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Entegris Inc patents

Recent patent applications related to Entegris Inc. Entegris Inc is listed as an Agent/Assignee. Note: Entegris Inc may have other listings under different names/spellings. We're not affiliated with Entegris Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "E" | Entegris Inc-related inventors

Substrate container with improved substrate retainer and door latch assist mechanism

A substrate container with a substrate retainer mounted to a biased actuation linkage, and a door assembly with latch assist. Various configurations for biasing the substrate retainer in a substrate non-engagement position are disclosed. ... Entegris Inc

Post chemical mechanical polishing formulations and method of use

A cleaning composition and process for cleaning post-chemical mechanical polishing (cmp) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. ... Entegris Inc

Silicon carbide/graphite composite and articles and assemblies comprising same

. . A silicon carbide-graphite composite is described, including (i) interior bulk graphite material and (ii) exterior silicon carbide matrix material, wherein the interior bulk graphite material and exterior silicon carbide matrix material inter-penetrate one another at an interfacial region therebetween, and wherein graphite is present in inclusions in the exterior silicon carbide matrix material. Such material may be formed by contacting a precursor graphite article with silicon monoxide (sio) gas under chemical reaction conditions that are effective to convert an exterior portion of the precursor graphite article to a silicon carbide matrix material in which graphite is present in inclusions therein, and wherein the silicon carbide matrix material and interior bulk graphite material interpenetrate one another at an interfacial region therebetween. ... Entegris Inc

Use of non-oxidizing strong acids for the removal of ion-implanted resist

A method and composition for removing bulk and/or ion-implanted resist material from microelectronic devices have been developed. The compositions effectively remove the ion-implanted resist material while not damaging the silicon-containing or germanium-containing materials.. ... Entegris Inc

Passivation of germanium surfaces

Compositions useful for the passivation of germanium-containing materials on a microelectronic device having same thereon.. . ... Entegris Inc

Wafer support column with interlocking features

A substrate support assembly for a substrate container. The assembly may include a pair of substrate support columns each including a stack of a plurality of shelf members and a plurality of support rods inserted through the stack for securing the stack together. ... Entegris Inc

Microporous carbon monoliths from natural carbohydrates

A carbon pyrolyzate material is disclosed, having utility as an adsorbent as well as for energy storage and other applications. The pyrolyzate material comprises microporous carbon derived from low cost naturally-occurring carbohydrate source material such as polysaccharides. ... Entegris Inc

Depth filtration media with multiple organic and/or inorganic materials

A method of making depth filtration media, such as for use in a depth filter, are described. The resulting depth filtration media includes a core tube having two or more different layers. ... Entegris Inc

Carbon dopant gas and co-flow for implant beam and source life performance improvement

Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. ... Entegris Inc

Post-etch residue removal for advanced node beol processing

The disclosure relates to a cleaning composition that aids in the removal of post-etch residues and aluminum-containing material, e.g., aluminum oxide, in the production of semiconductors that utilize an aluminum-containing etch stop layer. The compositions have a high selectivity for post-etch residue and aluminum-containing materials relative to low-k dielectric materials, cobalt-containing materials and other metals on the microelectronic device.. ... Entegris Inc

Substrate container with enhanced containment

Substrate containers and/or portions thereof for use in the semiconductor manufacturing industry can be formed by injection molding metal slurries. More particularly, such substrate containers and/or portions thereof can be formed by injection molding metal slurries containing magnesium or magnesium alloys. ... Entegris Inc

Compositions and methods for removing ceria particles from a surface

A removal composition and process for cleaning post-chemical mechanical polishing (cmp) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and cmp contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, or tungsten-containing materials.. ... Entegris Inc

Articles coated with a fluoro-annealed film

Articles and methods relating to coatings having superior chemical resistance and structural integrity, can be prepared via atomic layer deposition and fluoro-annealing at low process temperatures of between about 150° c. And less than 300° c. ... Entegris Inc

