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Fujimi Incorporated patents


Recent patent applications related to Fujimi Incorporated. Fujimi Incorporated is listed as an Agent/Assignee. Note: Fujimi Incorporated may have other listings under different names/spellings. We're not affiliated with Fujimi Incorporated, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "F" | Fujimi Incorporated-related inventors


Polishing pad and polishing method

. . To provide a polishing pad capable of sufficiently polishing, in polishing of an object to be polished having at least one of a projection portion and a recessed portion on the surface, a portion near the projection portion or the inner surface of the recessed portion of the surface of the object to be polished. The polishing pad has a piloerection portion (1) in which a plurality of fibers (12) having a length of 2 mm or more are raised on the surface of a base (11), in which the mass of the fibers (12) is 250 g/m2 or more. ... Fujimi Incorporated

Variable shape frame and variable shape three-dimensional structure

A variable shape frame having a polygonal shape includes: extendable arms forming each side of a polygonal frame; and corner members located at at least two of the corners of the polygon. Each of the extendable arms includes cross units each formed by two rigid members in an x-shape and pivotally coupled by a middle coupling shaft, and an end coupling portion pivotally coupling ends of adjacent ones of the cross units. ... Fujimi Incorporated

Buffered slurry formulation for cobalt cmp

Described herein are polishing compositions containing an abrasive and a buffering material, wherein the ph of the polishing composition is about 6 to about 9, and methods of preparing and using the same.. . ... Fujimi Incorporated

Thermal spray material and thermal spray coated article

Provided is a thermal spray material that can form a compact thermal sprayed coating having an enhanced plasma erosion resistance. The herein disclosed art provides a thermal spray material that contains a rare earth element (re), oxygen (o), and a halogen element (x) as constituent elements and that contains a mixed crystal of a rare earth element oxyhalide (re-o—x) and a rare earth element halide (rex3).. ... Fujimi Incorporated

Polishing composition for silicon wafer and polishing method

To perform polishing while reducing an lpd and preventing contamination with metals, particularly nickel and copper, in final polishing of a silicon wafer. A polishing composition contains abrasives, a water-soluble polymer, a basic compound, a chelating agent, and water, in which, when the particle diameter equivalent to a particle diameter at a cumulative volume of 10% from a smaller particle diameter side is defined as d10, the particle diameter equivalent to a particle diameter at a cumulative volume of 50% from the smaller particle diameter side is defined as d50, and the particle diameter equivalent to a particle diameter at a cumulative volume of 90% from the smaller particle diameter side is defined as d90 in a particle size distribution of particles present in the polishing composition, a value of a coarse particle frequency parameter a defined by (expression 1) illustrated below is less than 1.7, a=(d90−d50)/(d50−d10) and the polishing composition is used for final polishing in silicon wafer polishing.. ... Fujimi Incorporated

Polishing composition and polishing method

. . To provide a polishing composition which is hard to cause etching or corrosion in a polishing target containing a transition metal having a standard electrode potential of -0.45 v or more and 0.33 v or less even when used for polishing the polishing target. The polishing composition contains abrasives and a metal protecting organic compound. ... Fujimi Incorporated

Variable shape frame using extendable arm

A variable shape frame includes: a plurality of extendable arms to form a frame; and a coupling mechanism that couples ends of adjoining extendable arms. Each extendable arm includes cross units having by two rigid members crossing in an x-shape and pivotally coupled by a middle coupling shaft, and an end coupling portion pivotally coupling ends of adjoining cross units. ... Fujimi Incorporated

Method for polishing silicon wafer and surface treatment composition

There is provided a polishing method capable of more reducing defects on a silicon wafer surface. A polishing method of a silicon wafer, which includes a polishing step and a surface treatment step conducted after the polishing step and in which the number of abrasives in a surface treatment composition used in the surface treatment step is 1.0×1010 particles/ml or more and 1.0×1013 particles/ml or less.. ... Fujimi Incorporated

Polishing composition, polishing method, and method for manufacturing hard brittle material substrate

. . There is provided a polishing composition for use in polishing of a surface of a polishing object including at least one of an oxide of a metal or a semimetal or a composite material of oxides of one or more metals and/or semimetals, and the polishing composition includes at least water and silica. The silica includes small-particle diameter silica having a particle diameter of 20 nm or more to 70 nm or less and large-particle diameter silica having a particle diameter of 100 nm or more to 200 nm or less, 2 mass % or more of the small-particle diameter silica is included in the polishing composition, 2 mass % or more of the large-particle diameter silica is included in the polishing composition, and a value obtained by dividing an average particle diameter of the large-particle diameter silica by an average particle diameter of the small-particle diameter silica is 2 or more.. ... Fujimi Incorporated

Polishing composition, polishing method, and method for manufacturing ceramic component

. . Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic.. ... Fujimi Incorporated

Polishing composition, polishing method, and method for manufacturing ceramic component

Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a ph of 6.0 or more to 9.0 or less, and is used for polishing ceramic.. ... Fujimi Incorporated

Polishing composition

. . The present invention provides a polishing composition for use in polishing a material having a vickers hardness of 1500 hv or higher. The polishing composition has an oxidation-reduction potential orpx mv and the material to be polishing has an oxidation-reduction potential orpy mv, with their relation satisfying orpx−orpy≧100 mv.. ... Fujimi Incorporated

