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Tosoh Smd Inc
Tosoh Smd Inc_20100107
  

Tosoh Smd Inc patents

Recent patent applications related to Tosoh Smd Inc. Tosoh Smd Inc is listed as an Agent/Assignee. Note: Tosoh Smd Inc may have other listings under different names/spellings. We're not affiliated with Tosoh Smd Inc, we're just tracking patents.

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Date Tosoh Smd Inc patents (updated weekly) - BOOKMARK this page
04/06/17Radio frequency identification in-metal installation and isolation for sputtering target
03/23/17Diffusion-bonded sputter target assembly and manufacturing
03/16/17Silicon sputtering target with special surface treatment and good particle performance and methods of making the same
01/26/17Boron-doped n-type silicon target
10/13/16Soft-magnetic based targets having improved pass through flux
08/11/16Optimized textured surfaces and methods of optimizing
12/10/15Silicon sputtering target with enhanced surface profile and improved performance and methods of making the same
06/18/15Low deflection sputtering target assembly and methods of making same
02/06/14Diffusion-bonded sputter target assembly and manufacturing
11/21/13Monolithic aluminum alloy target and manufacturing
12/06/12Sputter target
11/29/12Sputtering target
10/25/12Systems and methods for a target and backing plate assembly
01/05/12Sputtering target assembly and making same
09/15/11Circular groove pressing mechanism and sputtering target manufacturing
09/08/11Method of making a sputter target and sputter targets made thereby
08/25/11Method of bonding rotatable ceramic targets to a backing structure
06/16/11Sputtering target with an insulating ring and a gap between the ring and the target
03/10/11Monolithic aluminum alloy target and manufacturing
04/29/10Ultra smooth face sputter targets and methods of producing same
02/25/10Sputtering target assembly and making same
02/18/10Systems and methods for a target and backing plate assembly
01/07/10Copper sputtering target with fine grain size and high electromigration resistance and methods of making the same
09/24/09Non-planar sputter targets having crystlallographic orientations promoting uniform deposition
08/27/09High purity target manufacturing methods
06/25/09Low leak o-ring seal
05/14/09Sputter targets with expansion grooves for reduced separation
03/26/09Sputter targets and methods of manufacturing same to reduce particulate emission during sputtering
01/07/10Copper sputtering target with fine grain size and high electromigration resistance and methods of making the same







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