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Carl Zeiss Smt Gmbh patents


Recent patent applications related to Carl Zeiss Smt Gmbh. Carl Zeiss Smt Gmbh is listed as an Agent/Assignee. Note: Carl Zeiss Smt Gmbh may have other listings under different names/spellings. We're not affiliated with Carl Zeiss Smt Gmbh, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "C" | Carl Zeiss Smt Gmbh-related inventors


Optical imaging arrangement with actively adjustable metrology support units

An optical imaging arrangement includes an optical projection system, a support structure system and a control device. The optical projection system includes a group of optical elements supported by the support structure system and configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. ... Carl Zeiss Smt Gmbh

Optical system of a microlithographic projection exposure system or of a wafer inspection system

The disclosure relates to an optical system of a microlithographic projection exposure apparatus or of a wafer inspection apparatus having a first retardation manipulator, a second retardation manipulator, and a manipulator for displacing the second retardation manipulator independently of the first retardation manipulator in at least one direction that is transverse to the optical system axis of the optical system. The second retardation manipulator leaves the wavefront of light that passes through it during operation of the optical system unchanged. ... Carl Zeiss Smt Gmbh

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by a first, larger object field dimension and along a second, smaller object field dimension. ... Carl Zeiss Smt Gmbh

Illumination system for euv projection lithography

An illumination system for euv projection lithography has a beam shaping optical unit for generating an euv collective output beam from an euv raw beam of a synchrotron-radiation-based light source. An output coupling optical unit serves for generating a plurality of euv individual output beams from the euv collective output beam. ... Carl Zeiss Smt Gmbh

Reflective optical element

A reflective optical element, in particular for a duv or vuv operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system (26) includes a layer (l) of material having a lower refractive index n1 at the operating wavelength, a layer (h) of material having a higher refractive index n2 at the operating wavelength and a layer (m) of material having a refractive index n3 at the operating wavelength, where n1<n3<n2. ... Carl Zeiss Smt Gmbh

Reflective optical element and euv lithography appliance

A reflective optical element and an euv lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. ... Carl Zeiss Smt Gmbh

Method and device for characterizing a wafer patterned by at least one lithography step

A method includes determining at least one characteristic variable which is characteristic of a patterned wafer based on a plurality of measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least two different orders of diffraction. ... Carl Zeiss Smt Gmbh

Mirror, in particular for a microlithographic projection exposure apparatus

A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface, a mirror substrate (205, 305), a reflection layer (220, 320), which is configured to provide the mirror with a reflectivity of at least 50% for electromagnetic radiation with a predetermined operating wavelength incident on the optically effective surface (200a, 300a) at angles of incidence in relation to the respective surface normals of at least 65°, and a substrate protection layer (210, 310) which is arranged between the mirror substrate (205, 305) and the reflection layer (220, 320). The substrate protection layer has a transmission of less than 0.1% for euv radiation.. ... Carl Zeiss Smt Gmbh

Method of operating a microlithographic projection apparatus and illumination system of such an apparatus

An illumination system of a microlithographic projection apparatus includes a spatial light modulator having a modulation surface including a plurality of micromirrors. Each micromirror includes a mirror surface having an orientation that can be changed individually for each micromirror. ... Carl Zeiss Smt Gmbh

Optical system for field mapping and/or pupil mapping

An optical system for field imaging and/or pupil imaging has an optical axis, a stop plane and an image plane. The optical system includes a lens element system that has three lens element groups, each including at least one lens element. ... Carl Zeiss Smt Gmbh

Method and device for characterizing a wafer patterned using at least one lithography step

In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. ... Carl Zeiss Smt Gmbh

Method and device for beam analysis

A method and an apparatus for beam analysis in an optical system are disclosed, wherein a plurality of beam parameters of a beam propagating along an optical axis are ascertained. The method includes: splitting the beam into a plurality of partial beams which have a focus offset in the longitudinal direction in relation to the optical axis; recording a measurement image produced by these partial beams; carrying out a forward simulation of the beam in the optical system on the basis of estimated initial values for the beam parameters in order to obtain a simulated image; and calculating a set of values for the beam parameters on the basis of the comparison between the simulated image and the measurement image.. ... Carl Zeiss Smt Gmbh

Projection exposure apparatus and method for measuring an imaging aberration

. . A microlithographic projection exposure apparatus (10) includes a projection lens (26) that images an object field (22) arranged in a mask plane (24) onto a substrate (28) during exposure operation of the projection exposure apparatus, and an illumination system (16) that has: an exposure illumination beam path (44) for radiating illumination radiation (14) onto the object field on the illumination side with respect to the mask plane, a measurement illumination beam path (48) for irradiating a measurement structure (54) arranged in the mask plane with the illumination radiation, and a scattering structure (50) arranged on the illumination side with respect to the mask plane and outside the exposure illumination beam path. The measurement illumination beam path extends via the scattering structure and runs rectilinearly between the scattering structure and the mask plane.. ... Carl Zeiss Smt Gmbh

Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective

An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. ... Carl Zeiss Smt Gmbh

07/12/18 / #20180196253

Optical imaging arrangement with a piezoelectric device

An optical imaging arrangement includes an optical element and a piezoelectric device. The optical element includes an optical element body carrying an optical surface on a front side of the optical element body. ... Carl Zeiss Smt Gmbh

07/05/18 / #20180191233

Electromagnetic drive comprising a stator and a stator holder

An electromagnetic drive includes a stator, having a stator holder and an actuating element which is movable by electromagnetic interaction with the stator. The stator holder has at least two electrically conductive paths running separately from and adjacent to one another. ... Carl Zeiss Smt Gmbh