Formulations to selectively etch silicon germanium relative to germanium

Compositions useful for the selective removal of silicon germanium materials relative to germanium-containing materials and silicon-containing materials from a microelectronic device having same thereon. The removal compositions include at least one diol and are tunable to achieve the required sige:ge removal selectivity and etch rates.. ... Entegris Inc

07/12/18 / #20180193785

High pressure filter

A high pressure filter including first and second housings having complimentary tapered surfaces, a gasket located between the tapered surfaces, a filter element centrally disposed within the housings, and a compression collar fitted over the second housing and threaded onto the first housing is provided. Methods of making and using high pressure filters are also provided.. ... Entegris Inc

07/05/18 / #20180185835

Grafted polysulfone membranes

A polysulfone membrane is modified so that monomers are grafted onto the surface of the membrane. The polysulfone membranes can be grafted by contacting the membrane with a grafting solution and exposing the membrane to electromagnetic radiation, typically within the ultraviolet portion of the spectrum. ... Entegris Inc

06/28/18 / #20180180225

Anti-spike pressure management of pressure-regulated fluid storage and delivery vessels

A fluid supply package comprising a pressure-regulated fluid storage and dispensing vessel, a valve head adapted for dispensing of fluid from the vessel, and an anti-pressure spike assembly adapted to combat pressure spiking in flow of fluid at inception of fluid dispensing.. . ... Entegris Inc

06/21/18 / #20180174875

Flow modification fixture for an equipment front end module

An equipment front end module. An equipment front end module (efem) includes a flow modification feature projecting away from an interior wall of the equipment front end module and extending into an interior of the equipment front end module (efem) at an angle. ... Entegris Inc

06/21/18 / #20180174874

Wafer carrier having a door with a unitary body

A front opening wafer carrier includes: a container portion. The container portion includes a top wall, a bottom wall, a pair of side walls, a back wall, and a door frame opposite the back wall, the door frame defining a front opening, and a door removably received in the door frame for closing the front opening. ... Entegris Inc

06/21/18 / #20180172187

Anti-rotation device for hydraulic connectors

An anti-rotation device for preventing a hydraulic connector assembly from leaking. Various embodiments of the anti-rotation device provide a mechanism whereby threadably engaged connectors, such as compression fittings, are permitted to rotate only a fraction of a turn after loosening. ... Entegris Inc

06/07/18 / #20180158687

Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt

The present disclosure relates to a bridging asymmetric haloalkynyl dicobalt hexacarbonyl precursors, and ultra high purity versions thereof, methods of making, and methods of using these bridging asymmetric haloalkynyl dicobalt hexacarbonyl precursors in a vapor deposition process. One aspect of the disclosure relates to an ultrahigh purity bridging asymmetric haloalkynyl dicobalt hexacarbonyl precursor of the formula co2(co)6(r3c≡cr4), where r3 and r4 are different organic moieties and r4 is more electronegative or more electron withdrawing compared to r3.. ... Entegris Inc

05/31/18 / #20180149315

Gas cabinets

Gas supply systems and methods are described for delivery of gas to gas-utilizing process tools, e.g., gas-utilizing tools for manufacturing of semiconductor products, flat-panel displays, solar panels, etc. The gas supply systems may comprise gas cabinets that are arranged with adsorbent-based and/or interiorly pressure-regulated gas supply vessels therein, and a gas mixing manifold is described, which may be disposed in the gas cabinet or operated in a standalone fashion. ... Entegris Inc

05/31/18 / #20180148669

Cleaning compositions for removing post etch residue

The disclosure relates to a cleaning composition that aids in the removal of post-etch residues in the production of semiconductors. There is provided a stock composition comprising: a tetraalkylammonium hydroxide base or a quaternary trialkylalkanolamine base; a corrosion inhibitor; and a combination of at least two or more polyprotic acids or salts thereof, wherein at least one said polyprotic acid or salt thereof contains phosphorous.. ... Entegris Inc

