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Tokyo Ohka Kogyo Co Ltd
Tokyo Ohka Kogyo Co Ltd_20100114
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Tokyo Ohka Kogyo Co Ltd patents


Recent patent applications related to Tokyo Ohka Kogyo Co Ltd. Tokyo Ohka Kogyo Co Ltd is listed as an Agent/Assignee. Note: Tokyo Ohka Kogyo Co Ltd may have other listings under different names/spellings. We're not affiliated with Tokyo Ohka Kogyo Co Ltd, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "T" | Tokyo Ohka Kogyo Co Ltd-related inventors


Resist composition and forming resist pattern

where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Yax1 is a single bond or a divalent linking group, Wax1 is a (nax1+1) valent aromatic hydrocarbon group, and nax1 is an integer of... Tokyo Ohka Kogyo Co Ltd

Method for purifying liquid, producing chemical solution or cleaning solution, filter medium, and filter device

The present invention addresses the problem of providing: a method for purifying a liquid using a porous polyimide and/or polyamideimide membrane having excellent impurities (e.g., metals) removal performance which is preferably compatible with a flow rate, and also having an excellent stress, an excellent breaking elongation and the like; a... Tokyo Ohka Kogyo Co Ltd

Gas-permeable membrane

The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having... Tokyo Ohka Kogyo Co Ltd

Polyimide and/or polyamideimide porous body and manufacturing same, separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter device

Provided are a polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption using the porous body, a separation material, adsorption material, and filter media composed of the porous body, a laminate, and a filter device. A polyimide and/or polyamideimide porous body in which the... Tokyo Ohka Kogyo Co Ltd

Method of preparing polymer compound

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are... Tokyo Ohka Kogyo Co Ltd

Resist composition, forming resist pattern, and polymer compound

A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is... Tokyo Ohka Kogyo Co Ltd

Varnish for porous polyimide film production and producing porous polyimide film using same

Provided are a varnish for porous polyimide film production, providing an unburned composite film that is less likely to have a sea-island structure, and a method for producing a porous polyimide film using the same. The varnish according to the present invention comprises a resin including polyamide acid and/or polyimide,... Tokyo Ohka Kogyo Co Ltd

Resist composition and forming resist pattern

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va1 is a divalent hydrocarbon group, na1 represents an... Tokyo Ohka Kogyo Co Ltd

Resist composition, forming resist pattern, compound, and acid generator

Rb1—Yb1—Vb1—CF2—SO3−(Mm+)1/m  (b1)... Tokyo Ohka Kogyo Co Ltd

Resist composition and forming resist pattern

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va1 is a divalent hydrocarbon group. na1 represents an... Tokyo Ohka Kogyo Co Ltd

Resin composition for forming a phase-separated structure, and producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being −4.5 eV or more, and the energy difference between the LUMO and... Tokyo Ohka Kogyo Co Ltd

Deep ultraviolet led and manufacturing the same

A deep ultraviolet LED with a design wavelength of λ is provided that includes a reflecting electrode layer, a metal layer, a p-type GaN contact layer, and a p-type AlGaN layer that are sequentially stacked from a side opposite to a substrate, the p-type AlGaN layer being transparent to light... Tokyo Ohka Kogyo Co Ltd

Cell culture substrate for trait induction of nerve cell, controlling trait of nerve cell, extending neurite, controlling dopamine secretion, and controlling acetylcholinesterase activity

Provided is a cell culture substrate for trait induction of a nerve cell, which has a pattern of unevenness on a surface to which a cell adheres, the width of the unevenness being 50 nm or more and 1,000 nm or less.... Tokyo Ohka Kogyo Co Ltd

Trait induction undifferentiated cells

A trait induction method of undifferentiated cells is provided, including: culturing undifferentiated cells on abase material which has an uneven pattern on the surface to which the cells adhere and of which the width of the unevenness is 1 nm to 1,000 nm.... Tokyo Ohka Kogyo Co Ltd

Cell culture substrate for trait induction control of macrophage and controlling trait of macrophage

Provided is a cell culture substrate for trait induction control of a macrophage, which has a pattern of unevenness on a surface to which a cell adheres, the width of the unevenness being 50 nm or more and less than 1,000 nm.... Tokyo Ohka Kogyo Co Ltd

