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Cabot Corporation patents


Recent patent applications related to Cabot Corporation. Cabot Corporation is listed as an Agent/Assignee. Note: Cabot Corporation may have other listings under different names/spellings. We're not affiliated with Cabot Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Cabot Corporation-related inventors


Methods of making an elastomer composite reinforced with silica and carbon black and products containing same

Methods to make a silica and carbon black elastomer composite with a destabilized dispersion that includes silica are described, along with particle reinforced elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

Methods of making an elastomer composite reinforced with silica and products containing same

Methods to make a silica elastomer composite with a destabilized dispersion of silica are described, along with silica elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

Carbonaceous materials for lead acid batteries

Disclosed herein are compositions, which can be used to coat electrode plates, comprising at least one carbonaceous material and at least one additive, wherein the at least one additive comprises a metal ion selected from calcium, barium, potassium, magnesium, and strontium ion, and wherein the metal ion is present in an amount ranging from 0.5 wt. % to 3 wt. ... Cabot Corporation

Methods of making an elastomer composite reinforced with silica and products containing same

Methods to make a silica elastomer composite with a destabilized dispersion of a never-dried, or as-produced, precipitated silica are described, along with silica elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

Liquid purification using activated carbon

Disclosed herein are methods liquid (e.g., water) purification using activated carbon.. . ... Cabot Corporation

Polymers for inkjet ink compositions

Disclosed herein are polymers, which can be incorporated in pigment dispersions and inkjet ink compositions, comprising first monomers selected from ethylenically unsaturated hydrophobic monomers, and second monomers selected from maleic anhydride, maleic acid, and salts, esters, imides, and amides thereof. The polymers can have a portion of the second monomers functionalized with at least one organic group having a calcium index value greater than or equal to a calcium index value of phenylphosphonic acid. ... Cabot Corporation

Supercapacitors containing carbon black particles

A supercapacitor includes an electrode comprising activated carbon and carbon black particles containing less than or equal to about 100 ppm of calcium. A method includes treating base carbon black particles to form treated carbon black particles containing less than or equal to about 100 ppm of calcium; and using the treated carbon black particles to form an electrode of a supercapacitor. ... Cabot Corporation

Oxidized carbon blacks and applications for lead acid batteries

Disclosed herein are oxidized carbon blacks, which can be incorporated into electrode compositions for lead acid batteries. In some embodiments, the oxidized carbon blacks have a bet surface area ranging from 650 to 2100 m2/g; an oil absorption number (oan) ranging from 35 to 500 ml/100 g; and a volatile content of at least 5.5 wt. ... Cabot Corporation

Elastomer compounds reinforced with silica and products containing same

A silica elastomer composite having superior mechanical properties.. . ... Cabot Corporation

Composition and method for polishing silicon carbide

The invention provides a chemical-mechanical polishing composition comprising (a) silica particles, (b) a polymer comprising sulfonic acid monomeric units, (c) optionally, a buffering agent, and (d) water, wherein the polishing composition has a ph of about 2 to about 5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. ... Cabot Corporation

Composition and method for removing residue from chemical-mechanical planarization substrate

Described is a post-cmp cleaning solution and methods useful to remove residue from a cmp substrate or to prevent formation of residue on a surface of a cmp substrate.. . ... Cabot Corporation

Fine particle size activated carbon

Disclosed herein are activated carbon having a particle size distribution of d95 ranging from 1 μm to 28 μm and a d95/d50 ratio ranging from 1.5 to 3, compositions comprising such activated carbons and methods of making the same, and methods of mercury removal from flue gas generated from coal combustion by injecting activated carbon into the flue gas.. . ... Cabot Corporation

Coated compressive subpad for chemical mechanical polishing

Coated compressive subpads for polishing pad stacks and methods of fabricating coated compressive subpads for polishing pad stacks are described. In an example, a polishing pad stack for polishing a substrate includes a polishing pad having a polishing surface and a back surface. ... Cabot Corporation