05/24/18 / #20180142345

Low temperature molybdenum film deposition utilizing boron nucleation layers

The disclosure relates to a method of making molybdenum films utilizing boron and molybdenum nucleation layers. The resulting molybdenum films have low electrical resistivity, are substantially free of boron, and can be made at reduced temperatures compared to conventional chemical vapor deposition processes that do not use the boron or molybdenum nucleation layers. ... Entegris Inc

05/17/18 / #20180138065

Wafer container with external passive getter module

A semiconductor wafer container assembly includes a container defining an exterior and defining an interior having a wafer storage area adapted to support one or more semiconductor wafers. The container also defines an opening in the container between the exterior and the interior. ... Entegris Inc

05/10/18 / #20180130706

Cobalt deposition selectivity on copper and dielectrics

A process for forming cobalt on a substrate, comprising: volatilizing a cobalt precursor of the disclosure, to form, a precursor vapor: and contacting the precursor vapor with the substrate under vapor deposition conditions effective for depositing cobalt on the substrate from the precursor vapor, wherein the vapor deposition conditions include temperature not exceeding 200° c., wherein: the substrate includes copper surface and dielectric material, e.g., ultra-low dielectric material. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms a capping layer, encapsulating layer, electrode, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel, display, or solar panel. ... Entegris Inc

05/10/18 / #20180130654

Precursors for silicon dioxide gap fill

A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon dioxide of a substantially void-free character and substantially uniform density throughout its bulk mass. A method of manufacturing a semiconductor product also is described, involving use of specific silicon precursor compositions for forming substantially void-free and substantially uniform density silicon dioxide material in the trench. ... Entegris Inc

05/03/18 / #20180119888

Valve assemblies and fluid storage and dispensing packages comprising same

Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. ... Entegris Inc

04/19/18 / #20180104147

Dry sterilizable bag and clamp for storing liquid and frozen media and dispensing

A single-use bag (32) and dispensing system (30) for storage of liquid or frozen media and for dispensing the media are disclosed. A single-use bag (32) is composed of materials that can withstand the temperatures required for dry heat sterilization and, further, includes specialized clamps (40, 140) that accommodate the materials and construction techniques necessary for constructing the single-use bag (32) for restriction and isolation of flow from the single-use bag (32). ... Entegris Inc

03/15/18 / #20180071891

Cmp pad conditioning assembly

A chemical mechanical planarization (cmp) pad conditioning assembly that includes one or more support structures positioned between one or more abrasive regions of the pad conditioning assembly is disclosed. The support structures and abrasive regions can be separated by one or more channels. ... Entegris Inc

03/01/18 / #20180056291

Bottom opening pod with magnetically coupled casssettes

A bottom opening pod utilizing magnetic coupling for securing one or more cassettes within. The pod includes magnetic couplers that provide magnetic coupling between the cassette(s) and the bottom door of the pod. ... Entegris Inc

02/15/18 / #20180044800

Coatings for enhancement of properties and performance of substrate articles and apparatus

Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. ... Entegris Inc

02/15/18 / #20180044788

Alloys of co to reduce stress

A deposited cobalt composition is described, including cobalt and one or more alloy component that is effective in combination with cobalt to enhance adhesion to a substrate when exposed on the substrate to variable temperature and/or delaminative force conditions, as compared to corresponding elemental cobalt, wherein the one or more alloy component is selected from the group consisting of boron, phosphorous, tin, antimony, indium, and gold. Such deposited cobalt composition may be employed for metallization in semiconductor devices and device precursor structures, flat-panel displays, and solar panels, and provides highly adherent metallization when the metallized substrate is subjected to thermal cycling and/or chemical mechanical planarization operations in the manufacturing of the semiconductor, flat-panel display, or solar panel product.. ... Entegris Inc