Chemical for photolithography with improved liquid transfer property and resist composition comprising the same

A method of forming a pattern, the method including exposing under KrF excimer laser beams, a chemical for photolithography coated through spin coating, including a resin ingredient having a mass-average molecular weight (Mw) of 2000 to 50000 and an organic solvent having a saturated vapor pressure of 1 kPa or... Tokyo Ohka Kogyo Co Ltd

Laminate production method, substrate processing method, and laminate

A production method of a laminate including a substrate and a light-transmitting support plate that are laminated each other via an adhesive layer and a release layer that is altered through absorption of light, the method including a release layer forming step of coating a reactive polysilsesquioxane on a surface... Tokyo Ohka Kogyo Co Ltd

Curable composition

A curable composition that can be cured at low temperature in a short time regardless of the type of epoxy compound that is mixed therewith, and has a long pot life; an adhesive comprising said curable composition; a method for producing a fiber-reinforced composite material that uses the curable composition;... Tokyo Ohka Kogyo Co Ltd

Polyimide-based resin film cleaning liquid, cleaning polyimide-based resin film, producing polyimide coating, producing filter, filter medium, or filter device, and producing chemical solution for lithography

A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other... Tokyo Ohka Kogyo Co Ltd

Chemically amplified positive-type photosensitive resin composition

A chemically amplified positive-type photosensitive resin composition capable of suppressing occurrence of footing in which the width of the bottom becomes narrower than that of the top in a nonresist section, denaturation of the surface of the metal substrate, and occurrence of a development residue, when a resist pattern serving... Tokyo Ohka Kogyo Co Ltd

Chemically amplified positive-type photosensitive resin composition

A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having a nonresist portion with a favorable rectangular sectional shape, a method of manufacturing a resist pattern using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing... Tokyo Ohka Kogyo Co Ltd

Sulfonium salt, photoacid generator, and photosensitive composition

A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R1 and R2 each independently represent the group that is represented... Tokyo Ohka Kogyo Co Ltd

Homogeneous coating solution and production method thereof, light-absorbing layer of solar cell and production method thereof, and solar cell and production method thereof

A homogeneous coating solution for forming a light-absorbing layer of a solar cell, the homogeneous solution including: at least one metal or metal compound selected from the group consisting of a group 11 metal, a group 13 metal, a group 11 metal compound and a group 13 metal compound; a... Tokyo Ohka Kogyo Co Ltd

Cleaning solution, removing a removal target and etching a substrate using said cleaning solution

in which R1 represents an alkyl group having 1 to 5 carbon atoms.... Tokyo Ohka Kogyo Co Ltd

Resist composition and forming resist pattern

A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an α-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as... Tokyo Ohka Kogyo Co Ltd

Composition for forming interlayer insulating film, interlayer insulating film, forming interlayer insulating film pattern, and device

A composition for forming an interlayer insulating film including a polymerizable monomer, an alkali-soluble elastomer containing a polymerizable group, an imide compound represented by general formula (z-1), and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and... Tokyo Ohka Kogyo Co Ltd

Composition for forming interlayer insulating film, interlayer insulating film, forming interlayer insulating film pattern, and device

A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method... Tokyo Ohka Kogyo Co Ltd

Chemically amplified positive-type photosensitive resin composition

A chemically amplified positive-type photosensitive resin composition that can be well developed with an aqueous basic solution having low pH, a substrate with a photosensitive film formed from the composition, and a method for patterned resist film formation using the composition. The composition includes an acid generator that produces an... Tokyo Ohka Kogyo Co Ltd

Method for manufacturing semiconductor substrate

A method for manufacturing a semiconductor substrate that, even when a substrate which has, on a surface thereof, a three-dimensional structure having nanometer-scale microvoids on a surface thereof is used, can allow an impurity diffusion ingredient to be uniformly diffused into the substrate at the whole area thereof where the... Tokyo Ohka Kogyo Co Ltd

High-frequency antenna element and high-frequency antenna module

A high-frequency antenna element that is easily downsized even when an electromagnetic wave absorber is used, and is capable of protecting a receiving antenna unit by covering the receiving antenna unit, and provides a high-frequency antenna module including the high-frequency antenna element. The high-frequency antenna element includes a substrate, a... Tokyo Ohka Kogyo Co Ltd

