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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd patents

Recent patent applications related to Tokyo Ohka Kogyo Co Ltd. Tokyo Ohka Kogyo Co Ltd is listed as an Agent/Assignee. Note: Tokyo Ohka Kogyo Co Ltd may have other listings under different names/spellings. We're not affiliated with Tokyo Ohka Kogyo Co Ltd, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "T" | Tokyo Ohka Kogyo Co Ltd-related inventors




Date Tokyo Ohka Kogyo Co Ltd patents (updated weekly) - BOOKMARK this page
09/21/17 new patent  Surface treatment method, anti-static agent, and hydrophilizing treatment agent
09/07/17Cleaning liquid and cleaning
09/07/17Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and forming interlayer insulating film
09/07/17Method for producing porous polyimide film
08/31/17Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method
08/24/17Resin composition for forming a phase-separated structure, and producing structure containing phase-separated structure
08/24/17Resin composition for forming a phase-separated structure, and producing structure containing phase-separated structure
08/03/17Filtration material, filtration filter, manufacturing filtration material, filtration method, copolymer, and manufacturing copolymer
07/20/17Method for manufacturing laminate, and laminate
06/29/17Method for producing porous polyimide film, porous polyimide film and separator using same
06/22/17Resist composition, forming resist pattern, acid generator and compound
06/15/17Method for manufacturing polymer compound
06/15/17Method for forming resist pattern
06/08/17Photosensitive composition and compound
05/25/17Adhesive composition, laminate, and stripping method
05/18/17Photosensitive resin composition for forming cell culture substrate
04/27/17Energy-sensitive resin composition
04/06/17Resist composition, forming resist pattern, compound, and acid diffusion control agent
03/30/17Surface treatment liquid
03/30/17Surface treatment agent and surface treatment method
03/30/17Filtration filter, filtration method, production purified liquid chemical product for lithography, and forming resist pattern
03/02/17Resist pattern forming method and developer for lithography
02/23/17Filtering material, filtration filter, and filtration method
01/19/17Crystal growth control agent, forming p-type semiconductor microparticles or p-type semiconductor microparticle film, composition for forming hole transport layer, and solar cell
01/19/17Porous separator for secondary batteries and secondary battery using same
12/29/16Positive-type resist composition, forming resist pattern, photo-reactive quencher, and polymeric compound
12/15/16Composition for nanoimprint, cured product, pattern forming method, and article having pattern
12/15/16Resist composition and forming resist pattern
12/08/16Method for producing a fiber having a pattern on the surface thereof
12/08/16Method for producing a fiber having a pattern on a surface thereof
12/01/16Method of forming resist pattern
11/24/16Method of preparing laminate, and separating support
11/17/16Composition for forming release layer, release layer, laminate including release layer, preparing laminate, and treating laminate
11/17/16Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition
10/27/16Diffusion agent composition
10/20/16Composition for nanoimprint and nanoimprint pattern forming method
10/20/16Chemical for photolithography with improved liquid transfer property and resist composition comprising the same
10/06/16Chemically amplified positive-type photosensitive resin composition
10/06/16Photosensitive resin composition for dry etching, and producing resist pattern for dry etching
10/06/16Surface treatment process and surface treatment liquid
10/06/16Method for manufacturing semiconductor substrate
10/06/16Nonaqueous secondary battery, manufacturing method thereof and electrolyte
09/29/16Process for preparing chemical liquid of silylating agent and surface treatment method
09/29/16Laminated film
09/29/16Filtering material, filter, filtration, producing phenylimine compound, producing alkoxyphenylimine compound, and compound
09/29/16Resist composition, forming resist pattern, acid generator, photoreactive quencher, and compound
09/29/16Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure
09/29/16Resist composition, forming resist pattern, photo-reactive quencher and compound
09/22/16Reflective mirror for light concentrating system, and light concentrating system
09/22/16Resist composition, forming resist pattern, acid generator and compound
09/22/16Method for forming photosensitive resin layer, producing photoresist pattern, and producing plated molded article
09/22/16Method of recovering resist pattern
09/15/16Method of forming resist pattern