02/15/18 / #20180044787

High-purity tungsten hexacarbonyl for solid source delivery

A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. ... Entegris Inc

02/01/18 / #20180029865

Apparatus and method for pressure dispensing of high viscosity liquid-containing materials

A liner-based pressure dispensing container includes a connector-mounted probe arranged to seat a dip tube against an inner surface of a liner fitment for sealing utility. A dip tube and probe may include increased and/or matched flow area. ... Entegris Inc

01/25/18 / #20180023765

Smart package

A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (qr) code and an rfid tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). ... Entegris Inc

01/18/18 / #20180019165

Cvd mo deposition by using moocl4

A method of forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum oxytetrachloride (moocl4) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. In various implementations, a diborane contact of the substrate may be employed to establish favorable nucleation conditions for the subsequent bulk deposition of molybdenum, e.g., by chemical vapor deposition (cvd) techniques such as pulsed cvd.. ... Entegris Inc

01/11/18 / #20180011003

Small volume, long pathlength multi-pass gas cell for ir and uv monitoring

A multipass cell assembly for monitoring of fluid is described, as well as fluid processing systems utilizing same, and associated methods of use of such multipass cell assembly for fluid monitoring. The multipass cell assembly is usefully employed in fluid processing operations such as monitoring of vapor deposition process reactants, e.g., reactants used for vapor deposition metallization of tungsten from a tungsten carbonyl precursor.. ... Entegris Inc

12/28/17 / #20170372931

Horizontal substrate container with integral corner spring for substrate containment

A substrate container including substrate supports, such as concentric rings, adapted to receive substrates in a substrate stack. The container includes a base and a top cover to enclose the substrate stack. ... Entegris Inc

12/28/17 / #20170370691

Connection verification tool

A connection verification tool for verifying a secure connection between two fluid handling components of a fluid handling system. A connection verification tool can include a gauge portion sized sized to be placed over a first fluid handling component connected to a second fluid handling component to verify a secure connection between the two components. ... Entegris Inc

12/21/17 / #20170365496

Wafer container wiht shock condition protection

A front opening wafer container has a container portion and a door sized to close an open front of the container portion. The container portion has shelves for holding wafers defining a seating position and has forward and rearward wafer supports to suspend wafers therebetween in a transport position above the seating position. ... Entegris Inc

12/21/17 / #20170361583

Film with improved flex crack resistance

Provided herein are liners, for example, for storing or dispensing high purity chemicals, as well as methods of manufacturing such liners. The liners resist formation of stress-induced breaches. ... Entegris Inc

12/07/17 / #20170352549

Vapor phase etching of hafnia and zirconia

A method is described for vapor phase etching of oxide material including at least one of hafnia (hfo2) and zirconia (zro2), in the absence of plasma exposure of the oxide material. The method involves contacting the oxide material with an etching medium including at least one of phosphorus chloride and tungsten chloride under conditions producing a removable fluid reaction product, and removing the removable fluid reaction product. ... Entegris Inc

11/30/17 / #20170342557

Solid vaporizer

Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, leds, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.. ... Entegris Inc

