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Fujifilm Planar Solutions Llc patents


Recent patent applications related to Fujifilm Planar Solutions Llc. Fujifilm Planar Solutions Llc is listed as an Agent/Assignee. Note: Fujifilm Planar Solutions Llc may have other listings under different names/spellings. We're not affiliated with Fujifilm Planar Solutions Llc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "F" | Fujifilm Planar Solutions Llc-related inventors


Reduction in large particle counts in polishing slurries

The present disclosure provides a method for reducing large particle counts (lpcs) in copper chemical mechanical polishing slurry by way of using high purity removal rate enhancer (rre) in the slurry. The conductivity of the rre in deionized water solutions correlates very strongly with the number of lpcs in the rre, and thus in a slurry using the rre.. ... Fujifilm Planar Solutions Llc

Polishing compositions

The present disclosure provides chemical mechanical polishing compositions that achieve minimal dishing at reduced dishing reducer (dr) levels when compared to known cmp compositions. The compositions of the disclosure include a dynamic surface tension reducer (dstr) which allows for lower levels of dishing reducer in the compositions. ... Fujifilm Planar Solutions Llc

Elevated temperature cmp compositions and methods for use thereof

Cmp compositions providing stable and robust polishing performance at elevated pad or wafer surface temperatures are disclosed, as well as methods for use thereof. The compositions of the disclosure include reaction rate optimizing (rro) compounds that optimize various chemical reactions occurring in the slurry chemistry at elevated polishing temperatures on the wafer surface, such that removal rate variation within an individual wafer is <10%.. ... Fujifilm Planar Solutions Llc

Reduction in large particle counts in polishing slurries

The present disclosure provides a method for reducing large particle counts (lpcs) in copper chemical mechanical polishing slurry by way of using high purity removal rate enhancer (rre) in the slurry. The conductivity of the rre in deionized water solutions correlates very strongly with the number of lpcs in the rre, and thus in a slurry using the rre.. ... Fujifilm Planar Solutions Llc

Advanced fluid processing methods and systems

This disclosure features methods of forming chemical compositions. The method includes (1) mixing a plurality of continuous material flows in a mixing tank to form a chemical composition, each continuous material flow including at least one component of the composition; and (2) moving a continuous flow of the chemical composition to a packaging station downstream of the mixing tank. ... Fujifilm Planar Solutions Llc








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