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Tosoh Smd Inc
Tosoh Smd Inc_20100107

Tosoh Smd Inc patents

Recent patent applications related to Tosoh Smd Inc. Tosoh Smd Inc is listed as an Agent/Assignee. Note: Tosoh Smd Inc may have other listings under different names/spellings. We're not affiliated with Tosoh Smd Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "T" | Tosoh Smd Inc-related inventors

 new patent  Method of making a tantalum sputter target and sputter targets made thereby

Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then cut from the cross rolled ingot.... Tosoh Smd Inc

Sputtering target having reverse bowng target geometry

Generally planar sputter targets having a reverse bow surface (i.e., convexity) facing the magnets in a magnetron assembly is provided. Methods of making Cu and Cu alloy targets are provided including an annealing step performed at temperatures of from 1100-1300 F for a period of about 1-2 hours. Targets made... Tosoh Smd Inc

Radio frequency identification in-metal installation and isolation for sputtering target

A RFID tag containment combination for a sputter target/backing plate assembly. A bore is provided in either the target or the backing plate and is adapted for snug receipt of a plug therein. The plug comprises a recessed portion thereof configured to carry the RFID tag therein.... Tosoh Smd Inc

Diffusion-bonded sputter target assembly and manufacturing

A method of making a diffusion bonded sputter target assembly is provided. A target blank comprising a first metal or alloy has a first surface defining a sputtering surface and a second surface. A second metal or alloy is placed around the target blank. A backing plate is provided adjacent... Tosoh Smd Inc

Silicon sputtering target with special surface treatment and good particle performance and methods of making the same

A sputter target assembly comprising a Si target and a backing plate is provided wherein the backing plate is bonded to the target. The Si target comprises a smooth, mirror-like surface and has a surface roughness of less than about 15.0 Angstroms. Methods are provided for producing silicon target/backing plate... Tosoh Smd Inc

Boron-doped n-type silicon target

Sputter targets and methods of making same. The targets comprise B doped n-type Si. The targets may be made from single crystal boron doped p-type Si ingot made by the CZ method. Resistivities along the length of the crystal are measured, and blanks may be cut perpendicular to the ingot... Tosoh Smd Inc

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009


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