11/23/17 / #20170338130

Ion implanter comprising integrated ventilation system

An ion implantation system is described, including: an ion implanter comprising a housing defining an enclosed volume in which is positioned a gas box configured to hold one or more gas supply vessels, the gas box being in restricted gas flow communication with gas in the enclosed volume that is outside the gas box; a first ventilation assembly configured to flow ventilation gas through the housing and to exhaust the ventilation gas from the housing to an ambient environment of the ion implanter; a second ventilation assembly configured to exhaust gas from the gas box to a treatment apparatus that is adapted to at least partially remove contaminants from the gas box exhaust gas, or that is adapted to dilute the gas box exhaust gas, to produce a treated effluent gas, the second ventilation assembly comprising a variable flow control device for modulating flow rate of the gas box exhaust gas between a relatively lower gas box exhaust gas flow rate and a relatively higher gas box exhaust gas flow rate, and a motive fluid driver adapted to flow the gas box exhaust gas through the variable flow control device to the treatment apparatus; and a monitoring and control assembly configured to monitor operation of the ion implanter for occurrence of a gas hazard event, and thereupon to responsively prevent gas-dispensing operation of the one or more gas supply vessels, and to modulate the variable flow control device to the relatively higher gas box exhaust gas flow rate so that the motive fluid driver flows the gas box exhaust gas to the treatment apparatus at the relatively higher gas box exhaust gas flow rate. Preferably, in a gas hazard event, the shell exhaust discharge from the housing is also terminated, to facilitate exhausting all gas within the housing, outside as well as inside the gas box, to the treatment unit.. ... Entegris Inc

11/23/17 / #20170338104

Formulations for the removal of particles generated by cerium-containing solutions

Compositions and methods for removing lanthanoid-containing solids and/or species from the surface of a microelectronic device or microelectronic device fabrication hardware. Preferably, the lanthanoid-containing solids and/or species comprise cerium. ... Entegris Inc

11/23/17 / #20170338082

Alon coated substrate with optional yttria overlayer

A fluorine plasma resistant coating on a substrate being a component in a semiconductor manufacturing system is disclosed. In one embodiment the composition includes an alon coating that overlies a substrate, and an optional yttria coating layer that overlies the alon coating, with a total coating thickness of about 5-6 microns.. ... Entegris Inc

11/23/17 / #20170338075

Ion implantation processes and apparatus

An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (10), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. ... Entegris Inc

11/23/17 / #20170333841

Gas purifier

The invention relates to a gas purifier that removes moisture and oxygen from inert gases and reducing gases, for example, at sub-atmospheric pressures. The purifier can remove part per million levels of moisture in a gas stream to less than 100 parts per trillion by volume, and has a low pressure drop and a sharp breakthrough curve.. ... Entegris Inc

11/16/17 / #20170330756

Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system

An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.. . ... Entegris Inc

11/16/17 / #20170330726

Fluorinated compositions for ion source performance improvements in nitrogen ion implantation

Compositions, methods, and apparatus are described for carrying out nitrogen ion implantation, which avoid the incidence of severe glitching when the nitrogen ion implantation is followed by another ion implantation operation susceptible to glitching, e.g., implantation of arsenic and/or phosphorus ionic species. The nitrogen ion implantation operation is advantageously conducted with a nitrogen ion implantation composition introduced to or formed in the ion source chamber of the ion implantation system, wherein the nitrogen ion implantation composition includes nitrogen (n2) dopant gas and a glitching-suppressing gas including one or more selected from the group consisting of nf3, n2f4, f2, sif4, wf6, pf3, pf5, asf3, asf5, cf4 and other fluorinated hydrocarbons of cxfy (x≧1, y≧1) general formula, sf6, hf, cof2, of2, bf3, b2f4, gef4, xef2, o2, n2o, no, no2, n2o4, and o3, and optionally hydrogen-containing gas, e.g., hydrogen-containing gas including one or more selected from the group consisting of h2, nh3, n2h4, b2h6, ash3, ph3, sih4, si2h6, h2s, h2se, ch4 and other hydrocarbons of cxhy (x≧1, y≧1) general formula and geh4.. ... Entegris Inc

10/12/17 / #20170294329

Wafer shipper with purge capability

A purge configurable wafer shipper. The container includes an enclosure portion with an open side or bottom, a door to sealing close the open side or bottom. ... Entegris Inc

10/12/17 / #20170294327

Substrate container

A front opening wafer container with a forward and rearward sets of stacked v-shaped wafer edge receiving portions, the rearward set part of a wafer shelf component and comprising a thin film of pbt preformed and overmolded with a polycarbonate. The sets of stacked v-shaped wafer edge receiving portions providing between-shelf seating positions above on-shelf seating positions. ... Entegris Inc