07/05/18 / #20180188656

Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.. ... Carl Zeiss Smt Gmbh

07/05/18 / #20180188470

Optical element unit

An optical element unit is provided comprising an optical element group for projecting light along an optical axis of the optical element group and a housing having an inner housing part partly defining a first space and a light passageway between the inner housing part and a second space. The inner housing part receives the optical element group. ... Carl Zeiss Smt Gmbh

06/28/18 / #20180181007

Optical imaging device with thermal attenuation

An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. ... Carl Zeiss Smt Gmbh

06/28/18 / #20180181005

Arrangement for actuating an element in a microlithographic projection exposure apparatus

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nr) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (na) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (na) is greater than the first number (nr). ... Carl Zeiss Smt Gmbh

06/21/18 / #20180173100

Projection exposure apparatus with at least one manipulator

A projection exposure apparatus for microlithography includes a projection lens which includes a plurality of optical elements for imaging mask structures onto a substrate during an exposure process. The projection exposure apparatus also includes at least one manipulator configured to change, as part of a manipulator actuation, the optical effects of at least one of the optical elements within the projection lens by changing a state variable of the optical element along a predetermined travel. ... Carl Zeiss Smt Gmbh

06/21/18 / #20180173001

Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit

An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164693

Illumination system for euv projection exposure apparatus, euv projection exposure apparatus including illumination system and method for operating an euv projection exposure apparatus

An illumination system for an euv projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received euv radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164691

Projection exposure methods and systems

Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length p in a second direction perpendicular to the first direction. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164690

Imaging optical unit for euv projection lithography

An imaging optical unit for euv projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164581

Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement

Mirror elements (2a, 2b) include a substrate (4a, 4b) and a multilayer arrangement (5a, 5b). The multilayer arrangement includes a reflective layer system (6a, 6b) having a radiation entrance surface (7a, 7b) and a piezoelectric layer (8a, 8b) arranged between the radiation entrance surface and the substrate. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164474

Projection objective for microlithography

A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. ... Carl Zeiss Smt Gmbh

06/14/18 / #20180164207

Method and apparatus for examining an element of a photolithographic mask for the euv range

The present application relates to a method for examining at least one element of a photolithographic mask for an extreme ultraviolet (euv) wavelength range, wherein the method includes the steps of: (a) examining the at least one element with light in the euv wavelength range; and (b) determining the behavior of the at least one element in the euv wavelength range.. . ... Carl Zeiss Smt Gmbh

05/31/18 / #20180151327

Beam blanker and method for blanking a charged particle beam

The present invention relates to a beam blanker for a scanning particle microscope for blanking a charged particle beam having a beam axis, along which charged particles propagate before entering the beam blanker, wherein the beam blanker comprises: (a) at least one stop having an aperture, through which the charged particle beam can pass; (b) at least one first and one second deflection element, which are each configured to deflect the particle beam from the beam axis in a first and a second direction, respectively, upon a voltage being present; and (c) a deflection controller configured to apply a first ac voltage having a first frequency to the first deflection element and a second ac voltage having a second frequency to the second deflection element, wherein the deflection controller sets a difference frequency between the first and second ac voltages such that pulses of the charged particle beam have a predefined pulse period and during the pulse period outside the pulse duration substantially no charged particles pass through the aperture of the stop.. . ... Carl Zeiss Smt Gmbh

05/17/18 / #20180136565

Projection exposure method and projection exposure apparatus for microlithography

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern includes providing the pattern between an illumination system and a projection lens of a projection exposure apparatus so that the pattern is arranged in the region of an object plane of the projection lens and can be imaged via the projection lens into an image plane of the projection lens. The image plane is optically conjugate with respect to the object plane, and imaging-relevant properties of the pattern can be characterized by pattern data. ... Carl Zeiss Smt Gmbh

05/10/18 / #20180129138

Optical apparatus with adjustable action of force on an optical module

The disclosure pertains to an optical apparatus, in particular for microlithography, that includes an optical module, a support structure and a connection apparatus. The connection apparatus includes at least one connection unit which includes a first connector part and a second connector part. ... Carl Zeiss Smt Gmbh

05/10/18 / #20180129137

Lighting system of a microlithographic projection exposure system and method for operating such a lighting system

An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using mems technology.. ... Carl Zeiss Smt Gmbh

05/10/18 / #20180129131

Method and device for generating a reference image in the characterization of a mask for microlithography

The invention relates to a method and a device for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous simulation and using a kirchhoff simulation, wherein the method comprises the following steps: assigning each structure of said plurality of structures either to a first category or to a second category, calculating a plurality of first partial spectra for structures of the first category with implementation of rigorous simulations, calculating a second partial spectrum for structures of the second category with implementation of a kirchhoff simulation, generating a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum, and generating the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system.. . ... Carl Zeiss Smt Gmbh

05/03/18 / #20180120710

Optical device having a deformable optical element

The disclosure relates to an optical device, in particular for microlithography. The optical device includes an optical module and a support structure that supports the optical module. ... Carl Zeiss Smt Gmbh

04/19/18 / #20180107122

Lithography apparatus and method for operating a lithography apparatus

A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. ... Carl Zeiss Smt Gmbh

04/19/18 / #20180106831

Method and apparatus for analyzing and for removing a defect of an euv photomask

The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) combining the first, the second and the third data.. . ... Carl Zeiss Smt Gmbh

04/19/18 / #20180106591

Interferometric measuring arrangement

A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). ... Carl Zeiss Smt Gmbh

04/12/18 / #20180102620

Beam reverser module and optical power amplifier having such a beam reverser module

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.. . ... Carl Zeiss Smt Gmbh

04/12/18 / #20180101105

Optical system

The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided. ... Carl Zeiss Smt Gmbh

04/12/18 / #20180101002

Mirror element, in particular for a microlithographic projection exposure apparatus

