaluating a semiconductor substrate, which evaluates quality of the semiconductor substrate by a photoluminescence measurement, wherein the evaluation by the photoluminescence measurement includes, after subjecting a surface of an evaluation-target semiconductor substrate to a pretreatment, irradiating the surface with excitation light, and then detecting emission... Sumco Corporation

Method for cleaning single crystal pulling apparatus, cleaning tool for use therein, and manufacturing single crystal

A method for cleaning a single crystal pulling apparatus according to the present invention includes preparing a dummy crucible that simulates a crucible and includes a dummy liquid surface simulating a liquid surface of material melt in the crucible and a first dummy ingot simulating a single crystal ingot in... Sumco Corporation

Method of producing semiconductor epitaxial wafer and producing solid-state image sensor

Provided is a method of producing a semiconductor epitaxial wafer having enhanced gettering ability. The method of producing a semiconductor epitaxial wafer includes: a first step of irradiating a surface of a semiconductor wafer with cluster ions to form a modified layer that is located in a surface portion of... Sumco Corporation

Method for evaluating abrasive grains, and manufacturing silicon wafer

An evaluation method of abrasive grains used in an ingot-cutting slurry includes: an evaluation solution preparation step in which abrasive grains including polishing grains and impurities are dissolved in a solvent to prepare an evaluation solution; a sedimentation step in which a container containing the evaluation solution is left still... Sumco Corporation

Manufacturing monocrystalline silicon and monocrystalline silicon

A manufacturing method of a monocrystalline silicon includes: a growth step in which a seed crystal having contacted a silicon melt is pulled up and a crucible is rotated and raised to form a straight body of the monocrystalline silicon; a separating step in which the monocrystalline silicon is separated... Sumco Corporation

Method for manufacturing epitaxial silicon wafer and vapor phase growth device

A vapor deposition apparatus includes an exhaust regulator provided in an exhaust pipe to regulate exhaust of the reaction chamber and including: a hollow frustum upstream baffle having a larger first opening near a reaction chamber than a second opening near an exhaust device; and a hollow frustum downstream baffle... Sumco Corporation

Method for producing single crystal

A manufacturing method of a monocrystal includes: a shoulder-formation step to form a shoulder of the monocrystal; and a straight-body-formation step to form a straight body of the monocrystal, in which, in the shoulder-formation step, providing that a distance from a lowermost portion inside the crucible to a top surface... Sumco Corporation

Vacuum chuck, beveling/polishing device, and silicon wafer beveling/polishing method

A vacuum chuck includes: a vacuum chuck stage having a circular vacuum surface; a vacuum protection pad provided to the vacuum surface; an annular or arc-shaped concave portion dividing the vacuum surface into a central region located closer to a center of the vacuum surface and an outer circumferential region... Sumco Corporation

Method for cleaning exhaust passage for semiconductor crystal manufacturing device

Dust that is accumulated in an exhaust passage provided in a chamber, the exhaust passage for discharging gas in the chamber of a semiconductor crystal manufacturing device, is removed by being sucked from the outside of the chamber. Moreover, an opening and closing valve for cleaning that is detachably attached... Sumco Corporation

Manufacturing method and manufacturing system for silicon single crystal

Spatial coordinates of multiple points on an inner surface of a vitreous silica crucible are measured prior to filling raw material in the vitreous silica crucible, and a three-dimensional shape of the inner surface of the vitreous silica crucible using a combination of polygons having vertex coordinates constituted by the... Sumco Corporation

Destructive inspection method and quality determination vitreous silica crucible

A destructive inspection method of a vitreous silica crucible for pulling a silicon single crystal evaluates a crack state of an inner surface of the vitreous silica crucible supported by a graphite susceptor when a load is instantaneously applied to at least one point on the inner surface via an... Sumco Corporation

Method for producing single crystal and producing silicon wafer

A method for producing a single crystal includes: bringing a seed crystal into contact with a dopant-added melt, in which a red phosphorus is added to a silicon melt, such that a resistivity of the single crystal is 0.9 mΩ·cm or less and subsequently pulling up the seed crystal, to... Sumco Corporation

Method of manufacturing silicon on insulator substrate

A method of manufacturing a silicon on insulator substrate includes: preparing a semiconductor substrate including a rear side semiconductor layer, an insulating layer, and a front side semiconductor layer, a first surface of the insulating layer being in contact with a surface of the rear side semiconductor layer, and a... Sumco Corporation

Method for polishing silicon wafer

A method of a polishing a wafer includes: a first polishing step of polishing a surface of the wafer while supplying a rough polishing liquid onto a polishing surface of a rough polishing cloth; subsequent to the first polishing step, a protection film formation step of supplying a protection film... Sumco Corporation

Semiconductor epitaxial wafer and producing the same, and producing solid-state image sensing device

