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D2s Inc patents (2018 archive)


Recent patent applications related to D2s Inc. D2s Inc is listed as an Agent/Assignee. Note: D2s Inc may have other listings under different names/spellings. We're not affiliated with D2s Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "D" | D2s Inc-related inventors


Method and system for dimensional uniformity using charged particle beam lithography

A method for mask process correction or forming a pattern on a reticle using charged particle beam lithography is disclosed, where the reticle is to be used in an optical lithographic process to form a pattern on a wafer, where sensitivity of the wafer pattern is calculated with respect to changes in dimension of the reticle pattern, and where pattern exposure information is modified to increase edge slope of the reticle pattern where sensitivity of the wafer pattern is high. A method for fracturing or mask data preparation is also disclosed, where pattern exposure information is determined that can form a pattern on a reticle using charged particle beam lithography, where the reticle is to be used in an optical lithographic process to form a pattern on a wafer, and where sensitivity of the wafer pattern is calculated with respect to changes in dimension of the reticle pattern.. ... D2s Inc

Sub-resolution assist features in semiconductor pattern writing

A method for optical proximity correction includes inputting a physical design having a plurality of shapes. Each shape has a plurality of corners, and the physical design is to be exposed on a surface of a substrate. ... D2s Inc








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