A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (111, 112, 113, 114, 115, 211, 212, 213, 311a-311m, 411, 412, 413) and a layer stack (121, 122, 123, 124, 125, 221, 222, 223, 321a-321m, 421, 422, 423) on the substrate. ... Carl Zeiss Smt Gmbh

04/05/18 / #20180095259

Catadioptric projection objective comprising deflection mirrors and projection exposure method

. . A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). ... Carl Zeiss Smt Gmbh

04/05/18 / #20180095258

Catadioptric projection objective

A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.. . ... Carl Zeiss Smt Gmbh

04/05/18 / #20180095108

Probe system and method for receiving a probe of a scanning probe microscope

The invention relates to a probe system for a scanning probe microscope which (a) has a receptacle apparatus for a probe, (b) has a probe storage, which provides at least one probe for the scanning probe microscope, (c) wherein the probe, the probe storage, and the receptacle apparatus are embodied in such a way that the probe can form a releasable first connection with the probe storage and a releasable second connection with the receptacle apparatus, wherein the first connection and/or the second connection use a magnetic force; and wherein the receptacle apparatus and the probe storage are movable relative to one another in such a way for receiving the probe that the probe forms the second connection before the first connection is released.. . ... Carl Zeiss Smt Gmbh

03/29/18 / #20180088303

Imaging optical unit and projection exposure apparatus including same

. . An imaging optical unit for projection lithography has a plurality of mirrors for imaging an object field into an image field with imaging light guided along a path from the object field to the image field. The penultimate mirror in the path has no passage opening to pass the imaging light. ... Carl Zeiss Smt Gmbh

03/29/18 / #20180087891

Measuring method and measuring arrangement for an imaging optical system

A measurement arrangement and a method for measuring a wavefront aberration of an imaging optical system (10) of a microlithographic projection exposure apparatus. The method includes separate measurement of respective wavefront aberrations of different partial arrangements (m1; m2; m3; m1, m3) of the optical elements.. ... Carl Zeiss Smt Gmbh

03/22/18 / #20180081281

Projection lens with wave front manipulator and related method and apparatus

A projection lens images a pattern of a mask arranged in the region of an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation with a work wavelength λ<260 nm. The projection lens has a multiplicity of optical elements with optical surfaces. ... Carl Zeiss Smt Gmbh

03/15/18 / #20180074410

Illumination optic for euv projection lithography

An illumination optical unit for euv projection lithography illuminates an object field with illumination light. The illumination optical unit has a first facet mirror including a plurality of first facets on a first mirror carrier. ... Carl Zeiss Smt Gmbh

03/15/18 / #20180074303

Imaging optical unit and projection exposure unit including same

An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by two object field coordinates, with a normal coordinate being perpendicular thereto. ... Carl Zeiss Smt Gmbh

03/15/18 / #20180074278

Method for producing a lens for a lithography apparatus, and measurement system

A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.. ... Carl Zeiss Smt Gmbh

03/15/18 / #20180074236

Faceted mirror for euv projection lithography and illumination optical unit with same

A facet mirror for euv projection lithography has a plurality of facets for reflecting euv illumination light. At least some of the facets are in the form of alignment facets and have a reflection surface, the edge contour of which is aligned along two alignment coordinates of an overall facet arrangement. ... Carl Zeiss Smt Gmbh

03/08/18 / #20180068842

Method for examining a gas by mass spectrometry and mass spectrometer

A method for examining a gas by mass spectrometry includes: ionizing the gas for producing ions; and storing, exciting and detecting at least some of the produced ions in an ft ion trap. Producing and storing the ions in the ft ion trap and/or exciting the ions prior to the detection of the ions in the ft ion trap includes at least one selective ift excitation, such as a swift excitation, which is dependent on the mass-to-charge ratio of the ions. ... Carl Zeiss Smt Gmbh

03/08/18 / #20180067400

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

Sensor arrangements, methods for ascertaining a respective position of a number of mirrors of a lithography apparatus, projection systems of a lithography apparatus, and lithography apparatus are disclosed. The sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.. ... Carl Zeiss Smt Gmbh

03/08/18 / #20180067399

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.. . ... Carl Zeiss Smt Gmbh

03/01/18 / #20180059551

Illumination system of a microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes first and second optical raster plates. An irradiance distribution of projection light on the first and second optical raster plates determines an angular light distribution of the projection light exclusively at a first portion and a second portion, respectively, of an illuminated field. ... Carl Zeiss Smt Gmbh

03/01/18 / #20180059548

Projection exposure method, system and objective

A microlithographic exposure system includes a catadioptric projection objective that includes a plurality of lenses and at least one concave mirror arranged as first, second, and third objective parts. The system also includes a plurality of manipulators each coupled to a respective optical element, each manipulator coupled to a lens being configured to adjust the respective lens, and a manipulator coupled to the at least one concave mirror being configured to vary a shape of the concave mirror. ... Carl Zeiss Smt Gmbh

03/01/18 / #20180059413

Wavefront correction element for use in an optical system

A wavefront correction element for an optical system, in particular an optical system of a microlithographic projection exposure apparatus or a mask inspection apparatus, has a carrier film (110, 210, 410) which at least partly transmits electromagnetic radiation that has an operating wavelength of the optical system and that impinges on the carrier film during operation of the optical system. The carrier film (110, 210, 410) is configured such that the real part of the complex refractive index of the carrier film varies over a used region of the surface of the carrier film (110, 210, 410).. ... Carl Zeiss Smt Gmbh

02/08/18 / #20180039184

Projection exposure system for microlithography and method of monitoring a lateral imaging stability

A projection exposure system (10) for microlithography includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) disposed in the optical path of the test waves (30) after they have passed through the projection optics (12) and configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.. . ... Carl Zeiss Smt Gmbh