09/08/16Block copolymer, producing block copolymer, and producing structure containing phase-separated structure
09/08/16Undercoat agent and forming pattern of layer containing block copolymer
09/08/16Negative resist composition, forming resist pattern and complex
08/11/16Chemically amplified positive-type photosensitive resin composition for thick film
07/21/16Cleaning liquid for lithography and forming wiring
07/21/16Resist composition and forming resist pattern
07/07/16Brush composition and producing structure containing phase-separated structure
07/07/16Brush composition, and producing structure containing phase-separated structure
06/30/16Production porous polyimide resin film, porous polyimide resin film, and separator employing same
06/16/16Novel compound
06/09/16Carrying method and bonding apparatus
06/09/16Method for manufacturing laminate, manufacturing sealed substrate laminate, sealed substrate laminate, and sealed substrate
Patent Packs
06/09/16Electromagnetic wave absorber and film forming paste
06/02/16Composite layer material, manufacturing membrane, and manufacturing layered body
06/02/16Coating solution for forming light-absorbing layer, and producing coating solution for forming light-absorbing layer
05/26/16Nonaqueous secondary battery and manufacturing same
05/12/16Deep ultraviolet led and manufacturing the same
05/05/16Cleaning liquid for lithography and cleaning substrate
04/28/16Method of forming resist pattern
04/21/16Method for manufacturing secondary battery separator and manufacturing lithium secondary battery
04/07/16Method of trimming resist pattern
04/07/16Method for manufacturing semiconductor substrate
03/31/16Method of purifying liquid chemical for semiconductor photolithography, purification device of liquid chemical for semiconductor photolithography, and liquid chemical for semiconductor photolithography
03/31/16Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern
03/10/16Method for producing porous polyimide film, porous polyimide film and separator using same
03/03/16Monomer having n-acyl carbamoyl group and lactone skeleton, and polymeric compound
03/03/16Resist composition and forming resist pattern
Patent Packs
02/18/16Vinyl-group-containing fluorene compound
02/18/16Composition containing vinyl-group-containing compound
02/18/16Compound containing structural unit derived from vinyl ether compound
02/11/16Semiconductor light emitting element and producing the same
01/07/16Attachment method
12/31/15Membrane filter
12/24/15Stripping solution that is used for removal of titanium or a titanium compound and wiring formation
11/26/15Method for producing polybenzoxazole resin
11/26/15Energy-sensitive resin composition
11/12/15Attaching apparatus
11/12/15Supporting member separation method
11/12/15Attaching apparatus
11/05/15Heating medium composition for solar thermal power generation system
10/22/15Adhesive composition, laminate, and stripping method
10/15/15Method of producing structure containing phase-separated structure and forming top coat film
10/01/15Coating agent for forming fine pattern
09/24/15Chemically amplified positive-type photosensitive resin composition
09/24/15Chemically amplified positive-type photosensitive resin composition for thick-film application
09/17/15Positive photosensitive resin composition, forming polyimide resin patterns, and patterned polyimide resin film
09/17/15Positive photosensitive resin composition, forming polyimide resin patterns, and patterned polyimide resin film
09/17/15Attaching device and attaching method
09/10/15Curable composition, adhesive, producing fiber-reinforced composite material, and fiber-reinforced composite material
09/10/15Electrode forming paste composition, and manufacturing electrode and solar cell each using the same
08/27/15Method for forming pattern, structural body, producing comb-shaped electrode, and secondary cell
08/20/15Method of producing polyimide resin, producing polyimide coating, producing polyamic acid solution, polyimide coating, and polyamic acid solution
07/23/15Composition for optical imprint and producing pattern using the same
07/23/15Method of producing structure containing phase-separated structure, forming pattern and forming fine pattern
07/16/15Resist composition, forming resist pattern, and polymeric compound
07/16/15Resist composition, forming resist pattern, compound, and polymeric compound
07/09/15Negative resist composition, forming resist pattern, and complex
Social Network Patent Pack
07/09/15Overlapping device, and overlapping method
07/02/15Method for modifying substrate surface, modifying film and coating solution used for modification of substrate surface
07/02/15Method of forming pattern
06/18/15Bonding method
06/11/15Developing solution for photolithography, forming resist pattern, and producing developing solution for photolithography
05/28/15Resist composition and forming resist pattern
