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Ultratech Inc
Ultratech Inc_20131212
  

Ultratech Inc patents

Recent patent applications related to Ultratech Inc. Ultratech Inc is listed as an Agent/Assignee. Note: Ultratech Inc may have other listings under different names/spellings. We're not affiliated with Ultratech Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "U" | Ultratech Inc-related inventors




Date Ultratech Inc patents (updated weekly) - BOOKMARK this page
09/14/17Quartz crystal microbalance assembly for ald systems
09/07/17Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations
08/31/17Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations
08/24/17Pe-ald methods with reduced quartz-based contamination
07/27/17Method and forming device quality gallium nitride layers on silicon substrates
07/06/17Improved through silicon via
06/22/17Full-wafer inspection methods having selectable pixel density
06/08/17Vapor deposition systems and methods
06/08/17High-efficiency line-forming optical defect annealing and dopant activation
06/08/17Systems and methods of characterizing process-induced wafer shape for process control using cgs interferometry
05/25/17Vapor delivery system
04/27/17Methods of forming an ald-inhibiting layer using a self-assembled monolayer
03/30/17High-throughput multichamber atomic layer deposition systems and methods
03/16/17Laser-assisted atomic layer deposition of 2d metal chalcogenide films
03/02/17Plasma-enhanced atomic layer deposition system with rotary reactor tube
01/26/17Masking methods for ald processes for electrode-based devices
01/26/17High-efficiency line-forming optical systems and methods using a serrated spatial filter
01/19/17Plasma atomic layer deposition system and method
12/15/16Polarization-based coherent gradient sensing systems and methods
12/08/16Microchamber laser processing systems and methods using localized process-gas atmosphere
12/01/16Silicon germanium heterojunction bipolar transistor structure and method
11/24/16Method of laser annealing a semiconductor wafer with localized control of ambient oxygen
10/20/16High-efficiency line-forming optical systems and methods
09/29/16Plasma enhanced ald system
09/22/16Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealing
08/18/16Laser annealing systems and methods with ultra-short dwell times
08/18/16Systems and processes for forming three-dimensional integrated circuits
07/14/16Method and forming device quality gallium nitride layers on silicon substrates
06/23/16Laser annealing systems and methods with ultra-short dwell times
06/02/16Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations
05/26/16High-efficiency line-forming optical defect annealing and dopant activation
04/28/16Atomic layer deposition head
03/24/16Laser annealing systems and methods with ultra-short dwell times
03/03/16Radical-enhanced atomic layer deposition using cf4 to enhance oxygen radical generation
02/04/16High-efficiency line-forming optical systems and methods
01/07/16Reaction chamber with removable liner
12/24/15Systems and methods for reducing beam instability in laser annealing
11/19/15Wynne-dyson projection lens with reduced susceptibility to uv damage
10/01/15Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range
10/01/15Oxygen radical enhanced atomic-layer deposition using ozone plasma
06/25/15Laser spike annealing using fiber lasers
04/02/15Epitaxial growth of compound semiconductors using lattice-tuned domain-matching epitaxy
02/26/15Wynne-dyson optical system with variable magnification
02/12/15Methods of laser processing photoresist in a gaseous environment
01/29/15Systems and methods for measuring high-intensity light beams
08/28/14Systems and methods for material processing using light-emitting diodes
08/14/14Apparatus and methods for improving the intensity profile of a beam image used to process a substrate
06/26/14Wynn-dyson imaging system with reduced thermal distortion
06/19/14Dual-loop control for laser annealing of semiconductor wafers
06/05/14Movable microchamber system with gas curtain
05/22/14Methods of characterizing semiconductor light-emitting devices based on product wafer characteristics
05/15/14Laser annealing of gan leds with reduced pattern effects
04/03/14Through silicon via and fabricating same
02/27/14Non-melt thin-wafer laser thermal annealing methods
12/12/13Laser annealing systems and methods with ultra-short dwell times
12/05/13Unit magnification large-format catadioptric lens for microlithography
10/24/13Betavoltaic power sources for mobile device applications
10/10/13Systems for and methods of laser-enhanced plasma processing of semiconductor materials
08/01/13Two-beam laser annealing with improved temperature performance
05/02/13Solder interconnect pads with current spreading layers
02/21/13Programmable illuminator for a photolithography system
09/06/12Minimization of surface reflectivity
06/21/12Photolithographic led fabrication using phase-shift mask
06/21/12Phase-shift mask with assist phase regions
05/10/12Thermal processing of substrates with pre- and post-spike temperature contro
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04/26/12Systems and methods for forming a time-averaged line image
03/22/12Substrate processing with reduced warpage and/or controlled strain
12/22/11Fast thermal annealing of gan leds
12/08/11Thermal processing of substrates with pre- and post-spike temperature control
11/17/11Fast annealing for gan leds
10/13/11Apparatuses and methods for irradiating a substrate to avoid substrate edge damage
06/02/11Optical alignment methods for forming leds having a rough surface
05/12/11Laser spike annealing for gan leds
04/21/11Systems and processes for forming three-dimensional circuits
03/10/11Dual-sided substrate measurement apparatus and methods
02/03/11Substrate processing with reduced warpage and/or controlled strain
04/16/09Laser thermal processing with laser diode radiation
12/12/13Laser annealing systems and methods with ultra-short dwell times







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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Ultratech Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Ultratech Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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