02/08/18 / #20180039001

Mirror, more particularly for a microlithographic projection exposure apparatus

A mirror, in particular for a microlithographic projection exposure apparatus, has a mirror substrate (101), a reflection layer system (102) configured to reflect electromagnetic radiation that is incident on the optically effective surface (100a), and a capping layer (104), which is arranged on the side of the reflection layer system (102) facing the optically effective surface. The capping layer is produced from a first material. ... Carl Zeiss Smt Gmbh

02/01/18 / #20180035525

Source hollow body and euv plasma light source comprising such a source hollow body

A source hollow body serves for predefining a plasma chamber for a section of a source plasma of an euv plasma light source. The hollow body has at least one chamber wall that delimits the plasma chamber. ... Carl Zeiss Smt Gmbh

02/01/18 / #20180031827

Lens module comprising at least one exchangeable optical element

An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. ... Carl Zeiss Smt Gmbh

02/01/18 / #20180031815

Catadioptric projection objective with parallel, offset optical axes

A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. ... Carl Zeiss Smt Gmbh

01/25/18 / #20180024445

Projection exposure system for microlithography with a measurement device

A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding to device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). ... Carl Zeiss Smt Gmbh

01/25/18 / #20180024440

Method for adjusting a projection objective

A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.. ... Carl Zeiss Smt Gmbh

01/25/18 / #20180024439

Method for operating an illumination system of a microlithographic projection exposure apparatus

A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. ... Carl Zeiss Smt Gmbh

01/25/18 / #20180024438

Support elements for an optical element

Support elements for an optical element and a method for supporting an optical element are disclosed. The disclosure can be used in connection with arbitrary optical apparatuses or optical imaging methods. ... Carl Zeiss Smt Gmbh

01/04/18 / #20180003951

Multi-mirror array

A multi-mirror array including displaceable mirror elements includes a passive electric damping mechanism for damping disturbances of the displacement positions of the mirror elements.. . ... Carl Zeiss Smt Gmbh

12/28/17 / #20170371251

Projection exposure tool for microlithography and method for microlithographic imaging

A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.. . ... Carl Zeiss Smt Gmbh

12/21/17 / #20170365371

Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

A multilayer mirror (m) reflecting extreme ultraviolet (euv) radiation from a first wavelength range in an euv spectral region includes a substrate (sub) and a stack of layers (sl). The stack of layers has layers having a low index material and layers having a high index material. ... Carl Zeiss Smt Gmbh

12/21/17 / #20170363963

Catadioptric projection objective with intermediate images

A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. ... Carl Zeiss Smt Gmbh

12/21/17 / #20170363861

Device for swiveling a mirror element with two degrees of swiveling freedom

A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. ... Carl Zeiss Smt Gmbh

12/14/17 / #20170357164

Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same

The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.. . ... Carl Zeiss Smt Gmbh

12/07/17 / #20170351183

Illumination system for illuminating a mask in a microlithographic exposure apparatus

An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. ... Carl Zeiss Smt Gmbh

12/07/17 / #20170351047

Positioning unit and apparatus for adjustment of an optical element

The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.. . ... Carl Zeiss Smt Gmbh

11/30/17 / #20170343449

Test device and method for testing a mirror

A test appliance and a method for testing a mirror, e.g., a mirror of a microlithographic projection exposure apparatus. The test appliance has a computer-generated hologram (cgh), and a test can be carried out on at least a portion of the mirror by way of an interferometric superposition of a test wave that is directed onto the mirror by this computer-generated hologram and a reference wave. ... Carl Zeiss Smt Gmbh

11/23/17 / #20170336719

Illumination optics for euv projection lithography

An illumination optical unit for euv projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.. ... Carl Zeiss Smt Gmbh

11/23/17 / #20170336714

Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator

A projection exposure apparatus includes a projection lens, a wavefront manipulator and a wavefront measuring device for measuring a wavefront in the projection lens. The wavefront measuring device includes a moiré grating arrangement having an object grating and an image grating which are designed to be arranged in an object plane and an image plane, respectively, of the projection lens. ... Carl Zeiss Smt Gmbh

11/16/17 / #20170329238

Arrangement for manipulating the position of an element

The disclosure relates to arrangements for manipulating the position of an element. An arrangement according has at least one actuator for each degree of freedom of the positional manipulation for exerting adjustable forces on the element, at least one position sensor for each degree of freedom of the positional manipulation for generating in each case a sensor signal that is characteristic of the position of the element, and at least one position controller, which in a position control circuit controls a force exerted on the element by the at least one actuator for the positioning of the element in dependence on the at least one sensor signal. ... Carl Zeiss Smt Gmbh

11/16/17 / #20170329233

Polarization-modulating optical element

A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. ... Carl Zeiss Smt Gmbh

11/16/17 / #20170329055

Optical imaging with reduced immersion liquid evaporation effects

The present disclosure relates to an optical arrangement for use in an optical imaging process. The optical arrangement includes an optical element, an immersion zone and a liquid repelling device. ... Carl Zeiss Smt Gmbh

11/09/17 / #20170322343

Microlithographic projection exposure apparatus

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.. ... Carl Zeiss Smt Gmbh

10/26/17 / #20170307982

Imaging optical unit for euv projection lithography

An imaging optical unit for euv projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. ... Carl Zeiss Smt Gmbh

10/12/17 / #20170293154

Optical component

An optical component for coupling out an individual output beam from a collective output beam includes a plurality of radiation-reflecting regions which are grouped in such a way that regions of the same group serve for guiding different partial beams of the individual output beam to the same scanner.. . ... Carl Zeiss Smt Gmbh

10/12/17 / #20170292923

Device and method for analysing a defect of a photolithographic mask or of a wafer

The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.. . ... Carl Zeiss Smt Gmbh

