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Varian Semiconductor Equipment Associates Inc
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Varian Semiconductor Equipment Associates Inc patents

Recent patent applications related to Varian Semiconductor Equipment Associates Inc. Varian Semiconductor Equipment Associates Inc is listed as an Agent/Assignee. Note: Varian Semiconductor Equipment Associates Inc may have other listings under different names/spellings. We're not affiliated with Varian Semiconductor Equipment Associates Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "V" | Varian Semiconductor Equipment Associates Inc-related inventors




Date Varian Semiconductor Equipment Associates Inc patents (updated weekly) - BOOKMARK this page
06/22/17 new patent  Self-damping end effector
06/22/17 new patent  Temperature controlled ion source
06/22/17 new patent  Apparatus and techniques for time modulated extraction of an ion beam
06/22/17 new patent  Techniques for controlling ion/neutral ratio of a plasma source
06/22/17 new patent  Damage free enhancement of dopant diffusion into a substrate
06/22/17 new patent  Ion implantation for improved contact hole critical dimension uniformity
06/22/17 new patent  Etch rate modulation through ion implantation
06/22/17 new patent  Non-uniform gate oxide thickness for dram device
06/15/17Parallelizing electrostatic acceleration/deceleration optical element
06/08/17Planar end effector and making a planar end effector
06/08/17System and controllable non-volatile metal removal
06/08/17Apparatus and techniques for filling a cavity using angled ion beam
05/25/17Modifying bulk properties of a glass substrate
05/18/17Low profile extraction electrode assembly
05/18/17Single piece ceramic platen
05/11/17System and in situ temperature measurement
05/11/17Finfet spacer etch with no fin recess and no gate-spacer pull-down
05/11/17Laser processing of superconductor layers
05/04/17Encapsulated nanostructures and fabricating
04/27/17Ion source for multiple charged species
04/20/17Controlling an ion beam in a wide beam current operation range
03/30/17In-situ plasma cleaning of process chamber electrostatic elements having varied geometries
03/16/17Techniques and manipulating an ion beam
03/02/17Light bath for particle suppression
03/02/17Method of improving ion beam quality in an implant system
03/02/17Gas injection system for ion beam device
03/02/17Liquid immersion doping
02/23/17Apparatus for forming crystalline sheet from a melt
02/23/17Apparatus and generating high current negative hydrogen ion beam
02/09/17Thermal load leveling using anisotropic materials
02/09/17Apparatus and techniques to treat substrates using directional plasma and reactive gas
02/02/17Apparatus and carbon film deposition profile control
02/02/17Controlling contamination particle trajectory from a beam-line electrostatic element
02/02/17High brightness ion beam extraction
02/02/17Negative ribbon ion beams from pulsed plasmas
01/26/17Apparatus and techniques to treat substrates using directional plasma and point of use chemistry
01/26/17Selective processing of a workpiece
01/26/17Masking for high temperature implants
01/05/17Workpiece processing technique
12/29/16Triple mode electrostatic collimator
12/29/16Techniques to engineer nanoscale patterned features using ions
12/29/16Method for selectively depositing a layer on a three dimensional structure
12/29/16Finfet spacer etch with no fin recess and no gate-spacer pull-down
12/29/16Techniques and anisotropic metal etching
12/29/16Electrostatic chuck with led heating
12/29/16Vacuum compatible led substrate heater
12/29/16Thermal shield for electrostatic chuck
12/15/16In-situ plasma cleaning of process chamber components
11/24/16Textured silicon liners in substrate processing systems
11/24/16Connecting system for superconducting systems
11/17/16Apparatus and multilayer deposition
11/17/16Source housing assembly for controlling ion beam extraction stability and ion beam current
11/10/16Methods of affecting material properties and applications therefor
11/10/16Apparatus for heating and processing a substrate
11/10/16Substrate handling and heating system
10/27/16Semiconductor manufacturing device with embedded fluid conduits
10/27/16Apparatus and controlling implant process
10/27/16Method for fabricating three dimensional device
10/27/16Method for fabricating asymmetrical three dimensional device
10/27/16Thermally insulating electrical contact probe
10/20/16Hybrid thermal electrostatic clamp
10/13/16Selective processing of a workpiece
10/06/16Sic coating in an ion implanter
10/06/16Device and substrate heating during transport
10/06/16Apparatus and endpoint detection
Patent Packs
09/29/16Multi-aperture extraction system for angled ion beam
09/22/16Cryopump arrangement for improved pump speed
09/15/16System and controllable non-volatile metal removal
09/15/16Rotary flex union
09/15/16Apparatus for improving temperature uniformity of a workpiece
08/11/16Apparatus and method to control ion beam current
08/11/16Angled ion beam processing of heterogeneous structure
07/28/16Multiple exposure treatment for processing a patterning feature
06/30/16In situ control of ion angular distribution in a processing apparatus