To provide a semiconductor epitaxial wafer having an epitaxial layer with excellent crystallinity, the semiconductor epitaxial wafer is a semiconductor epitaxial wafer in which an epitaxial layer is formed on a surface of a semiconductor wafer, and the peak of the hydrogen concentration profile detected by SIMS lies in a... Sumco Corporation

Quality-evaluated vitreous silica crucible

A quality-evaluated vitreous silica crucible for pulling silicon single crystal is provided, wherein an inner surface of the vitreous silica crucible has regions where surface defects including brown rings are to be generated when pulling silicon single crystal. The regions are distinguished using an infrared absorption spectrum or a Raman... Sumco Corporation

Grinding apparatus and grinding method

A double-head grinding machine includes: a spindle driving portion configured to rotate a spindle to which a grinding wheel is attachable; a moving portion configured to move the spindle driving portions toward and away from a wafer; and an inclination measuring portion configured to measure a change in an inclination... Sumco Corporation

Silicon single crystal manufacturing method

A silicon single crystal manufacturing method in which the distance between the heat shield and the melt level of the melt can be regulated in a high precision. The real image includes at least the circular opening of the heat shield provided in such a way that the heat shield... Sumco Corporation

Inspection vitreous silica crucible

A method of manufacturing a vitreous silica crucible includes an inspection method comprising: a measurement step of measuring an infrared absorption spectrum or a Raman shift of a measurement point on an inner surface of the vitreous silica crucible; a determining step of predicting whether a surface defect region is... Sumco Corporation

Method for manufacturing single crystal

A target value of a pull-up speed of the single crystal is set in advance before starting pulling-up of the single crystal for every predetermined pull-up length, the pull-up speed moving average value is calculated from actual values of the pull-up speeds measured from a time point that pulling-up of... Sumco Corporation

Method and manufacturing single crystal

Disclosed herein is a method for manufacturing a single crystal, the method includes: photographing an image of a boundary portion between the single crystal and a melt by a camera during a single crystal pull-up process according to a Czochralski method; comparing at least one pixel included in a left... Sumco Corporation

Epitaxial silicon wafer and producing the epitaxial silicon wafer

A method for producing an epitaxial silicon wafer, including a preliminary thermal treatment step of subjecting a silicon wafer to thermal treatment for increasing a density of oxygen precipitates, the silicon wafer being one that has an oxygen concentration in a range of 9×1017 atoms/cm3 to 16×1017 atoms/cm3, contains no... Sumco Corporation

Method of producing semiconductor epitaxial wafer, semiconductor epitaxial wafer, and producing solid-state image sensing device

A method of producing a semiconductor epitaxial wafer 100 according to the present invention includes a first step of irradiating a semiconductor wafer 10 with cluster ions 16 to form a modifying layer 18 formed from a constituent element of the cluster ions 16 in a surface portion 10A of... Sumco Corporation

Vitreous silica crucible and manufacturing the same

A method of manufacturing a vitreous silica crucible includes: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before... Sumco Corporation

Production epitaxial silicon wafer, vapor deposition equipment and valve

A method for producing an epitaxial silicon wafer comprises applying a vapor deposition on a silicon wafer to produce the epitaxial silicon wafer. Vapor deposition equipment, in which the vapor deposition is conducted, at least includes a chamber, and a hydrogen-chloride-gas supply apparatus that is in communication and connected with... Sumco Corporation

Soi wafer manufacturing process and soi wafer

Provided is an SOI wafer manufacturing method that allows production of an SOI wafer having a high gettering ability and a small resistance variance in a thickness direction of an active layer, at high productivity. The SOI wafer manufacturing method includes a first step of implanting light element ions to... Sumco Corporation

Soi wafer manufacturing process and soi wafer

Provided is an SOI wafer manufacturing method that allows production of an SOI wafer having a high gettering ability and a small resistance variance in a thickness direction of an active layer, at high productivity. The SOI wafer manufacturing method includes a first step of implanting light element ions to... Sumco Corporation

Silicon wafer and manufacturing same

A manufacturing method of this invention includes: a step of slicing a silicon single crystal containing boron as an acceptor and obtaining a non-heat-treated silicon wafer, a step of determining a boron concentration with respect to the non-heat-treated silicon wafer, and a step of determining an oxygen donor concentration with... Sumco Corporation

Method for manufacturing semiconductor wafer

A mirror-finishing chamfer polishing is applied using an abrasive-grain-free polishing solution to a chamfered portion of a semiconductor wafer having an oxide film on a top side or the top and bottom sides of the semiconductor wafer and having no oxide film on the chamfered portion. Further, prior to the... Sumco Corporation

Epitaxial-silicon-wafer manufacturing method and epitaxial silicon wafer

A manufacturing method of an epitaxial silicon wafer including a silicon wafer doped with boron and having a resistivity of 100 mΩ•cm or less and an epitaxial film formed on the silicon wafer includes: growing the epitaxial film on the silicon wafer; and applying a heat treatment on the epitaxial... Sumco Corporation








ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009



###

This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Sumco Corporation in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Sumco Corporation with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

###