10/12/17 / #20170292830

Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and euv-lithography system

The invention relates to a method for determining the thickness of a contaminating layer and/or the type of a contaminating material on a surface (7) in an optical system, in particular on a surface (7) in an euv lithography system, comprising: irradiating the surface (7) on which plasmonic nanoparticles (8a,b) are formed with measurement radiation (10), detecting the measurement radiation (10a) scattered at the plasmonic nanoparticles (8a,b), and determining the thickness of the contaminating layer and/or the type of the contaminating material on the basis of the detected measurement radiation (10a). The invention also relates to an optical element (1) for reflecting euv radiation (4), and to an euv lithography system.. ... Carl Zeiss Smt Gmbh

10/05/17 / #20170285493

Projection exposure method and projection exposure apparatus

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens. . ... Carl Zeiss Smt Gmbh

10/05/17 / #20170285311

Zoom system with interchangeable optical elements

A method for adjusting the magnification scale of an optical imaging device for exposing or inspecting substrates is provided. The optical imaging device includes a first optical element group, which includes a plurality of first optical elements in an imaging beam path. ... Carl Zeiss Smt Gmbh

10/05/17 / #20170284893

Optical device

A device including an imaging optical unit (9) imaging an object field (5) in an image field (10), a structured mask (7), arranged in the region of the object field (5) via reticle holder (8) displaceable in a reticle scanning direction (21), and a sensor apparatus (25), arranged in the region of the image field (10) via a substrate holder (13) displaceable in a substrate scanning direction (22). The mask (7) has at least one measurement structure (27; 33) to be imaged on the sensor apparatus (25), wherein the sensor apparatus (25) includes at least one sensor row (28) with a multiplicity of sensor elements (29), and affords the possibility of testing the imaging optical unit (9) during the displacement of the substrate holder (13) for exposing a substrate (12) arranged on the substrate holder.. ... Carl Zeiss Smt Gmbh

09/28/17 / #20170278690

Ionization device with mass spectrometer therewith

An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a field generating device for generating a glow discharge in a secondary plasma region; an inlet for supplying a gas to be ionized into the secondary plasma region; and a further inlet for supplying the metastable particles and/or the ions of the ionization gas into the secondary plasma region. A mass spectrometer includes such an ionization device and a detector downstream of the outlet of the ionization device for the mass-spectrometric analysis of the ionized gas.. ... Carl Zeiss Smt Gmbh

09/28/17 / #20170276842

Mirror device

A mirror device includes at least one electrically conductive shielding element, which forms a mechanism for producing an electric field in a region adjacent to at least one side surface and/or a rear side of a mirror body.. . ... Carl Zeiss Smt Gmbh

09/21/17 / #20170269347

Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method therefor

The present invention relates to a method for calibrating a measuring microscope which may be used to measure masks, in which a calibration mask is utilized in a self-calibration algorithm in order to ascertain error correction data of the measuring microscope, wherein, in the self-calibration algorithm, the calibration mask is imaged and measured in various positions in the measuring microscope in order to ascertain one or more portions of the error correction data, wherein the surface profile of the calibration mask is ascertained and utilized when determining the error correction. Moreover, the invention relates to a measuring microscope and a method for operating same.. ... Carl Zeiss Smt Gmbh

09/14/17 / #20170263843

Piezoelectric positioning device and positioning method by means of such a piezoelectric positioning device

A piezoelectric positioning device (1) has at least one piezoelectric actuator (3) having a first connection contact (4) and a second connection contact (5). A control device (6) with digital/analog converters (12, 16) connected to the connection contacts (4, 5) is used to control the at least one piezoelectric actuator (3). ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261867

Optical assembly having a thermally conductive component

An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 w m−1 k−1. ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261861

Illumination system of a microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261860

Optical element, optical assembly and production method

An optical element for transmitting radiation includes: a first surface region surrounding an optically used area of the optical element; and a second surface region that adjoins the first surface region. A circumferential edge is formed between the first and second surface regions. ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261859

Arrangement for actuating at least one optical element in an optical system

The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.. . ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261680

Optical waveguide for guiding illumination light

An optical waveguide serves for guiding illumination light. The waveguide has a waveguide main body for guiding the illumination light between a main body entrance region and a main body exit region. ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261532

Method and apparatus for avoiding damage when analysing a sample surface with a scanning probe microscope

The present application relates to a method for avoiding damage when analyzing a sample surface with a scanning probe microscope, the method comprising the step of: detecting an electrostatic interaction between a charging of the sample surface and a measuring tip of the scanning probe microscope in the course of the approach of the measuring tip to the sample surface already at a distance from the sample surface which is greater than the distance of the measuring tip when analyzing the sample surface.. . ... Carl Zeiss Smt Gmbh

09/14/17 / #20170261304

Position measuring device and method for determining positions of a measurement object

In a position measuring device (5) and a method for ascertaining positions of an object (3) to be measured, at least one capacitive position measuring sensor (7) provides a position measurement signal (pm) relating to the object (3) to be measured and at least one capacitive reference measurement sensor (14) provides a reference measurement signal (rm). The measuring sensors (7, 14) are connected to a computing unit (8) which is embodied to calculate a position signal (p) to ascertain the positions from the position measurement signal (pm) and the reference measurement signal (rm). ... Carl Zeiss Smt Gmbh

09/07/17 / #20170255110

Lithography apparatus comprising a plurality of individually controllable write heads

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.. ... Carl Zeiss Smt Gmbh

09/07/17 / #20170254995

Mirror, in particular collector mirror for microlithography

A collector mirror for an euv microlithography system. The collector mirror includes an optical grating having an optically effective mirror surface, which reflects electromagnetic used rays in an euv spectral range emanating from a first focal point and focuses them onto a second focal point. ... Carl Zeiss Smt Gmbh