Polishing method and polishing composition

Provided is a method for polishing a material having a vickers hardness of 1500 hv or higher. The polishing method comprises a step of carrying out preliminary polishing using a preliminary polishing composition that comprises an abrasive apre and a step of carrying out final polishing using a final polishing composition that comprises an abrasive afin lower in hardness than the abrasive apre.. ... Fujimi Incorporated

Polishing composition, method for manufacturing same, and polishing method

There is provided a polishing composition capable of polishing a polishing object including elemental silicon, a silicon compound, metals and the like, especially including tungsten, at a high polishing rate. The polishing composition includes: colloidal silica with organic acid immobilized to a surface thereof; hydrogen peroxide; and salt, the salt being at least one of ammonium nitrate and ammonium sulfate.. ... Fujimi Incorporated

10/05/17 / #20170283933

Thermal spray slurry, thermal spray coating and method for forming thermal spray coating

This invention provides a thermal spray slurry capable of forming a favorable thermal spray coating. The thermal spray slurry comprises a dispersion medium and thermal spray particles formed of at least one material selected from the group consisting of a ceramic, a cermet and a metal. ... Fujimi Incorporated

09/14/17 / #20170260436

Abrasives, polishing composition, and polishing method

. . Abrasives, a polishing composition, and a polishing method that can reduce undulation of an outer surface of a resin coating by polishing with reduced occurrence of polishing flaws. The polishing composition includes abrasives of aluminium oxide particles having a specific surface area of 5 m2/g or more and 50 m2/g or less and an average secondary particle diameter of 0.05 μm or more and 4.8 μm or less. ... Fujimi Incorporated

09/07/17 / #20170252892

Polishing pad

A polishing pad capable of removing waviness of a surface of a polishing target having a curved surface is provided. A polishing pad (10) includes a structure (40, 50) including a polishing surface (30) formed of a hard resin layer (40), the structure (40, 50) allowing the polishing surface (30) to follow a curved surface of a polishing target (90).. ... Fujimi Incorporated

09/07/17 / #20170252890

Polishing tool and polishing method for member having curved surface shape

A polishing method capable of removing waviness on a resin-coated surface having a curved surface is provided. The resin-coated surface having the curved surface is polished by using a polishing pad having a polishing surface formed of a hard resin layer.. ... Fujimi Incorporated

08/31/17 / #20170247574

Polishing composition

Provided is a polishing composition capable of keeping a good polishing removal rate stably. The polishing composition includes silica particles as abrasives and a basic compound as a polishing removal accelerator. ... Fujimi Incorporated

06/08/17 / #20170157842

Molding material for forming structure and molding method

. . . . . . . . Provided is a material for molding, without a mold, a highly uniform structure comprising a resin and a non-resin such as metals and ceramic. The molding material provided by this invention is formed of a powder comprising a resin and at least one species of non-resin selected among metals and ceramic. ... Fujimi Incorporated

04/20/17 / #20170107604

Thermal spray slurry, thermal spray coating and method for forming thermal spray coating

. . Provided is a thermal spray slurry capable of satisfactorily forming a thermal spray coating with superior plasma erosion resistance. The invention provides a thermal spray slurry comprising thermal spray particles and a dispersion medium. ... Fujimi Incorporated

04/20/17 / #20170107115

Processing of alumina

Described herein are stable aqueous dispersions of alumina and methods of preparing the same.. . ... Fujimi Incorporated

03/30/17 / #20170088930

Slurry for thermal spraying, sprayed coating, and method for forming sprayed coating

To provide a slurry for thermal spraying. In the slurry, even when spray particles precipitate, the precipitates easily disappear. ... Fujimi Incorporated

03/30/17 / #20170088928

Slurry for thermal spraying

To provide a slurry for thermal spraying capable of forming a favorable sprayed coating. The present invention provides a slurry for thermal spraying including spray particles including at least one material selected from the group consisting of ceramics, inorganic compounds, cermets, and metals and a dispersion medium. ... Fujimi Incorporated

03/23/17 / #20170081554

Composition for polishing silicon wafers

. . . . Provided is a composition for polishing silicon wafers, having an excellent effect of reducing haze and having low agglomerating property. A composition for polishing silicon wafers provided here includes: an amido group-containing polymer a; and an organic compound b not containing an amido group. ... Fujimi Incorporated

01/26/17 / #20170022392

Polishing composition for hard materials

This invention provides a polishing composition with which high-rate polishing is possible in an application where an object formed of a hard material is polished and also a method for producing a hard material, using the polishing composition. The polishing composition provided by this invention is characterized by that an abrasive formed of titanium diboride is dispersed in a dispersing medium. ... Fujimi Incorporated

01/12/17 / #20170009101

Polishing composition

The present invention relates to a polishing composition used in application in which a polishing object having a cobalt element-containing layer is polished, including: a cobalt dissolution inhibitor; and a ph adjusting agent, wherein the polishing composition has a ph of 4 or more and 12 or less, and the cobalt dissolution inhibitor is at least one member selected from the group consisting of an organic compound having an ether bond, an organic compound having a hydroxyl group, an organic compound having a carboxyl group and having a molecular weight of 130 or more, and salts thereof. According to the present invention, there is provided a polishing composition capable of suppressing the dissolution of a cobalt element-containing layer when a polishing object having a cobalt element-containing layer is polished.. ... Fujimi Incorporated








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