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Veeco Instruments Inc patents

Recent patent applications related to Veeco Instruments Inc. Veeco Instruments Inc is listed as an Agent/Assignee. Note: Veeco Instruments Inc may have other listings under different names/spellings. We're not affiliated with Veeco Instruments Inc, we're just tracking patents.

ARCHIVE: New 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "V" | Veeco Instruments Inc-related inventors




Date Veeco Instruments Inc patents (updated weekly) - BOOKMARK this page
06/01/17Stress control on thin silicon substrates
05/04/17Wafer carrier having thermal uniformity-enhancing features
05/04/17Ion beam etching of stt-ram structures
04/06/17Rotating disk reactor with ferrofluid seal for chemical vapor deposition
03/16/17Planetary wafer carriers
03/09/17Multiple chamber chemical vapor deposition system
02/23/17Process-specific wafer carrier correction to improve thermal uniformity in chemical vapor deposition systems and processes
02/02/17Method and controlled dopant incorporation and activation in a chemical vapor deposition system
01/26/17Deposition of thick magnetizable films for magnetic devices
12/22/16Self-centering wafer carrier system for chemical vapor deposition
12/08/16Stress control for heteroepitaxy
12/01/16Wafer surface 3-d topography mapping based on in-situ tilt measurements in chemical vapor deposition systems
10/06/16Hydroxide facilitated optical films
09/01/16Wafer processing with carrier extension
08/11/16Film deposition assisted by angular selective etch on a surface
07/14/16Processing methods and apparatus with temperature distribution control
06/23/16Self-filtered optical monitoring of narrow bandpass filters
06/16/16Gas injection system for chemical vapor deposition using sequenced valves
06/09/16Linear cluster deposition system
06/09/16Linear cluster deposition system
05/05/16Method for improving performance of a substrate carrier
04/28/16Multi-wafer rotating disc reactor with inertial planetary drive
03/10/16Method and surface processing of a substrate using an energetic particle beam
02/11/16Temperature control for gan based materials
02/11/16Enhanced enclosures for acoustical gas concentration sensing and flow control
12/31/15Variable-temperature material growth stages and thin film growth
12/17/15Wafer loading and unloading
12/17/15Gas flow flange for a rotating disk reactor for chemical vapor deposition
11/26/15Control of stray radiation in a cvd chamber
09/17/15Method for increased target utilization in ion beam deposition tools
08/13/15Density-matching alkyl push flow for vertical flow rotating disk reactors
08/06/15Pressure-adjusting lapping element
07/30/15Wafer carrier having retention pockets with compound radii for chemical vapor desposition systems
07/02/15Water carrier having thermal cover for chemical vapor deposition systems
07/02/15Engineered substrates for use in crystalline-nitride based devices
03/19/15Rotating disk reactor with ferrofluid seal for chemical vapor deposition
03/12/15Tensile separation of a semiconducting stack
02/26/15Chemical vapor deposition with elevated temperature gas injection
02/05/15Deposition of thick magnetizable films for magnetic devices
12/25/14Bellows-free retractable vacuum deposition sources
11/20/14Dual-side wafer bar grinding
09/18/14Wafer carrier with temperature distribution control
08/14/14Alkyl push flow for vertical flow rotating disk reactors
07/10/14Self-cleaning shutter for cvd reactor
05/15/14Insertion/extraction tool for components in housing
05/01/14Chemical vapor deposition flow inlet elements and methods
03/06/14Apparatus and improved acoustical transformation
01/16/14Film deposition assisted by angular selective etch on a surface
12/26/13Temperature control for gan based materials
10/31/13Method for improving performance of a substrate carrier
09/26/13Keyed wafer carrier
08/29/13Automated cassette-to-cassette substrate handling system
08/15/13Method and surface processing of a substrate using an energetic particle beam
05/16/13Ion beam deposition of fluorine-based optical films
02/14/13Grid providing beamlet steering
12/27/12Chemical vapor deposition flow inlet elements and methods
12/06/12Heated wafer carrier profiling
12/06/12Heated wafer carrier profiling
11/01/12Metal-organic vapor phase epitaxy system and process
10/04/12Apparatus and batch non-contact material characterization
08/23/12Ion sources and methods for generating an ion beam with controllable ion current density distribution
07/05/12Methods and systems for in-situ pyrometer calibration
07/05/12Wafer carrier with selective control of emissivity
07/05/12Wafer processing with carrier extension
06/21/12Gas injection system for chemical vapor deposition using sequenced valves
Patent Packs
06/21/12Sectional wafer carrier
04/19/12Fault tolerant ion source power system
04/05/12Ion beam distribution
04/05/12Plume steering
04/05/12Grid providing beamlet steering
03/29/12Heater with liquid heating element
03/22/12Movable injectors in rotating disc gas reactors
03/08/12Linear cluster deposition system
02/16/12Enhanced wafer carrier
02/16/12Chemical vapor deposition with elevated temperature gas injection
02/02/12Exhaust for cvd reactor
12/08/11Apparatus and batch non-contact material characterization
12/08/11Multi-wafer rotating disc reactor with inertial planetary drive
12/08/11Apparatus and batch non-contact material characterization
12/01/11Multi-chamber cvd processing system
Patent Packs
11/24/11Wafer carrier with hub
09/29/11Split laser scribe
09/08/11Wafer carrier with sloped edge
08/25/11Processing methods and apparatus with temperature distribution control
07/07/11Method and apparatus of operating a scanning probe microscope
06/02/11Method for improving performance of a substrate carrier
05/19/11Wafer carrier with hub
04/21/11Gas treatment systems
04/21/11Method and surface processing of a substrate
04/21/11Gas treatment systems
02/24/11Erodible spacer dicing blade gang assembly
12/09/10Method and characterizing a probe tip
12/02/10Multi-gas distribution injector for chemical vapor deposition reactors
11/18/10Web substrate deposition system
11/11/10Linear deposition source
11/11/10Linear deposition source
09/02/10Grid transparency and grid hole pattern control for ion beam uniformity
06/24/10Linear deposition source
06/10/10Chemical vapor deposition flow inlet elements and methods
05/13/10Method and apparatus of operating a scanning probe microscope
05/06/10Chemical vapor deposition with elevated temperature gas injection
04/08/10Chemical vapor deposition with energy input
03/04/10Wafer carrier with varying thermal resistance
10/15/09Probe microscope setup method
09/10/09Apparatus and batch non-contact material characterization
09/03/09Method and obtaining quantitative measurements using a probe based instrument
08/13/09Method of fabricating a probe device for a metrology instrument and a probe device produced thereby
07/23/09Interferometric measurement of dlc layer on magnetic head
06/18/09Wafer carrier with hub
04/16/09Method and surface processing of a substrate using an energetic particle beam
Social Network Patent Pack
02/05/09Fast-scanning spm and operating same







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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Veeco Instruments Inc in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Veeco Instruments Inc with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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