08/31/17 / #20170248851

Illumination optical unit for euv projection lithography

An illumination optical unit for euv projection lithography serves to illuminate an object field with illumination light. A transmission optical unit images field facets in a manner superposed on one another into the object field via illumination channels, which each have assigned to them one of the field facets and one pupil facet of a pupil facet mirror. ... Carl Zeiss Smt Gmbh

08/31/17 / #20170248850

Projection objective for microlithography

A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.. ... Carl Zeiss Smt Gmbh

08/31/17 / #20170248842

Method and device for permanently repairing defects of absent material of a photolithographic mask

The present application relates to a method for permanently repairing defects of absent material of a photolithographic mask, comprising the following steps: (a) providing at least one carbon-containing precursor gas and at least one oxidizing agent at a location to be repaired of the photolithographic mask; (b) initiating a reaction of the at least one carbon-containing precursor gas with the aid of at least one energy source at the location of absent material in order to deposit material at the location of absent material, wherein the deposited material comprises at least one reaction product of the reacted at least one carbon-containing precursor gas; and (c) controlling a gas volumetric flow rate of the at least one oxidizing agent in order to minimize a carbon proportion of the deposited material.. . ... Carl Zeiss Smt Gmbh

08/10/17 / #20170228477

Method and device for the simulation of a photolithographic process for generating a wafer structure

A method for the simulation of a photolithographic process for generating a wafer structure includes providing an aerial image of a region of a mask that includes the mask structure, prescribing a range of intensities, determining auxiliary or potential wafer structures for different threshold values within the range of intensities, determining the number of structure elements for each of the auxiliary or potential wafer structures, determining a stability range consisting of successive threshold values from the threshold values that were used for the determination of auxiliary or potential wafer structures, within the stability range the number of structure elements of the auxiliary or potential wafer structures remaining constant or lying within a prescribed range, and determining the wafer structure on the basis of the aerial image and a threshold value within the stability range. A microscope for carrying out the method is also provided.. ... Carl Zeiss Smt Gmbh

08/10/17 / #20170227853

Projection objective for a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in n>−2 successive sections a1 to an of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. ... Carl Zeiss Smt Gmbh

08/03/17 / #20170219932

Projection exposure apparatus with at least one manipulator

A microlithography projection exposure apparatus includes a projection lens at least one manipulator to change an optical effect of at least one optical element of the projection lens, and a travel establishing device for generating a travel command for the at least one manipulator.. . ... Carl Zeiss Smt Gmbh

08/03/17 / #20170219929

Optical projection system

An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. ... Carl Zeiss Smt Gmbh

08/03/17 / #20170219920

Mask for euv lithography, euv lithography apparatus and method for determining a contrast proportion caused by duv radiation

A mask (m) for euv lithography includes: a substrate (7), a first surface region (a1) formed by a surface (8a) of a multilayer coating (8) embodied to reflect euv radiation (27), said surface (8a) facing away from the substrate (7), and a second surface region (a2) formed by a surface (18a) of a further coating (18) embodied to reflect duv radiation (28) and to suppress the reflection of euv radiation (27), said surface (18a) facing away from the substrate (7). The further coating is a multilayer coating (18). ... Carl Zeiss Smt Gmbh

07/27/17 / #20170212428

Vacuum linear feed-through and vacuum system having said vacuum linear feed-through

A vacuum linear feed-through (20), e.g., for an euv lithography system, includes: a vacuum diaphragm bellows (21), which has a first end (21a) attaching a component and a second end (21b), opposite the first end, attaching to a vacuum housing, and an actuator device (27) generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (30, 30′), connected to the bellows at the first end, and at least one second shield (31, 31′), connected to the bellows at the second end. ... Carl Zeiss Smt Gmbh

07/27/17 / #20170212426

Method for predicting at least one illumination parameter for evaluating an illumination setting

In a method for predicting at least one illumination parameter for evaluating an illumination setting for illuminating an object field of a projection exposure apparatus, illumination parameters are measured at a number of calibration settings, correction terms for prediction values of the illumination parameters are determined from the measured values, and then at least one illumination parameter of at least one illumination setting, which is not contained in the set of n calibration settings, is predicted.. . ... Carl Zeiss Smt Gmbh

07/13/17 / #20170199465

Lens comprising a plurality of optical element disposed in a housing

The invention relates to a lens comprising several optical elements that are disposed in a lens housing. At least one sensor array encompassing at least one capacitive sensor unit and/or at least one inductive sensor unit is provided for determining the relative position between a first optical element and a second optical element or between a load-bearing structural element of the lens and a second optical element.. ... Carl Zeiss Smt Gmbh

07/06/17 / #20170192362

Microlithography projection objective

Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.. . ... Carl Zeiss Smt Gmbh

07/06/17 / #20170192361

Illumination system for microlithography

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. ... Carl Zeiss Smt Gmbh

07/06/17 / #20170192360

Optical arrangement of a microlithographic projection exposure apparatus

An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. ... Carl Zeiss Smt Gmbh

06/29/17 / #20170184982

Connection arrangement for a force-fit connection between ceramic components

A connection arrangement is provided for a force-fit connecting ceramic components for a lithography apparatus. The connection arrangement includes first and a second ceramic components and a clamping device. ... Carl Zeiss Smt Gmbh

06/22/17 / #20170176868

Lithographic apparatus and method

A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an euv radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.. . ... Carl Zeiss Smt Gmbh

06/22/17 / #20170176865

Facet mirror for an illumination optical unit for projection lithography

A facet mirror for an illumination optical unit for projection lithography has a plurality of used facets, which in each case reflect an illumination light partial beam. The facet mirror has at least one change subunit having a plurality of change facets arranged jointly on a facet carrier, which change facets can be positioned alternatively at the used location of exactly one used facet. ... Carl Zeiss Smt Gmbh