Sulfur removal from petroleum fluids

A method for removing sulfur containing compounds from petroleum liquid. The method includes contacting the petroleum liquid with an activated carbon that has a high ash content, a high metal content and a significant amount of meso and macro porosity.. ... Cabot Corporation

05/03/18 / #20180118963

Polymers for inkjet ink compositions

Disclosed herein are polymers, which can be incorporated in pigment dispersions and inkjet ink compositions, comprising first monomers selected from ethylenically unsaturated hydrophobic monomers, and second monomers selected from maleic anhydride, maleic acid, and salts, esters, imides, and amides thereof. The polymers can have a portion of the second monomers functionalized with at least one organic group having a calcium index value greater than or equal to a calcium index value of phenylphosphonic acid. ... Cabot Corporation

04/19/18 / #20180105646

Amphoteric polymers and use in inkjet ink compositions

. . Disclosed herein are inkjet ink compositions comprising a polymer comprising the repeat units (a), (b), and (c), wherein: (a) is selected from —n+(r1)(r2)— and —n(r1)—; (b) is selected from c1-c10 alkylene; c3-c20 cycloalkylene; c3-c20 heterocycloalkylene; arylene; heteroarylene; c2-c20 ether; c2-c20 thioether; c2-c20 ester; c2-c20 acetal; c2-c20 amide; bisphenols; and oligomer and polymer moieties selected from polyether, polyester, polyamines, polycarbonate, polyacetal, polythioether, polyester amide, polyurethane, polyacrylate, polyolefin, and polyalkylsiloxane, and (c) comprises at least one group selected from: (i) —c(r3) (r4)—c(r5)(oh)—(c(r6)(r7))m-, (ii) —c(r3)(r4)—c(r5)(h)—c(o)—, and (iii) c(r3)(r4) c(r5)(h) s(o)(o); and (a) is bonded to the —c(r3)(r4)— group of (c), and (b) is bonded to (c).. . ... Cabot Corporation

04/19/18 / #20180104870

Method and apparatus for processing elastomer composite

A method and configuration for automated operation of a two-roll mill. Also provided is a method for continuous or semi-continuous operation of a two-roll mill.. ... Cabot Corporation

04/19/18 / #20180104667

Sorbent blend compositions for mercury removal from flue gases

Disclosed herein are dry blend compositions comprising: a hydrated lime having a ca(oh)2 content of at least 94% by weight, the hydrated lime being present in an amount ranging from 1% to 40% by weight relative to the total weight of the composition; and an activated carbon present in an amount of at least 60% by weight relative to the total weight of the composition. Also disclosed are methods of mercury removal from flue gases, such as flue gases generated from coal-fired power plants.. ... Cabot Corporation

03/15/18 / #20180072916

Diamond-based slurries with improved sapphire removal rate and surface roughness

The invention provides a chemical-mechanical polishing composition and a method of chemically-mechanically polishing a sapphire substrate. The composition contains a diamond abrasive and a ph adjuster. ... Cabot Corporation

01/25/18 / #20180021499

Urea sequestration compositions and methods

Graphene-based materials for sequestering urea from aqueous solutions are provided. The graphene-based materials include graphene aggregates as well as graphene oxides.. ... Cabot Corporation

01/18/18 / #20180016469

Alternative oxidizing agents for cobalt cmp

The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a ph of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. ... Cabot Corporation

01/04/18 / #20180002560

Coatings having filler-polymer compositions with combined low dielectric constant, high resistivity, and optical density properties and controlled electrical resistivity, devices made therewith, and methods for making same

Uv curable coatings containing dual phase filler-polymer compositions with high resistivity, low dielectric constant, good optical density, and controlled electrical resistivity are described, and cured coatings or films formed thereof, along with their use in black matrix, black column spacers, and other light shielding coating elements in lcd. Devices having these black matrices, black column spacers, and/or other light shielding coating elements, and methods of preparing and making these various materials and products are also described.. ... Cabot Corporation

