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Beneq Oy patents


Recent patent applications related to Beneq Oy. Beneq Oy is listed as an Agent/Assignee. Note: Beneq Oy may have other listings under different names/spellings. We're not affiliated with Beneq Oy, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "B" | Beneq Oy-related inventors


Display device and a method for manufacturing such device

An improved transparent thin film electroluminescent display including a substrate, an active layer capable of emitting a wavelength range of visible light, a viewing side surface and a narrowband reflector reflecting part of the light of the active layer back towards the viewing side surface is disclosed. Said narrowband reflector and viewing side surface are arranged on opposite sides of the active layer. ... Beneq Oy

Apparatus and method

An apparatus and a method for processing a surface of a substrate exposes the surface of the substrate to alternating surface reactions of at least a first starting material and a second starting material according to the principles of atomic layer deposition method. A first starting material is fed on the surface of the substrate locally by a source by moving the source in relation to the substrate, and the surface of the substrate processed with the first starting material is exposed to a second starting material present in the atmosphere surrounding the source.. ... Beneq Oy

Nozzle head and apparatus for coating substrate surface

A nozzle head, apparatus and method for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition. The nozzle head comprises an output face provided with at least two different precursor zones, the at least two different precursor zones being arranged to provide different coating layers on the surface of the substrate.. ... Beneq Oy

Arrangement for processing substrate and substrate carrier

The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier.. ... Beneq Oy

Nozzle head, apparatus and method for subjecting surface of substrate to successive surface reactions

The invention relates to a nozzle head, an apparatus and method for subjecting a surface of a substrate to successive surface reactions of at least a first precursor (a) and a second precursor (b). The nozzle head having an output face comprises at least one precursor nozzle for supplying precursor (a, b) to the surface of the substrate and at least one discharge channel for discharging precursor (a, b) from the surface of the substrate. ... Beneq Oy








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