Transparent body production method, transparent body, and amorphous body

A transparent body production method that includes subjecting the compound represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W1 and W2 is the group represented by formula (2) in which the ring Z... Tokyo Ohka Kogyo Co Ltd

Impurity diffusion agent composition and manufacturing semiconductor substrate

A diffusion agent composition that, even when a semiconductor substrate which is an object into which an impurity diffusion ingredient is to be diffused has, on a surface thereof, a three-dimensional structure having nano-scale fine voids on a surface thereof, can be evenly coated on the whole area of an... Tokyo Ohka Kogyo Co Ltd

Surface treatment method, anti-static agent, and hydrophilizing treatment agent

To provide a surface treatment method for hydrophilizing a surface of a treatment target and preventing charging by a simple and easy method and an anti-static agent. The present invention provides a surface treatment method. The method comprises an anti-static treatment step of coating a treatment target with an anti-static... Tokyo Ohka Kogyo Co Ltd

Cleaning liquid and cleaning

A cleaning liquid including hydrofluoric acid, a tetrazole compound, and water. The tetrazole compound may be represented by the following Formula (B1) in which R1 is a hydrogen atom or an organic group and R2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an... Tokyo Ohka Kogyo Co Ltd

09/07/17 / #20170255099

Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and forming interlayer insulating film

A photosensitive resin composition for forming an interlayer insulating film, which contains an alkali-soluble resin (A), a photosensitizer (B), a thermal acid generator (T) which generates an acid when heated, and a silane coupling agent (C), and wherein the alkali-soluble resin (A) has a constituent unit (A1) represented by general... Tokyo Ohka Kogyo Co Ltd

09/07/17 / #20170256766

Method for producing porous polyimide film

Provided is a method for producing a porous polyimide film with which it is possible to suppress the occurrence of curling in the polyimide-fine particle composite film obtained by firing the unfired composite film. The method for producing a porous polyimide film of the present invention includes, in the following... Tokyo Ohka Kogyo Co Ltd

08/31/17 / #20170247334

Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method

A novel imidazole compound that yields a surface treatment liquid that is very effective at suppressing migration and oxidation of a wiring surface; a metal surface treatment liquid that contains the imidazole compound; a metal surface treatment method that uses the metal surface treatment liquid; and a laminate production method... Tokyo Ohka Kogyo Co Ltd

08/24/17 / #20170240766

Resin composition for forming a phase-separated structure, and producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.... Tokyo Ohka Kogyo Co Ltd

08/24/17 / #20170240767

Resin composition for forming a phase-separated structure, and producing structure containing phase-separated structure

A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X″ represents an alkylene group of 2 to 6... Tokyo Ohka Kogyo Co Ltd

08/03/17 / #20170216814

Filtration material, filtration filter, manufacturing filtration material, filtration method, copolymer, and manufacturing copolymer

A filtration material including a silica base material having a group represented by the following general formula (a0-1) [in formula (a0-1), Ya01 represents a divalent linking group; Ra01 represents a hydrocarbon group which may have a substituent; Ra02 represents a hydroxyl group or a hydrocarbon group having 1 to 6... Tokyo Ohka Kogyo Co Ltd

07/20/17 / #20170203559

Method for manufacturing laminate, and laminate

After bringing a water-containing peeling liquid in contact with a thin flat film formed on a substrate, a support film including a cover film having one main surface thereof is laminated onto the flat film, such that the support film is in contact with the flat film, a cover film-attached... Tokyo Ohka Kogyo Co Ltd

06/29/17 / #20170187021

Method for producing porous polyimide film, porous polyimide film and separator using same

A method for producing a porous polyimide film comprises: forming a first un-burned composite film wherein the first film is formed on a substrate using a first varnish that contains (A1) a polyamide acid or a polyimide and (B1) fine particles at a volume ratio (A1):(B1) of from 19:81 to... Tokyo Ohka Kogyo Co Ltd

