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Wonik Ips Co Ltd patents


Recent patent applications related to Wonik Ips Co Ltd. Wonik Ips Co Ltd is listed as an Agent/Assignee. Note: Wonik Ips Co Ltd may have other listings under different names/spellings. We're not affiliated with Wonik Ips Co Ltd, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "W" | Wonik Ips Co Ltd-related inventors


Substrate processing apparatus and substrate processing method

Provided is a substrate processing apparatus and substrate processing method for depositing a thin film on a substrate. The substrate processing apparatus may include a chamber, a susceptor rotatably mounted in the chamber, at least one satellite mounted on the susceptor, configured to place a substrate thereon, and capable of... Wonik Ips Co Ltd

Substrate transfer apparatus and control method thereof

Provided are a substrate transfer apparatus and a control method thereof. The substrate transfer apparatus includes a body having a gate through which a substrate passes; a substrate transfer robot provided inside the body and including an end effector that includes a first seating portion and a second seating portion... Wonik Ips Co Ltd

Method of forming amorphous silicon layer

Provided is a method of forming an amorphous silicon layer. The method includes depositing an amorphous silicon layer on a substrate in a chamber; performing a post-treatment on an upper surface portion of the amorphous silicon layer using plasma by activating a post-treatment gas containing at least one component of... Wonik Ips Co Ltd

Substrate processing system and substrate processing method

A substrate processing system and substrate processing method. The substrate processing system includes: a chamber; a susceptor disposed inside the chamber and allowing a substrate to be seated thereon; a mask member disposed over the substrate; and a controller for controlling an arrangement height of the mask member with respect... Wonik Ips Co Ltd

Apparatus for processing a wafer and depositing a thin film using the same

An apparatus for processing a substrate may include a chamber, a substrate support, a showerhead structure and a purge ring structure. The purge ring structure may be arranged at an edge portion of the substrate support to inject a deposition-preventing gas, which may be supplied from the substrate support, to... Wonik Ips Co Ltd

Substrate processing apparatus

Provided is a substrate processing apparatus capable of improving thickness uniformity. The substrate processing apparatus includes a process chamber including a shower head, a feeding block including a tube to provide a source gas and a reaction gas to the shower head, and a mixing block configured to provide a... Wonik Ips Co Ltd








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This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. Freshpatents.com is not affiliated or associated with Wonik Ips Co Ltd in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Wonik Ips Co Ltd with additional patents listed. Browse our Agent directory for other possible listings. Page by FreshPatents.com

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