06/23/16Apparatus for improving temperature uniformity of a workpiece
06/23/16System and moving workpieces between multiple vacuum environments
06/16/16Apparatus and monitoring and controlling thickness of a crystalline layer
06/16/16Apparatus and method to control an ion beam
06/09/16Ion implantation for superconductor tape fabrication
06/09/16Boron implanting using a co-gas
Patent Packs
06/09/16Boron implanting using a co-gas
06/02/16System and opening a load lock door valve at a desired pressure after venting
05/26/16Detachable high-temperature electrostatic chuck assembly
05/19/16Control of workpiece temperature via backside gas flow
05/12/16Method for improving critical dimension variability
05/12/16Method for improving fin isolation
04/21/16Apparatus and controlling thickness of a crystalline sheet grown on a melt
04/21/16Ion beam uniformity control
04/21/16Workpiece processing method and apparatus
04/14/16Platen assembly
03/17/16Uniformity control using adjustable internal antennas
03/10/16Linkage conduit for vacuum chamber applications
03/10/16Control of ion angular distribution of ion beams with hidden deflection electrode
03/10/16Inductively coupled rf plasma source with magnetic confinement and faraday shielding
03/03/16Ion implant assisted metal etching
03/03/16Bias electrodes for tandem accelerator
02/11/16Techniques and anisotropic metal etching
02/11/16Techniques and anisotropic metal etching
01/28/16Annular cooling fluid passage for magnets
01/14/16Apparatus and efficient materials use during substrate processing
01/07/16Composite end effector and making a composite end effector
01/07/16Method and depositing a monolayer on a three dimensional structure
01/07/16Apparatus for dynamic temperature control of an ion source
01/07/16High efficiency depositing a layer on a three dimensional structure
01/07/16Method for selectively depositing a layer on a three dimensional structure
01/07/16Method of forming an interdigitated back contact solar cell
12/31/15Shielding device for substrate edge protection and using same
12/10/15Method of improving ion beam quality in a non-mass-analyzed ion implantation system
12/10/15Apparatus and mass analyzed ion beam
12/03/15Low ac loss high temperature superconductor tape
Social Network Patent Pack
12/03/15Integrated superconductor device and fabrication
11/12/15Platen with multiple shaped grounding structures
11/12/15Apparatus for processing a melt
11/12/15Apparatus and dynamic control of ion beam energy and angle
11/12/15System and holding a substrate over wide temperature range
10/29/15Techniques for forming angled structures for reduced defects in heteroepitaxy of semiconductor films
10/15/15Planar end effector and making a planar end effector
10/01/15Technique for temperature measurement and calibration of semiconductor workpieces using infrared
10/01/15Platen for reducing particle contamination on a substrate and a method thereof
10/01/15End effector pads
Patent Packs
09/24/15Thermistor based measurement system
09/24/15Ion beam uniformity control using ion beam blockers
09/24/15Advanced back contact solar cells
09/03/15Electrostatic charge removal for solar cell grippers
08/27/15Platen support structure
08/20/15Heated platen with improved temperature uniformity
08/13/15Method and three dimensional ion implantation
08/13/15Plasma resistant electrostatic clamp
08/13/15Complementary traveling masks
08/06/15Method and mechanism for erosion detection of defining apertures
07/30/15Diffusion resistant electrostatic clamp
07/30/15Techniques for ion implantation of narrow semiconductor structures
07/23/15Two-dimensional mass resolving slit mechanism for semiconductor processing systems
07/02/15Cold stripper for high energy ion implanter with tandem accelerator
06/25/15Techniques for diamond nucleation control for thin film processing
06/25/15Contained ceramic fastener
06/25/15In situ control of ion angular distribution in a processing apparatus
06/25/15Technique for processing a substrate
06/18/15Vacuum assembly for an ion implanter system
06/11/15Dielectric coating of the edge of a solar cell
06/11/15Fault current limiter with interleaved windings
05/28/15Triple mode electrostatic collimator
05/28/15Laser processing of superconductor layers
05/14/15Techniques for ion implantation of non-planar field effect transistors
05/07/15Plasma cathode charged particle lithography system
05/07/15System and rotational transfer of articles between vacuum and non-vacuum environments
05/07/15Dynamic pitch substrate lift
04/30/15Pinched plasma bridge flood gun for substrate charge neutralization
04/23/15Dual stage scanner for ion beam control
04/23/15Apparatus to control an ion beam
Patent Packs
04/23/15Wide metal-free plasma flood gun
04/16/15Method of cleaning an extraction electrode assembly using pulsed biasing
04/16/15Techniques for processing a substrate
04/16/15Moveable current sensor for increasing ion beam utilization during ion implantation
04/02/15Sic coating in an ion implanter
03/26/15Techniques for processing substrates using directional reactive ion etching
03/26/15System and transferring articles between vacuum and non-vacuum environments
03/12/15Dynamic electrode plasma system
03/12/15Gas coupled probe for substrate temperature measurement