12/28/17 / #20170373312

Electrode compositions comprising carbon additives

Disclosed herein are electrode compositions comprising a homogeneous mixture comprising: a lead-containing material and a carbon additive comprising carbon black and activated carbon. A total amount of the carbon additive ranges from 0.1% to 2% by weight, relative to the total weight of the composition. ... Cabot Corporation

12/28/17 / #20170369742

Polishing composition comprising an amine-containing surfactant

The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria abrasive, (b) a surfactant comprising an amine-containing anchor group and ethylene oxide-propylene oxide stabilizing group, wherein the surfactant has a molecular weight of from about 1000 daltons to about 5000 daltons, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a ph of about 3 to about 6. The invention further provides a method of chemically mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. ... Cabot Corporation

12/07/17 / #20170348820

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

Described are slurry compositions useful in chemical-mechanical processing of a nickel layer of a substrate, wherein the slurry compositions contain abrasive particles that include silica particles that are cationically charged at a low ph.. . ... Cabot Corporation

11/09/17 / #20170324096

Electrodes, compositions, and devices having high structure carbon blacks

An electrode for an energy storage device includes carbon black particles having (a) a brunauer-emmett-teller (bet) surface area ranging from 70 to 120 m2/g; (b) an oil absorption number (oan) ranging from 180 to 310 ml/100 g; (c) a surface energy less than or equal to 15 mj/m2; and (d) either an la crystallite size less than or equal to 29 Å, or a primary particle size less than or equal to 24 nm.. . ... Cabot Corporation

10/26/17 / #20170306157

Modified colorants and inkjet ink compositions comprising modified colorants

The present invention relates to a modified colorant comprising a colorant having attached at least one organic group. Various embodiments of the organic group are disclosed. ... Cabot Corporation

10/26/17 / #20170306156

Modified colorants and inkjet ink compositions comprising modified colorants

The present invention relates to a modified colorant comprising a colorant having at least one polymer attached or adsorbed thereto. The polymer comprises at least one functional group, and various embodiments of the functional group are disclosed. ... Cabot Corporation

10/26/17 / #20170306108

Methods of making an elastomer composite reinforced with silica and carbon black and products containing same

Methods to make a silica and carbon black elastomer composite with a destabilized dispersion that includes silica are described, along with particle reinforced elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

10/26/17 / #20170306107

Methods of making an elastomer composite reinforced with silica and products containing same

Methods to make a silica elastomer composite with a destabilized dispersion of a never-dried, or as-produced, precipitated silica are described, along with silica elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

10/26/17 / #20170306106

Methods of making an elastomer composite reinforced with silica and products containing same

Methods to make a silica elastomer composite with a destabilized dispersion of silica are described, along with silica elastomer composites made from the methods. The advantages achieved with the methods are further described.. ... Cabot Corporation

09/14/17 / #20170260421

Cobalt polishing accelerators

The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: nr1r2r3 wherein r1, r2, and r3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of r1, r2, and r3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-α-amino acids; n-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; n-aminoalkyl-α-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a ph of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. ... Cabot Corporation

08/17/17 / #20170236718

Method of polishing group iii-v materials

Disclosed is a method of chemically-mechanically polishing a substrate. The method comprises, consists of, or consists essentially of (a) contacting a substrate containing at least one group iii-v material, with a polishing pad and a chemical-mechanical polishing composition comprising water, abrasive particles having a negative surface charge, and an oxidizing agent for oxidizing the group iii-v material in an amount of from about 0.01 wt. ... Cabot Corporation

07/27/17 / #20170210946

Polishing composition comprising cationic polymer additive

The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria, (b) a water-soluble cationic polymer or copolymer, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a ph of about 3 to about 6. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. ... Cabot Corporation