05/21/15Resist composition, forming resist pattern, polymeric compound, compound
05/21/15Diffusing agent composition, and forming an impurity diffusion layer
04/30/15Method of producing structure containing phase-separated structure
04/30/15Method for forming resist pattern and resist composition
Patent Packs
04/23/15Coating solution for forming light-absorbing layer, and producing coating solution for forming light-absorbing layer
04/23/15Resist composition, forming resist pattern, compound and polymeric compound
04/02/15Method of producing structure containing phase-separated structure, and block copolymer composition
03/26/15Supporting member separation method and supporting member separation apparatus
03/05/15Adhesive composition, adhesive film, and bonding method
03/05/15Chamber apparatus and heating method
02/26/15Chemically amplified positive-type photosensitive resin composition and producing resist pattern using the same
02/12/15Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition
02/12/15Chemically amplified photosensitive resin composition and producing resist pattern using the same
02/12/15Method for forming resist pattern
02/12/15Method of forming metal chalcogenide dispersion, metal chalcogenide dispersion, producing light absorbing layer of solar cell, producing solar cell
02/12/15Film-forming material
02/05/15Method of producing structure containing phase-separated structure, forming pattern and forming fine pattern
02/05/15Method of producing structure containing phase-separation structure, forming pattern, and forming fine pattern
02/05/15Resist composition, acid generator, polymeric compound and forming resist pattern
01/29/15Undercoat agent and producing structure containing phase-separated structure
01/15/15Processing method and processing apparatus
01/15/15Coating agent for forming fine pattern
01/08/15Fluorocarbon, preparing fluorocarbon, and use thereof
01/01/15Method of manufacturing laminate
12/25/14Bonding method and bonding apparatus
12/18/14Heating apparatus and heating method
12/11/14Resist composition and forming resist pattern
12/04/14Resist composition, compound, polymeric compound and forming resist pattern
12/04/14Sulfonium salt and photo-acid generator
11/13/14Sticking apparatus and sticking method
11/13/14Method for processing mold material and manufacturing structural body
10/30/14Resist composition and forming resist pattern
10/23/14Laminated body and separating laminated body
10/23/14Method of forming film
Patent Packs
10/02/14Method for forming pattern, structural body, producing comb-shaped electrode, and secondary cell
09/25/14Resist composition and resist pattern forming method
09/25/14Resist composition and resist pattern forming method
09/25/14Resist composition and resist pattern forming method
09/18/14Chamber apparatus and heating method
09/18/14Method of producing polymeric compound, resist composition and forming resist pattern
09/11/14Resist composition, forming resist pattern, polymeric compound and compound
08/28/14Method of producing structure containing phase-separated structure, forming pattern, and top coat material
08/28/14Coating apparatus and coating method
08/28/14Method of producing metal complex-supporting mesoporous material
08/21/14Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device
08/21/14Developing solution and development processing photosensitive resin composition
08/14/14Diffusion-agent composition, forming impurity-diffusion layer, and solar cell
08/07/14Resist composition, polymeric compound, compound and forming resist pattern
08/07/14Novel compound
08/07/14Resist composition, forming resist pattern and polymeric compound
07/24/14Method for forming resist pattern
07/03/14Resist composition, forming resist pattern, and high-molecular weight compound
06/26/14Photosensitive resin composition
06/26/14Resist composition, forming resist pattern and compound
Social Network Patent Pack
06/19/14Laminate and separating the same
06/19/14Transport arm, transport apparatus and transport method
06/12/14Resist composition for euv, producing resist composition for euv, and forming resist pattern
06/05/14Method for forming laminate
05/29/14Resist composition and forming resist pattern
05/29/14Resist composition and forming resist pattern
05/29/14Resist composition and forming resist pattern
05/29/14Polymerization high-molecular weight compound, resist composition, and forming resist pattern
05/29/14Method of forming resist pattern
05/22/14Method of manufacturing multilayer body, processing substrate, and multilayer body
05/22/14Compound, radical polymerization initiator, producing compound, polymer, resist composition, and forming resist pattern
05/08/14Resist composition for negative development which is used for formation of guide pattern, guide pattern formation method, and forming pattern on layer containing block copolymer