03/05/15Barrier layer for electrostatic chucks
03/05/15High temperature platen power contact
03/05/15Semiconductor process pumping arrangements
03/05/15Gas coupled arc chamber cooling
03/05/15High throughput substrate handling endstation and sequence
03/05/15High temperature superconductor tape with alloy metal coating
02/26/15Fast switch fault current limiter
02/26/15System and providing isolated power to gate driving circuits in solid state fault current limiters
02/26/15Solid state fault current limiter
02/19/15Hybrid electrostatic lens with increased natural frequency
02/12/15Method for achieving sustained anisotropic crystal growth on the surface of a melt
Social Network Patent Pack
02/05/15Lifetime ion source
01/29/15Mechanical alignment of substrates to a mask
01/29/15Multi-part mask for implanting workpieces
01/22/15Method of improving ion beam quality in an implant system
01/22/15Method for implant productivity enhancement
01/15/15Method of doping a polycrystalline transistor channel for vertical nand devices
01/08/15Biasing system for a plasma processing apparatus
01/01/15Textured silicon liners in substrate processing systems
12/25/14Proximity mask for ion implantation
12/25/14Replacement metal gate transistor
12/25/14Process flow for replacement metal gate transistors
12/18/14Workpiece alignment device
12/18/14Annular cooling fluid passage for magnets
12/04/14System and improving implant quality in a plasma-based implant system
11/20/14System and quick-swap of multiple substrates
11/20/14Variable doping of solar cells
11/06/14Apparatus and techniques for controlling ion implantation uniformity
11/06/14Extended lifetime ion source
10/30/14Low emissivity electrostatic chuck
10/30/14Self-cleaning radio frequency plasma source
Social Network Patent Pack
10/30/14System and analyzing voltage breakdown in electrostatic chucks
10/16/14Method and system for modifying substrate relief features using ion implantation
10/16/14Spring retained end effector contact pad
09/18/14Ion source
09/18/14Wafer platen thermosyphon cooling system
09/18/14High voltage busing for cryogenics applications
09/18/14Workpiece support structure with four degree of freedom air bearing for high vacuum systems
09/18/14Workpiece support structure with four degree of freedom air bearing for high vacuum systems
09/18/14Wafer handling apparatus
09/18/14Wafer handling apparatus
09/18/14Composite end effectors
09/18/14Hardware plasma interlock system
09/18/14System and plasma control using boundary electrode
09/18/14Superconducting fault current limiter system
09/18/14Rotary flex union
09/18/14High throughput, low volume clamshell load lock
09/18/14Apparatus and techniques for energetic neutral beam processing
09/18/14Techniques for processing photoresist features using ions
09/18/14Method of forming single side textured semiconductor workpieces
09/18/14Techniques to mitigate straggle damage to sensitive structures
09/11/14Insulator protection
09/11/14Floating high vacuum seal cartridge
09/11/14Venturi assisted gripper
09/11/14Techniques and high rate hydrogen implantation and co-implantion
08/28/14Electric switchable magnet slitvalve
08/21/14Method and system for plasma-assisted ion beam processing
08/07/14Metallization process for solar cells
07/31/14Removing a sheet from the surface of a melt using gas jets
07/31/14Ion implantation based emitter profile engineering via process modifications
06/19/14Magnetic masks for an ion implant apparatus
Social Network Patent Pack
06/19/14Transfer chamber and using a transfer chamber
06/19/14Temperature monitor for devices in an ion implant apparatus
06/19/14Mask alignment system for semiconductor processing
06/12/14Technique for selectively processing three dimensional device
06/12/14Ion implant for defect control
06/05/14Use of dopants with different diffusivities for solar cell manufacture
05/01/14Techniques for patterning resist
05/01/14Techniques for manufacturing devices
04/24/14Apparatus for treating ion beam
04/24/14Valve
04/17/14Gas transport across a high voltage potential
04/17/14Biasing system for a plasma processing apparatus
04/10/14Apparatus for float grown crystalline sheets
04/10/14Inductively coupled plasma ion source chamber with dopant material shield
04/10/14Method and thermal control of ion sources and sputtering targets
03/20/14System and 2d workpiece alignment
03/13/14Internal rf antenna with dielectric insulation
03/06/14Electrostatic chuck with radiative heating
02/13/14Inductively coupled plasma ion source with multiple antennas for wide ion beam
02/06/14Enhanced etch and deposition profile control using plasma sheath engineering
02/06/14Hybrid electrostatic lens with increased natural frequency
02/06/14Anisotropic surface energy modulation by ion implantation
02/06/14Method and system for ion-assisted processing
01/30/14Three dimensional metal deposition technique
01/30/14Bifacial solar cell using ion implantation
01/23/14Beamline electrode voltage modulation for ion beam glitch recovery
01/23/14Electrostatic charge removal for solar cell grippers
01/02/14Vacuum insulated fitting enclosure
01/02/14Vacuum insulated cryogenic fluid transfer hose







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