06/22/17 / #20170176851

Method for producing a mask for the extreme ultraviolet wavelength range, mask and device

A method for producing a mask for the extreme ultraviolet wavelength range proceeding from a mask blank having defects is provided. The method includes classifying the defects into at least one first group and one second group; optimizing the arrangement of an absorber pattern on the mask blank in order to compensate for a maximum number of the defects of the first group by means of the arranged absorber pattern; and applying the optimized absorber pattern to the mask blank.. ... Carl Zeiss Smt Gmbh

06/22/17 / #20170176741

Mirror element, in particular for a microlithographic projection exposure apparatus

A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (111, 112, 113, 114, 115, 211, 212, 213, 311a-311m, 411, 412, 413) and a layer stack (121, 122, 123, 124, 125, 221, 222, 223, 321a-321m, 421, 422, 423) on the substrate. ... Carl Zeiss Smt Gmbh

06/15/17 / #20170168402

Vacuum system, in particular euv lithography system, and optical element

A vacuum system, in particular an euv lithography system, includes: a vacuum housing, in which a vacuum environment is formed, and also at least one component (14), e.g., an optical element, having a surface (14a) which is subjected to contaminating particles in the vacuum environment. A surface structure (18) is formed at the surface in order to reduce adhesion of the contaminating particles, said surface structure having pore-shaped depressions (24) separated from one another by webs (25). ... Carl Zeiss Smt Gmbh

06/15/17 / #20170168399

Projection lens, projection exposure apparatus and projection exposure method for euv microlithography

A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160644

Illumination optical assembly for projection lithography

An illumination optical assembly for projection lithography serves for illuminating an object field, in which an object to be imaged is arrangeable. The object field has a scan length along an object displacement direction. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160643

Illumination optical assembly for a projection exposure apparatus

An illumination optical assembly for a projection exposure apparatus includes a first facet element having a multiplicity of first facets, which are formed in each case by a multiplicity of displaceable individual mirrors, and a second facet element having a multiplicity of second facets. The displacement positions of the individual mirrors of the first facets are chosen in each case in so that, in the case of a predefined intensity distribution of an illumination radiation in an intermediate focus, the illumination radiation in the region of the facets of the second facet element has an intensity distribution with a maximum which is at most equal to a predefined maximum intensity or which is greater than a mean value of the intensity distribution by at most a predefined factor or absolute value.. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160642

Illumination optical unit for euv projection lithography

An illumination optical unit for euv projection lithography illuminates an object field, in which an object to be imaged is arrangeable. A first facet mirror of the illumination optical generates secondary light sources as images of an upstream light source. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160641

Iillumination optical unit for projection lithography

An illumination optical unit for projection lithography illuminates an illumination field, in which an object field of a downstream imaging optical unit and an object to be illuminated are arrangeable, with illumination light of an euv light source. The illumination optical unit includes two facet mirrors for reflecting, overlaid guidance of partial beams of a beam of the euv illumination light via exactly one facet of one of the two facet mirrors in each case. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160640

Illumination optical assembly for projection lithography

An illumination optical assembly for projection lithography serves for illuminating an illumination field, in which an object field of a downstream imaging optical assembly is arrangeable, with illumination light of an euv light source. The illumination optical assembly has a pupil illumination unit, on which the illumination light impinges and which includes facets for illuminating a pupil in the illumination beam path with the illumination light with a predefined pupil intensity distribution. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160639

Reflective optical element

A reflective optical element, in particular for a microlithographic projection exposure apparatus has a substrate (101), a reflection layer system (110) and a defect structure (120) of channel-shaped defects (121) which extend inward from the optical effective surface (100a), or from an interface oriented toward the substrate as far as the reflection layer system, and permit egress of hydrogen from the reflection layer system. The channel-shaped defects (121) increase a diffusion coefficient that is characteristic for the egress of the hydrogen from the reflection layer system (110) by at least 20%, in comparison to a similar layer construction without these channel-shaped defects.. ... Carl Zeiss Smt Gmbh

06/08/17 / #20170160447

Substrate for an euv-lithography mirror

Substrates suitable for mirrors used at wavelengths in the euv wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. ... Carl Zeiss Smt Gmbh

06/01/17 / #20170153555

Apparatus and method for bearing a lithography mask

An apparatus for bearing a lithography mask with a reticle stage includes a resting support holder for the lithography mask. The resting support holder has bearing points which bear the lithography mask. ... Carl Zeiss Smt Gmbh

06/01/17 / #20170153553

Arrangement for actuating an element in a microlithographic projection exposure apparatus

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nr) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (na) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (na) is greater than the first number (nr). ... Carl Zeiss Smt Gmbh

06/01/17 / #20170153552

Mirror module, in particular for a microlithographic projection exposure appararatus

The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. ... Carl Zeiss Smt Gmbh

05/11/17 / #20170132782

Method for three-dimensionally measuring a 3d aerial image of a lithography mask

In a method for three-dimensionally measuring a 3d aerial image in the region around an image plane during the imaging of a lithography mask, which is arranged in an object plane, a selectable imaging scale ratio in mutually perpendicular directions (x, y) is taken into account. For this purpose, an electromagnetic wavefront of imaging light is reconstructed after interaction thereof with the lithography mask. ... Carl Zeiss Smt Gmbh

05/11/17 / #20170131528

Imaging optical unit for a metrology system for examining a lithography mask

An imaging optical unit serves within a metrology system for examining a lithography mask. The lithography mask can be arranged in an object field of the imaging optical unit. ... Carl Zeiss Smt Gmbh

05/11/17 / #20170131518

Tilting an optical element

An optical unit, in particular a facet mirror unit, includes an optical element and a supporting device. The optical element has an optical surface, in particular an elongate optical surface, which defines a plane of main extension and a direction of main extension in the plane of main extension. ... Carl Zeiss Smt Gmbh