06/22/17 / #20170176855

Resist composition, forming resist pattern, acid generator and compound

Rb1—Yb1—Vb1—SO3−(Mm+)1/m  (b1)... Tokyo Ohka Kogyo Co Ltd

06/15/17 / #20170166664

Method for manufacturing polymer compound

A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a... Tokyo Ohka Kogyo Co Ltd

06/15/17 / #20170168396

Method for forming resist pattern

A method for forming a resist pattern including forming a first contact hole pattern including a hole portion and a hole-unformed portion, which includes alkali developing the exposed positive-type resist film; preparing a structure including the first contact hole pattern and a first layer which covers the first contact hole... Tokyo Ohka Kogyo Co Ltd

06/08/17 / #20170160636

Photosensitive composition and compound

The purpose of the present invention is to provide a photosensitive composition having excellent sensitivity, an insulating film formed using said photosensitive composition, a color filter formed using said photosensitive composition, a display device provided with said insulating film or said color filter, and a compound suitable for incorporation as... Tokyo Ohka Kogyo Co Ltd

05/25/17 / #20170148659

Adhesive composition, laminate, and stripping method

An adhesive composition for temporarily attaching a substrate to a support plate which supports the substrate, including a thermoplastic resin and a release agent.... Tokyo Ohka Kogyo Co Ltd

05/18/17 / #20170137767

Photosensitive resin composition for forming cell culture substrate

A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a... Tokyo Ohka Kogyo Co Ltd

04/27/17 / #20170115563

Energy-sensitive resin composition

An energy-sensitive resin composition that provides a highly transparent polybenzoxazole resin with suppressed coloring, which has excellent chemical resistance and excellent mechanical characteristics such as tensile elongation, even in cases where a polybenzoxazole precursor is thermally treated at low temperatures; a method for producing a polybenzoxazole film or polybenzoxazole molded... Tokyo Ohka Kogyo Co Ltd

04/06/17 / #20170097564
03/30/17 / #20170088683

Surface treatment liquid

A surface treatment liquid capable of making a surface of a treatment target hydrophilic or hydrophobic without including a resin having a coating film formation property, and a surface treatment method using the surface treatment liquid. The surface treatment liquid includes a resin, a solvent and a strong acid having... Tokyo Ohka Kogyo Co Ltd

03/30/17 / #20170088722

Surface treatment agent and surface treatment method

A surface treatment agent capable of effectively preventing pattern collapse of an inorganic pattern or a resin pattern provided on a substrate, and a surface treatment method using such a surface treatment agent. The surface treatment agent includes a silylation agent and a nitrogen-containing heterocyclic compound which does not include... Tokyo Ohka Kogyo Co Ltd

03/30/17 / #20170090293

Filtration filter, filtration method, production purified liquid chemical product for lithography, and forming resist pattern

A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid... Tokyo Ohka Kogyo Co Ltd

03/02/17 / #20170059994

Resist pattern forming method and developer for lithography

in which R1 to R4 each independently represent a linear or branched alkyl group, and the total number of carbon atoms contained in each of the alkyl groups represented by R1 to R4 is 4 to 15.... Tokyo Ohka Kogyo Co Ltd

02/23/17 / #20170051084

Filtering material, filtration filter, and filtration method

in which Ya01 represents a divalent linking group; W represents a heteroatom-containing group, here, the group represented by W includes a nitrogen atom bonded to Ya01 and two or more heteroatoms other than the nitrogen atom bonded to Ya01; n represents a natural number; and * represents a valence bond... Tokyo Ohka Kogyo Co Ltd

01/19/17 / #20170018369

Crystal growth control agent, forming p-type semiconductor microparticles or p-type semiconductor microparticle film, composition for forming hole transport layer, and solar cell

First, there is provided a crystal growth control agent which is capable of suppressing an increase in a crystal size of a p-type semiconductor, and performing chemical modification on a surface of p-type semiconductor microparticle. Second, there is provided a composition for forming a hole transport layer which is capable... Tokyo Ohka Kogyo Co Ltd

01/19/17 / #20170018749

Porous separator for secondary batteries and secondary battery using same

To provide a porous separator which has excellent handleability and provides a secondary battery with high electrical characteristics. A porous separator for secondary batteries according to the present invention is formed of a porous film, and is characterized by having a first layered region having an average pore diameter of... Tokyo Ohka Kogyo Co Ltd








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