10/12/17 / #20170294326

Substrate container with window retention spring

A reticle container for containing a reticle including a base plate having one or more windows. Each of the windows can include mounting recess having a recess sidewall including an undercut defined therein. ... Entegris Inc

10/12/17 / #20170292653

Fluid delivery system and method

A fluid supply system adapted for vacuum and pressure cycling of fluid, including a transfer vessel adapted to supply a process canister with fluid drawn from a bulk canister under a vacuum, wherein delivery of fluid from the transfer vessel to the process canister is accomplished with positive pressure. A method is also disclosed of delivering fluid, including drawing fluid under vacuum from a bulk canister and pressurizing the transfer vessel to effect dispensing of the fluid into a process canister for delivery to a location of use.. ... Entegris Inc

09/28/17 / #20170274507

High torque polymer fittings

A high torque polymer fittings useful in fluid handling systems. The fittings are especially useful for fluid handling fittings having diameters of one inch or greater. ... Entegris Inc

09/21/17 / #20170271188

Substrate container valve assemblies

A substrate container includes a container portion having an open side or bottom, and a door to sealingly close the open side or bottom, one of the door and the container portion defining access structure. The substrate container additionally includes a check-valve assembly, the check-valve assembly being retained with respect to the access structure to provide fluid communication with an interior of the substrate container. ... Entegris Inc

09/14/17 / #20170260449

Compositions and methods for selectively etching titanium nitride

Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.. ... Entegris Inc

09/14/17 / #20170259216

Point of use or point of dispense filter wiht multiple pleat packs

Embodiments provide a filter with a generally rectangular, non-cylindrical profile. The filter may have multiple pleat packs positioned between pleat covers that define regions and flow channels in a cavity of the filter body. ... Entegris Inc

09/07/17 / #20170253423

Packaging for dip tubes

A packaging pouch for storing and/or transporting one or more dip tube assemblies is provided. The pouch includes a front side sealably and fixedly attached to a back side along a first sealed edge, a second sealed edge, and a sealed end. ... Entegris Inc

08/31/17 / #20170250084

Phosphorus or arsenic ion implantation utilizing enhanced source techniques

Apparatus and method for use of solid dopant phosphorus and arsenic sources and higher order phosphorus or arsenic implant source material are described. In various implementations, solid phosphorus-comprising or arsenic-comprising materials are provided in the ion source chamber for generation of dimer or tetramer implant species. ... Entegris Inc

08/31/17 / #20170248275

Pressure-regulated gas supply vessel

A gas storage and dispensing vessel, including a vessel container definishing a gas storage interior volume, and a valve head regulator assembly secured to the vessel container, the valve head regulator assembly including a single gas pressure regulator disposed in the interior volume of the vessel container, and a valve head including a pneumatic flow control valve, wherein the single regulator is configured with a set point pressure of at least 0.5 mpa, and wherein the interior volume of the vessel container is at least 5 l.. . ... Entegris Inc

08/17/17 / #20170236737

Wafer container with door guide and seal

A wafer container that reduces or alleviates one or more of the problems associated with excessive container wall deflection due to loading and excessive particulate generation, particularly as those problems are experienced with containers for 450 mm diameter and larger wafers. The container has an enclosure and door with interlocking features to enable transfer of tension load to the door to minimize deflection of container surfaces. ... Entegris Inc

07/13/17 / #20170200619

Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility

A liquid removal composition and process for removing anti-reflective coating (arc) material and/or post-etch residue from a substrate having same thereon. The composition achieves at least partial removal of arc material and/or post-etch residue in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric and nitride-containing materials employed in the semiconductor architecture.. ... Entegris Inc