07/06/17 / #20170194160

Method of polishing a low-k substrate

Disclosed is a method of chemically-mechanically polishing a substrate. The method comprises, consists of, or consists essentially of (a) contacting a substrate containing a low-k dielectric composition, which includes less than about 80% by weight of carbon, with a polishing pad and a chemical-mechanical polishing composition comprising water and abrasive particles having a positive surface charge, wherein the polishing composition has a ph of from about 3 to about 6; (b) moving the polishing pad and the chemical-mechanical polishing composition relative to the substrate; and (c) abrading at least a portion of the substrate to polish the substrate. ... Cabot Corporation

07/06/17 / #20170190936

Tungsten processing slurry with catalyst

Described are compositions (e.g., slurries) useful in methods for chemical-mechanical processing (e.g. Polishing or planarizing) a surface of a substrate that contains tungsten, the slurries containing abrasive particles, metal cation catalyst, phosphorus-containing zwitterionic compound, and optional ingredients such as oxidizer; also described are methods and substrates used or processed on combination with the compositions.. ... Cabot Corporation

06/29/17 / #20170183540

Cmp processing composition comprising alkylamine and cyclodextrin

Described are compositions useful in methods for chemical-mechanical processing a surface of a substrate, especially a substrate that contains dielectric material, wherein the composition contains cyclodextrin and an alkylamine.. . ... Cabot Corporation

06/22/17 / #20170174897

Hydrophobic-treated metal oxide

This invention provides metal oxide particles surface-treated with a hydrophobicity-imparting agent, methods of making such, and toner compositions comprising the same.. . ... Cabot Corporation

06/22/17 / #20170174896

Surface-treated metal oxide particles

The invention provides metal oxide particles surface-treated with at least one alkoxysilane compound, methods of making such, and toners comprising same.. . ... Cabot Corporation

06/08/17 / #20170158993

Stabilization of tris(2 hydroxyethyl)methylammonium hydroxide against decomposition with dialkyhydroxylamine

The invention provides stabilized solutions useful as raw materials in various applications and methods for stabilizing such aqueous solutions with a stabilizer comprising one or more dialkylhydroxylamines or inorganic or organic acid salts thereof. Stabilized solutions and methods for stabilizing aqueous solutions thereof, include, for example, those of tris(2-hydroxy ethyl)methylammonium hydroxide (themah) and/or carbohydrazide (chz).. ... Cabot Corporation

06/08/17 / #20170158992

Cleaning composition following cmp and methods related thereto

The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains a bulky protecting ligand, an organic amine, an organic inhibitor, and water. ... Cabot Corporation

05/18/17 / #20170137650

Inkjet ink compositions

Disclosed herein inkjet ink compositions comprising: (a) a carbon black having the following properties: oan≧170 ml/100 g; and stsa ranging from 160 to 220 m2/g; (b) at least one polymeric dispersant selected from polyoxyethylene / polyoxypropylene block copolymers, styrene-acrylic resins, styrene-methacrylic resins, styrene-maleic acid copolymers, and styrene- maleic anhydride copolymers; (c) at least one surfactant selected from ethoxylated siloxanes, succinic acid esters, and succinic acid salts; and (d) at least one polyurethane.. . ... Cabot Corporation

05/04/17 / #20170121561

Tungsten-processing slurry with cationic surfactant

Described are chemical mechanical polishing compositions and methods of using the compositions for planarizing a surface of a substrate that contains tungsten, the compositions containing silica abrasive particles and cationic surfactant.. . ... Cabot Corporation

05/04/17 / #20170121560

Tungsten-processing slurry with cationic surfactant and cyclodextrin

Described are chemical-mechanical polishing compositions (e.g., slurries) and methods of using the slurries for chemical-mechanical polishing (or planarizing) a surface of a substrate that contains tungsten, the compositions containing cationic surfactant and cyclodextrin.. . ... Cabot Corporation