05/01/14Coating solution for forming light-absorbing layer, and producing coating solution for forming light-absorbing layer
05/01/14Resist composition, forming resist pattern, novel compound, and acid generator
04/24/14Solvent developable negative resist composition, resist pattern formation method, and forming pattern of layer including block copolymer
04/24/14Retention device and retention method
04/03/14Resist composition for euv or eb and forming resist pattern
04/03/14Resist pattern formation method and resist composition
03/27/14Stripping solution for photolithography and pattern formation method
03/13/14Method of producing hydrazine-coordinated cu chalcogenide complex
Social Network Patent Pack
02/27/14Method of producing polyimide resin, producing polyimide coating, producing polyamic acid solution, polyimide coating, and polyamic acid solution
02/13/14Adhesive composition, film adhesive, and bonding method
02/06/14Processed substrate and manufacturing same
01/30/14Method of diffusing impurity-diffusing component and manufacturing solar cell
01/16/14Coating device
01/16/14Cleaning liquid and anticorrosive agent
01/09/14Substrate treating method and substrate treating apparatus
01/02/14Method of forming resist pattern and negative tone-development resist composition
11/28/13Resist composition, forming resist pattern, polymeric compound and producing polymeric compound
11/21/13Coating apparatus and coating method
11/21/13Resist composition, forming resist pattern, polymeric compound and compound
11/14/13Resist composition, forming resist pattern, and compound
11/07/13Negative electrode for lithium ion secondary battery, lithium ion secondary battery, and producing negative electrode for lithium ion secondary battery
10/24/13Coating apparatus and coating method
10/24/13Film-forming composition, diffusing agent composition, manufacturing film-forming composition, and manufacturing diffusing agent composition
10/17/13Nozzle and coating apparatus
10/17/13Transporting apparatus and coating apparatus
10/17/13Coating apparatus and coating method
10/03/13Resist composition, forming resist pattern, and polymeric compound
10/03/13Resist composition, forming resist pattern, compound and polymeric compound
09/26/13Negative electrode base member
09/26/13Negative electrode base member
09/26/13Resist composition and forming resist pattern
09/26/13Undercoat agent and forming pattern of layer comprising block copolymer
09/26/13Resist composition, forming resist pattern and polymeric compound
09/19/13Block copolymer-containing composition and reducing pattern
09/19/13Film-forming composition for optical imprint and producing optical member
09/19/13Undercoat agent and forming pattern of layer containing block copolymer
09/19/13Resist composition and forming resist pattern
09/05/13Positive-type photoresist composition, photoresist laminate, producing photoresist pattern, and producing connecting terminal
Social Network Patent Pack
08/29/13Laminate and separating the same
08/29/13Resist composition and forming resist pattern
08/29/13Resist composition and forming resist pattern
08/22/13Laminate and separating the same
08/15/13Surface treatment agent and surface treatment method
08/15/13Method of forming pattern
08/15/13Method of forming contact hole pattern
07/25/13Method of forming resist pattern
07/25/13Resist composition and forming resist pattern
07/18/13Method for forming fine pattern, and coating agent for pattern fining
07/11/13Resist composition and forming resist pattern
07/11/13Resist composition, forming resist pattern and novel compound
07/04/13Method for producing thick film photoresist pattern
07/04/13Cleaning liquid, and anticorrosive agent
06/27/13Method of forming resist pattern
06/20/13Resist composition, forming resist pattern and compound
06/20/13Resist composition, forming resist pattern, and polymeric compound
06/06/13Substrate cleaning apparatus
06/06/13Resist composition for euv or eb, and forming resist pattern
05/30/13Method of forming resist pattern
05/30/13Resist composition and forming resist pattern
05/30/13Method of forming polymeric compound, resist composition and forming resist pattern
05/23/13Stripping solution for photolithography and pattern formation method
05/16/13Method for forming fine pattern, and coating forming agent for pattern fining
05/09/13Substrate processing apparatus and substrate processing method
05/09/13Resist composition, forming resist pattern and polymeric compound
05/09/13Resist composition and forming resist pattern
05/02/13Diffusing agent composition and forming impurity diffusion layer
04/18/13Resist composition for euv or eb and forming resist pattern







ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009



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