07/13/17 / #20170200601

Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility

Cleaning compositions and processes for cleaning post-plasma etch residue from a microelectronic device having said residue thereon. The composition achieves highly efficacious cleaning of the residue material, including titanium-containing, copper-containing, tungsten-containing, and/or cobalt-containing post-etch residue from the microelectronic device while simultaneously not damaging the interlevel dielectric, metal interconnect material, and/or capping layers also present thereon.. ... Entegris Inc

05/04/17 / #20170122496

Adsorbent-based pressure stabilization of pressure-regulated fluid storage and dispensing vessels

A fluid supply package is described, including a pressure-regulated fluid storage and dispensing vessel comprising a fluid dispensing flow path, and adsorbent disposed in the flow path or in fluid communication therewith to reversibly adsorb fluid from the flow path for pressure stabilization of fluid dispensed from the vessel. A corresponding method is disclosed, of stabilizing fluid pressure during dispensing of fluid through a fluid flow path in a fluid supply package, by contacting the fluid in the fluid flow path with an adsorbent on which the fluid is reversibly adsorbable during the dispensing of fluid. ... Entegris Inc

04/27/17 / #20170114879

Anti-backlash mechanism for motor-driven components in precision systems and applications

Backlash in a precision system such as a pumping system can be reduced or eliminated with an anti-backlash device that has a first nut coupled to and fixed in relation to a piston. The first nut and a second nut may engage with a lead screw of a motor driving the piston. ... Entegris Inc

04/27/17 / #20170114452

Cobalt precursors for low temperature ald or cvd of cobalt-based thin films

Cobalt silylamide and cobalt carbonyl precursors are described, which are usefully employed in vapor deposition processes, such as chemical vapor deposition and atomic layer deposition, to deposit cobalt and to form high purity cobalt-containing films at temperatures below 400° c. These precursors and processes can be utilized in the manufacture of integrated circuitry and production of devices such as microprocessors, and logic and memory chips.. ... Entegris Inc

04/20/17 / #20170108427

Disposable liquid chemical sensor system

Embodiments as disclosed herein may provide a sensor system including a container, such as a bag, having a port assembly integrated therewith. The port assembly includes an optically transparent window and be configured such that a sensor may be mechanically attached to the port assembly to interface with the optical window. ... Entegris Inc

04/20/17 / #20170107982

System and method for operation of a pump with feed and dispense sensors, filtration and dispense confirmation, and reduced pressure priming of filter

A pumping system with a pressure sensor positioned on the fill side and a pressure sensor on the dispense side to obtain and provide pressure information that can be used by a controller in determining various operating profiles. To avoid trapping air in a process fluid, a pressure sensor can be flush mounted or mounted at an angle on the sidewall of a feed chamber, a bottle, or a reservoir tank at or near the bottom or half-height. ... Entegris Inc

04/13/17 / #20170103888

Amine catalysts for low temperature ald/cvd sio2 deposition using hexachlorodisilane/h2o

A precursor composition is described, useful for low temperature (<150° c.) vapor deposition of silicon dioxide. The precursor composition includes hexachlorodisilane, water, and nitrogenous catalyst including an amide compound selected from the group consisting of n-ethylacetamide and n,n-dimethylformamide. ... Entegris Inc

04/06/17 / #20170098568

Electrostatic chuck

In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck. The surface layer includes a plurality of protrusions extending to a height above portions of the surface layer surrounding the protrusions to support the substrate upon the protrusions during electrostatic clamping of the substrate. ... Entegris Inc

04/06/17 / #20170095903

Chemical mechanical planarization pad conditioner with elongated cutting edges

A cmp pad conditioner for conditioning a polishing pad. Various embodiments of the disclosure include a plurality of elongated protrusions work a conditioned surface of a polishing pad at a variety of attack angles as the cmp pad conditioner engages the polishing pad. ... Entegris Inc