05/04/17 / #20170120417

Polishing pad with foundation layer and window attached thereto

Polishing pads having a foundation layer and a window attached to the foundation layer, and methods of fabricating such polishing pads, are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a first modulus. ... Cabot Corporation

04/27/17 / #20170115588

Toner additives comprising composite particles

Metal-oxide composite particles are used as a toner additive.. . ... Cabot Corporation

04/13/17 / #20170101773

Flexible insulating structures and methods of making and using same

A flexible insulating structure includes a batting and a mixture of aerogel-containing particles and a binder, the aerogel-containing particles impregnating at least one layer of the batting. A method for preparing a flexible insulating structure comprises applying a mixture including aerogel-containing particles and a binder to a batting having one or more batting layers; and drying or allowing the binder to dry, thereby forming the flexible insulating structure.. ... Cabot Corporation

04/06/17 / #20170096593

Modified carbon black for oilfield fluids

Surface treated modified carbon black particles and oil-based drilling fluids are described. The carbon blacks are incorporated into the oil-based drilling fluids to reduce the electrical resistivity of the oil-based drilling fluids. ... Cabot Corporation

03/30/17 / #20170087688

Polyurethane cmp pads having a high modulus ratio

A chemical-mechanical polishing pad comprising a polyurethane polishing layer having a high storage modulus at low temperatures and a low storage modulus at high temperatures is disclosed. For example, the disclosed pad embodiments may be fabricated from a thermoplastic polyurethane having a ratio of storage modulus at 25 degrees c. ... Cabot Corporation

03/09/17 / #20170066944

Methods and compositions for processing dielectric substrate

Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., cmp processing.. . ... Cabot Corporation

03/09/17 / #20170066102

Selective nitride slurries with improved stability and improved polishing characteristics

The invention provides a chemical-mechanical polishing composition comprising, consisting essentially of, or consisting of (a) about 0.01 wt. % to about 1 wt. ... Cabot Corporation

02/23/17 / #20170051181

Polishing composition and method utilizing abrasive particles treated with an aminosilane

The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.. . ... Cabot Corporation

02/16/17 / #20170044403

Polishing composition containing ceria abrasive

The invention provides a chemical-mechanical polishing composition including first abrasive particles, wherein the first abrasive particles are wet-process ceria particles, have a median particle size of about 40 nm to about 100 nm, are present in the polishing composition at a concentration of about 0.005 wt. % to about 2 wt. ... Cabot Corporation

02/09/17 / #20170037278

Slurry composition and method for polishing substrate

Provided are a slurry composition to be used in chemical mechanical polishing (cmp), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. ... Cabot Corporation

02/09/17 / #20170036320

Cmp polishing pad with columnar structure and methods related thereto

The invention provides a polishing pad for chemical-mechanical polishing. The polishing pad has a substrate with two opposing surfaces and a plurality of columns projecting from at least one of the surfaces of the substrate in spaced relation to each other. ... Cabot Corporation

01/19/17 / #20170014969

Methods and compositions for processing dielectric substrate

Described are materials and methods for processing (polishing or planarizing) a substrate that contains pattern dielectric material using a polishing composition (aka “slurry”) and an abrasive pad, e.g., cmp processing.. . ... Cabot Corporation

01/05/17 / #20170002220

Aqueous pigment dispersions

Disclosed herein are aqueous dispersions comprising: at least one pigment present in an amount of at least 10% by weight relative to the total weight of the dispersion, the at least one pigment being selected from oxidized carbon blacks and modified carbon blacks having attached at least one organic group; and at least one organic solvent present in an amount of at least 10% by weight relative to the total weight of the dispersion, the at least one organic solvent having a hansen hydrogen bonding parameter (δh) ranging from 13 to 50 mpa0.5, and a hansen polarity parameter (δp) ranging from 5 to 13 mpa0.5, wherein the dispersion is substantially free of a surfactant. Also disclosed are methods of preparing aqueous dispersions and injet ink compositions prepared from the same.. ... Cabot Corporation








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