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Synos Technology Inc
Synos Technology Inc_20100114

Synos Technology Inc patents

Recent patent applications related to Synos Technology Inc. Synos Technology Inc is listed as an Agent/Assignee. Note: Synos Technology Inc may have other listings under different names/spellings. We're not affiliated with Synos Technology Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "S" | Synos Technology Inc-related inventors

Date Synos Technology Inc patents (updated weekly) - BOOKMARK this page
03/06/14Cooling substrate and atomic layer deposition apparatus using purge gas
01/30/14Growing of gallium-nitrade layer on silicon substrate
01/30/14Deposition of graphene or conjugated carbons using radical reactor
12/19/13Reactor in deposition device with multi-staged purging structure
10/03/13Scanning injector assembly module for processing substrate
09/12/13Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation
05/16/13Securing of shadow mask and substrate on susceptor of deposition apparatus
04/18/13Linear atomic layer deposition apparatus
01/24/13Depositing material with antimicrobial properties on permeable substrate using atomic layer deposition
01/24/13Textile including fibers deposited with material using atomic layer deposition for increased rigidity and strength
11/29/12Method for forming thin film using radicals generated by plasma
11/29/12Forming substrate structure by filling recesses with deposition material
10/04/12Magnetic field assisted deposition
08/23/12Enhanced deposition of layer on substrate using radicals
08/23/12Depositing thin layer of material on permeable substrate
08/16/12Combined injection module for sequentially injecting source precursor and reactant precursor
08/16/12Atomic layer deposition using radicals of gas mixture
05/24/12Extended reactor assembly with multiple sections for performing atomic layer deposition on large substrate
05/10/12Radical reactor with multiple plasma chambers
04/26/12Formation of barrier layer on device using atomic layer deposition
04/19/12Deposition of layer using depositing apparatus with reciprocating susceptor
02/02/12Rotating reactor assembly for depositing film on substrate
01/26/12Treating surface of substrate using inert gas plasma in atomic layer deposition
12/01/11Protective structure enclosing device on flexible substrate
10/27/11Vaporizing or atomizing of electrically charged droplets
03/31/11Vapor deposition reactor for forming thin film on curved surface
12/09/10Vapor deposition reactor and forming thin film
08/26/10Method for forming thin film using radicals generated by plasma
07/22/10Electrode structure, device comprising the same and forming electrode structure
03/18/10Electrode for generating plasma and plasma generator
03/18/10Vapor deposition reactor using plasma and forming thin film using the same
02/18/10Vapor deposition reactor
02/18/10Plasma reactor having injector
02/18/10Forming substrate structure by filling recesses with deposition material
02/18/10Vapor deposition reactor for forming thin film
01/14/10Solar cell and fabricating the same
01/14/10Solar cell and fabricating the same

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Synos Technology Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Synos Technology Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by