04/06/17 / #20170095771

System and method for removing airborne molecular contaminants from gas streams

System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. ... Entegris Inc

03/09/17 / #20170069499

Carbon materials for carbon implantation

A method of implanting carbon ions into a target substrate, including: ionizing a carbon containing dopant material to produce a plasma having ions; optionally co-flowing an additional gas or series of gases with the carbon-containing dopant material; and implanting the ions into the target substrate. The carbon-containing dopant material is of the formula cwfxoyhz wherein if w=1, then x>0 and y and z can take any value, and wherein if w>1 then x or y is >0, and z can take any value. ... Entegris Inc

03/02/17 / #20170062253

Thin wafer shipper

An improved wafer support mechanism in a wafer container useful for carrying a plurality of axially aligned thin mostly circular wafer substrates. The container includes a cassette that has a plurality of adjacently disposed teeth for receiving the substrates, wherein each rib member is continuous from the cassette open top to the cassette open bottom, a removable top cover portion, a removable bottom cover portion, a cushion assembly removably attached to the container top cover, and another cushion assembly removably located in the container bottom cover and held in place by the weight of the wafer cassette. ... Entegris Inc

02/09/17 / #20170037511

Solid precursor-based delivery of fluid utilizing controlled solids morphology

Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. ... Entegris Inc

02/09/17 / #20170036158

High purity gas purifier

High-purity gas purifiers for purification of corrosive gases, such as halogen gases or halide gases, and noncorrosive gases, such as hydrogen and inert gases, methods of making and methods of using the gas purifiers, are described. The gas purifier includes a housing made of nickel or stainless steel. ... Entegris Inc

02/02/17 / #20170032973

Cobalt cvd

A cobalt deposition process, including: volatilizing a cobalt precursor selected from among cctba, cctmsa, and ccbtmsa, to form a precursor vapor; and contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms an electrode, capping layer, encapsulating layer, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel display, or solar panel.. ... Entegris Inc

02/02/17 / #20170032942

Surface coating for chamber components used in plasma systems

Disclosed herein are surface coatings for plasma components that have the benefit of being robust against chemical and plasma physical attack in aggressive (e.g., fluorine-based) plasma environments. The coatings also provide low plasma surface recombination rates for active oxygen, nitrogen, fluorine, and hydrogen species when compared with other known surface treatments. ... Entegris Inc

02/02/17 / #20170029946

Method and apparatus to help promote contact of gas with vaporized material

Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. ... Entegris Inc

01/19/17 / #20170018422

Nodule ratios for targeted enhanced cleaning performance

A foam brush that has nodules on an outer diameter surface of the brush that have a pitch to diameter ratio (p/d) of between 1.2 and 1.5 and a nodule height to nodule diameter ratio of 0.2 to 0.5 can be used to achieve improved small particle and organic residue removal from substrates following cmp processing. Cmp cleaning brushes of the disclosure may also be prepared with foams that are relatively soft and have a compression strength of less than 90 grams/cm2. ... Entegris Inc

01/19/17 / #20170016825

System and method for detection and signaling of component end-of-life in a dissolved oxygen sensor

Embodiments as disclosed herein may include a sensor including a luminophor exposed to a fluid flow path. The luminophor may emit light in response to illumination by an excitation light source. ... Entegris Inc

01/05/17 / #20170003056

Carbon monoliths for adsorption refrigeration and heating applications

An adsorbent assembly for use in an adsorption heating and/or cooling system is described. The adsorbent assembly includes an array of adsorbent articles in which at least one adsorbent article is arranged in at least one of the following compatible arrangements (i)-(iii): (i) in contact with at least one other adsorbent article along matable engagement surfaces of respective contacting articles, with the contacting articles being configured to form a communicating gas flow passage through the contacting articles or at peripheral portions thereof; (ii) in a tube comprising at least one matable engagement surface that is in contact with a complementary matable engagement surface of another tube containing at least one adsorbent article; and (iii) in contact with a deformable foil member that is in contact with at least one other adsorbent article and/or a heat transfer member.. ... Entegris Inc

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