05/04/17 / #20170123118

Optical element having a coating for influencing heating radiation and optical arrangement

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λeuv) in the euv wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.. ... Carl Zeiss Smt Gmbh

05/04/17 / #20170122803

System and method for analyzing a light beam guided by a beam guiding optical unit

A system and a method for analyzing a light beam guided by a beam guiding optical unit. The system has a graduated neutral density filter arrangement (120, 520), which is arranged in a far field plane of the beam guiding optical unit and has at least one graduated neutral density filter (121, 521, 522, 523) having a spatially varying transmission, and a light intensity sensor arrangement having at least one light intensity sensor (140, 540), which is arranged in a near field plane of the beam guiding optical unit and is configured to measure (141, 541, 542, 543), for each graduated neutral density filter (121, 521, 522, 523) of the graduated neutral density filter arrangement (120, 520), a light intensity transmitted by each graduated neutral density filter.. ... Carl Zeiss Smt Gmbh

04/27/17 / #20170115576

Projection exposure apparatus including at least one mirror

A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.. ... Carl Zeiss Smt Gmbh

04/20/17 / #20170108788

Mirror arrangement for microlithographic projection exposure apparatus and related method

A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. ... Carl Zeiss Smt Gmbh

04/20/17 / #20170108780

Optical manipulator, projection lens and projection exposure apparatus

An optical manipulator (man) includes an optical element (oe), in particular composed of fused silica, and an actuating device (dr) that reversibly changes the surface form (sf) of the optical element (oe). The actuating device (dr) has a plurality of actuators (ak) that mechanically act on the optical element (oe) at a plurality of contact areas. ... Carl Zeiss Smt Gmbh

04/13/17 / #20170102622

Polarization-modulating optical element

A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. ... Carl Zeiss Smt Gmbh

04/13/17 / #20170102551

Illumination optical unit for projection lithography and hollow waveguide component therefor

An illumination optical unit for projection lithography guides illumination light toward an object field and has a mirror array including a multiplicity of individual mirrors which are tiltable independently. A condenser optical unit transfers an arrangement plane of the mirror array into a pupil plane of the illumination optical unit. ... Carl Zeiss Smt Gmbh

04/13/17 / #20170102539

Optical assembly, projection system, metrology system and euv lithography apparatus

An optical assembly (1) includes an optical element (2), a mount (3) configured to hold the optical element (2), and a plurality of fastening elements (12) with fastening areas (14) configured to fasten the optical element (2) to the mount (3). The fastening elements (12) bridge an interstice (11) between the optical element (2) and the mount (3), and a purge device (15) produces at least one purge gas flow (16) in the region of the optical element (2) such that the purge gas flow flows around the fastening areas (14) of the fastening elements (12).. ... Carl Zeiss Smt Gmbh

04/13/17 / #20170102407

Scanning probe microscope and method for examining a surface with a high aspect ratio

The invention relates to a scanning probe microscope, having: (a) a scanning device for scanning a measurement tip over a surface; (b) a cantilever for the measurement tip, wherein the cantilever has a torsion region; (c) wherein the torsion region is configured such that it undergoes torsion when a control signal is applied and thereby pivots the measurement tip; and (d) a control device for outputting the control signal when the measurement tip scans a region of the surface that can be examined more closely with a pivoted measurement tip than with-out pivoting the measurement tip.. . ... Carl Zeiss Smt Gmbh

03/30/17 / #20170091921

Method for determining a position of a structure element on a mask and microscope for carrying out the method

A method and a microscope for determining a position of a structure element on a mask are provide. The method comprises predefining a region on the mask which comprises at least the structure element; determining a phase image of the region, wherein the phase image comprises in a spatially resolved manner the phase of the imaging of the mask by the illumination radiation; and determining the position of the structure element within the phase image.. ... Carl Zeiss Smt Gmbh

03/23/17 / #20170084474

Method for introducing a substrate into a measuring apparatus and device for carrying out the method

A method for introducing a substrate into a measuring apparatus, in particular a lithography mask into a coordinate measuring machine, includes the following steps: a) providing a first substrate in a start station; b) transporting the first substrate to a parking station; c) transporting a second substrate from the measuring apparatus to the start station; and d) transporting the first substrate from the parking station into the measuring apparatus. Measurements are carried out on the second substrate during the process of introducing the first substrate. ... Carl Zeiss Smt Gmbh

03/23/17 / #20170082931

Projection exposure tool for microlithography and method for microlithographic imaging

A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.. . ... Carl Zeiss Smt Gmbh

03/23/17 / #20170082930

Microlithographic projection exposure apparatus and measuring device for a projection lens

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. ... Carl Zeiss Smt Gmbh

03/23/17 / #20170082929

Illumination apparatus for a projection exposure system

For controlling an intensity distribution of an illumination radiation impinging on an object field, an illumination apparatus for a projection exposure apparatus for microlithography includes a mechanism for spatially displacing an illumination beam relative to a first facet mirror of an illumination optical unit.. . ... Carl Zeiss Smt Gmbh

03/23/17 / #20170082928

Optical system of a microlithographic projection exposure apparatus

An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser (200, 400, 500) which includes two arrangements (210, 220, 410, 420, 510, 520) following one another in the light propagation direction and made of beam-deflecting optical elements (211-213, 221-223, 411-413, 421-423, 511-513, 521-523), which produce a multiplicity of optical channels. ... Carl Zeiss Smt Gmbh

03/23/17 / #20170082824

Optical element unit

An optical element unit is provided comprising an optical element group for projecting light along an optical axis of the optical element group and a housing having an inner housing part partly defining a first space and a light passageway between the inner housing part and a second space. The inner housing part receives the optical element group. ... Carl Zeiss Smt Gmbh








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